JPS6242035B2 - - Google Patents
Info
- Publication number
- JPS6242035B2 JPS6242035B2 JP58093997A JP9399783A JPS6242035B2 JP S6242035 B2 JPS6242035 B2 JP S6242035B2 JP 58093997 A JP58093997 A JP 58093997A JP 9399783 A JP9399783 A JP 9399783A JP S6242035 B2 JPS6242035 B2 JP S6242035B2
- Authority
- JP
- Japan
- Prior art keywords
- tin
- acid
- copper
- ions
- stripping solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052802 copper Inorganic materials 0.000 claims description 23
- 239000010949 copper Substances 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 22
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 18
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 16
- 229910001432 tin ion Inorganic materials 0.000 claims description 11
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 9
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 7
- 235000002906 tartaric acid Nutrition 0.000 claims description 7
- 239000011975 tartaric acid Substances 0.000 claims description 7
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 6
- 150000002894 organic compounds Chemical class 0.000 claims description 5
- 150000007522 mineralic acids Chemical class 0.000 claims description 4
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 3
- 239000000174 gluconic acid Substances 0.000 claims description 3
- 235000012208 gluconic acid Nutrition 0.000 claims description 3
- 150000007524 organic acids Chemical class 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 150000002978 peroxides Chemical class 0.000 claims description 2
- 235000015165 citric acid Nutrition 0.000 claims 1
- 238000000034 method Methods 0.000 description 20
- 239000000243 solution Substances 0.000 description 15
- 239000002244 precipitate Substances 0.000 description 11
- -1 fluorine ions Chemical class 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 230000006641 stabilisation Effects 0.000 description 4
- 238000011105 stabilization Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 3
- AUYOHNUMSAGWQZ-UHFFFAOYSA-L dihydroxy(oxo)tin Chemical compound O[Sn](O)=O AUYOHNUMSAGWQZ-UHFFFAOYSA-L 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical class OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910001439 antimony ion Inorganic materials 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 229910001430 chromium ion Inorganic materials 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- YXVFQADLFFNVDS-UHFFFAOYSA-N diammonium citrate Chemical compound [NH4+].[NH4+].[O-]C(=O)CC(O)(C(=O)O)CC([O-])=O YXVFQADLFFNVDS-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- 229910001174 tin-lead alloy Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 229910001456 vanadium ion Inorganic materials 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- ing And Chemical Polishing (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Description
【発明の詳細な説明】
本発明は金属銅上の錫または錫合金の剥離液に
関するものであり、更に詳しくは金属銅よりなる
プリント配線板上の錫または錫合金の剥離液に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a stripping solution for tin or tin alloys on metallic copper, and more particularly to a stripping solution for tin or tin alloys on printed wiring boards made of metallic copper.
プリント配線板の製造に於いて最近いわゆる銅
スルーホール配線板の要求が多くなつてきてい
る。この銅スルーホール配線板の製造法には穴詰
め法、テンテイング法、メタルレジスト剥離法の
3つがある。穴詰め法は回路形成前の銅スルーホ
ール基板に於いて穴部分にインキを詰め、表面の
回路をエツチングインキ印刷工程、エツチングイ
ンキ除去工程の順で形成する方法であり、テンテ
イング法は回路形成前の銅スルーホール基板の両
面にドライフイルムを張り、写真法で回路を現像
し、エツチング、ドライフイルムの除去の順で回
路を形成する方法である。この2つの方法では穴
が多くなつたり回路が細密化されるに従い製品の
不良率が多くなるので、細密回路の銅スルーホー
ル配線板の製造にはメタルレジスト剥離法がクロ
ーズアツプされてきた。この第3の方法は例えば
従来から行われているハンダメツキ法でハンダス
ルーホール配線板を作つた後、表面のハンダのみ
を除去して銅スルーホール配線板を作る方法であ
る。銅をエツチングする際のメタルレジストとし
ては、エツチヤントに堪えるものであれば何でも
よいが、一般に工業的には錫又は錫合金(ハン
ダ)がよい。 In the production of printed wiring boards, there has recently been an increasing demand for so-called copper through-hole wiring boards. There are three methods for manufacturing this copper through-hole wiring board: hole filling method, tenting method, and metal resist peeling method. The hole filling method is a method in which ink is filled into the holes of a copper through-hole board before circuit formation, and circuits on the surface are formed through an etching ink printing process and an etching ink removal process. In this method, a dry film is applied to both sides of a copper through-hole board, the circuit is developed using a photographic method, and the circuit is formed by etching and removing the dry film. With these two methods, the defective rate of the product increases as the number of holes increases and the circuit becomes finer, so the metal resist stripping method has been attracting attention for manufacturing copper through-hole wiring boards with fine circuits. This third method is a method in which, for example, a solder through-hole wiring board is made by a conventional solder plating method, and then only the solder on the surface is removed to make a copper through-hole wiring board. As a metal resist for etching copper, any resist may be used as long as it can withstand the etching agent, but tin or a tin alloy (solder) is generally preferred industrially.
