JPS6247185A - Drying of thick film circuit part - Google Patents
Drying of thick film circuit partInfo
- Publication number
- JPS6247185A JPS6247185A JP18786485A JP18786485A JPS6247185A JP S6247185 A JPS6247185 A JP S6247185A JP 18786485 A JP18786485 A JP 18786485A JP 18786485 A JP18786485 A JP 18786485A JP S6247185 A JPS6247185 A JP S6247185A
- Authority
- JP
- Japan
- Prior art keywords
- thick film
- drying
- film circuit
- temperature
- circuit pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔概要〕
基板の表面に所望の回路パターンをスクリーン印刷した
後の、乾燥工程において、乾燥炉の昇温室の蒸気を排出
しつつ乾燥することにより、回路パターンの幅が拡大す
ることを阻1[二する。[Detailed Description of the Invention] [Summary] In the drying process after screen-printing a desired circuit pattern on the surface of a substrate, the width of the circuit pattern is reduced by drying while discharging steam from the heating chamber of the drying oven. Prevent it from expanding.
本発明は厚膜回路部品の製造方法に係わり、特に乾燥方
法の改良に関する。The present invention relates to a method for manufacturing thick film circuit components, and particularly to an improvement in a drying method.
厚膜回路部′品の製造にあたっては、基板の表面に、所
望のペースト状の導体、抵抗体、或いは誘電体等をスク
リーン印刷し、乾燥炉に投入して、低温(例えば150
℃)で乾燥し、さらに、焼成炉に投入して、高温(例え
ば800℃〜900℃)で焼成して所望の回路パターン
を形成するのが一般である。In manufacturing thick film circuit components, a desired paste-like conductor, resistor, dielectric, etc. is screen printed on the surface of the substrate, placed in a drying oven, and heated at a low temperature (for example, 150℃).
It is common practice to dry the material at a temperature of 0.degree.
第2図は厚膜回路部品の乾燥特性図を示し、第3図は従
来の乾燥炉の側断面図、第4図は厚膜回路部品の一部破
断斜視図である。FIG. 2 shows a drying characteristic diagram of a thick film circuit component, FIG. 3 is a side sectional view of a conventional drying oven, and FIG. 4 is a partially cutaway perspective view of the thick film circuit component.
第4図に示すように厚膜回路部品1は、例えばアルミナ
基板のような基板2の表面に、所望のペースト状の導体
、抵抗体、或いは誘電体等をそれぞれペースト別に、回
路パターンをスクリーン印刷し、低温で乾燥し、次に高
温で焼成し、この工程を繰り返して製造している。As shown in FIG. 4, the thick film circuit component 1 is produced by screen-printing a circuit pattern on the surface of a substrate 2 such as an alumina substrate by pasting a desired paste-like conductor, resistor, dielectric material, etc. It is then dried at a low temperature, then fired at a high temperature, and this process is repeated.
但し、第4図においては、その1種の回路パターン3
(図の回路パターンは、Ag−Pdよりなる導体パター
ンを示す。)のみを示す。回路パターン3の膜厚は、2
0μm〜25μm、膜幅は例えば200μmであり、隣
接した回路パターン3の膜間隔は所望の距離Bである。However, in FIG. 4, one type of circuit pattern 3
(The circuit pattern in the figure shows a conductor pattern made of Ag--Pd.) only. The film thickness of circuit pattern 3 is 2
The film width is, for example, 200 μm, and the film interval between adjacent circuit patterns 3 is a desired distance B.
この回路パターン3をスクリーン印刷した後に実施する
乾燥工程の、乾燥特性は第2図の如くである。The drying characteristics of the drying process carried out after screen printing this circuit pattern 3 are as shown in FIG.
第2図の縦軸は乾燥温度、横軸は乾燥時間を示し、厚膜
回路部品lを乾燥炉に投入直後の、a分(例えば2分間
)は昇温工程14Aであって、常温より直線状に、所定
の保温温度T’C(例えば150℃)まで上昇させる。In Fig. 2, the vertical axis shows the drying temperature, and the horizontal axis shows the drying time. Immediately after putting the thick film circuit component l into the drying oven, a minute (for example, 2 minutes) is the temperature raising step 14A, which is a straight line from normal temperature. The temperature is then raised to a predetermined temperature T'C (for example, 150° C.).
保温工程15AではT’Cでb分(例えば10分)保持
し、次の降温工程16Aで0分(例えば2分)間の間に
徐々に陣下さ−Uる。(、うにしている。In the heat retention step 15A, the temperature is maintained at T'C for b minutes (for example, 10 minutes), and in the next temperature drop step 16A, the temperature is gradually lowered for 0 minutes (for example, 2 minutes). (I'm making a sea urchin.
