JPS6228955B2 - - Google Patents
Info
- Publication number
- JPS6228955B2 JPS6228955B2 JP55072627A JP7262780A JPS6228955B2 JP S6228955 B2 JPS6228955 B2 JP S6228955B2 JP 55072627 A JP55072627 A JP 55072627A JP 7262780 A JP7262780 A JP 7262780A JP S6228955 B2 JPS6228955 B2 JP S6228955B2
- Authority
- JP
- Japan
- Prior art keywords
- fluoride
- reaction
- present
- cupric
- fluorosilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910000831 Steel Inorganic materials 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000010959 steel Substances 0.000 claims 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 16
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 12
- 229910021594 Copper(II) fluoride Inorganic materials 0.000 description 11
- GWFAVIIMQDUCRA-UHFFFAOYSA-L copper(ii) fluoride Chemical compound [F-].[F-].[Cu+2] GWFAVIIMQDUCRA-UHFFFAOYSA-L 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000005046 Chlorosilane Substances 0.000 description 8
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 4
- CTRICEWDSISGPV-UHFFFAOYSA-L copper;difluoride;dihydrate Chemical compound O.O.[F-].[F-].[Cu+2] CTRICEWDSISGPV-UHFFFAOYSA-L 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229940096017 silver fluoride Drugs 0.000 description 3
- REYHXKZHIMGNSE-UHFFFAOYSA-M silver monofluoride Chemical compound [F-].[Ag+] REYHXKZHIMGNSE-UHFFFAOYSA-M 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- ODNBVEIAQAZNNM-UHFFFAOYSA-N 1-(6-chloroimidazo[1,2-b]pyridazin-3-yl)ethanone Chemical compound C1=CC(Cl)=NN2C(C(=O)C)=CN=C21 ODNBVEIAQAZNNM-UHFFFAOYSA-N 0.000 description 2
- GUNJVIDCYZYFGV-UHFFFAOYSA-K Antimony trifluoride Inorganic materials F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 description 2
- 229910016509 CuF 2 Inorganic materials 0.000 description 2
- MYXNDYLVSSEVMV-UHFFFAOYSA-F F[Sb](F)F.Cl[Sb](Cl)(Cl)(Cl)Cl Chemical compound F[Sb](F)F.Cl[Sb](Cl)(Cl)(Cl)Cl MYXNDYLVSSEVMV-UHFFFAOYSA-F 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 150000004683 dihydrates Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000000967 suction filtration Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- OKYCIVBMPIIGIH-UHFFFAOYSA-N dichloro(octyl)silane Chemical compound CCCCCCCC[SiH](Cl)Cl OKYCIVBMPIIGIH-UHFFFAOYSA-N 0.000 description 1
- BOMPXIHODLVNMC-UHFFFAOYSA-N difluoro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](F)(F)C1=CC=CC=C1 BOMPXIHODLVNMC-UHFFFAOYSA-N 0.000 description 1
- YXBGGXXOSAYEJC-UHFFFAOYSA-N difluoro-methyl-phenylsilane Chemical compound C[Si](F)(F)C1=CC=CC=C1 YXBGGXXOSAYEJC-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- CRVLHKAKXXSEJG-UHFFFAOYSA-N fluoro-dimethyl-trimethylsilylsilane Chemical compound C[Si](C)(C)[Si](C)(C)F CRVLHKAKXXSEJG-UHFFFAOYSA-N 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- -1 n-octyldifluorosilane Chemical compound 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Description
本発明は新規かつ改良されたフルオロシランの
