JPS62294423A - Denitration apparatus for high-temperature exhaust gas - Google Patents
Denitration apparatus for high-temperature exhaust gasInfo
- Publication number
- JPS62294423A JPS62294423A JP61136009A JP13600986A JPS62294423A JP S62294423 A JPS62294423 A JP S62294423A JP 61136009 A JP61136009 A JP 61136009A JP 13600986 A JP13600986 A JP 13600986A JP S62294423 A JPS62294423 A JP S62294423A
- Authority
- JP
- Japan
- Prior art keywords
- dilute
- tank
- pumps
- dilution
- pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000007788 liquid Substances 0.000 claims abstract description 13
- 239000012895 dilution Substances 0.000 claims description 33
- 238000010790 dilution Methods 0.000 claims description 33
- 239000007789 gas Substances 0.000 claims description 16
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 3
- 238000002347 injection Methods 0.000 abstract description 13
- 239000007924 injection Substances 0.000 abstract description 13
- 239000011550 stock solution Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
発明の詳細な説明
〔発明の利用分野〕
本発明は、窒素酸化物（以下、ＮＯｘという）を含む高
温排ガスの脱硝装置に注入する過酸化水素（以下、Ｈｘ
Ｏｘという）を一定濃度に希釈するためのＨｘ Ｏｘ
希釈装置に関するものである。Detailed Description of the Invention Detailed Description of the Invention [Field of Application of the Invention] The present invention provides hydrogen peroxide (hereinafter referred to as Hx
Hx to dilute Ox to a constant concentration
This relates to a dilution device.
高温排ガスを対象とした脱硝装置は、特公昭５７−１９
７００号に記載のように、アンミニア（以下、Ｎ Ｈａ
という）とＨ２０ｘを注入して行う気相還元脱硝方法が
好適である。この公報には、Ｈｚ Ｏｘは入口ＮＯｘモ
ル比に対し約１以下として注入することが必要であり、
注入モル比は流量調節弁により制御されることが記載さ
れている。しかし注入するＨ ｚ Ｏ２濃度については
特に記載されていない。A denitrification device for high-temperature exhaust gas was developed by the Special Publication Corporation in 1984.
As described in No. 700, Ammonia (hereinafter, N Ha
A gas phase reduction denitrification method performed by injecting H20x and H20x is suitable. This publication states that Hz Ox needs to be injected at a molar ratio of about 1 or less to the inlet NOx molar ratio,
It is stated that the injection molar ratio is controlled by a flow control valve. However, there is no particular description of the concentration of H z O2 to be injected.
注入Ｈｚ Ｏｚの濃度を具体的に考えた場合、高濃度の
Ｈｘ Ｏｘ注入では微量注入となり、排ガスダクト内全
面に均一に噴霧できず、排ガス中における分散混合が悪
くなる。また高濃度ＨｚＯｚ （３６ｗ ｔ％以上）は
消防法の危険物に該当し取扱いがむずかしく、脱硝装置
の相当部分の機器計器等は防爆仕様しなければならない
。Considering the concentration of the injection Hz Oz, high concentration Hx Ox injection results in a very small amount of injection, which makes it impossible to spray uniformly over the entire surface of the exhaust gas duct, resulting in poor dispersion and mixing in the exhaust gas. In addition, high concentrations of HzOz (36wt% or more) fall under the category of hazardous materials under the Fire Service Act and are difficult to handle, so a considerable portion of the equipment and instruments in the denitrification equipment must be explosion-proof.
そこで、注入するＨ ２０ ｘを数Ｗ ｔ、％に希釈す
ると、噴−量が多くなり、均一噴霧が可能となる」二に
、仮にＮＯｘ濃度が低い場合でも安定した脱硝性能を得
ることができ、取扱いおよび設備等の点で有利と考えら
れる。Therefore, if the injected H20x is diluted to several Wt%, the spray amount will increase and uniform spraying will be possible.Secondly, even if the NOx concentration is low, stable denitrification performance can be obtained. It is considered to be advantageous in terms of handling, equipment, etc.
本発明の目的は、ＮＯｘを含む高温排ガスの脱硝装置に
おいて、Ｈｘ Ｏｘを自動的に一定濃度に希釈し、安定
した組成のＨｘ Ｏｚ水を脱硝装置に供給可能なＨｘ
Ｏｘ希釈装置を提供することである。The purpose of the present invention is to automatically dilute HxOx to a constant concentration in a denitrification equipment for high-temperature exhaust gas containing NOx, and to supply HxOx water with a stable composition to the denitrification equipment.
An object of the present invention is to provide an Ox dilution device.
