JPS62289913A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS62289913A JPS62289913A JP13348186A JP13348186A JPS62289913A JP S62289913 A JPS62289913 A JP S62289913A JP 13348186 A JP13348186 A JP 13348186A JP 13348186 A JP13348186 A JP 13348186A JP S62289913 A JPS62289913 A JP S62289913A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- carbon
- thin film
- head
- kinds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 19
- 150000004767 nitrides Chemical class 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims description 22
- 239000010409 thin film Substances 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 230000001681 protective effect Effects 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 abstract description 41
- 238000005260 corrosion Methods 0.000 abstract description 14
- 230000007797 corrosion Effects 0.000 abstract description 11
- 239000000758 substrate Substances 0.000 abstract description 8
- 239000011241 protective layer Substances 0.000 abstract description 5
- 229910021384 soft carbon Inorganic materials 0.000 abstract description 4
- 230000003449 preventive effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 6
- 235000019589 hardness Nutrition 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229910021385 hard carbon Inorganic materials 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 238000009751 slip forming Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000013441 quality evaluation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
〔産業上の利用分野〕
本発明はコンピュータの外部記録装置として広（利用さ
れている磁気記録装置に用いられている磁気記録媒体に
関し、詳しくは該記録媒体の中で金属磁性薄膜上の保護
膜に関するものである。Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a magnetic recording medium used in a magnetic recording device that is widely used as an external storage device for computers. This relates to a protective film on a metal magnetic thin film in the recording medium.
金属磁性薄膜を記録層とする磁気記録媒体においては、
金属磁性薄膜を腐食から守る防食性を有し、かつヘッド
との接触に耐えるだけの十分な機械的信鯨性を有する保
護膜を形成する必要がある。In magnetic recording media whose recording layer is a metal magnetic thin film,
It is necessary to form a protective film that has anticorrosion properties to protect the metal magnetic thin film from corrosion and has sufficient mechanical strength to withstand contact with the head.
各種酸化物、各種窒化物、各種炭化物等による保護層の
形成が、
特公昭４９−２９４４５、同５２−１７４０２、同５８
−３７６１６、特開昭５７−１１７１２６、特公昭４９
−２６５６３、同５０−３０４４３、同５１−１５９６
７、同５２−１８００１同５４−２９２４２、同５４−
３４６０２、同５５−２９５００、同５７−４０５６５
、同５７−５８７３１、同５８−３７６１４、同５８−
３７６１５、特開昭５１−４７４０１同５１．−１４８
４０６、同５５−１０８９３０、同５７−１４７１３３
、同５７−１８９３３９、同５Ｂ−１３３６３４、同５
８−１０８０３０、特公昭５５−３９０４７、特開昭５
５−７３９３１、同５８−１７９９３８、同５８−１７
９９３９、同５８−１７等で提案されているが、油滑性
におとり、機械的信頼性を十分に満足するものではなが
った。Formation of protective layers with various oxides, various nitrides, various carbides, etc. is described in Japanese Patent Publications No. 49-29445, No. 52-17402, and No. 58.
-37616, Japanese Patent Application Publication No. 57-117126, Special Publication No. 1977-117126
-26563, 50-30443, 51-1596
7, 52-18001 54-29242, 54-
34602, 55-29500, 57-40565
, 57-58731, 58-37614, 58-
37615, JP-A-51-47401, 51. -148
406, 55-108930, 57-147133
, 57-189339, 5B-133634, 5
8-108030, Japanese Patent Publication No. 55-39047, Japanese Patent Publication No. 1983
5-73931, 58-179938, 58-17
No. 9939, No. 58-17, etc., but these methods lacked oil lubricity and did not fully satisfy mechanical reliability.
