JPS6231723B2 - - Google Patents
Info
- Publication number
- JPS6231723B2 JPS6231723B2 JP4409480A JP4409480A JPS6231723B2 JP S6231723 B2 JPS6231723 B2 JP S6231723B2 JP 4409480 A JP4409480 A JP 4409480A JP 4409480 A JP4409480 A JP 4409480A JP S6231723 B2 JPS6231723 B2 JP S6231723B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- parts
- glycol
- residue
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 10
- 239000011342 resin composition Substances 0.000 claims description 9
- 239000003504 photosensitizing agent Substances 0.000 claims description 5
- 229920000728 polyester Polymers 0.000 claims description 5
- 125000003827 glycol group Chemical group 0.000 claims description 4
- 239000007870 radical polymerization initiator Substances 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000005442 diisocyanate group Chemical group 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- KZMAWJRXKGLWGS-UHFFFAOYSA-N 2-chloro-n-[4-(4-methoxyphenyl)-1,3-thiazol-2-yl]-n-(3-methoxypropyl)acetamide Chemical compound S1C(N(C(=O)CCl)CCCOC)=NC(C=2C=CC(OC)=CC=2)=C1 KZMAWJRXKGLWGS-UHFFFAOYSA-N 0.000 claims 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 238000001723 curing Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- -1 diisocyanate compound Chemical class 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 3
- 239000004342 Benzoyl peroxide Substances 0.000 description 3
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 235000019400 benzoyl peroxide Nutrition 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- QQVIHTHCMHWDBS-UHFFFAOYSA-L isophthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC(C([O-])=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-L 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- ZTEHOZMYMCEYRM-UHFFFAOYSA-N 1-chlorodecane Chemical compound CCCCCCCCCCCl ZTEHOZMYMCEYRM-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- WMTLVUCMBWBYSO-UHFFFAOYSA-N N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 Chemical compound N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 WMTLVUCMBWBYSO-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000003949 imides Chemical group 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Description
【発明の詳細な説明】
本発明は加熱あるいは紫外線、電子線などを照
射することによつて硬化し、耐熱性のすぐれた硬
化物を提供し得る硬化性樹脂組成物に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a curable resin composition that can be cured by heating or irradiation with ultraviolet rays, electron beams, etc., and can provide a cured product with excellent heat resistance.
近年、各種の工業分野、特に電気機器の工業分
野では機器の小型軽量化、信頼性向上の観点から
使用する絶縁材料には高度の耐熱性が要求される
ようになつてきている。また、含浸用ワニスの場
合についてみると、従来のスチレン系無溶剤ワニ
スは加熱硬化時にスチレンが揮発し易く、経済
性、作業環境の二つの点で問題がある。そこで、
スチレンをこれよりも低臭気、低毒性のモノマに
置換したり、紫外線等で表面硬化させたのち加熱
によつて内部まで完全に硬化させる等の措置が講
ぜられるようになつてきている。本発明の目的は
このような産業界の要請に応え得る耐熱性の良好
な硬化性樹脂組成物を提供することにある。 BACKGROUND ART In recent years, in various industrial fields, particularly in the field of electrical equipment, insulating materials used have come to be required to have a high degree of heat resistance in order to reduce the size and weight of equipment and improve reliability. Regarding impregnating varnishes, conventional styrene-based solvent-free varnishes tend to volatize styrene during heat curing, which poses two problems in terms of economy and working environment. Therefore,
Measures are being taken such as replacing styrene with monomers that have lower odor and toxicity, or curing the surface with ultraviolet rays, etc., and then completely curing the interior by heating. An object of the present invention is to provide a curable resin composition with good heat resistance that can meet such industrial demands.
すなわち本発明は一般式
(但し式中R1は水素又はメチル基、R2はグリ
コール残基又は一般式(―R′―COO―R″―COO)―
nR′―(但し式中R′はグリコール残基、R″は二塩
基性酸残基、mは1〜20の整数)で表わされる直
鎖状ポリエステルオリゴマ残基、R3はジイソシ
アネート残基、nは1〜10の整数である)で表わ
される不飽和化合物95〜50重量部、分子中に1個
以上の重合性不飽和基を有する化合物5〜50重量
部及びラジカル重合開始剤及び/又は光増感剤0
〜10重量部を含有してなる硬化性樹脂組成物に関
する。 That is, the present invention is based on the general formula (However, in the formula, R 1 is hydrogen or a methyl group, R 2 is a glycol residue or the general formula (-R'-COO-R''-COO)-
A linear polyester oligomer residue represented by n R'- (wherein R' is a glycol residue, R'' is a dibasic acid residue, and m is an integer from 1 to 20), R3 is a diisocyanate residue , n is an integer of 1 to 10), 5 to 50 parts by weight of a compound having one or more polymerizable unsaturated groups in the molecule, and a radical polymerization initiator and/or Or photosensitizer 0
-10 parts by weight of the curable resin composition.
