JPS6239016A - Developing device - Google Patents

Abstract

PURPOSE:To contact a treatment solution of uniform temperature to the material to be developed by a method wherein the treatment solution flowed in from the bottom side of a longitudinally slender aperture runs on the flow passage of the desired length and it overflows, thereby enabling to give a high circulating property on the processing surface of a sample. CONSTITUTION:The developing solution, which is controlled at the prescribed temperature by a temperature regulating unit 2, passes a flow-in duct 4 from a developing solution reservoir 1 by the circulating function of a pump 3, it flows in the bottom part of a developing solution feeding part 7, passes through a filter 8, and it overflows from an aperture part 10. The developing solution is received by an overflow vessel 9, passes through a flow-out duct 5 connected to the bottom part of the vessel 9, and it is circulated to and withdrawn by the developing solution reservoir 1 as shown by the arrow in the diagram. The surface to be treated of the sample 11 is brought sufficiently to come in contact with the developing solution overflowed from the aperture part of the developing solution feeding part 7, and a sample supporting and driving part 12 is reciprocatingly moved horizontally in the direction crossing the long side of the aperture 10. As a result, the temperature and the concentration of the treatment solution on the surface of treatment of the sample can be made uniform.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a developing device used in forming fine patterns in an IC manufacturing process.

[Conventional technology]

In the photolithography process, a developed pattern is formed by subjecting an exposed sample to development processing in a developing device. Further, in order to remove developer residue after the development process, a rinsing process is also performed subsequently. The resolution (quality) of this pattern is ultimately determined by the development process. Therefore, especially when forming fine patterns, it is important to manage the development processing conditions in order to maintain sufficient resolution. The main development processing conditions for managing and maintaining the resolution of the developed pattern include the temperature and concentration of the developer, and changes over time. For this reason, in conventional developing devices, various measures have been taken to equalize the temperature of the developer and to supply new liquid to the sample surface, but at present they are not necessarily sufficient. Not yet.

Hereinafter, a conventional developing device will be explained based on the drawings.

FIG. 4 shows a first conventional example, in which development is carried out by a dip type, and the device configuration is relatively simple and is the most common developing device of this type. In the same figure,
1 is an inner tank of a developer container, and 2 is a developer. A heating means 5 is disposed on the side surface of the outer tank 3 of the developer container, and the heating means 5 controls the heating of the liquid 4 for controlling the temperature of the developer. Further, the developer 2 is controlled to a predetermined temperature via the developer temperature control liquid 4. Further, the developer container inner tank 1 is supported within the developer container outer tank 3 by support means 6 .

Then, the sample 7 is immersed in the developer 2 from the direction of the arrow to perform a development process.

However, in an apparatus having a simple configuration such as the first conventional example, the temperature distribution of the developer 2 becomes wide. Also,
Near the developing surface of sample 7, there is developer 2 that has deteriorated due to the development reaction.
remains, the development speed decreases and it is difficult to perform uniform development on the development surface. In order to improve this, it is possible to convect the developer 2 using a stirring means or the like to continuously and uniformly supply the developer 2 to the developing surface, but due to the difficulty of generating ideal thermal convection, it is difficult to use the method described above. It is difficult to solve the problem of uniformity of developer temperature and noise at the same time.

Further, FIG. 5 shows a second embodiment, in which development processing is performed by an overflow method. In the same figure, 1
is a developer tank, and from the liquid supply pipe 3 provided on the bottom side,
The temperature-controlled developer 2 is sent in the direction of the arrow and overflows at the upper surface of the developer tank 1. Then, as shown in the figure, the sample 7 is immersed in this overflowing developer 2 to perform a development process.

In this second conventional example, the quality of the developed pattern is improved compared to the above-mentioned first conventional example in that the developing solution can be constantly supplied to the developing surface of the sample 7 to be processed. However, since it is difficult to maintain a uniform flow rate of the developer 2 at the center and periphery of the developing surface, it is difficult to perform the developing process uniformly within the developing surface. Furthermore, in order to equalize the developer temperature in the developer tank 1, it is necessary to optimize the inflow direction, flow rate, etc. of the developer 2, and it is difficult to set and control these factors ( (See Japanese Patent Publication No. 58-7709).

[Problem that the invention seeks to solve]

As detailed above, in the conventional developing device, it is difficult to achieve uniformity of developer temperature and developer supply within the development surface of sample 7, and for this reason, it is difficult to achieve uniformity of developer temperature and developer supply within the development surface of sample 7. There was a problem in that it was difficult to obtain a pattern.

In addition, in the conventional example, when it is necessary to perform continuous development using multiple developers, or when it is necessary to perform rinsing immediately after development, due to the limitations of the device configuration, There was also the problem that these treatments were repeated.

Therefore, the present invention provides the above-mentioned high resolution 1'9'! 3. It is an object of the present invention to provide a processing liquid recovery type developing device that solves the problems of not being able to obtain a high quality development pattern and not being able to perform continuous development processing.

