JPS62294162A - Production of vacuum deposition plated steel sheet - Google Patents
Production of vacuum deposition plated steel sheetInfo
- Publication number
- JPS62294162A JPS62294162A JP13488386A JP13488386A JPS62294162A JP S62294162 A JPS62294162 A JP S62294162A JP 13488386 A JP13488386 A JP 13488386A JP 13488386 A JP13488386 A JP 13488386A JP S62294162 A JPS62294162 A JP S62294162A
- Authority
- JP
- Japan
- Prior art keywords
- steel strip
- plating
- vacuum deposition
- chamber
- activation treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 49
- 239000010959 steel Substances 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000001771 vacuum deposition Methods 0.000 title abstract description 10
- 238000007747 plating Methods 0.000 claims abstract description 38
- 230000004913 activation Effects 0.000 claims abstract description 18
- 230000001680 brushing effect Effects 0.000 claims abstract description 18
- 230000003746 surface roughness Effects 0.000 claims abstract description 15
- 238000011282 treatment Methods 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 10
- 230000003213 activating effect Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 13
- 239000002184 metal Substances 0.000 abstract description 13
- 239000000356 contaminant Substances 0.000 abstract description 6
- 229910052804 chromium Inorganic materials 0.000 abstract description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- 229910052718 tin Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 238000007789 sealing Methods 0.000 abstract 2
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 238000001994 activation Methods 0.000 description 16
- 238000007738 vacuum evaporation Methods 0.000 description 13
- 239000007789 gas Substances 0.000 description 12
- 238000007740 vapor deposition Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000010960 cold rolled steel Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910001335 Galvanized steel Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000008397 galvanized steel Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000002436 steel type Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】 ３、発明の詳細な説明 〈産業上の利用分野〉 本発明は真空蒸着めっき鋼板の製造方法に関する。[Detailed description of the invention] 3. Detailed description of the invention <Industrial application field> The present invention relates to a method for manufacturing a vacuum-deposited steel plate.
〈従来技術の問題点〉
真空蒸着めっきを行なう場合、鋼帯と被覆した金属皮膜
との密着性は、１８０°密着（Ｏｔ）曲げ加工あるいは
逆再絞り加工等の過酷な加工を行なっても、蒸着皮膜の
剥離やクラック、あるいはパウダリングを発生しないも
のでなくてはならない。そのため、蒸着めっきを行なう
際は、蒸着めっき前の鋼帯表面の活性化あるいは清浄化
処理を十分に行なう必要がある。この活性化処理には、
ガス還元処理、酸洗、電子ビーム処理などの方法がある
。<Problems with the prior art> When performing vacuum evaporation plating, the adhesion between the steel strip and the coated metal film remains unreliable, even after severe processing such as 180° contact (Ot) bending or reverse re-drawing. It must not cause peeling, cracking, or powdering of the deposited film. Therefore, when performing vapor deposition plating, it is necessary to sufficiently activate or clean the surface of the steel strip before vapor deposition plating. This activation process includes
Methods include gas reduction treatment, pickling, and electron beam treatment.
たとえば、水素５〜７５ｖｏ１％を含む雰囲気で加熱す
る方法の場合には、加熱中に＃′ｊ！帯表面が活性化さ
れてその後の蒸着めっきで、鋼帯と蒸着めっき金属との
密着性を良好に保つ。For example, in the case of heating in an atmosphere containing 5 to 75 vol% hydrogen, #'j! during heating! The strip surface is activated and the subsequent vapor deposition plating maintains good adhesion between the steel strip and the vapor deposited metal.
しかしこのような還元雰囲気中で加熱して鋼帯表面の活
性化を行なう方法では、めっきされる鋼帯表面の汚染度
が高い場合、必ずしも十分な鋼帯表面の活性度を得るこ
とが困難となる。However, with this method of activating the surface of the steel strip by heating in a reducing atmosphere, if the surface of the steel strip to be plated is highly contaminated, it may be difficult to obtain sufficient activation of the surface of the steel strip. Become.
また、めっきされる鋼帯を還元雰囲気で活性化した後、
真空蒸着室内に設置されたブラッシング装置で、さらに
鋼帯表面を清浄化、あるいは活性化する方法が提案され
ている（特開昭５８−１７４５７５）。In addition, after activating the steel strip to be plated in a reducing atmosphere,
A method has been proposed in which the surface of the steel strip is further cleaned or activated using a brushing device installed in a vacuum deposition chamber (Japanese Patent Application Laid-Open No. 174575/1983).