本発明になる硬化性樹脂組成物は、以下に述べ
る三つの方法のいずれかの方法あるいはこれらの
複数を組み合わせた方法によつて硬化させること
ができる。一つの方法は一般に広く行なわれてい
るラジカル重合開始剤を添加し、加熱によつて硬
化させる方法である。ラジカル重合開始剤として
はベンゾイルペルオキシド、メチルエチルケトン
ペルオキシド、ターシヤリーブチルパーベンゾエ
ート、ジクミルペルオキシド、アゾビスイソブチ
ロニトリル等の通常のものを使用することがで
き、これらを一般式(1)で示される化合物および分
子中に1個以上の重合性不飽和基を有する化合物
100重量部に対して0.1〜5重量部添加しておよそ
80〜180℃の温度で2〜10時間程度加熱すればよ
い。もう一つの方法は光増感剤を添加し太陽光、
各種の水銀灯、クセノンランプ等から発生される
紫外線によつて硬化させる方法である。光増感剤
としてはベンゾイン及びベンゾインエチルエーテ
ル等のベンゾインのアルキルエーテル類、ベンゾ
フエノン及びイセトフエノン等のベンゾフエノン
のアルキルエーテル類、アントラキノン、2―エ
チルアントラキノン等の多核キノン類、ジフエニ
ルジスルフイド等のポリスルフイド類、アゾビス
イソブチロニトリル等のアゾ化合物類、塩化デシ
ル、ミヒラーケトン類等を使用することができ、
これらは一般式(1)で示れる化合物および分子中に
1個以上の不飽和基を有する化合物100重量部に
対して0.01〜10重量部添加される。さらに別の方
法は、電子線、X線、ガンマー線等の電離性放射
線を照射することによつて硬化させる方法であ
る。安全性や操作性の点から電子線を用いるのが
好ましい。電子線で硬化させる場合には特にラジ
カル重量開始剤や光増感剤は添加する必要がな
い。 The curable resin composition of the present invention can be cured by any one of the following three methods or a combination of these methods. One method is the generally widely used method of adding a radical polymerization initiator and curing by heating. As the radical polymerization initiator, common ones such as benzoyl peroxide, methyl ethyl ketone peroxide, tertiary butyl perbenzoate, dicumyl peroxide, and azobisisobutyronitrile can be used, and these are represented by the general formula (1). Compounds and compounds having one or more polymerizable unsaturated groups in the molecule
Approximately add 0.1 to 5 parts by weight per 100 parts by weight.
It may be heated at a temperature of 80 to 180°C for about 2 to 10 hours. Another method is to add a photosensitizer to
This is a method of curing with ultraviolet light emitted from various mercury lamps, xenon lamps, etc. Examples of photosensitizers include benzoin and alkyl ethers of benzoin such as benzoin ethyl ether, alkyl ethers of benzophenone such as benzophenone and isetophenone, polynuclear quinones such as anthraquinone and 2-ethylanthraquinone, and polysulfides such as diphenyl disulfide. , azo compounds such as azobisisobutyronitrile, decyl chloride, Michler's ketones, etc.
These are added in an amount of 0.01 to 10 parts by weight per 100 parts by weight of the compound represented by the general formula (1) and the compound having one or more unsaturated groups in the molecule. Yet another method is to cure the material by irradiating it with ionizing radiation such as electron beams, X-rays, and gamma rays. From the viewpoint of safety and operability, it is preferable to use an electron beam. When curing with an electron beam, there is no need to add a radical weight initiator or photosensitizer.
