JPS62287640A - Substrate holder for edge reference - Google Patents

Substrate holder for edge reference

Info

Publication number
JPS62287640A
JPS62287640A JP61132540A JP13254086A JPS62287640A JP S62287640 A JPS62287640 A JP S62287640A JP 61132540 A JP61132540 A JP 61132540A JP 13254086 A JP13254086 A JP 13254086A JP S62287640 A JPS62287640 A JP S62287640A
Authority
JP
Japan
Prior art keywords
substrate
fixing pins
fixing
pins
substrate holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61132540A
Other languages
Japanese (ja)
Inventor
Masao Kyono
京野 昌男
Taiji Hiraga
平賀 泰司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP61132540A priority Critical patent/JPS62287640A/en
Publication of JPS62287640A publication Critical patent/JPS62287640A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/707Chucks, e.g. chucking or un-chucking operations or structural details
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To improve the opposing position alignment accuracy of both surfaces of a substrate by a method wherein two each of fixing pins are provided on upper and lower X sides of the substrate while another fixing pin is provided on Y side of the same. CONSTITUTION:Fixing pins 4,5 are provided on the X side 3 end of a substrate holder 2 with vacuum suction holes 1. Another fixing pin 9 is provided on a more distant position than the position 8 bisecting a substrate 7 in the Y direction. The other fixing pins 12, 13 are provided on the Y side 6 opposing to the X side symmetrically with the pins 5, 4 using the line in the X direction passing the fixing pin 9 as a symmetrical axis. The substrate 7 is pressed down onto the fixing pins 4,5 and 9 for masking using a surface photo mask 20 with oblique line part patterns 18 and alignment marks 19 to be exposed. Next, the substrate 7 is made upside-down to press down respective sides onto the fixing pins 9, 12, 13. Finally, the oblique line parts are exposed using another back surface mask 20 provided in the direction reverse to that of the surface.

Description

【発明の詳細な説明】 3、発明の詳細な説明 〔産業上の利用分野〕 本発明は混成IC基板のパターン形成に用いられる蕗元
イ幾お工ひ印刷機に関し、特に基板両面の相河向する位
置に正確にパターン形成金する必要がある場合のパター
ン形成におけるフォトレジストの耳元やペースtt−印
刷する際の基板用ホルダーに関する。
Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a printing machine manufactured by Fukimoto Ikuo used for pattern formation of hybrid IC substrates, and particularly relates to a printing machine that is used for forming patterns on hybrid IC substrates. The present invention relates to a holder for a substrate when printing a photoresist edge or paste tt in pattern formation when it is necessary to accurately form a pattern in a facing position.

〔従来の技術〕[Conventional technology]

一般に、混[IC用セラミック基板の両面(表、裏)に
薄膜回路パターン全形成する場合、予め四角形のセラミ
ック基板の三辺、又は四辺にそってマスク合せ用穴を明
けておき、スパッタリング等にエフ金属薄Mを被着する
。次にスピンナー等を用いて一万の面に7オトレジスト
’を塗布し乾燥しt後、他方の面に再度フォトレジスト
を塗布、乾燥する。
Generally, when forming all thin film circuit patterns on both sides (front and back) of a ceramic substrate for mixed IC, holes for mask alignment are made in advance along three or four sides of the square ceramic substrate, and then sputtering etc. Apply F Metal Thin M. Next, using a spinner or the like, 7 photoresist' is applied to one side and dried. After that, photoresist is applied again to the other side and dried.

次に、表面(又は裏面)パターン形成用フォトマスクを
用いて、フォトマスクに予め設は定セラミック基板上の
穴に同位置で、同一形状のマークをセラミック基板の穴
に合せM、−xする。しかる後、裏面全同様方法にて凝
血パターン形成用フォトマスクを用いてMr元する。
Next, using a photomask for pattern formation on the front side (or back side), align the mark of the same shape with the hole on the ceramic substrate at the same position as the hole on the ceramic substrate previously set on the photomask, and make M, -x. . Thereafter, the entire back surface is subjected to Mr. extraction using a photomask for forming a blood coagulation pattern in the same manner.