しかし、上記の提案を実施する場合、真空系内にブラッ
シング装置を設置するので、設備が複雑となり、コスト
も高くなる。さらに真空系内部に、ブラッシング装置を
設置しているので、その整備。However, when implementing the above proposal, the brushing device is installed within the vacuum system, which increases the complexity of the equipment and the cost. Furthermore, we have installed a brushing device inside the vacuum system, so we need to maintain it.
調整が難しく、またブラッシングにより除去された汚染
物、スケールなどの除去処理が非常に難しいという問題
がある。There are problems in that adjustment is difficult and removal of contaminants, scale, etc. removed by brushing is extremely difficult.
〈発明の目的〉
本発明は、鋼帯表面の活性化、あるいは清浄化を効率的
かつ工業的に安価に行なって、密着性の良好な真空蒸着
めっき鋼帯を提供するものである。<Objective of the Invention> The present invention provides a vacuum-deposited plated steel strip with good adhesion by activating or cleaning the surface of the steel strip efficiently and industrially at low cost.
〈問題を解決するための手段〉
本発明は、前述した従来技術上の問題点に着目してなさ
れたもので、従来の、鋼帯表面活性化工程の前に、ブラ
ッシングで表面汚染物を強制除去し、かつ表面粗度Ｒａ
を０．２〜３．０μｍの範囲に調整することにより１表
面活性化を向上させ、蒸着金属と鋼帯との密着性を向上
させることを特徴とする真空蒸着めっき鋼板の製造方法
を提供するものである。<Means for Solving the Problems> The present invention has been made by paying attention to the problems in the prior art described above. removed and surface roughness Ra
Provided is a method for producing a vacuum evaporated plated steel sheet, characterized in that 1 surface activation is improved by adjusting the thickness to a range of 0.2 to 3.0 μm, and the adhesion between the evaporated metal and the steel strip is improved. It is something.
〈発明の構成〉
本発明によれば、鋼帯に連続的に真空蒸着めっきする方
法において、従来の活性化処理工程の前に付設されたブ
ラッシング装置で、鋼帯の表面粗度をＲａ ： ０．２
〜３．０μＩの範囲に調整した後、活性化処理を行ない
、つづいて蒸着めっきすることにより得られる蒸着めっ
き鋼板の製造方法が提供される。<Structure of the Invention> According to the present invention, in a method of continuously vacuum deposition plating on a steel strip, the surface roughness of the steel strip is reduced to Ra: 0 using a brushing device attached before the conventional activation treatment step. .2
A method for producing a vapor-deposited plated steel sheet is provided, which is obtained by adjusting the content to a range of ~3.0 μI, performing an activation treatment, and then performing vapor deposition plating.
〈発明の具体的開示〉
連続式真空蒸着めっき装置には、いくつかの様式が提案
されているが、第１図に例示するものは、ガス還元型活
性化処理炉２．ｉ１元ガス、あるいは空気の流入を防止
するための賦圧室３．３’、一連の段階的に排気する個
別に真空排気手段を備えた隔室に納められた多数のシー
ルロールからなる第１、および第２のシールロール室４
．４’、ｌ帯の片方の面に真空蒸着めっきするための第
１真空蒸着めっき室５．および鋼帯の他方の面に真空蒸
着めっきするための第１真空蒸着めっき室に連通ずる第
２真空蒸着めっき室５′から構成されている。なお。<Specific Disclosure of the Invention> Several types of continuous vacuum evaporation plating apparatus have been proposed, and the one illustrated in FIG. 1 is a gas reduction type activation processing furnace 2. i1 A pressure chamber 3.3' for preventing the inflow of source gas or air; a first chamber consisting of a number of seal rolls housed in compartments each equipped with a series of stepwise evacuation means; , and second seal roll chamber 4
．． 4', a first vacuum evaporation plating chamber for performing vacuum evaporation plating on one side of the L band; 5. and a second vacuum evaporation plating chamber 5' communicating with the first vacuum evaporation plating chamber for vacuum evaporation plating on the other surface of the steel strip. In addition.
上記真空蒸着めっき室５，５′の内部にはめっき金属浴
６，６′およびデフレクタロール７．７′が配設されて
いる。A plating metal bath 6, 6' and a deflector roll 7, 7' are arranged inside the vacuum deposition plating chamber 5, 5'.