[Means for solving problems]

The developing device according to the present invention has a vertically elongated opening on the top surface having two parallel sides that are approximately equal to or longer than one side of the sample, and the processing liquid is flowed from the bottom side through this opening into the desired amount. a processing liquid supply section for overflowing through a long flow path, an overflow tank for receiving the overflowing processing liquid, and a processing liquid circulation supply for circulating the processing liquid in the overflow tank to the processing liquid supply section after adjusting the temperature. or a set including the processing liquid supply section, the overflow tank, and the processing liquid circulation supply section, and a plurality of sets thereof, and a sample support drive section that supports the sample to be processed. It is.

[For production]

As described above, when placed in the developing device of the present invention, it has a vertical opening on the top surface with two parallel sides that are approximately equal to or longer than one side of the sample, and from this opening, from the bottom side. Since a processing liquid supply section is provided to allow the processing liquid to flow in and overflow through a flow path of a desired length, the processing liquid overflowing from the opening has the following characteristics in its long side direction:
The flow rate and outflow direction are equalized.

In addition, in addition to providing an overflow tank in the processing liquid supply section, a processing liquid circulation supply section that circulates the temperature-adjusted processing liquid is also provided, so that the sample processing surface has high circulation properties.
The processing liquid at a uniform temperature comes into contact. Furthermore, since the sample support driving section is provided, the processing surface of the supported sample can be brought into close contact with the processing liquid overflowing from the opening of the processing liquid supply section.

Furthermore, by arranging multiple sets of the processing liquid supply unit, overflow tank, and processing liquid circulation supply unit as one set, continuous processing can be performed by circulating different processing liquids in each set. . For example, put the developer in the first set, and put the developer in the second set.
Pour the rinse solution into the set. First, the first set is activated to perform a developing process, and immediately after the development is completed, the second set is activated to perform a rinsing process.

〔Example〕

Hereinafter, the present invention will be explained in detail based on the drawings. FIG. 1 shows an embodiment of the first invention. Note that this developing device uses a developing solution as the processing solution. In the figure, 1 is a processing liquid storage tank (developer storage tank), and 2 is a temperature adjustment unit attached to the same type and provided with means for heating and cooling the developer. Further, 3 is a pump means for circulating the developer. A processing liquid supply section (currently a retained liquid supply section) 7 having an overflow tank 9 disposed above is placed on a support stand (not shown) within the enclosure section 13 . Also,
The developer reservoir tank 1 and the bottom side of the developer supply section 7 are as follows:
They are connected by an inflow conduit 4 via the pump means 3, and the developer reservoir 1 and the bottom side of the overflow tank 9 are connected by an outflow conduit 5.

A processing liquid circulation supply section (developer circulation supply section) 6 is constituted by the developer reservoir tank 1, the temperature adjustment unit 2, the pump means 3, the inflow conduit 4, and the outflow conduit 5. Also, 1
2 is a sample support drive unit, which supports the sample (mask, wafer, etc.)
11 can be supported and fixed horizontally, and can also be moved back and forth in the direction of the arrow shown in the figure, that is, in the vertical and horizontal directions.

Next, the structure of the developer supply section 7 and overflow tank 9 will be explained in detail with reference to FIG. This developer supply section 7
In this embodiment, it forms a rectangular parallelepiped with a small volume, has a vertically elongated shape with a narrow horizontal cross section, and is formed to have a dimension larger than its long side force \' sample width. The inflow conduit 4 is connected to the bottom side of the developer supply section 7, and a filter 8 is disposed at a predetermined position above the bottom surface to purify the developer passing through. Together with the shape and configuration of the developer supply section 7, it functions to equalize the flow velocity distribution in the long side direction. An opening 10 is provided on the upper surface of the developer supply section 7 for overflowing the developer.
is provided. Furthermore, an overflow tank 9 is attached to the upper side of the developer supply section 7 for receiving overflowing developer. The bottom surface of the overflow tank 9 and the developer storage tank 1 are connected through an outflow conduit 5.

Here, a processing liquid circulation part (developer circulation part) is formed by the developer circulation supply part 6, the developer supply part 7, and the overflow tank 9.
14 are configured. Next, the circulation f of this developer circulation section 14 is
J! Let's talk about the system. First, the developer whose temperature is controlled to a predetermined temperature by the temperature adjustment unit 2 attached to the developer reservoir 1 is passed from the developer reservoir 1 through the inflow conduit 4 by the circulation action of the pump means 3 to the developer supply section 7. Flow into the bottom. The developer solution that has flowed in increases in water level, passes through the filter 8, and overflows from the opening 10. This overflowing developer is received in an overflow tank 9, and is circulated and recovered to the developer reservoir 1 as shown by the arrow through an outflow conduit 5 connected to the bottom of the overflow tank 9.