本発明は、上記目的を達成するために、原液のＨ２Ｏ２
タンクと、希釈水タンクと、それぞれに吐出量が可変の
原液Ｈ２Ｏ２ポンプおよび希釈水ポンプと、これらポン
プからの液体を混合する希釈タンクとからなるＨ２Ｏ２
希釈装置を提供するものである。In order to achieve the above-mentioned object, the present invention aims to solve the problems of undiluted H2O2
A H2O2 tank, a dilution water tank, a stock H2O2 pump and a dilution water pump each having a variable discharge amount, and a dilution tank that mixes the liquid from these pumps.
A dilution device is provided.
所望の希釈Ｉ−Ｉ ｚ Ｏｘ濃度に応じて、両ポンプの
吐出量の比率を調整した後は、タンク内の液面が一定範
囲になるようにする液面スイッチからの信号により、両
ポンプを必ず同時に起動停止させるので、常に一定の希
釈濃度が自動的に得られることになる。After adjusting the ratio of the discharge amounts of both pumps according to the desired dilution I-I z Ox concentration, both pumps are controlled by a signal from the liquid level switch that keeps the liquid level in the tank within a certain range. Since they are always started and stopped at the same time, a constant dilution concentration is automatically obtained.
以下、本発明の一実施例を第１図により説明する。第１
図は高温排ガスを対象として気相還元脱硝装置の本発明
によるＨ２Ｏ２希釈系統を示す図である。An embodiment of the present invention will be described below with reference to FIG. 1st
The figure is a diagram showing a H2O2 dilution system according to the present invention of a gas phase reduction and denitrification apparatus for high-temperature exhaust gas.
高濃度のＨｘ Ｏｘは原液Ｈｘ Ｏｔタンク１に点蔵さ
れており、ポンプ３によって流量計４および背圧弁５を
通り、希釈タンク１１に移送される。ここでポンプ３は
吐出量可変式の例えばレシプロ型ポンプ等である。背圧
弁５を取付けであるのは、ポンプの前圧を常に一定とし
、吐出量を正確に制御するためであり、例えば一般的な
バネ式安全弁等である。Highly concentrated HxOx is stored in a stock HxOt tank 1, and is transferred to a dilution tank 11 by a pump 3 through a flowmeter 4 and a back pressure valve 5. Here, the pump 3 is a variable discharge amount type, for example, a reciprocating type pump. The reason why the back pressure valve 5 is installed is to keep the front pressure of the pump constant and accurately control the discharge amount, and is, for example, a general spring-type safety valve.
次に、Ｈ２Ｏ２希釈水７は、水タンクもしくはプール等
６に貯蔵されており、ポンプ８によって流量計９および
背圧弁１０を通り、希釈タンク１１に移送される。ここ
で希釈水７は不純物を含まない」二本もしくは純水であ
ることが必要である。ポンプ８および背圧弁１０の仕様
は、前記の原液Ｈ２Ｏ２移送用のポンプおよび背圧弁５
と同じである。Next, the H2O2 dilution water 7 is stored in a water tank or pool 6, and is transferred to a dilution tank 11 by a pump 8 through a flow meter 9 and a back pressure valve 10. Here, the dilution water 7 needs to be pure water or two bottles containing no impurities. The specifications of the pump 8 and back pressure valve 10 are the same as the pump and back pressure valve 5 for transferring the stock solution H2O2.
is the same as
希釈タンク１１に移送された高濃度Ｈ２０ｘおよび希釈
水７はここで希釈混合される。希釈混合を良くするため
攪拌機１６により常時攪拌することが望ましい。また希
釈タンク１１には液面スイッチ１３を設け、接点はＬと
Ｈの２点とし、Ｌ接点で希釈開始信号すなわちポンプ３
および８の起動信号となり、Ｈ接点で希釈停止信号すな
わちポンプ３および８の停止信号となるようにしである
。High concentration H20x and dilution water 7 transferred to dilution tank 11 are diluted and mixed here. In order to improve dilution and mixing, it is desirable to constantly stir the mixture using the stirrer 16. In addition, the dilution tank 11 is provided with a liquid level switch 13 with two contact points, L and H.
and 8, and the H contact serves as a dilution stop signal, that is, a stop signal for pumps 3 and 8.
液面スイッチ１３からの電気信号１４および１５は、ポ
ンプ３および８に印加され起動停止信号となる。ポンプ
３および８は同時に起動停止とすることが必要である。Electrical signals 14 and 15 from the liquid level switch 13 are applied to the pumps 3 and 8 and serve as start/stop signals. It is necessary to start and stop pumps 3 and 8 at the same time.
またＬ接点よりも下にＬＬ接点を設け、この信号を攪拌
機１６および注入ポンプ１．７に接続し、ＬＬ接点以下
はこれらを停止させ、攪拌機」−６および注入ポンプ１
７の空運転防止の保護回路とする。In addition, an LL contact is provided below the L contact, and this signal is connected to the stirrer 16 and the injection pump 1.7.
7, a protection circuit to prevent dry running.