本発明を実施する装置は、第２図に示すように第１図の
装置に加えて、ガス還元型活性化処理炉２の前にブラッ
シング装ｆｉ８を設けたものである。As shown in FIG. 2, the apparatus for implementing the present invention is one in which a brushing device fi8 is provided in front of the gas reduction type activation processing furnace 2 in addition to the apparatus shown in FIG.
冷間圧延されたままの鋼帯１は、ブラッシング装置８に
より連続的にブラッシングされ、表面汚染物が除去され
、かつ表面粗度がＲａ ： ０．２〜３．０μｍになる
ように調整される。その後、鋼帯１は連続して活性化処
理炉２に導入され、冷間圧延鋼帯の焼鈍と同時に雰囲気
ガスによる鋼帯表面の活性化が施される。鋼種により差
はあるパ、冷間圧延鋼帯が還元焼鈍されるためには、６
００〜９００℃の温度範囲で２０〜１８０秒の保持時間
が必要である。ガス還元による活性化処理で密着性のよ
い蒸着めっき鋼板を得るためには、Ｈ２ガス（例えば［
Ｉ２５〜７５％残Ｎ２）の雰囲気が必要である。ガス還
元型活性化処理炉２の後半部で鋼帯は２５０〜２８０℃
まで冷却され、さらに賦圧室３、段階的に排気される第
１シールロール室４を経由して、第１真空蒸着室５に導
入される。めっき金属が連続的に供給されるめっき金属
浴６は、電気抵抗加熱、電子ビーム加熱手段等の手段に
よって加熱され、鋼帯の下方の而に蒸着めっきが施され
る。ついでＭ帯１は、回廊部でデフレクタロール７．７
′によってその上面と下面が逆転し、前述と同様に鋼帯
の他方の面にめっき金属浴６′からの金属蒸気が析出し
て、蒸着めっきが行なわれる。その後、鋼帯は第２シー
ルロール室４′、賦圧室３′を経て、大気中へ導出され
る。The cold-rolled steel strip 1 is continuously brushed by a brushing device 8 to remove surface contaminants and adjust the surface roughness to Ra: 0.2 to 3.0 μm. . Thereafter, the steel strip 1 is continuously introduced into an activation treatment furnace 2, where the surface of the steel strip is activated by atmospheric gas at the same time as annealing the cold rolled steel strip. There are differences depending on the steel type, but in order for a cold rolled steel strip to be reduced annealed, 6
A holding time of 20 to 180 seconds is required at a temperature range of 00 to 900°C. In order to obtain vapor-deposited plated steel sheets with good adhesion through activation treatment by gas reduction, H2 gas (e.g. [
An atmosphere of I25 to 75% balance N2 is required. The steel strip is heated to 250 to 280°C in the latter half of the gas reduction type activation treatment furnace 2.
The liquid is further cooled down to a pressure chamber 3 and introduced into a first vacuum deposition chamber 5 via a first seal roll chamber 4 which is evacuated in stages. A plating metal bath 6 into which plating metal is continuously supplied is heated by means such as electric resistance heating or electron beam heating means, and vapor deposition plating is applied to the lower part of the steel strip. Next, M band 1 has deflector roll 7.7 in the corridor section.
The upper and lower surfaces of the steel strip are reversed by ', and the metal vapor from the plating metal bath 6' is deposited on the other surface of the steel strip, and vapor deposition plating is performed in the same manner as described above. Thereafter, the steel strip passes through the second seal roll chamber 4' and the pressure chamber 3' and is led out into the atmosphere.
なおシールロール室４，４′は排気管および多数の真空
ポンプにより排気され、段階的に減圧することにより、
真空蒸着室を所定の真空に保持する作用を有している。The seal roll chambers 4, 4' are evacuated by an exhaust pipe and a number of vacuum pumps, and the pressure is reduced in stages.
It has the function of maintaining the vacuum deposition chamber at a predetermined vacuum.
鋼帯はブラッシング装置８でｍ帯表面の汚染物を強制図
に除去し、その後のガス還元型活性化処理炉２における
表面の活性化が完全に行なわれる。さらにブラッシング
により表面粗度をＲａ：０．２〜３．０μｍに調整する
のは１表面を研磨することにより１表面積を増加させ、
ガス還元型活性化処理炉における活性化面を増加させる
ためである。Contaminants on the surface of the steel strip are forcibly removed by a brushing device 8, and the surface is then completely activated in a gas reduction type activation treatment furnace 2. Furthermore, adjusting the surface roughness to Ra: 0.2 to 3.0 μm by brushing increases the surface area by polishing one surface.