製造方法、とくには工業的に有利な製造方法に関
するものである。
近年、フルオロシランは耐熱性の冷媒あるいは
有機合成の中間体として注目されている。
このフルオロシランの一般的合成方法として
は、対応するクロロシランに適当なふつ化物を作
用させる方法が知られ、該ふつ化物としては、ふ
つ化水素、三ふつ化アンチモン、三ふつ化アンチ
モン―五塩化アンチモン、ふつ化亜鉛、ふつ化カ
リウム―ふつ化水素、ふつ化アンモニウム、ふつ
化銀あるいはほうふつ化銀などが使用されてい
る。
しかしながら、上記したふつ化物のうち、ふつ
化水素、三ふつ化アンチモン、三ふつ化アンチモ
ン―五塩化アンチモンは有毒であり、その取扱い
などに危険を伴ない、またふつ化銀などの銀化合
物は高価であるため、多量使用は経済的に不利益
を招き、さらにふつ化亜鉛は後処理が比較的困難
であるなどの問題を有している。
本発明は上記したような従来の問題点を解決し
たフルオロシランの製造方法を提供するものであ
つて、
これは一般式
R(2o+2)-nSioCln ……(i)
(こゝにRは非置換の一価炭化水素基、nは1
〜5の整数、mは1以上の整数、、ただしm<2n
+2)で示されるクロロシランとふつ化第2銅と
を反応させることを特徴とする、一般式
R(2o+2)-nSioFn ……(ii)
(こゝにR,mおよびnは上記と同じ意味であ
る)で示されるフルオロシランの製造方法に関す
るものである。
本発明者らは、クロロシランからフルオロシラ
ンを製造する方法について上記したような問題を
解決する目的で鋭意研究を重ねた結果、比較的安
価なふつ化第二銅が良好なふつ素化作用を有する
ことを見出し本発明を完成したもので、これによ
れば
(1) ふつ素化反応が0℃〜室温できわめて容易に
進行し(多くの場合、発熱的に進行)、ふつ化
第二銅として市販の2水和物をそのまま使用し
〓〓〓〓〓
てもふつ素化が優先し、水の影響がほとんどな
い。
(2) ふつ化第二銅中のふつ素原子はすべて反応に
関与し、副生する塩化銅は炭化水素系溶剤を添
加することにより確実に析出させることがで
き、したがつて目的とするフルオロシランは
過により容易に分離することができる、
(3) けい素原子に結合する炭素の立体配置は何ら
影響を受けず、また従来方法においては、始発
原料であるクロロシランが水素―けい素結合を
有する場合、この結合の切断される確率が高か
つたが、本発明においてはこのような切断が起
ることがなく、水素―けい素結合はそのまま残
存する、
などの効果が与えられる。
以下、本発明方法について詳細に説明する。
本発明において始発原料として使用されるクロ
ロシランは上記した一般式(i)で示されるもので、
式中のRは非置換の一価炭化水素基を表わし、こ
れにはメチル基、エチル基、プロピル基、ブチル
基あるいはオクチル基などのアルキル基、シクロ
ペンチル基あるいはシクロヘキシル基などのシク
ロアルキル基、ビニル基あるいはアリル基などの
アルケニル基、フエニル基あるいはトリル基など
のアリール基などをあげることができる。
mおよびnは前記のとおりである。
本発明においては上記一般式を満足する限り従
来から知られている種々のクロロシランを使用す
ることができる。
また、上記シランとともに使用されるふつ化第
2銅としては、一般に市販されているふつ化第2
銅のエーテル懸濁液を用いることができる。
本発明方法における反応を下記に反応式で示
す。
R(2o+2)-nSioCln
+1/2m・CuF2・2H2O→R(2o+2)-nSioFn
+1/2m・CuCl2(+2H2O)
(ただし、R,mおよびnは上記と同じ意味で
ある)
本発明方法にかかる反応は、例えば上記したふ
つ化第2銅のエーテル溶液中にクロロシランを0
℃〜室温、大気圧下で単に滴下するのみで容易に
進行し(必要に応じてかく拌を行つてもよい)、
目的物であるフルオロシランの生成はガスクロマ
トグラフイー分析により容易に確認することがで
きる。
なお、反応生成物中には副生する塩化銅が含ま
れるが、この塩化銅はペンタンなどの炭化水素系
溶媒を加えることにより完全に析出させることが
でき、目的とするフルオロシランと塩化銅はろ過
処理によつて分離することができる。
前記クロロシランとふつ化第2銅との使用割合
(反応モル比)については、クロロシラン中の塩
素原子の全部をふつ素原子に変換させる量のふつ
化第2銅を使用することがよい。
なお、本発明方法の実施に際しては、反応溶媒
を使用してもよく、この反応溶媒としては一般に
エーテルが使用される。また、該反応はペンタ
ン、オクタンなどの炭化水素系溶媒中でも進行す
るが、これらはエーテルに比較して若干反応速度
が遅くなる。
つぎに、本発明の実施例をあげるが、本発明は
これに何ら限定されるものではない。
実施例 1
ジフエニルジクロロシラン1.25g(4.9mmol)
をふつ化第2銅の二水塩(CuF2・2H2O)0.70g
(5.1mmol)のエーテル(5ml)懸濁液中に室温
にて徐々に滴下し、滴下終了後室温にてかく拌を
1時間行つた。ついでペンタン5mlを加えたの
ち、吸引ろ過を行い、得られたろ過残渣をペンタ
ン5mlで洗浄しろ液と洗浄液とを合わせた。つぎ
に溶媒を留去し、減圧蒸留にて油浴温度180℃/
18mmHgまでの留分0.995gを得た。
このものはガスクロマトグラフイー分析からジ
フエニルジフルオロシランであることが確認され
た(収率89%)。
実施例 2
フエニルジメチルクロロシラン0.96g
(5.63mmol)、ふつ化第2銅0.418g(3.04mmol)
およびエーテル5mlを使用し上記実施例1とほぼ
同様に処理を行い、油浴温度120℃/18mmHgま
での留分0.5552gを得た。
このものはガスクロマトグラフイー分析からフ
エニルメチルジフルオロシランであることが確認
された(収率64%)。
実施例 3
〓〓〓〓〓
ふつ化第2銅の二水塩0.752g(5.4mmol)の
エーテル(10ml)懸濁液に、ペンタメチルクロロ
シラン1.612g(9.7mmol)を室温にて徐々に適
下した。ガスクロマトグラフイー分析により反応
の進行状態を追跡し、反応完結後、実施例1に準
じて処理したところ、沸点90〜100℃の留分とし
てペンタメチルフルオロジシランが0.971g得ら
れた(収率67%)。
実施例 4
ふつ化第2銅の二水塩3.6g(26mmol)のエー
テル(15ml)懸濁液に、endo―ノルボニルトリ
クロロシラン3.6g(15.7mmol)を水冷下(0
℃)にて3分間を要して滴下したところ、かつ色
を呈する液状物が得られた。この液状物を室温に
て12時間かく拌したのち、ペンタン15mlを加え、
ついで吸引ろ過を行い残渣をペンタンで洗浄し
た。ろ液と洗浄液を硫酸ナトリウムで乾燥し、蒸