本発明に使用される一般式(1)で示される化合物
は次のようにして合成することができる。まず、
はじめに無水トリメリツト酸(以下TMAと略
す)とジイソシアネート化合物をジイソシアネー
ト化合物が過剰になるような配合比で反応させて
下記の一般式(i)で示される化合物を得る。ジイソ
シアネート化合物としては、たとえばトリレンジ
イソシアネート、ジフエニルメタンジイソシアネ
ート、ジフエニルエーテルジイソシアネート、キ
シリレンジイソシアネートなどが用いられる。 The compound represented by the general formula (1) used in the present invention can be synthesized as follows. first,
First, trimellitic anhydride (hereinafter abbreviated as TMA) and a diisocyanate compound are reacted in a mixing ratio such that the diisocyanate compound is in excess to obtain a compound represented by the following general formula (i). As the diisocyanate compound, for example, tolylene diisocyanate, diphenylmethane diisocyanate, diphenyl ether diisocyanate, xylylene diisocyanate, etc. are used.
(但し式中R3,nは上記と同じ)
次で一般式
HO―R2―OH ……(ii)
(但し式中R2は上記と同じ)
で示されるグリコール、例えばエチレングリコー
ル、ジエチレングリコール、トリエチレングリコ
ール、プロピレングリコール、ジプロピレングリ
コール、トリプロピレングリコール、1,6―ヘ
キサンジオール、ネオペンチルグリコールの1種
もしくは2種以上又は次の一般式
HO(―R′―COOR″)―nCOO―R′―OH ……(iii)
(但し式中R′,R″,mは上記と同じ)
で示される二塩基酸とグリコールを反応させて得
られる末端に水酸基を有する直鎖状ポリエステル
オリゴマを反応させた後、更に次の一般式
(但し式中R1は、上記と同じ)
で示される化合物、例えばアクリル酸、メタクリ
ル酸あるいはこれらの酸の塩化物あるいは低級ア
ルキルエステルを反応させる。(iii)式の直鎖状ポリ
エステルオリゴマは二塩基酸とグリコールをグリ
コールが過剰の配合比で通常の方法によつて重縮
合させて得られる。使用可能な二塩基酸としては
フタル酸、イソフタル酸、テレフタル酸、マレイ
ン酸、アジピン酸、コハク酸、フマル酸あるいは
これらの酸の無水物、低級アルキルエステル等が
あげられ、グリコールとしては上述した式(ii)で表
わされる化合物があげられる。(iii)式においてmの
値は1〜20が適しており、また(i)式においてnの
値は1〜10が適している。mが20を超える場合あ
るいはnが10を超える場合は得られる樹脂組成物
の粘度が高くなり、作業性が低下する。 (However, R 3 and n in the formula are the same as above) Glycols represented by the following general formula HO―R 2 -OH ... (ii) (However, R 2 in the formula is the same as above), such as ethylene glycol, diethylene glycol, One or more of triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,6-hexanediol, neopentyl glycol, or the following general formula HO (-R'-COOR'') - n COO- R′-OH ...(iii) (wherein R′, R″, m are the same as above) A linear polyester oligomer having a hydroxyl group at the end obtained by reacting a dibasic acid represented by the formula with glycol. After the reaction, the following general formula (However, R 1 in the formula is the same as above.) A compound represented by, for example, acrylic acid, methacrylic acid, or a chloride or lower alkyl ester of these acids is reacted. The linear polyester oligomer of formula (iii) can be obtained by polycondensing a dibasic acid and a glycol at a blending ratio in which the glycol is in excess by a conventional method. Usable dibasic acids include phthalic acid, isophthalic acid, terephthalic acid, maleic acid, adipic acid, succinic acid, fumaric acid, anhydrides and lower alkyl esters of these acids, and glycols include the above-mentioned formulas. Examples include compounds represented by (ii). In formula (iii), the value of m is preferably 1 to 20, and in formula (i), the value of n is preferably 1 to 10. When m exceeds 20 or when n exceeds 10, the viscosity of the resulting resin composition increases and workability decreases.