カーボン膜を用いた保護層の形成が、特公昭５４−３３
５２１、特開昭５３−１４３２０６、同５６−４１５２
４等で提案されているが、これらは他の保護膜と比較し
て安定した油滑性を示し、機械的信頼性はかなり高いも
のであった。しかし、カーボン膜が高い機械的信頼性を
示すのはモノリシックヘッドと呼ばれるヘッドが主であ
り、アルミナチタンカーバイド（ＡＴＣ）を材料として
用いている薄膜ヘッドとは相性が悪く、十分な機械的信
頼性を有していなかった。より具体的にはコンタクトス
タートアンドストップ（以下ｃｓｓと呼ぶ）テストにお
いて、キズが発生したり、摩擦係数が増大したりする場
合があることである。The formation of a protective layer using a carbon film was published in
521, JP 53-143206, JP 56-4152
4, etc., but compared to other protective films, these showed stable oil lubricity and had considerably high mechanical reliability. However, carbon film mainly shows high mechanical reliability in heads called monolithic heads, and is not compatible with thin film heads that use alumina titanium carbide (ATC) as a material. did not have. More specifically, in a contact start and stop (hereinafter referred to as CSS) test, scratches may occur or the coefficient of friction may increase.
さらにカーボン膜は微細なピンホールが多く、膜自身の
水や酸素の透過率が高いために耐食性はほとんど向上せ
ず、防食性は不十分なものであった。Furthermore, the carbon film had many fine pinholes and the film itself had a high permeability to water and oxygen, so the corrosion resistance was hardly improved and the corrosion resistance was insufficient.
以上述べたように従来技術では薄膜ヘッドとの組合わせ
において機械的信頼性を十分に満たす保護膜はなく、さ
らに防食性も不十分であった。As described above, in the prior art, there is no protective film that fully satisfies mechanical reliability when used in combination with a thin film head, and furthermore, the anticorrosion properties are insufficient.
本発明はこの問題を解決するもので、その目的とすると
ころは、薄膜ヘッドとの組合わせにおいて機械的信頼性
を十分に満足し、かつ必要十分な防食性を有する保護膜
を提供することにある。The present invention solves this problem, and its purpose is to provide a protective film that fully satisfies mechanical reliability in combination with a thin film head and has necessary and sufficient corrosion resistance. be.
本発明の磁気記録媒体は、基板上に金属薄膜を記録層と
して形成した後に、該金属磁性薄膜上に酸化物、窒化物
、炭化物からなる少なくとも１種の物質より形成される
薄膜を防食層として被覆され、更に該防食層の表面にカ
ーボンを５０〜３００オングストロームの厚みで形成さ
れたものである。そして本発明のポイントとなる所は、
このカーボン層が硬さの異なる少なくとも２種類のカー
ボン層から出来ており、比較的柔らかいカーボン層を緩
衝層として作用させ、ヘッドとの衝撃を弱めていること
である。ヘッドと直接接触する部分はある程度固くし、
ヘッドによる保護膜のけずれを防止する。この比較的固
い層の下部に比較的柔らかな層を形成しヘッドと媒体と
の衝撃力を低下させる。In the magnetic recording medium of the present invention, after forming a metal thin film as a recording layer on a substrate, a thin film made of at least one substance consisting of oxide, nitride, and carbide is formed on the metal magnetic thin film as an anticorrosion layer. The anticorrosive layer is coated with carbon to a thickness of 50 to 300 angstroms on the surface of the anticorrosive layer. And the key point of the present invention is that
This carbon layer is made of at least two types of carbon layers with different hardnesses, and the relatively soft carbon layer acts as a buffer layer to weaken the impact with the head. The parts that come into direct contact with the head should be hardened to some extent.
Prevents the protective film from being scratched by the head. A relatively soft layer is formed below this relatively hard layer to reduce the impact force between the head and the medium.
Ｃ８Ｓの動作を行なうヘッドとメディアにおいては、一
般にヘッド材料の方が硬度が高い。中でも薄膜ヘッドに
用いられているＡＴＣは非常に硬く、現在まで一般的に
用いられているフェライトとは相当に機械的性質が異な
っている。このためメディア側の保護膜もこれに対応し
て硬くなければならない。ところが保護膜を硬くすると
、ヘッドとメディアとの衝撃力が直接メディアに加わり
磁性層がダメージを受けたり、場合によってはキズの発
生からヘッドクラッシュへとつながることさえある。In heads and media that perform C8S operations, the head material generally has higher hardness. Among them, ATC used in thin film heads is extremely hard and has mechanical properties considerably different from ferrite, which has been commonly used up to now. Therefore, the protective film on the media side must be correspondingly hard. However, if the protective film is hardened, the impact force between the head and the media will be applied directly to the media, damaging the magnetic layer, and in some cases even causing scratches that may lead to a head crash.