留したところ、沸点57〜58℃/68mmHgの留分と
してendo―ノルポニルトリフルオロシランが2.10
g得られた(収率74%)。
実施例 5
ふつ化第2銅の二水塩0.950g(6.9mmol)の
エーテル(5ml)懸濁液に、n―オクチルジクロ
ロシラン0.706g(3.3mmol)を0℃にて徐々に
滴下し、滴下終了後同温度で5分間かく拌を行つ
た。
ついで、実施例1と同様に処理を行つたとこ
ろ、n―オクチルジフルオロシランが収率74%の
割合で得られた。
実施例 6〜9
下記の表に示すようなシランとふつ化第2銅の
二水塩とを同表に示すような条件で反応させ、つ
いで実施例1とほぼ同様に処理を行つたところ、
下記の表に示すような生成物が得られた。
The present invention relates to a new and improved method for producing fluorosilane, and particularly to an industrially advantageous method for producing fluorosilane. In recent years, fluorosilane has attracted attention as a heat-resistant refrigerant or an intermediate in organic synthesis. As a general method for synthesizing this fluorosilane, a method is known in which a suitable fluoride is reacted with the corresponding chlorosilane. Examples of the fluoride include hydrogen fluoride, antimony trifluoride, and antimony trifluoride-antimony pentachloride. , zinc fluoride, potassium fluoride-hydrogen fluoride, ammonium fluoride, silver fluoride, or silver fluoride. However, among the above-mentioned fluorides, hydrogen fluoride, antimony trifluoride, antimony trifluoride-antimony pentachloride are toxic and dangerous to handle, and silver compounds such as silver fluoride are expensive. Therefore, the use of large amounts causes economic disadvantages, and furthermore, zinc fluoride has problems such as post-treatment being relatively difficult. The present invention provides a method for producing fluorosilane that solves the conventional problems as described above, and is based on the general formula R (2o+2)-n Si o Cl n ...(i)ゝR is an unsubstituted monovalent hydrocarbon group, n is 1
An integer of ~5, m is an integer greater than or equal to 1, where m<2n
The general formula R (2o+2)-n Si o F n ...(ii) (where R, m and n has the same meaning as above). The present inventors have conducted extensive research with the aim of solving the above-mentioned problems regarding the method of producing fluorosilane from chlorosilane, and have found that relatively inexpensive cupric fluoride has a good fluorination effect. The present invention has been completed based on the following findings: (1) The fluorination reaction proceeds extremely easily (proceeds exothermically in most cases) at temperatures between 0°C and room temperature, resulting in the formation of cupric fluoride as cupric fluoride. Use commercially available dihydrate as is〓〓〓〓〓
However, chlorination takes precedence, and there is almost no effect of water. (2) All the fluorine atoms in cupric fluoride participate in the reaction, and by-product copper chloride can be reliably precipitated by adding a hydrocarbon solvent. (3) The steric configuration of the carbon bonded to the silicon atom is not affected in any way, and in the conventional method, the starting material chlorosilane has no hydrogen-silicon bond. However, in the present invention, such cleavage does not occur, and the hydrogen-silicon bond remains intact. The method of the present invention will be explained in detail below. The chlorosilane used as the starting material in the present invention is represented by the above general formula (i),