分子中に1個以上の重合性不飽和基を有する化
合物としてはビニル化合物、ジビニル化合物、不
飽和ポリエステル樹脂などがあげられる。ビニル
化合物としてはアクリル酸、メタクリル酸および
これらの酸の低級アルキルエステル、アクリル酸
グリシジル、スチレン、ビニルトルエンなどがあ
る。ジビニル化合物としてはエチレングリコール
ジ(メタ)アクリレート(ジアクリレート又はジ
メタクリートの意、以下同じ)、ジエチレングリ
コールジ(メタ)アクリレート、プロピレングリ
コールジ(メタ)アクリレート、ネオペンチルグ
リコールジ(メタ)アクリレート等の(メタ)ア
クリル酸のグリコールエステル類や、ビス(メ
タ)アクリロキシアルキルテレフタレート、ビス
(メタ)アクリロキシアルキルイソフタレート、
ビス(メタ)アクリロキシフタレート、ビス(メ
タ)アクリロキシアルキルヘキサヒドロフタレー
ト等の(メタ)アクリル酸とポリエステルポリオ
ールとの反応生成物類やジビニルベンゼン、ジア
リルフタレート、ジアリルイソフタレート等があ
げられる。不飽和ポリエステル樹脂としては不飽
和二塩基酸およびグリコール必要に応じさらに飽
和二塩基酸を重縮合させて得られる通常のものを
使用することができる。これらの分子中に1個以
上の重合性不飽和基を有する化合物は単独で使用
してもよいし、複数を混合して使用してもよい。
また、その使用量は式(i)で示される化合物95〜50
重量部に対して5〜50重量部とされ、配合量が5
重量部未満では樹脂組成物の粘度低下による作業
性向上効果や可とう性、密着性向上効果が乏し
く、50重量部を越える場合には得られる硬化物の
耐熱性が低下する。 Examples of compounds having one or more polymerizable unsaturated groups in the molecule include vinyl compounds, divinyl compounds, and unsaturated polyester resins. Examples of vinyl compounds include acrylic acid, methacrylic acid, lower alkyl esters of these acids, glycidyl acrylate, styrene, and vinyltoluene. Examples of divinyl compounds include ethylene glycol di(meth)acrylate (diacrylate or dimethacrylate, the same applies hereinafter), diethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, etc. ) Glycol esters of acrylic acid, bis(meth)acryloxyalkyl terephthalate, bis(meth)acryloxyalkyl isophthalate,
Examples include reaction products of (meth)acrylic acid and polyester polyols such as bis(meth)acryloxyphthalate and bis(meth)acryloxyalkylhexahydrophthalate, divinylbenzene, diallyl phthalate, and diallyl isophthalate. As the unsaturated polyester resin, a usual one obtained by polycondensing an unsaturated dibasic acid, a glycol, and, if necessary, a saturated dibasic acid can be used. These compounds having one or more polymerizable unsaturated groups in the molecule may be used alone or in combination.
In addition, the amount used is 95 to 50% of the compound represented by formula (i).
The amount is 5 to 50 parts by weight, and the amount is 5 to 50 parts by weight.
If the amount is less than 50 parts by weight, the effect of improving workability by reducing the viscosity of the resin composition, and the effect of improving flexibility and adhesion will be poor, and if it exceeds 50 parts by weight, the heat resistance of the cured product obtained will decrease.
本発明の樹脂組成物は表面保護塗料、フイル
ム、シートなどに利用することができ、また注型
用、成形用、含浸用の材料として広く、一般的に
使用することが可能である。 The resin composition of the present invention can be used for surface protection paints, films, sheets, etc., and can also be widely and generally used as materials for casting, molding, and impregnation.
以下本発明を更に実施例によつて具体的に説明
する。 EXAMPLES The present invention will be explained in more detail below with reference to Examples.
実施例 A
ジフエニルメタンジイソシアネート418.6g、
無水トリメリツト酸160.7g、N―メチル―2―
ピロリドン869gを撹拌装置、温度計、分留管及
び窒素導入管を備えた四つ口フラスコに入れ、
100℃で2時間反応後、更に140℃で3時間反応さ
せた。生成物を少量サンプリングし、メタノール
中に投じて得られた沈殿の赤外吸収スペクトル分
析を行なつたところ、1780cm-1にイミド環の吸収
が認められ、1660cm-1と1540cm-1にアミド結合の
吸収が認められた。次でジプロピレングリコール
117.8g、ジエチレングリコール93.2gを加え150
℃で約4時間反応させた。その後温度を120℃に
してメタクリル酸180gを加え、反応水を系外に
留去した。理論量の85%の水を留去せしめた後、
減圧下でN―メチル―2―ピロリドンと過剰のメ
タクリル酸を留去し、一般式(1)で示される型の不
飽和化合物を得た。Example A 418.6 g of diphenylmethane diisocyanate,
Trimellitic anhydride 160.7g, N-methyl-2-
Put 869 g of pyrrolidone into a four-necked flask equipped with a stirrer, thermometer, fractionator tube, and nitrogen introduction tube.