この様に表面と裏面のパターンの対称位置は、基板の目
合せ用穴を利用して位置ぎめするか、まehセラミック
基板の一厘交辺の端面と予めフォトマスク上のコーナ一
部分に設け2L字形等の目合せ用パターンを合わせる方
法が採用されている。
In this way, the symmetrical positions of the patterns on the front and back sides can be determined by using the alignment holes on the substrate, or by setting them on the end face of one side of the ceramic substrate and a part of the corner on the photomask in advance. A method is adopted in which alignment patterns such as letter shapes are matched.

なお、この時の基板全固定する基板ホルダーは、ホルダ
ーの1直交辺にそってL字形のストッパー全役け、更に
ホルダー上の孔を通して真空吸着し固定している。
At this time, the substrate holder for completely fixing the substrate is fixed by vacuum suction through an L-shaped stopper along one orthogonal side of the holder and a hole on the holder.

〔発明が解決し工つとする問題点〕[Problems that the invention attempts to solve]

上述し友従来のセラミック基板の両面パターン形成にお
ける位置合せ方法は、前者に関しては、基板に穴明は加
工を施す必要があり、目合せは基板1枚ずつ行う方法で
あり、後者に関しては、基板の端面を利用し基板毎に目
合せするか、ホルダー上のL字形のストッパー全利用し
、1枚目の基板(又は標準板〕の目合せ後フォトマスク
と基板ホルダー全固定し、2枚目以降はストッパーに合
わせるだけで位置合せを行う方法も出来るが、表面のパ
ターン形成時は、該ストッパーに接する基板の端面が表
面パターン形成時に利用した同−基&端面と異なる。従
って、いずれの方法も作業効率(1枚ずつ目合せ)に劣
ることと、セラミック基板自体の加工精度に両面位置合
せ精度が影響上受けやすい欠点を有する。
As mentioned above, the conventional alignment method for double-sided pattern formation of ceramic substrates is that for the former, it is necessary to drill holes in the substrate, and alignment is performed one substrate at a time; for the latter, Align each substrate using the edge of the holder, or use all the L-shaped stoppers on the holder, and after aligning the first substrate (or standard plate), fully fix the photomask and substrate holder, and then align the second substrate. Thereafter, it is possible to perform alignment by simply aligning with the stopper, but when forming the surface pattern, the end surface of the substrate that contacts the stopper is different from the same base and end surface used when forming the surface pattern. However, the work efficiency (aligning one sheet at a time) is poor, and the double-sided alignment accuracy is easily affected by the processing accuracy of the ceramic substrate itself.

〔発明の独創性〕[Originality of invention]

上述した従来技術の基板両面の相対向する位置に正確に
パターン形成する必要がある場合に用いる基板ホルダー
は、基板の1直交辺全固足するストッパー(L字形ま友
にピン)全役けであるのに対し、本発明に基板ホルダー
サイズヶ若干大きくし、かつ、基板を固定するl直交辺
の1辺に1本。
The substrate holder used in the above-mentioned conventional technology when it is necessary to accurately form a pattern at opposite positions on both sides of the substrate has a stopper (an L-shaped pin) that fixes one orthogonal side of the substrate. In contrast, in the present invention, the substrate holder size is slightly larger, and there is one on each orthogonal side to which the substrate is fixed.