さて、希釈タンク１１で希釈されたＨ２０ｘは、注入ポ
ンプ１７によりＨ２Ｏ２注入配管１８に圧送され、ノズ
ルからダクト２２内のＮＯｘを含む徘ガス１９内に噴霧
される。このＨｘ Ｏｘ噴震よりも上流側においては、
同様にＮＨａ２０がＮ Ｈａ注入配管２１を通り、ノズ
ルかにタクト２２内に噴震される。Now, the H20x diluted in the dilution tank 11 is force-fed to the H2O2 injection pipe 18 by the injection pump 17, and is sprayed from the nozzle into the wandering gas 19 containing NOx in the duct 22. On the upstream side of this Hx Ox eruption,
Similarly, NHa 20 passes through the NHa injection pipe 21 and is ejected into the nozzle or tact 22.
ダクト２２内においては、ＮＨａ２０およびＨ２Ｏ２１
，２により気相還元脱硝がなされ、ＮＯｘを低減する構
成となっている。Inside the duct 22, NHa20 and H2O21
, 2 performs gas phase reduction denitrification to reduce NOx.
次に動作原理について説明する。Next, the operating principle will be explained.
高濃度Ｈｘ Ｏｘ ２を希釈タンク１１である濃度に希
釈する場合は、流量計４および９で確認し、吐出量可変
ポンプ３および８の吐出量を、下記演算式からそれぞれ
決定する。When high-concentration Hx Ox 2 is diluted to a certain concentration in the dilution tank 11, it is checked with the flowmeters 4 and 9, and the discharge amounts of the variable discharge amount pumps 3 and 8 are determined from the following calculation formulas, respectively.
＝希釈Ｈｘ Ｏｘ濃度〔％〕
これにより希釈Ｈｘ Ｏｘ濃度は指定する濃度に調整さ
れる。調整後は、液面スイッチによりポンプ３と８とが
同時に起動停止するから、常に自動で一定濃度に希釈で
きる。=Diluted Hx Ox concentration [%] Accordingly, the diluted Hx Ox concentration is adjusted to the specified concentration. After adjustment, the liquid level switch starts and stops pumps 3 and 8 at the same time, so that the liquid can always be automatically diluted to a constant concentration.
ここで流量計４および９の目盛単位を重量流量とすれば
、上記演算式から重量％の濃度を決定することが容易で
あり、同様に目盛単位を質量流量とすれば、質量％の濃
度を容易に決定できる。Here, if the scale unit of flowmeters 4 and 9 is the weight flow rate, it is easy to determine the concentration in weight% from the above calculation formula, and similarly, if the scale unit is the mass flow rate, the concentration in mass% can be determined. Easy to determine.
本実施例によれば、以下の効果が得られる。According to this embodiment, the following effects can be obtained.
１、ＨｚＯｚは高濃度のものを貯蔵したその部分のみを
防爆仕様として、必要に応じ希釈し使用する方が安価で
あり、安全性も高い。1. For HzOz, it is cheaper and safer to make only the part where the high concentration is stored explosion-proof, dilute it as necessary, and use it.
２、Ｈ２０ｚ希釈濃度は可変式であり、指定濃度に自在
に調整できるため、実際の脱硝性能状況に合わせて設定
を変更可能である。2. The H20z dilution concentration is variable and can be freely adjusted to the specified concentration, so the setting can be changed according to the actual denitrification performance situation.
３、ポンプ吐出側に背圧弁を設けたことにより、吐出量
の制御は正確となり、また自動希釈であるため作業性が
向上する。3. By providing a back pressure valve on the pump discharge side, the discharge amount can be controlled accurately, and the automatic dilution improves work efficiency.
本発明によれば、ＮＯｘを含む高温排ガスの脱硝装置に
おいて、Ｈｘ Ｏｚを自動的に一定濃度に希釈し、安定
した組成の、Ｈｘ Ｏｘ水を脱硝装置に大量供給可能な
Ｈ２Ｏ２希釈装置が得られる。According to the present invention, in a denitrification device for high-temperature exhaust gas containing NOx, it is possible to obtain an H2O2 dilution device that can automatically dilute HxOz to a constant concentration and supply a large amount of HxOx water with a stable composition to the denitrification device. .