本発明はこのようなメタルレジスト剥離法にお
ける金属銅上の錫又は錫合金の剥離液に関するも
のである。 The present invention relates to a stripping solution for tin or tin alloy on metallic copper in such a metal resist stripping method.
銅スルーホール製造のための錫又は錫合金の剥
離剤に要求される主な性質は次のようなものであ
る:
1 剥離液の単位体積当りできるだけ多くの錫又
は錫合金を溶解すること、
2 一般に錫が溶解する際は酸化性の酸や酸化剤
が存在すれば二価の錫イオンが酸化されて次式
のようなメタ錫酸の白色沈澱が生ずるが、この
白色沈澱は銅の上に再付着したり容器に付着
し、工業的なスケールの場合種々の不都合を生
ずるので、このようなメタ錫酸の沈澱の生成の
困難な液組成であること、
Sn2++1/2O2+2H2O
→H2SnO3↓+2H+
3 下地の銅の溶解が少いこと、
4 得られる銅表面が完全に清浄な光沢面である
こと。 The main properties required of a tin or tin alloy stripping agent for copper through-hole production are as follows: 1. To dissolve as much tin or tin alloy as possible per unit volume of stripping solution; 2. Generally, when tin is dissolved, if an oxidizing acid or oxidizing agent is present, the divalent tin ions are oxidized and a white precipitate of metastannic acid as shown in the following formula is formed, but this white precipitate is formed on top of the copper. Sn 2+ + 1/2O 2 + 2H 2 must have a liquid composition that makes it difficult to form metastannic acid precipitates, as it may redeposit or adhere to containers, causing various problems on an industrial scale. O →H 2 SnO 3 ↓+2H + 3. There is little dissolution of the underlying copper. 4. The resulting copper surface is completely clean and shiny.
本発明はこのような目的に合致した錫または錫
合金の剥離液を提供するものである。 The present invention provides a tin or tin alloy stripping solution that meets these objectives.
メタ錫酸の沈澱防止や銅の上への再付着を防止
する特許としては次のようなものが挙げられる:
1 フツ素イオンまたはフツ素含有錯イオンによ
る錫イオンの安定化(特開昭50―8716)、
2 チタニウムイオン、クロムイオン、アンチモ
ンイオン、バナジウムイオン等による錫イオン
の安定化(特開昭50―28425)、
3 鉄イオンによる錫イオンの安定化(特開昭49
―135840)、
4 本発明者等による=NH、又は≡Nの形で窒
素原子を含有する銅インヒビターの添加による
銅の溶解防止と錫の再付着防止(特開昭57―
164984)。 Patents that prevent metastannic acid from precipitating or redepositing onto copper include the following: 1. Stabilization of tin ions by fluorine ions or fluorine-containing complex ions (Japanese Patent Application Laid-Open No. 1989-1999) -8716), 2. Stabilization of tin ions by titanium ions, chromium ions, antimony ions, vanadium ions, etc. (Japanese Patent Application Laid-Open No. 1983-28425), 3. Stabilization of tin ions by iron ions (Japanese Patent Application Laid-Open No. 1983-28425).