他の辺に2本の固定ピン?−足の間隔で配置し、さらに
2本の固定ピンに平行に対向する位置に2本の固定ピン
全役け、計5本の固定ピンでもって両面の位置合せ全行
なう独−1」的内容を有する。
Two fixing pins on other sides? - Contents of ``Germany-1'' in which both sides are aligned using a total of 5 fixing pins, placed at foot spacing, and 2 fixing pins placed parallel to and opposite the 2 fixing pins. has.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、セラミック基板の両面に混成ICパターンを
形成する際に表面パターンと相対向する位置に正確に位
置合せする方法に関し、両面の位置合せ作業効率の同上
および合せ精度においてセラミック基板加工による基板
寸法精度の影41:極力少なくすること全目的とし、真
空吸着孔を有する基板ホルダー上の1直交辺のY辺にそ
って2本の固定ピンとY辺にそって1本の固定ピンをセ
ットする基板の中心(1/2 )工9以上の距離に設け
、さらにY辺に対向する他の辺にそってX方向に、該2
本の固定ピンと同間隔で、かつ、該2本の固定ピンの位
置からY方向にY辺上の該1本の固定ピン迄の距離と同
距離で2本のピン全役け、合わせて5本のピ/を有して
いる。
The present invention relates to a method for accurately aligning a hybrid IC pattern to a position opposite to a surface pattern when forming a hybrid IC pattern on both sides of a ceramic substrate, and the present invention relates to a method for accurately aligning a hybrid IC pattern to a position opposite to a surface pattern. Shadow of dimensional accuracy 41: With the aim of minimizing the shadow as much as possible, two fixing pins are set along one orthogonal Y side on the substrate holder that has a vacuum suction hole, and one fixing pin is set along the Y side. Provided at a distance of 9 or more from the center (1/2) of the board, and further along the other side opposite to the Y side in the X direction,
Two pins with the same spacing as the fixing pins of the book, and the same distance from the position of the two fixing pins to the one fixing pin on the Y side in the Y direction, totaling 5 I have a copy of the book.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第1図は、本発明の一実施例の平面図お工ひ断面図であ
る。第1図(a)に示す真空吸着孔1を有する基板ホル
ダー2上の1直交辺X辺3端部に2本の固定ピン4.5
を一定の間隔で設ける。次に、Y辺6端部に例えば基板
7の場合、基板上Y方において2等分した位t!i:8
工9以上の距離で1本の固定ピン9を設ける。さらにY
辺に対向する他の辺にそってX方向に、該固定ピン4,
5と同間隔で、かつ、固定ピン4.5と固定ピン9との
距離10と同じ距離11に固定ピン12.13’を設け
る。なお、固定ピンは、第1図(b)に示すようにフォ
トマスクと基板が密着出来るように基板の厚さより低く
する。
FIG. 1 is a plan view and cross-sectional view of an embodiment of the present invention. Two fixing pins 4.5 are attached to one orthogonal side X side three ends on the substrate holder 2 having the vacuum suction hole 1 shown in FIG.
are provided at regular intervals. Next, for example, in the case of the board 7, the 6th end of the Y side is divided into two equal parts in the Y direction on the board, t! i:8
One fixing pin 9 is provided at a distance of 9 or more. Further Y
In the X direction along the other side opposite to the side, the fixing pin 4,
Fixing pins 12.13' are provided at the same intervals as 5 and at a distance 11 that is the same as the distance 10 between fixing pins 4.5 and 9. Note that the fixing pins are made lower than the thickness of the substrate so that the photomask and the substrate can be brought into close contact as shown in FIG. 1(b).

以上の構造からなる基板ホルダーを用意した後、金属薄
膜15とフォトレジスト16被着基板7ま友は基板同一
サイズの標準板を固定ピン4.5と9に押しつける。こ
の時、基板面積以外の真空吸着孔はテープ14等でふさ
ぐ。次に、ホルダー内部を排気17し吸着する。
After preparing the substrate holder having the above structure, the metal thin film 15 and the photoresist 16 are adhered to the substrate 7, and a standard plate of the same size as the substrate is pressed onto the fixing pins 4.5 and 9. At this time, the vacuum suction holes other than the area of the substrate are covered with tape 14 or the like. Next, the inside of the holder is evacuated 17 and adsorbed.