Therefore, when performing a developing process using the developing device having the above configuration, the sample supporting drive section 120 which horizontally supports and fixes the sample 11ff! 1 adjustment so that the treated surface of the sample 11 comes into sufficient contact with the developer overflowing from the opening 10 of the developer supply section 7. Then, with the height unchanged, the sample support drive section 12 is moved as shown in FIG.
horizontally in a direction across the long side of the opening 10 for a predetermined period of time.

According to the embodiment of the second invention, as shown in FIG. 3, in addition to the processing liquid circulation section 14 for the developer described above, a rinsing liquid circulation section 34 for circulating a rinsing liquid as the processing liquid is added. They can also be arranged in parallel to form a developing device. Here, the rinsing process is performed in the following steps. That is, after the development process is completed, first, the pump means 3 for circulating the developer and the pump means 23 for circulating the rinse solution are switched and operated to cause the rinse solution to overflow from the opening 30 of the rinse solution supply section 27. Then, the sample support drive section 12 is quickly moved to the installation position of the rinsing liquid supply section 27, and the processing surface of the sample 11 is brought into sufficient contact with the rinsing liquid flowing over from the opening 30. Thereafter, as in the case of the development process described above, the sample support drive unit 12 is horizontally reciprocated in a direction across the long side of the opening 30 to remove developer residue and the like. In the figure, 21 is a rinsing liquid storage tank, 22 is a temperature adjustment unit, 24 is an inflow conduit, 25 is an outflow conduit, 26 is a rinsing liquid circulation supply section, 28 is a filter, and 29 is an overfull tank. .

Furthermore, in the above configuration, the sample support drive section 12 is
It is possible to provide two or more sets and operate the pump means 3 for circulating the developer solution and the pump means 23 for circulating the rinsing solution sequentially, so that the development and rinsing treatments can be continuously performed on two or more samples. Of course it can be done.

〔Effect of the invention〕

As described above in detail, according to the present invention, the flow rate and outflow direction of the processing liquid exceeding 70 mm from the opening of the processing liquid supply section are made uniform in the long side direction, and the This improves the circulation and temperature uniformity of the processing solution. Therefore, when performing each process, by horizontally reciprocating the sample support drive unit in a direction that crosses the long side of the opening, the temperature and concentration of the processing liquid on the sample processing surface are made uniform, and Since these changes over time are also suppressed, there is an effect that a developed pattern with high resolution (quality) can be obtained.

Furthermore, in the developing device of the present invention, two or more sets of the processing liquid supply section, the overflow tank, and the processing liquid circulation supply section are arranged in parallel, so that the processing liquid includes various developing solutions, By using a rinsing liquid and a rinsing liquid, development-rinse processing or a plurality of development processings can be performed continuously, which has the effect of improving work efficiency.

[Brief explanation of the drawing]

1 is a perspective view illustrating a developing device according to an embodiment of the first invention, FIG. 2 is an enlarged perspective view of main parts of the developing device shown in FIG. 1, and FIG. 3 is a perspective view illustrating a developing device according to an embodiment of the second invention. Explanatory perspective view, 4th
FIG. 5 is a cross-sectional view of a main part of a first conventional developing device, and FIG. 5 is a cross-sectional view of a main part of a second conventional developing device. DESCRIPTION OF SYMBOLS 1... Processing liquid storage tank, 3... Pump means, 4... Inflow conduit, 5... Outflow conduit, 6... Processing liquid circulation supply part, 7... Processing liquid supply part, 9.・・Overflow tank,
DESCRIPTION OF SYMBOLS 10... Opening part, 11... Sample, 12... Sample support drive part. Patent applicant: Oki Electric Industry Co., Ltd. T + J appearance figure 1 figure 2 figure 71 for antagonist! ; Ward to 5

Claims (2)

[Claims] (1) The upper surface has a vertically elongated opening whose long sides are two parallel sides that are approximately equal to or longer than one side of the sample, and the processing liquid flowing from the bottom side through the opening is passed through a flow path of a desired length. a processing liquid supply section for overflowing the processing liquid through the processing liquid supply section; an overflow tank for receiving the overflow processing liquid; a processing liquid circulation supply section for circulating the processing liquid in the overflow tank to the processing liquid supply section with temperature adjustment; A developing device comprising a sample support drive section that supports a sample to be processed above an opening of a processing liquid supply section. (2) The upper surface has a vertically elongated opening whose long sides are two parallel sides that are approximately equal to or longer than one side of the sample, and the processing liquid flowing from the bottom side through the opening is passed through a flow path of a desired length. A processing liquid supply section for overflowing the processing liquid through the overflow, an overflow tank for receiving the overflow processing liquid, and a processing liquid circulation supply section for circulating the processing liquid in the overflow tank to the processing liquid supply section while adjusting the temperature. 1. A developing device comprising: one set, one or more other sets attached thereto, and a sample support drive section for supporting a sample to be processed over the openings of these processing liquid supply sections.