他方保護膜を柔らかくしてゆ（と、キズの発生は少なく
なるが保護膜自身が徐々にけずり取られてゆきダストの
発生を起こしたり、場合によってはけずられたものがた
まってゆき、摩擦係数が増大したり、ヘッドに付着して
ヘッドの浮上特性を悪化させたりすることがある。On the other hand, if the protective film is softened, the occurrence of scratches will be reduced, but the protective film itself will be gradually scratched off, causing dust to be generated, and in some cases, the scraped materials will accumulate, reducing the coefficient of friction. may increase or adhere to the head, deteriorating the flying characteristics of the head.
以上のような問題を解決するためにカーボン層において
膜の硬さの異なる少なくとも２種類のカーボン層を形成
することが本発明のポイントの１つである。ヘッドと直
接接触する層は比較的硬度を高く形成し、その下部によ
り柔らかな層を形成して衝撃力を緩和させる。もち論こ
の２つの層の特性は連続的に変化させても良い。In order to solve the above problems, one of the points of the present invention is to form at least two types of carbon layers having different hardnesses in the carbon layer. The layer that is in direct contact with the head is formed to have relatively high hardness, and the softer layer is formed below to soften the impact force. Of course, the properties of these two layers may be changed continuously.
防食層としての酸化物としては、Ａ １ ｓ ３１ ％
Ｔｉ、Ｖ、Ｃｒｓ ＺｒＳＮｂＳＭｏ、Ｓｎ、Ｔａ等の
各酸化物あるいはこれらの混合物が適当であり、窒化物
としてはＳｉ、Ｔｉ、Ｔａ等の各窒化物あるいはこれら
の混合物が適当であり、炭化物としては、Ｓｉｓ Ｔｉ
、Ｔａ等の各炭化物あるいはこれらの混合物が適当であ
る。As the oxide for the anti-corrosion layer, A 1 s 31%
Oxides such as Ti, V, Crs, ZrSNbSMo, Sn, and Ta or mixtures thereof are suitable; as nitrides, nitrides such as Si, Ti, and Ta, or mixtures thereof are suitable; as carbides, , Sis Ti
, Ta, and mixtures thereof are suitable.
膜厚としては１５０オングストロームから８００オング
ストロームが適当である。１５０オングストロームより
薄いと膜にピンホールが多いために防食性が不十分であ
る。８００オングストロームよりも厚くなるとヘッドと
金属磁性薄膜との距離が大きくなりすぎスペースロスが
大きくなりすぎる。A suitable film thickness is 150 angstroms to 800 angstroms. If it is thinner than 150 angstroms, the film will have many pinholes, resulting in insufficient corrosion protection. If it is thicker than 800 angstroms, the distance between the head and the metal magnetic thin film becomes too large, resulting in too large a space loss.
保護膜の形成法としては、スパッタ法が一般的であるが
、真空蒸着法、イオンブレーティング法、ＣＶＤ法等い
ずれの方法でも良い。ただし金属磁性薄膜の特性を悪化
させたり、基板の機械的特性および磁気的特性を悪化さ
せるものは避けなければならない。A sputtering method is generally used as a method for forming the protective film, but any method such as a vacuum evaporation method, an ion blasting method, or a CVD method may be used. However, it is necessary to avoid materials that deteriorate the properties of the metal magnetic thin film or the mechanical and magnetic properties of the substrate.
カーボンの膜質はダイアモンド状、グラファイト状、ア
モルファス状、もしくはこれらの混合物いずれでも良い
が、硬さの異なる層を形成することが本発明の意図であ
る。The quality of the carbon film may be diamond-like, graphite-like, amorphous, or a mixture thereof, but it is the intention of the present invention to form layers with different hardnesses.
〔実施例１〕
鏡面仕上げをされたディスク状アルミ合金基板上に非磁
性のＮ１−Ｐメッキを２０μｍの厚さにメッキ後、研磨
により下地層を１５μｍ、表面あらさを０．０３μｍ以
下にしたものを基板として用いた（Ｎｉ−Ｐ基板）。[Example 1] Non-magnetic N1-P plating was plated to a thickness of 20 μm on a disk-shaped aluminum alloy substrate with a mirror finish, and then polished to a base layer of 15 μm and a surface roughness of 0.03 μm or less. was used as a substrate (Ni-P substrate).
