JPS6246058B2 - - Google Patents
Info
- Publication number
- JPS6246058B2 JPS6246058B2 JP16249481A JP16249481A JPS6246058B2 JP S6246058 B2 JPS6246058 B2 JP S6246058B2 JP 16249481 A JP16249481 A JP 16249481A JP 16249481 A JP16249481 A JP 16249481A JP S6246058 B2 JPS6246058 B2 JP S6246058B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- electron beam
- beam irradiation
- irradiation density
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16249481A JPS5863135A (ja) | 1981-10-12 | 1981-10-12 | 電子ビ−ム露光方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16249481A JPS5863135A (ja) | 1981-10-12 | 1981-10-12 | 電子ビ−ム露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5863135A JPS5863135A (ja) | 1983-04-14 |
JPS6246058B2 true JPS6246058B2 (enrdf_load_html_response) | 1987-09-30 |
Family
ID=15755682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16249481A Granted JPS5863135A (ja) | 1981-10-12 | 1981-10-12 | 電子ビ−ム露光方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5863135A (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3177599B2 (ja) | 1998-06-12 | 2001-06-18 | 松下電子工業株式会社 | パターン形成方法 |
-
1981
- 1981-10-12 JP JP16249481A patent/JPS5863135A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5863135A (ja) | 1983-04-14 |
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