This is to increase the activation surface in the gas reduction type activation processing furnace.
表面粗度Ｒａの下限を０．２μｍにしたのは、それ以下
では密着性の向上効果が顕著には認められないためであ
り、またその上限を３μｍとしたのはそれ以上ではめっ
き後の表面にすし状の模様が現われ、製品の外観を損な
うからである。The reason why the lower limit of surface roughness Ra was set to 0.2 μm is that the effect of improving adhesion is not noticeable below that, and the reason why the upper limit was set to 3 μm is that if it is higher than that, the surface after plating will deteriorate. This is because a sushi-like pattern appears and spoils the appearance of the product.
なお、表面の清浄化と１表面粗度調整を同時に行なうブ
ラッシング方法以外に、あらかじめ鋼帯表面の粗度をサ
ンドブラストなどにより調整しておき、ブラッシング装
置８では表面の清浄化だけを行なっても同様の効果が得
られる。したがってブラシの材質は目的に応じて選択で
きる。また、活性化処理として、ガス還元法以外に、真
空中で電子銃などにより鋼帯表面を活性化処理する場合
などにも本発明が適用できる。In addition to the brushing method that cleans the surface and adjusts the surface roughness at the same time, it is also possible to adjust the roughness of the steel strip surface in advance by sandblasting, etc., and then use the brushing device 8 to only clean the surface. The effect of this can be obtained. Therefore, the material of the brush can be selected depending on the purpose. In addition to the gas reduction method, the present invention can also be applied to the activation treatment of the steel strip surface using an electron gun or the like in a vacuum.
〈実施例〉
第２図に示す連続式真空蒸着めっき装置を用いて、冷間
圧延のまま長期放置した鋼帯に真空蒸着亜鉛めっきを施
した。操作条件は次の通り。<Example> Using a continuous vacuum evaporation plating apparatus shown in FIG. 2, vacuum evaporation galvanization was applied to a cold rolled steel strip that had been left for a long period of time. The operating conditions are as follows.
鋼 帯：０．８ｆｆＷｌ厚さＸ３００ｎｍ巾の低炭素
鋼通板速度： ２０ｍ／ｉｎ
蒸着室圧力； ０．０１ｔｏｒｒ蒸発方法：
抵抗加熱方式
％式％
めっき二 片面または両面
ブラシ周速： ６００〜１５００＋ｎｐｉ表面粗
度：０．１〜５．０μｍ
上記の条件で製造した蒸着亜鉛めっき鋼板について、ブ
ラッシングによる鋼帯表面粗度と、めっき層と鋼帯との
密着性および表面外観を調査した。Steel strip: 0.8ffWl thickness x 300nm width low carbon steel Threading speed: 20m/in Evaporation chamber pressure: 0.01torr Evaporation method:
Resistance heating method % formula % Plating 2 Single-sided or double-sided brush peripheral speed: 600 to 1500 + npi surface roughness: 0.1 to 5.0 μm Regarding the vapor deposited galvanized steel sheet manufactured under the above conditions, the steel strip surface roughness by brushing, The adhesion and surface appearance between the plating layer and the steel strip were investigated.
その結果を第３図に示す。The results are shown in FIG.
めっき層と鋼帯との密着性向上は、鋼帯表面粗度がＲａ
Ｏ，２μｍ以上で顕著にあられれる。しかしＲａが３μ
ｍを越えると、めっき層表面にすじ状の模様があられれ
、密着性および美観が損なわれる。したがって特許請求
の範囲に記載している粗度Ｒａ：０．２〜３．０μｍの
範囲に、鋼イ；シ表面粗度を調整した場合に、最も密着
性向上の効果が得られる。The adhesion between the plating layer and the steel strip is improved when the steel strip surface roughness is Ra.
O, it is noticeable at 2 μm or more. However, Ra is 3μ
If it exceeds m, a streak-like pattern will appear on the surface of the plating layer, impairing the adhesion and aesthetic appearance. Therefore, when the surface roughness of the steel is adjusted to a roughness Ra of 0.2 to 3.0 μm as described in the claims, the effect of improving adhesion is most obtained.