Ｎ１−Ｐ基板に金属磁性薄膜としてＣｏ−Ｎ１−Ｐをメ
ッキ法にして約０．０７μｍメッキした。An N1-P substrate was plated with Co-N1-P as a metal magnetic thin film to a thickness of approximately 0.07 μm using a plating method.
次にマグネトロンスパッタ装置により、ＳｔＯ。Next, StO was added using a magnetron sputtering device.
を５００オングストローム形成しその後に柔らかいカー
ボン層を２００オングストローム、硬いカーボン層を１
００オングストローム形成した。After that, a soft carbon layer of 200 angstroms and a hard carbon layer of 1 angstrom are formed.
00 angstroms were formed.
５ｉｌ１層は防食層としてであり、これは他の酸化物、
窒化物、炭化物でも良い。The 5il1 layer is an anti-corrosion layer, which contains other oxides,
Nitride or carbide may also be used.
カーボン膜の硬さを変える方法として本実施例において
はスパッタ時のアルゴン圧力を変化させた。すなわち柔
らかいカーボン層としては高いＡｒ圧力で、固いカーボ
ン層としては低いＡｒ圧力でスパッタを行なった。具体
的には柔らかい層を２、ＯＸ １０−”ＴＯＲＲ１固い
層を３．０Ｘ１０−”ＴＯＲＲで形成した。In this example, as a method of changing the hardness of the carbon film, the argon pressure during sputtering was changed. That is, sputtering was performed at a high Ar pressure for the soft carbon layer, and at a low Ar pressure for the hard carbon layer. Specifically, the soft layer was formed with 2 OX 10-'' TORR, and the hard layer was formed with 3.0 X 10-'' TORR.
〔実施例２〕
実施例１と同様にメッキ法にてＣｏ−Ｎ１−Ｐを形成し
た。[Example 2] Co-N1-P was formed by the plating method in the same manner as in Example 1.
次にマグネトロンスパッタ装置にてＳ ｉ Ｏｚを５０
０オングストローム形成した後に、連続してカーボン層
を３００オングストローム形成した。Next, 50 oz of Si was applied using a magnetron sputtering device.
After forming a carbon layer of 0 angstrom, a carbon layer of 300 angstrom was continuously formed.
その際にカーボン層形成の初期には２．ＯＸ １０−”
ＴＯＲＲでスパッタし、その後に連続的にＡｒ圧力を変
化させ最後にＡｒ圧力を３． ＯＸ １０−３ＴＯＲ
Ｒとなるようにした。At that time, in the initial stage of carbon layer formation, 2. OX 10-”
Sputtering with TORR, then continuously changing the Ar pressure, and finally increasing the Ar pressure to 3. OX 10-3TOR
I made it to be R.
〔実施例３〕
実施例１および２と同様にＮ１−Ｐ基板を用い、金属磁
性薄膜をスパッタ法にて形成した。Ｃｒを下地層として
３０００オングストローム形成した後に、Ｃｏ−Ｎｉ−
Ｃｒの金属磁性薄膜を形成し、その後に連続してＳｉＯ
□を５００オングストローム、カーボン層を合計３００
オングストローム形成した。カーボン形成条件は実施例
１と同じである。[Example 3] As in Examples 1 and 2, a metal magnetic thin film was formed by sputtering using an N1-P substrate. After forming 3000 angstroms of Cr as an underlayer, Co-Ni-
A metal magnetic thin film of Cr is formed, and then SiO is continuously formed.
□ is 500 angstroms, carbon layer is 300 angstroms in total
formed into angstroms. The carbon forming conditions are the same as in Example 1.
〔比較例１〕
実施例１とほぼ同様な構成でディスクを作成した。カー
ボンの作成条件のみが固い膜の作成条件であるＡｒ圧力
３．ＯＸ １０−”ＴＯＲＲとした。[Comparative Example 1] A disk was produced with almost the same configuration as in Example 1. Ar pressure is the only condition for forming a hard film.3. OX 10-” TORR.