上述の温度特性に準拠して、厚膜回路部品1を乾燥する
のに、従来は第3図に示すように、厚膜回路部品1をコ
ンヘア5に載せて乾燥炉10に投入し、連続乾燥して乾
燥作業の能率化をはかっζいる。In order to dry the thick film circuit component 1 according to the above-mentioned temperature characteristics, conventionally, as shown in FIG. This is done to streamline drying work.
第3図において、細長い乾燥炉10は外壁を炉壁11で
形成して、炉内に炉入口20側より腎温室14、保温室
15、炉出口21側に降温室16を設けである。In FIG. 3, an elongated drying oven 10 has an outer wall formed of an oven wall 11, and is provided with a kidney chamber 14, a heat preservation chamber 15, and a cooling chamber 16 from the oven inlet 20 side, and a cooling chamber 16 at the oven outlet 21 side.
そして、厚膜回路部品1を載せるコンヘア5は、炉入口
20より炉出「121に向かって、水平に所望の速度で
走行するよう設置しである。The container 5 on which the thick film circuit component 1 is placed is installed so as to run horizontally from the furnace inlet 20 toward the furnace outlet 121 at a desired speed.
昇温室14の下部には、下部昇温コントロール用ヒータ
17Aを、上部には−L部屏温コントロール用ヒータ1
7Bを設置し、保温室15には保温ヒータ18を、降温
室16には降温用ヒータ19をそれぞれ設置し、さらに
温室14と保温室15の間には隔壁12を、保温室15
と降温室16の間には隔壁13を、それぞれ設け、温度
管理を容易な構造となっている。At the bottom of the heating chamber 14, there is a heater 17A for lower temperature increase control, and at the upper part, a -L section temperature control heater 1 is installed.
7B, a heat-retaining heater 18 is installed in the insulating room 15, a temperature-lowering heater 19 is installed in the cooling room 16, a partition wall 12 is installed between the greenhouse 14 and the insulating room 15, and a partition wall 12 is installed in the insulating room 15.
A partition wall 13 is provided between the cooling chamber 16 and the cooling chamber 16, and the structure facilitates temperature control.
このような乾燥炉10に、厚Hり回路部品1をコンヘア
5に載ゼて、炉入[12oより、乾燥炉1oに投入し、
昇温室14でa分の間に所定の温度T”Cまで上昇させ
、保温室15の通過中のb分間T”Cに保持し、引続き
降温室16に送り込み、C分間で徐々番こ降温させ、炉
出口21で取り−Lげて厚膜回路部品lを乾燥している
。In such a drying oven 10, the thick circuit component 1 is placed on the conhair 5 and placed in the oven [12o, then put into the drying oven 1o,
The temperature is raised to a predetermined temperature T"C for a minutes in the heating chamber 14, held at T"C for b minutes while passing through the insulating chamber 15, and then sent to the cooling chamber 16, where the temperature is gradually lowered for C minutes. , the thick film circuit component l is dried by removing it at the furnace outlet 21.
しかしながら上記従来の厚膜回路部品の乾燥方法は、昇
温室においては、印刷したペースト状の回路パターンの
揮発成分が多量に蒸発する。したがって、厚膜回路部品
1を連続乾燥することにより、この蒸気が厚膜回路部品
1の周囲に充満して、蒸発が阻止され、且つペーストが
高温となることにより流動化する。よって第4図に示す
如くに回路パターン3の周縁が垂れ下がり、はみ出し3
aとなる。However, in the above-mentioned conventional drying method for thick film circuit components, a large amount of volatile components of the printed paste-like circuit pattern evaporates in the heating chamber. Therefore, by continuously drying the thick film circuit component 1, this vapor fills around the thick film circuit component 1, preventing evaporation, and the paste becomes fluidized due to the high temperature. Therefore, as shown in FIG.
It becomes a.
このはみ出し3aにより回路パターン3の幅が拡大され
る。また、隣接した回路パターン3の距離Bが縮小され
距離すになる。即ち、厚膜囲路部品1の所望の特性を得
ることが困難になるという問題点がある。The width of the circuit pattern 3 is expanded by this protrusion 3a. Furthermore, the distance B between adjacent circuit patterns 3 is reduced to a distance of 0. That is, there is a problem that it becomes difficult to obtain desired characteristics of the thick film enclosure component 1.