-135840), 4 Prevention of dissolution of copper and prevention of redeposition of tin by the addition of a copper inhibitor containing a nitrogen atom in the form of =NH or ≡N by the present inventors (Japanese Patent Application Laid-Open No. 1983-197-
164984).
しかしながら1)の方法においては使用するフ
ツ素化合物はその多くが劇毒物であるので人体に
悪影響があり、また排水中に含まれるフツ素イオ
ンは処理が困難であるために排水処理上種々の困
難を生じることになり工業的には問題がある。
2)の方法においてはチタニウイオン等を含有す
る金属化合物は多くのものが有毒物質であるとい
う欠点を有しており、また3)の方法においては
存在する鉄イオンが酸化剤の分解も促進するとい
う問題を有しており、無機酸の存在下では金属銅
のエツチングが甚大になる不利益がある。そして
1)〜4)の何れの方法においても液中の錫濃度
が30g/lを越えると白色沈澱を生じ、液の品質
管理が困難となり工業的には錫イオンに対してこ
れ以上溶解能を上げることはむずかしいのが実情
である。 However, in method 1), many of the fluorine compounds used are highly toxic and have an adverse effect on the human body, and the fluorine ions contained in wastewater are difficult to treat, resulting in various difficulties in wastewater treatment. This is an industrial problem.
Method 2) has the disadvantage that many metal compounds containing titanium ions are toxic substances, and method 3) has the disadvantage that the iron ions present also accelerate the decomposition of the oxidizing agent. However, in the presence of inorganic acids, metal copper is severely etched, which is a disadvantage. In any of the methods 1) to 4), if the tin concentration in the liquid exceeds 30 g/l, a white precipitate will occur, making it difficult to control the quality of the liquid, and industrially it is difficult to further dissolve tin ions. The reality is that it is difficult to raise it.
しかるに本発明によれば、酒石酸、クエン酸、
グルコン酸およびそれらの塩からなる群から選ん
だ錫イオンに対して錯体形成能を有する有機化合
物を該剥離液の成分として使用することにより、
錯イオンを安定させ剥離液の錫溶解能を向上させ
ることが可能である。 However, according to the present invention, tartaric acid, citric acid,
By using an organic compound having the ability to form a complex with tin ions selected from the group consisting of gluconic acid and salts thereof as a component of the stripping solution,
It is possible to stabilize the complex ions and improve the tin dissolving ability of the stripping solution.
本発明によれば、40〜50g/lの錫含有量まで
沈澱を生じない。又これを越える錫の含有量で
も、溶解してから沈澱を生ずるまで2日(48時
間)〜15日の時間を要し、工業的には沈澱を前生
じないものとして取扱つて何等差支えない。 According to the invention, no precipitation occurs up to a tin content of 40-50 g/l. Even if the tin content exceeds this value, it will take 2 days (48 hours) to 15 days for precipitation to occur after dissolution, and there is no problem in industrially handling it as if no precipitation occurs.
本発明に於ける錯体形成能を有し錫イオンを安
定化させる有機化合物としては酒石酸、酒石酸塩
類例えばナトリウム塩、カリウム塩、ロツシエル
塩、クエン酸、クエン酸塩類例えばクエン酸2ア
ンモニウム塩、グルコン酸、グルコン酸塩類例え
ばナトリウム塩、カリウム塩が挙げられる。これ
らの錯化剤と錫イオンは処理液中で例えば次式の
ような錯体を形成し錫イオンが安定化される錫の
溶解が促進されるものと考えられる。 In the present invention, organic compounds that have the ability to form a complex and stabilize tin ions include tartaric acid, tartrates such as sodium salt, potassium salt, Rothsiel's salt, citric acid, citric acid salts such as diammonium citrate, and gluconic acid. , gluconate salts such as sodium salt and potassium salt. It is thought that these complexing agents and tin ions form, for example, a complex as shown in the following formula in the treatment solution, which stabilizes the tin ions and promotes the dissolution of tin.