R in the formula represents an unsubstituted monovalent hydrocarbon group, including alkyl groups such as methyl, ethyl, propyl, butyl or octyl, cycloalkyl such as cyclopentyl or cyclohexyl, vinyl or alkenyl groups such as allyl groups, and aryl groups such as phenyl groups and tolyl groups. m and n are as described above. In the present invention, various conventionally known chlorosilanes can be used as long as they satisfy the above general formula. In addition, as the cupric fluoride used together with the above silane, commonly available commercially available cupric fluoride
An ethereal suspension of copper can be used. The reaction in the method of the present invention is shown in the reaction formula below. R (2o+2)-n Si o Cl n +1/2m・CuF 2・2H 2 O→R (2o+2)-n Si o F n +1/2m・CuCl 2 (+2H 2 O) (However, R , m and n have the same meanings as above) In the reaction according to the method of the present invention, for example, chlorosilane is added to the ether solution of cupric fluoride described above
℃ to room temperature and under atmospheric pressure, it proceeds easily by simply dropping it dropwise (stirring may be performed if necessary),
The production of the target fluorosilane can be easily confirmed by gas chromatography analysis. Note that the reaction product contains copper chloride as a by-product, but this copper chloride can be completely precipitated by adding a hydrocarbon solvent such as pentane, and the desired fluorosilane and copper chloride are It can be separated by filtration. Regarding the usage ratio (reaction molar ratio) of the chlorosilane and cupric fluoride, it is preferable to use an amount of cupric fluoride that converts all of the chlorine atoms in the chlorosilane to fluorine atoms. Note that when carrying out the method of the present invention, a reaction solvent may be used, and ether is generally used as the reaction solvent. The reaction also proceeds in hydrocarbon solvents such as pentane and octane, but the reaction rate in these is slightly slower than in ether. Next, examples of the present invention will be given, but the present invention is not limited thereto. Example 1 Diphenyldichlorosilane 1.25g (4.9mmol)
Cupric fluoride dihydrate (CuF 2 2H 2 O) 0.70g
(5.1 mmol) in ether (5 ml) was gradually added dropwise at room temperature, and after completion of the dropwise addition, the mixture was stirred at room temperature for 1 hour. Then, after adding 5 ml of pentane, suction filtration was performed, the resulting filtration residue was washed with 5 ml of pentane, and the filtrate and washing solution were combined. Next, the solvent was distilled off and distilled under reduced pressure at an oil bath temperature of 180°C.