上記従来の問題点を解決するため本発明は、ペースト状
の導体、抵抗体、或いは誘電体等の回路パターンを基板
の表面にスクリーン印刷し、乾燥工程、焼成工程を経て
、厚膜回路部品を製造するにあたり、第1図のように、
連続乾燥炉30のJil室1室部4部分気ダクト25を
設け、ペースト状の回路パターンの発散した蒸気を排出
しつつ、厚膜回路部品1を乾燥するものである。In order to solve the above-mentioned conventional problems, the present invention screen-prints a circuit pattern of a paste-like conductor, resistor, or dielectric material on the surface of a substrate, and then performs a drying process and a baking process to form a thick film circuit component. During manufacturing, as shown in Figure 1,
An air duct 25 is provided in the Jil chamber 1 and 4 of the continuous drying oven 30 to dry the thick film circuit component 1 while discharging the vapor emitted by the paste-like circuit pattern.
上記本発明の手段によれば、乾燥炉30の昇温室14に
排気ダクト25を設け、昇温室14内の蒸気を炉外に排
出することにより、ペースト状の回路パターン3の蒸発
が進捗し、回路パターン3の硬化が促進される。したが
って、回路パターン3は周辺に垂れ下がることがなくて
、所定のパターン幅が維持される。According to the means of the present invention, the exhaust duct 25 is provided in the warming chamber 14 of the drying oven 30, and the steam inside the warming chamber 14 is discharged to the outside of the oven, so that the evaporation of the paste-like circuit pattern 3 progresses. Hardening of the circuit pattern 3 is promoted. Therefore, the circuit pattern 3 does not hang down to the periphery, and a predetermined pattern width is maintained.
以下図示実施例により、本発明を具体的に説明する。な
お、全図を通じて同一符号は同一対象物を示す。The present invention will be specifically explained below with reference to illustrated examples. Note that the same reference numerals indicate the same objects throughout the figures.
第1図は本発明に使用する1実施例の乾燥炉の側断面図
である。FIG. 1 is a sectional side view of a drying oven according to an embodiment of the present invention.
第1図に示す乾燥炉30が、第3図に示す従来の乾燥炉
10と異なる点は、昇温室14の」二部に、排気量を調
整する排気ファン26を備えた、排気ダクト25を設け
たことである。The drying oven 30 shown in FIG. 1 is different from the conventional drying oven 10 shown in FIG. This is what we have set up.
また、排気ダクト25より昇温室14内の蒸気を空気と
ともに排出するので、炉入口20より4温室に流入する
冷気の量が多くなる。この冷気が昇温室14の温度制御
を困難にするので、炉入口20の近傍に誘導板12aを
設けである。Furthermore, since the steam in the heating chamber 14 is exhausted together with air through the exhaust duct 25, the amount of cold air flowing into the four greenhouses through the furnace inlet 20 increases. Since this cold air makes it difficult to control the temperature of the heating chamber 14, a guide plate 12a is provided near the furnace inlet 20.
誘導板12aの作用により、炉入口20よりの流入空気
は炉の側壁に沿って迂回され、予熱されて昇温室14に
入る。したがって、厚膜回路部品1の周囲温度の制御が
容易である。Due to the action of the guide plate 12a, the inflowing air from the furnace inlet 20 is detoured along the side wall of the furnace, is preheated, and enters the heating chamber 14. Therefore, the ambient temperature of the thick film circuit component 1 can be easily controlled.
上述のように昇温室14に排気ダクト25を設置t 。As described above, the exhaust duct 25 is installed in the heating chamber 14.
印刷したペースト状の回路パターンから蒸発した蒸気を
排出しつつ、厚膜回路部品lを乾燥することにより、厚
膜回路部品1の周辺は常に不飽和状態に維持される。By drying the thick film circuit component 1 while discharging the vapor evaporated from the printed paste-like circuit pattern, the area around the thick film circuit component 1 is always maintained in an unsaturated state.
したがって、ペーストの蒸発成分の蒸発が進捗し回路パ
ターン3の硬化が促進され、回路パターン3が周辺に垂
れ下がることがなくて、所定のパターン幅を維持するこ
とができる。Therefore, the evaporation of the evaporative components of the paste progresses, and the curing of the circuit pattern 3 is promoted, so that the circuit pattern 3 does not sag around the periphery, and a predetermined pattern width can be maintained.