第１図は気相還元脱硝装置の本発明によるＨ２Ｏ２希釈
系統を示す図である。
］・・・原液Ｈ２０２タンク、２・・・原液Ｈｚ Ｏｘ
、３・・・原液Ｉ−■２ｏｚポンプ、４・・・流量計、
５・・・背圧弁、６・・・希釈タンク、７・・・希釈水
、８・・・希釈水ポンプ、９・・・流量計、１０・・・
背圧弁、１１・・・希釈タンク、１２・・・希釈Ｈ２Ｏ
２，１３・・・液面スイッチ、１−４・・・液面スイッ
チ電気信号、１５・・・液面スイッチ電気信号、１６・
・・攪拌機、１７・・・Ｈ２０ｚ注入ポンプ。
１８・・・Ｈｘ Ｏｘ注入配管、１９・・・高温排ガス
、２０・・・ＮＨｓ 、 ２ ］・・・Ｎ Ｈｓ注入配
管、２２・・・ダクト。FIG. 1 is a diagram showing a H2O2 dilution system according to the present invention of a gas phase reduction and denitrification apparatus. ]...Stock solution H202 tank, 2...Stock solution Hz Ox
, 3... Stock solution I-■2oz pump, 4... Flow meter,
5... Back pressure valve, 6... Dilution tank, 7... Dilution water, 8... Dilution water pump, 9... Flow meter, 10...
Back pressure valve, 11... dilution tank, 12... dilution H2O
2, 13...Liquid level switch, 1-4...Liquid level switch electrical signal, 15...Liquid level switch electrical signal, 16.
... Stirrer, 17...H20z injection pump. 18...Hx Ox injection pipe, 19...High temperature exhaust gas, 20...NHs, 2]...NHs injection pipe, 22...Duct.
Claims (1)
注入しその下流で過酸化水素を注入して脱硝する気相還
元高温排ガスの脱硝装置において、原液過酸化水素タン
クと希釈水タンクとそれぞれに吐出量が可変の原液過酸
化水素ポンプおよび希釈水ポンプとこれらポンプからの
液体を混合する希釈タンクとを備え、所定希釈度に合わ
せて両ポンプの吐出量を設定後は、これらのポンプを同
時に起動停止させて、常に一定濃度に希釈された過酸化
水素水を得て注入することを特徴とする高温排ガスの脱
硝装置。1. In a gas phase reduction high temperature exhaust gas denitrification equipment that injects ammonia into high temperature exhaust gas containing nitrogen oxides upstream and then injects hydrogen peroxide downstream, there is a undiluted hydrogen peroxide tank and a dilution water tank, respectively. Equipped with a stock hydrogen peroxide pump and a dilution water pump with variable discharge volumes, and a dilution tank that mixes the liquid from these pumps, after setting the discharge volume of both pumps according to the predetermined dilution level, these pumps can be operated at the same time. A high-temperature exhaust gas denitrification device that starts and stops to constantly obtain and inject hydrogen peroxide solution diluted to a constant concentration.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136009A JPS62294423A (en) | 1986-06-13 | 1986-06-13 | Denitration apparatus for high-temperature exhaust gas |
| GB8704607A GB2192624B (en) | 1986-06-13 | 1987-02-27 | Denitrating device for high temperature waste gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61136009A JPS62294423A (en) | 1986-06-13 | 1986-06-13 | Denitration apparatus for high-temperature exhaust gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62294423A true JPS62294423A (en) | 1987-12-21 |
Family
ID=15165050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61136009A Pending JPS62294423A (en) | 1986-06-13 | 1986-06-13 | Denitration apparatus for high-temperature exhaust gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62294423A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5737677A (en) * | 1995-08-31 | 1998-04-07 | Eastman Kodak Company | Apparatus and method of toner transfer using non-marking toner |
| US5794111A (en) * | 1995-12-14 | 1998-08-11 | Eastman Kodak Company | Apparatus and method of transfering toner using non-marking toner and marking toner |
| US5912097A (en) * | 1993-07-06 | 1999-06-15 | Eastman Kodak Company | Electrostatographic method using an overlay toner |
| CN100346866C (en) * | 2005-08-16 | 2007-11-07 | 卢作基 | Self-adaption flow-field ammonia jetter |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS533492U (en) * | 1976-06-29 | 1978-01-13 | ||
| JPS5472764A (en) * | 1977-11-24 | 1979-06-11 | Babcock Hitachi Kk | Controlling method for charge of hydrogen peroxide used for denitration |
-
1986
- 1986-06-13 JP JP61136009A patent/JPS62294423A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS533492U (en) * | 1976-06-29 | 1978-01-13 | ||
| JPS5472764A (en) * | 1977-11-24 | 1979-06-11 | Babcock Hitachi Kk | Controlling method for charge of hydrogen peroxide used for denitration |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5912097A (en) * | 1993-07-06 | 1999-06-15 | Eastman Kodak Company | Electrostatographic method using an overlay toner |
| US5737677A (en) * | 1995-08-31 | 1998-04-07 | Eastman Kodak Company | Apparatus and method of toner transfer using non-marking toner |
| US5794111A (en) * | 1995-12-14 | 1998-08-11 | Eastman Kodak Company | Apparatus and method of transfering toner using non-marking toner and marking toner |
| CN100346866C (en) * | 2005-08-16 | 2007-11-07 | 卢作基 | Self-adaption flow-field ammonia jetter |
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