0.995 g of fraction up to 18 mmHg was obtained. This product was confirmed to be diphenyldifluorosilane by gas chromatography analysis (yield 89%). Example 2 Phenyldimethylchlorosilane 0.96g
(5.63mmol), cupric fluoride 0.418g (3.04mmol)
The treatment was carried out in substantially the same manner as in Example 1 above using 5 ml of ether and 0.5552 g of a fraction up to an oil bath temperature of 120° C./18 mmHg was obtained. This product was confirmed to be phenylmethyldifluorosilane by gas chromatography analysis (yield 64%). Example 3 〓〓〓〓〓
To a suspension of 0.752 g (5.4 mmol) of cupric fluoride dihydrate in ether (10 ml), 1.612 g (9.7 mmol) of pentamethylchlorosilane was gradually added dropwise at room temperature. The progress of the reaction was monitored by gas chromatography analysis, and after the reaction was completed, the treatment was carried out according to Example 1, and 0.971 g of pentamethylfluorodisilane was obtained as a fraction with a boiling point of 90 to 100°C (yield: 67 %). Example 4 To a suspension of 3.6 g (26 mmol) of cupric fluoride dihydrate in ether (15 ml), 3.6 g (15.7 mmol) of endo-norbornyltrichlorosilane was added under water cooling (0
When the solution was added dropwise over a period of 3 minutes at a temperature of 100.degree. C., a colored liquid was obtained. After stirring this liquid at room temperature for 12 hours, 15 ml of pentane was added.
Then, suction filtration was performed and the residue was washed with pentane. When the filtrate and washing solution were dried with sodium sulfate and distilled, endo-norponyltrifluorosilane was found as a fraction with a boiling point of 57-58℃/68mmHg at 2.10%.
g (yield 74%). Example 5 To a suspension of 0.950 g (6.9 mmol) of cupric fluoride dihydrate in ether (5 ml), 0.706 g (3.3 mmol) of n-octyldichlorosilane was gradually added dropwise at 0°C. After the completion of the reaction, stirring was continued for 5 minutes at the same temperature. Then, the same treatment as in Example 1 was carried out, and n-octyldifluorosilane was obtained with a yield of 74%. Examples 6 to 9 Silanes shown in the table below and dihydrate of cupric fluoride were reacted under the conditions shown in the table, and then treated in substantially the same manner as in Example 1.
The products shown in the table below were obtained.
【表】
〓〓〓〓〓
[Table] 〓〓〓〓〓
Claims (1)
〜5の整数、mは1以上の正の整数、ただしm<
2n+2)で示されるクロロシランとふつ化第2
鋼とを反応させることを特徴とする、 一般式 R(2o+2)-nSioFn (式中、R,mおよびnは上記と同じ意味であ
る)で示されるフルオロシランの製造方法。[Claims] 1 General formula R (2o+2)-n Si o Cl n (wherein, R is an unsubstituted monovalent hydrocarbon group, and n is 1
An integer of ~5, m is a positive integer of 1 or more, provided that m<
2n+2)
A method for producing fluorosilane represented by the general formula R (2o+2)-n Si o F n (wherein R, m and n have the same meanings as above), characterized by reacting with steel. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7262780A JPS56167693A (en) | 1980-05-30 | 1980-05-30 | Preparation of fluorosilane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7262780A JPS56167693A (en) | 1980-05-30 | 1980-05-30 | Preparation of fluorosilane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56167693A JPS56167693A (en) | 1981-12-23 |
JPS6228955B2 true JPS6228955B2 (en) | 1987-06-23 |
Family
ID=13494805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7262780A Granted JPS56167693A (en) | 1980-05-30 | 1980-05-30 | Preparation of fluorosilane |
Country Status (1)
Country | Link |
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JP (1) | JPS56167693A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61151015A (en) * | 1984-12-24 | 1986-07-09 | Mitsui Toatsu Chem Inc | Production of partially substituted fluorosilane |
JPS61232215A (en) * | 1985-04-09 | 1986-10-16 | Central Glass Co Ltd | Production of partially fluorinated silane |
DE102015222019A1 (en) * | 2015-11-09 | 2017-05-11 | Wacker Chemie Ag | Process for the preparation of cyanoalkylfluorosilanes |
-
1980
- 1980-05-30 JP JP7262780A patent/JPS56167693A/en active Granted
Also Published As
Publication number | Publication date |
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JPS56167693A (en) | 1981-12-23 |
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