以−ヒ説明したように本発明は、乾燥炉の昇温室の蒸気
を排出しつつ、印刷したペースト状の回路パターンをを
乾燥することにより、回路パターンの周縁の垂れ下りが
阻止されて、回路パターンが所定の幅を維持することが
でき、厚膜回路部品の所望の特性を得ることできるとい
う、実用上で優れた効果がある。As explained below, the present invention allows the printed paste-like circuit pattern to be dried while exhausting the steam in the heating chamber of the drying oven, thereby preventing the peripheral edges of the circuit pattern from sagging and forming the circuit. This has excellent practical effects in that the pattern can maintain a predetermined width and desired characteristics of thick film circuit components can be obtained.
第1図は本発明に使用するl実施例の乾燥炉の側断面図
、
第2図は厚膜回路部品の乾燥特性図、
第3図は従来の乾燥炉の側断面図、
第4図は厚膜回路部品の斜視図である。
図において、
1は厚膜回路部品、 2は基板、3は回路パター
ン、 5はコンベア、10.30は乾燥炉、
14は昇温室、15は保温室、 16は
降温室、25は排気ダクト、
26は排気ファンをそれぞれ示す。
/6−−考街堅−
W−幹、燥炉
寺H吏回剣陽す刊則Fig. 1 is a side sectional view of a drying oven according to an embodiment of the present invention, Fig. 2 is a drying characteristic diagram of thick film circuit components, Fig. 3 is a side sectional view of a conventional drying oven, and Fig. 4 is a side sectional view of a drying oven according to an embodiment of the present invention. FIG. 2 is a perspective view of a thick film circuit component. In the figure, 1 is a thick film circuit component, 2 is a board, 3 is a circuit pattern, 5 is a conveyor, 10.30 is a drying oven,
14 is a warming room, 15 is a heating room, 16 is a cooling room, 25 is an exhaust duct, and 26 is an exhaust fan. /6--Kojiken-W-Kan, Droji H-Kenyosu publication rules
Claims (1)
ーンを基板の表面にスクリーン印刷し、乾燥工程、焼成
工程を経て、厚膜回路部品を製造するにあたり、 該乾燥工程の乾燥炉(10)の昇温室(14)部分に排
気ダクトを設け、前記ペースト状の回路パターンより発
生する蒸気を排出しつつ、該厚膜回路部品(1)を乾燥
することを特徴とする厚膜回路部品の乾燥方法。[Claims] In manufacturing a thick film circuit component by screen-printing a circuit pattern of a paste-like conductor, resistor, dielectric, etc. on the surface of a substrate, and going through a drying process and a baking process, the drying process An exhaust duct is provided in the heating chamber (14) of the drying oven (10), and the thick film circuit component (1) is dried while exhausting steam generated from the paste-like circuit pattern. Method for drying thick film circuit components.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18786485A JPS6247185A (en) | 1985-08-27 | 1985-08-27 | Drying of thick film circuit part |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18786485A JPS6247185A (en) | 1985-08-27 | 1985-08-27 | Drying of thick film circuit part |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6247185A true JPS6247185A (en) | 1987-02-28 |
JPH0369190B2 JPH0369190B2 (en) | 1991-10-31 |
Family
ID=16213549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18786485A Granted JPS6247185A (en) | 1985-08-27 | 1985-08-27 | Drying of thick film circuit part |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6247185A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58107171A (en) * | 1981-12-09 | 1983-06-25 | サイブロン・コ−ポレイシヨン | Oblique cultivating tube rack |
JPS58107171U (en) * | 1982-01-11 | 1983-07-21 | 山崎電機工業株式会社 | Continuous thick film firing furnace |
JPS58131662U (en) * | 1982-03-01 | 1983-09-05 | 株式会社ヤマザキ電機 | Continuous thick film firing furnace |
JPS61265893A (en) * | 1985-05-15 | 1986-11-25 | トムソン‐セーエスエフ | Printed circuit board firing furnace |
-
1985
- 1985-08-27 JP JP18786485A patent/JPS6247185A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58107171A (en) * | 1981-12-09 | 1983-06-25 | サイブロン・コ−ポレイシヨン | Oblique cultivating tube rack |
JPS58107171U (en) * | 1982-01-11 | 1983-07-21 | 山崎電機工業株式会社 | Continuous thick film firing furnace |
JPS58131662U (en) * | 1982-03-01 | 1983-09-05 | 株式会社ヤマザキ電機 | Continuous thick film firing furnace |
JPS61265893A (en) * | 1985-05-15 | 1986-11-25 | トムソン‐セーエスエフ | Printed circuit board firing furnace |
Also Published As
Publication number | Publication date |
---|---|
JPH0369190B2 (en) | 1991-10-31 |
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