〔比較例２〕
比較例１とほぼ同一の作成法で、カーボン層を形成する
際のＡｒ圧力のみを柔らかい膜の条件である２、ＯＸ
１０−”ＴＯＲＲとした。[Comparative Example 2] Using almost the same method as Comparative Example 1, only the Ar pressure when forming the carbon layer was set to 2, OX, which is a condition for a soft film.
It was set to 10-''TORR.
品質評価方法として、ＣＳＳ耐久テストを行なった。使
用ヘッドはＡＴＣを材料として用いた薄膜ヘッドであり
、浮上高さは０．２８μｍである。As a quality evaluation method, a CSS durability test was conducted. The head used is a thin film head using ATC as a material, and the flying height is 0.28 μm.
比較例１は２００００回後においてキズの発生が見られ
、比較例２ではカーボンのけずれが見られ、また摩擦係
数の増大が見られた。（μ＞Ｑ。In Comparative Example 1, scratches were observed after 20,000 cycles, and in Comparative Example 2, carbon was scratched and an increase in the coefficient of friction was observed. (μ>Q.
これらの結果に対して実施例１．２．３共にキズの発生
などの外観上の異常もなく摩擦係数も０゜６以下であっ
た。In contrast to these results, in Examples 1, 2, and 3, there were no abnormalities in appearance such as occurrence of scratches, and the coefficient of friction was 0.6 or less.
耐食性テストとしては８０℃、８０％相対湿度において
２０日間放置した後のディフェクト増加を調査した。そ
の結果比較例３のみディフェクト増が認められた。As a corrosion resistance test, the increase in defects after being left at 80° C. and 80% relative humidity for 20 days was investigated. As a result, an increase in defects was observed only in Comparative Example 3.
以上述べたように本発明により金属磁性薄膜を記録層と
する磁気記録媒体において薄膜ヘッドとの組合わせにお
いても機械的信軌性を十分に得ることが出来、高い信頼
性の磁気ディスクを提供出来た。さらに本発明の磁気記
録媒体は、酸化物、窒化物、炭化物よりなる防食層を有
しているために、機械的信鯨性の確保と共に、耐食性も
十分に得られた。As described above, the present invention makes it possible to obtain sufficient mechanical reliability even in combination with a thin film head in a magnetic recording medium having a metal magnetic thin film as the recording layer, and to provide a highly reliable magnetic disk. Ta. Furthermore, since the magnetic recording medium of the present invention has an anti-corrosion layer made of oxide, nitride, or carbide, not only mechanical reliability was ensured but also sufficient corrosion resistance was obtained.
以 上that's all
Claims (1)
性層の上部に酸化物、窒化物、炭化物よりなる少なくと
も１種の物質により形成される薄膜を有し、さらにその
上部に、硬さの異なった少なくとも２種類のカーボン層
を有する保護膜を有することを特徴とする磁気記録媒体
。A magnetic recording medium having a metal magnetic thin film as a recording layer has a thin film formed of at least one substance consisting of oxide, nitride, and carbide on top of the magnetic layer, and further has a thin film formed of at least one substance consisting of oxide, nitride, and carbide on top of the magnetic layer, and further has a thin film formed of at least one substance consisting of oxide, nitride, and carbide on the top of the magnetic layer. A magnetic recording medium comprising a protective film having at least two types of carbon layers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13348186A JPS62289913A (en) | 1986-06-09 | 1986-06-09 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13348186A JPS62289913A (en) | 1986-06-09 | 1986-06-09 | Magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62289913A true JPS62289913A (en) | 1987-12-16 |
Family
ID=15105777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13348186A Pending JPS62289913A (en) | 1986-06-09 | 1986-06-09 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62289913A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01138610A (en) * | 1987-11-26 | 1989-05-31 | Nec Corp | Magnetic disk |
| JPH01243221A (en) * | 1988-03-23 | 1989-09-27 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
-
1986
- 1986-06-09 JP JP13348186A patent/JPS62289913A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01138610A (en) * | 1987-11-26 | 1989-05-31 | Nec Corp | Magnetic disk |
| JPH01243221A (en) * | 1988-03-23 | 1989-09-27 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
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