JPS6233014Y2 - - Google Patents
Info
- Publication number
- JPS6233014Y2 JPS6233014Y2 JP10605883U JP10605883U JPS6233014Y2 JP S6233014 Y2 JPS6233014 Y2 JP S6233014Y2 JP 10605883 U JP10605883 U JP 10605883U JP 10605883 U JP10605883 U JP 10605883U JP S6233014 Y2 JPS6233014 Y2 JP S6233014Y2
- Authority
- JP
- Japan
- Prior art keywords
- ring
- gate
- chamber
- plasma
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 229920001971 elastomer Polymers 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000012495 reaction gas Substances 0.000 description 4
- 238000001947 vapour-phase growth Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10605883U JPS6013960U (ja) | 1983-07-07 | 1983-07-07 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10605883U JPS6013960U (ja) | 1983-07-07 | 1983-07-07 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6013960U JPS6013960U (ja) | 1985-01-30 |
| JPS6233014Y2 true JPS6233014Y2 (enrdf_load_stackoverflow) | 1987-08-24 |
Family
ID=30248351
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10605883U Granted JPS6013960U (ja) | 1983-07-07 | 1983-07-07 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6013960U (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62102827A (ja) * | 1985-10-29 | 1987-05-13 | Natl Res Inst For Metals | 金属窒化物微粒子の製造法 |
| JP5243089B2 (ja) * | 2008-04-09 | 2013-07-24 | 東京エレクトロン株式会社 | プラズマ処理装置のシール構造、シール方法およびプラズマ処理装置 |
| JP5490435B2 (ja) * | 2009-03-31 | 2014-05-14 | 東京エレクトロン株式会社 | ゲートバルブ装置 |
| JP7164992B2 (ja) * | 2018-08-21 | 2022-11-02 | 株式会社荏原製作所 | 希ガス回収装置 |
-
1983
- 1983-07-07 JP JP10605883U patent/JPS6013960U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6013960U (ja) | 1985-01-30 |
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