本発明の剥離液に用いる無機酸としては工業的
には硝酸、塩酸が実用的であり、その量は1〜5
モル/lが望ましい。これらの無機酸の外に適当
な有機酸を添加することにより銅面を光沢のある
清浄な面に保つことができる。これに適する炭素
数が2または3の低分子有機酸としては酢酸、プ
ロピオン酸、グリコール酸、乳酸など低分子の有
機酸があげられ、その添加量は夫々1種類か又は
2種類以上で合計1〜3モル/lが望ましい。ま
た過酸化物としては当該技術分野における通常の
酸化剤を使用することができるが、市販の35%過
酸化水素の使用が最も簡便であり量としては5〜
50g/lが望ましい。 As the inorganic acid used in the stripping solution of the present invention, nitric acid and hydrochloric acid are industrially practical, and the amount thereof is 1 to 5.
Mol/l is preferred. By adding a suitable organic acid in addition to these inorganic acids, the copper surface can be kept shiny and clean. Suitable low-molecular organic acids having 2 or 3 carbon atoms include acetic acid, propionic acid, glycolic acid, lactic acid, etc., and the amount of each added is 1 type or 2 or more types in total. ~3 mol/l is desirable. Further, as the peroxide, any ordinary oxidizing agent in the technical field can be used, but it is easiest to use commercially available 35% hydrogen peroxide, and the amount is 5 to 5%.
50g/l is desirable.
次に実施例をあげて本発明を更に具体的に説明
する。 Next, the present invention will be explained in more detail with reference to Examples.
実施例 1
35%塩酸300g/l、酢酸200g/l、70%グリ
コール酸50g/l、35%過酸化水素30g/lより
なる水溶液に酒石酸を70g/l加えたものおよび
酒石酸無添加のもの夫々に錫40g/lを溶解し
た。これらの液を何れも40℃の恒温槽に入れ、沈
澱の生成を観察した所酒石酸無添加のものは10分
後より沈澱が出はじめたのに対し酒石酸添加のも
のは48時間経過しても沈澱は生成しなかつた。Example 1 An aqueous solution consisting of 300 g/l of 35% hydrochloric acid, 200 g/l of acetic acid, 50 g/l of 70% glycolic acid, and 30 g/l of 35% hydrogen peroxide with 70 g/l of tartaric acid added and one without tartaric acid. 40 g/l of tin was dissolved in the solution. Both of these solutions were placed in a constant temperature bath at 40°C and the formation of precipitates was observed.The samples without tartaric acid started to form precipitates after 10 minutes, but the samples with tartaric acid did not contain any precipitation even after 48 hours. No precipitate was formed.
実施例 2
67.5%硝酸300g/l、グリコール酸200g/l、
プロピオン酸100g/l、35%過酸化水素20g/l
よりなる水溶液にクエン酸50g/lを添加したも
のおよび添加しないもの夫々に錫鉛合金(錫60g
含有)100g/lを溶解した。この両方の液を40
℃の恒温槽に入れ、沈澱の析出を観察した所、ク
エン酸無添加のものは殆んど瞬間的に沈澱を生じ
たがクエン酸添加のものは5日(120時間)後は
じめて沈澱が僅かに生成した。Example 2 67.5% nitric acid 300g/l, glycolic acid 200g/l,
Propionic acid 100g/l, 35% hydrogen peroxide 20g/l
A tin-lead alloy (60 g of tin) was added to an aqueous solution of
(containing) 100g/l was dissolved. 40% of both liquids
When we observed the precipitation of precipitate by placing it in a constant temperature bath at ℃, we found that the sample without citric acid precipitated almost instantaneously, but the sample with citric acid did not precipitate slightly until 5 days (120 hours) later. was generated.