After reacting at 100°C for 2 hours, it was further reacted at 140°C for 3 hours. When a small amount of the product was sampled and infrared absorption spectrum analysis of the precipitate obtained by pouring it into methanol, imide ring absorption was observed at 1780 cm -1 , and amide bonds were observed at 1660 cm -1 and 1540 cm -1 . absorption was observed. dipropylene glycol with
Add 117.8g and 93.2g of diethylene glycol to 150
The reaction was carried out at ℃ for about 4 hours. Thereafter, the temperature was raised to 120°C, 180 g of methacrylic acid was added, and the reaction water was distilled out of the system. After distilling off 85% of the theoretical amount of water,
N-methyl-2-pyrrolidone and excess methacrylic acid were distilled off under reduced pressure to obtain an unsaturated compound of the type represented by general formula (1).
実施例 1
実施例Aで得た不飽和化合物95重量部とグリシ
ジルメタクリレート5重量部を撹拌混合し、この
混合物に対して1重量%のベンゾイルペルオキシ
ツドを添加したものを厚さ0.25mmの鋼板に厚さが
約40ミクロンになるように塗布し、100℃で1時
間、更に120℃で2時間加熱した。このようにし
て得られた硬化塗膜は鉛筆硬度5Hの硬さを有
し、50mmφのマンドレル試験に合格した。この塗
膜を200℃で24時間加熱後、再び鉛筆硬度を測定
したところ、加熱劣化させる前と同様に5Hの値
を維持しており、またマンドレル試験においても
50mmφに合格し、耐熱性にすぐれていることを示
している。Example 1 95 parts by weight of the unsaturated compound obtained in Example A and 5 parts by weight of glycidyl methacrylate were stirred and mixed, 1% by weight of benzoyl peroxide was added to this mixture, and the mixture was applied to a 0.25 mm thick steel plate. It was coated to a thickness of about 40 microns and heated at 100°C for 1 hour and then at 120°C for 2 hours. The cured coating film thus obtained had a pencil hardness of 5H and passed the 50 mmφ mandrel test. After heating this coating film at 200℃ for 24 hours, we measured the pencil hardness again, and found that it maintained the same 5H value as before heating and deterioration, and also in the mandrel test.
It passed the 50mmφ test, showing that it has excellent heat resistance.
実施例 2
実施例Aで得られた不飽和化合物70重量部とビ
スヒドロキシエチルイソフタレートのジアクリル
エステル25重量部及びグリシジルメタクリレート
5重量部を撹拌混合した。この混合物に混合物に
対して1.5重量%のベンゾインエチルエーテルを
添加したものを厚さ0.25mmの鋼板に厚さが約40ミ
クロンになるように塗布し、2KWの高圧水銀灯
(オーク製作所製ORC―CMM―3000)下20cmの
距離のところで2分間光照射した。このようにし
て得られた硬化塗膜は鉛筆硬度4Hで30mmφのマ
ンドレル試験に合格した。この塗膜を200℃で24
時間加熱劣化させたが、鉛筆硬度は4Hで、30mm
φのマンドレル試験に合格した。Example 2 70 parts by weight of the unsaturated compound obtained in Example A, 25 parts by weight of diacrylic ester of bishydroxyethyl isophthalate, and 5 parts by weight of glycidyl methacrylate were mixed with stirring. 1.5% by weight of benzoin ethyl ether was added to this mixture and applied to a 0.25mm thick steel plate to a thickness of approximately 40 microns. -3000) Light was irradiated for 2 minutes at a distance of 20 cm below. The cured coating film thus obtained had a pencil hardness of 4H and passed a 30 mmφ mandrel test. This coating film was heated to 200℃ for 24 hours.
The pencil hardness is 4H and 30mm after being heated and deteriorated for a long time.
Passed the φ mandrel test.