なお、上記実施例ではＺｎを蒸着めっき金属として用い
たが、Ｃｕ、 ＡＩ、 Ｔｉ、 Ｎｉ、 Ｃｒ、 Ｓｎ
、 Ｐｂなどの金属においても同様の効果が得られるこ
とが確認されている。In addition, although Zn was used as the vapor-deposited plating metal in the above example, Cu, AI, Ti, Ni, Cr, Sn
, It has been confirmed that similar effects can be obtained with metals such as Pb.
〈発明の効果〉
通常活性化処理前にブラッシング装置を設置することに
よりめっきされる鋼帯表面の汚染物が、強制的に除去さ
れるので、これまで良好な密着性を得ることが困難であ
った汚染度の高い鋼帯でも、容易に良好な密着性をもっ
た蒸着めっきを施すことができる。<Effects of the Invention> Contaminants on the surface of the steel strip to be plated are forcibly removed by installing a brushing device before the activation treatment, which has hitherto been difficult to obtain. Even highly contaminated steel strips can be easily coated with vapor deposition plating with good adhesion.
また、本発明ではブラッシング装置が大気中に設置され
るため、設備的にも、整備の点でも大巾なコスト低減が
達成される。また、表面粗度は、あらかじめブラッシン
グ以外の方法にて調整しても本発明と同様な効果かえら
れる。なお、片面めっきを施す場合には、第１真空蒸着
室または第２真空蒸着室のいずれか一方で真空蒸着めっ
きすればよい。Further, in the present invention, since the brushing device is installed in the atmosphere, a significant cost reduction can be achieved in terms of equipment and maintenance. Further, even if the surface roughness is adjusted in advance by a method other than brushing, the same effect as that of the present invention can be obtained. In addition, when performing single-sided plating, vacuum evaporation plating may be performed in either the first vacuum evaporation chamber or the second vacuum evaporation chamber.
第１図は現在、使用されている装置の概念図である。第
２図は本発明に用いた装置の概念図である。第３図は鋼
帯の表面粗度と蒸着層の密着性表面外観の関係を示すグ
ラフである。
１・・・鋼帯、２・・・ガス還元型活性化処理炉、３
ａｎｄ ３′・＝Ｅ正圧室４ａｎｄ４′・・・シールロ
ール室５ ａｎｄ ５’・・・真空蒸着めっき室、 ６
ａｎｄ ６’・・・めっき金属浴、７ ａｎｄ ７’
・・・デフレクタロール、８・・・ブラッシング装置。FIG. 1 is a conceptual diagram of the device currently in use. FIG. 2 is a conceptual diagram of the apparatus used in the present invention. FIG. 3 is a graph showing the relationship between the surface roughness of the steel strip and the adhesion and surface appearance of the vapor deposited layer. 1... Steel strip, 2... Gas reduction type activation treatment furnace, 3
and 3'...=E positive pressure chamber 4 and 4'... seal roll chamber 5 and 5'... vacuum evaporation plating chamber, 6
and 6'...Plating metal bath, 7 and 7'
... Deflector roll, 8... Brushing device.
Claims (1)
の表面を活性化する装置の直前に付設されたブラッシン
グ装置で、あらかじめ鋼帯の表面粗度をＲａ：０．２〜
３．０μｍの範囲に調整した後、常法の活性化処理を行
ない、つづいて蒸着めっきすることからなる蒸着めっき
鋼板の製造方法。In a method of continuously vacuum evaporating a steel strip, a brushing device installed just before a device for activating the surface of the steel strip is used to adjust the surface roughness of the steel strip to Ra: 0.2 to 0.2 in advance.
A method for producing a vapor-deposited steel sheet, which comprises adjusting the thickness to a range of 3.0 μm, performing a conventional activation treatment, and then vapor-depositing plating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13488386A JPS62294162A (en) | 1986-06-12 | 1986-06-12 | Production of vacuum deposition plated steel sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13488386A JPS62294162A (en) | 1986-06-12 | 1986-06-12 | Production of vacuum deposition plated steel sheet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62294162A true JPS62294162A (en) | 1987-12-21 |
Family
ID=15138735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13488386A Pending JPS62294162A (en) | 1986-06-12 | 1986-06-12 | Production of vacuum deposition plated steel sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62294162A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009084642A (en) * | 2007-09-28 | 2009-04-23 | Fujifilm Corp | Film-forming apparatus and film-forming method |
-
1986
- 1986-06-12 JP JP13488386A patent/JPS62294162A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009084642A (en) * | 2007-09-28 | 2009-04-23 | Fujifilm Corp | Film-forming apparatus and film-forming method |
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