以上の実施例からも分るように錫イオンに対し
錯体形成能を有する有機化合物を加えた剥離液は
無添加の場合に比べて、全く沈澱を生じないか又
は沈澱生成までの時間が相当に長く、したがつて
該有機化合物は剥離液の安定化に寄与することが
明らかである。 As can be seen from the above examples, a stripping solution containing an organic compound that has the ability to form a complex with tin ions does not form a precipitate at all, or takes a considerable amount of time to form a precipitate, compared to a stripping solution containing no additive. Therefore, it is clear that the organic compound contributes to the stabilization of the stripping solution.
又、更に銅インヒビターとしては例えばベンゾ
トリアゾールを該剥離液に添加すれば下地の銅の
エツチングが抑えられるので、銅スルーホール製
造用の錫又は錫合金の剥離剤として最も適した組
成物が得られる。 Furthermore, if a copper inhibitor such as benzotriazole is added to the stripping solution, etching of the underlying copper can be suppressed, resulting in a composition most suitable as a stripping agent for tin or tin alloys for producing copper through-holes. .
Claims (1)
および過酸化物からなる系に、酒石酸、クエン
酸、グルコン酸およびそれらの塩からなる群から
選んだ錫イオンに対して錯体成形能を有する有機
化合物を添加したことを特徴とする金属銅上の錫
または錫合金の剥離液。1 A system consisting of an inorganic acid, a low-molecular-weight organic acid with 2 or 3 carbon atoms, and a peroxide is given the ability to form a complex with tin ions selected from the group consisting of tartaric acid, citric acid, gluconic acid, and their salts. A stripping solution for tin or tin alloys on metallic copper, characterized in that it contains an organic compound containing:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9399783A JPS59219475A (en) | 1983-05-30 | 1983-05-30 | Removing solution for tin or tin alloy |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9399783A JPS59219475A (en) | 1983-05-30 | 1983-05-30 | Removing solution for tin or tin alloy |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59219475A JPS59219475A (en) | 1984-12-10 |
JPS6242035B2 true JPS6242035B2 (en) | 1987-09-05 |
Family
ID=14098038
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9399783A Granted JPS59219475A (en) | 1983-05-30 | 1983-05-30 | Removing solution for tin or tin alloy |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59219475A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4580085B2 (en) * | 2000-10-26 | 2010-11-10 | メック株式会社 | Method for etching metal tin or tin alloy and metal tin or tin alloy etchant |
SG10201502960YA (en) * | 2010-04-15 | 2015-06-29 | Entegris Inc | Method for recycling of obsolete printed circuit boards |
CN105177575A (en) * | 2015-10-01 | 2015-12-23 | 常州市奥普泰科光电有限公司 | Deplating method for deplating brass surface tin-nickel coating |
JP7035883B2 (en) * | 2018-07-27 | 2022-03-15 | 三菱マテリアル株式会社 | Stripper |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS508716A (en) * | 1973-05-29 | 1975-01-29 | ||
JPS5240292A (en) * | 1975-09-26 | 1977-03-29 | Tokyu Car Corp | Shift device |
JPS57164984A (en) * | 1981-04-06 | 1982-10-09 | Metsuku Kk | Exfoliating solution for tin or tin alloy |
-
1983
- 1983-05-30 JP JP9399783A patent/JPS59219475A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS508716A (en) * | 1973-05-29 | 1975-01-29 | ||
JPS5240292A (en) * | 1975-09-26 | 1977-03-29 | Tokyu Car Corp | Shift device |
JPS57164984A (en) * | 1981-04-06 | 1982-10-09 | Metsuku Kk | Exfoliating solution for tin or tin alloy |
Also Published As
Publication number | Publication date |
---|---|
JPS59219475A (en) | 1984-12-10 |
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