実施例 3
実施例Aで得られた不飽和化合物80重量部、ビ
スヒドロキシエチルイソフタレートのジメタクリ
ルエステル10重量部及びジエチレングリコールジ
アクリレート10重量部を撹拌混合した。この混合
物に混合物に対し2重量%のベンゾインエチルエ
ーテルと1重量%のベンゾイルペルオキシドを添
加したものをポリエステル銅線を使用したクリー
ナ用アーマチユアに含浸させ、2KWの高圧水銀
灯(オーク製作所製ORC―CHM―3000)下20cm
の距離のところで3分間光照射して表面層を硬化
させた後、更に130℃で4時間加熱炉中で加熱し
て内部まで十分に硬化させた。このようにして得
られたクリーナ用アーマチユアを150℃の乾燥器
中に入れ、168時間放置後とり出して、回転イン
パルス及び耐電圧等の絶縁性能をチエツクしたが
異常は認められなかつた。Example 3 80 parts by weight of the unsaturated compound obtained in Example A, 10 parts by weight of dimethacrylic ester of bishydroxyethyl isophthalate, and 10 parts by weight of diethylene glycol diacrylate were mixed with stirring. A cleaner armature made of polyester copper wire was impregnated with 2% by weight of benzoin ethyl ether and 1% by weight of benzoyl peroxide based on the mixture. 3000) Bottom 20cm
The surface layer was cured by irradiation with light for 3 minutes at a distance of , and then heated in a heating oven at 130° C. for 4 hours to fully cure the inside. The cleaner armature thus obtained was placed in a dryer at 150°C, left for 168 hours, and then taken out and checked for insulation performance such as rotational impulse and withstand voltage, but no abnormality was found.
本発明になる硬化性樹脂組成物によれば、紫外
線や電子線を用いることにより、熱のみを硬化手
段にした場合と比較して硬化速度が速いためエネ
ルギーの利用効率および生産性が向上される。ま
た、紫外線と熱を組み合わせた場合には、紫外線
によつて表面層が硬化するため、その後熱を加え
てもモノマーが揮散せず、経済性、作業環境の点
で好ましい。 According to the curable resin composition of the present invention, by using ultraviolet rays or electron beams, the curing speed is faster than when only heat is used as a curing means, so energy usage efficiency and productivity are improved. . Furthermore, when ultraviolet rays and heat are used in combination, the surface layer is cured by the ultraviolet rays, so the monomer does not volatilize even if heat is subsequently applied, which is preferable in terms of economy and work environment.
Claims (1)
リコール残基又は一般式(―R′―COO―R″―COO
)―nR′―(但し式中R′はグリコール残基、R″は二
塩基性酸残基、mは1〜20の整数)で表わされる
直鎖状ポリエステルオリゴマ残基、R3はジイソ
シアネート残基、nは1〜10の整数である)で表
わされる不飽和化合物95〜50重量部、分子中に1
個以上の重合性不飽和基を有する化合物5〜50重
量部及びラジカル重合開始剤及び/又は光増感剤
0〜10重量部を含有してなる硬化性樹脂組成物。[Claims] 1. General formula (However, in the formula, R 1 is hydrogen or a methyl group, R 2 is a glycol residue or the general formula (-R′-COO-R″-COO
) —n R′—(wherein R′ is a glycol residue, R″ is a dibasic acid residue, m is an integer from 1 to 20), a linear polyester oligomer residue, R 3 is a diisocyanate 95 to 50 parts by weight of an unsaturated compound represented by a residue (n is an integer from 1 to 10), 1 in the molecule
1. A curable resin composition comprising 5 to 50 parts by weight of a compound having at least 10 polymerizable unsaturated groups and 0 to 10 parts by weight of a radical polymerization initiator and/or a photosensitizer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4409480A JPS56141314A (en) | 1980-04-03 | 1980-04-03 | Curable resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4409480A JPS56141314A (en) | 1980-04-03 | 1980-04-03 | Curable resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56141314A JPS56141314A (en) | 1981-11-05 |
JPS6231723B2 true JPS6231723B2 (en) | 1987-07-10 |
Family
ID=12682026
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4409480A Granted JPS56141314A (en) | 1980-04-03 | 1980-04-03 | Curable resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56141314A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0815915B2 (en) * | 1993-03-03 | 1996-02-21 | 日本電気株式会社 | Clean case |
-
1980
- 1980-04-03 JP JP4409480A patent/JPS56141314A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56141314A (en) | 1981-11-05 |
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