しかる後、基板7のX、Y辺の角が見える第2図(b)
に示す透明部分の斜線部パターン18お工ひ目合せマー
ク19を有するフォトマスク20’に用いてマスク合せ
する。次に、フォトマスクお工び基板ホルダーを、上下
方向のみ動作可能にし、X1Y10方向に動力)ない様
固定し1枚目の目合せを完了した後、基板とフォトマス
クkffi看芒せ、水銀ランプの紫外光に工9j4元す
る。次に、フォトマスクと基板を離し、基板全基板ホル
ダー内部取り出し、2枚目の基板全固定ピンにセットし
目合せすることなくフォトマスクと基板全密着し蕗光す
る。以後は必要枚数を2枚目同様に行なう。
After that, the corners of the X and Y sides of the board 7 can be seen in Figure 2 (b).
The mask is aligned using a photomask 20' having a hatched pattern 18 and alignment marks 19 in the transparent portion shown in FIG. Next, make the photomask substrate holder movable only in the vertical direction and fix it so that it does not move in the It costs 9j4 yuan for the ultraviolet light. Next, the photomask and the substrate are separated, the entire substrate is taken out of the substrate holder, and the entire substrate is set on the second substrate fixing pin, and the photomask and the substrate are brought into close contact with each other without alignment, and then the photomask is exposed. After that, repeat the process for the second required number of sheets.

次に、第1図(C1に示す工うに、基板の裏面パターン
形成に際してのMfr:、は裏面を上向きにし、かつ、
基板のマスク合せ時固定ピン4,5.9に接し几各辺を
固定ピン9.12.13に押しつけることにLり固定ピ
y4,5.9で接した各辺の同部分に位置することが出
来る。
Next, in the process shown in FIG.
When aligning the mask on the board, press each side of the box that touches the fixing pins 4, 5.9 to the fixing pins 9, 12, 13, and position it at the same part of each side that touches the fixing pins 4, 5.9. I can do it.

以後は、第1図(dJの工うに表面用フォトマスクの斜
線部のパターンと目合せマークと反対方向に設は九所望
パターン19と目合せマーク2(l有する裏面マスク2
0を用いて表面パターンのg元と同様に行う。この操作
にエフ、第1因(f)の様に裏面パターン露元部21は
表面ノ(ターン嬉元部21の相対する同一位置に蕗元す
ることが出来る。
From now on, as shown in FIG.
The process is performed in the same way as the g element of the surface pattern using 0. In this operation, as in the first factor (f), the back pattern exposure portion 21 can be exposed to the same position facing the front surface pattern exposure portion 21.

しかる後は、フォトレジストの現像、不要金属膜のエツ
チング、フォトレジストの剥離を行なうことにエフ、第
1図(g)に示す工うに所望金Is膜を基板の表面、裏
面の相対する同一位置に形成される。
After that, the photoresist is developed, the unnecessary metal film is etched, and the photoresist is peeled off.The desired gold Is film is then placed at the same opposing positions on the front and back surfaces of the substrate as shown in FIG. 1(g). is formed.

第2図は本発明の実施例2の平面図お工ひ断面図である
。実施例2は、基板両面の相対向する同一位置に印刷に
エフパターン形成する例である。
FIG. 2 is a plan view and a sectional view of a second embodiment of the present invention. Embodiment 2 is an example in which the F pattern is printed at the same position facing each other on both sides of the substrate.

実施例1のフォトマスクを第2図(a) 、 fb)に
示す工うに、印刷ペーストが通過出来る所望パターン状
孔24お工び基板端面角が見える目合わせマーク25を
有する表面お:び裏面印刷スクリーン22に置きかえて
第1図と同様構成からなる基板ホルダーを用いる。次に
、表面の印刷時、裏面の印刷時には実施例1と同様な位
置合わせ會行なう。
The photomask of Example 1 was fabricated as shown in FIGS. 2A and 2F, with holes 24 in a desired pattern through which the printing paste could pass, and alignment marks 25 on which the edge corners of the substrate could be seen. In place of the printing screen 22, a substrate holder having the same structure as that shown in FIG. 1 is used. Next, when printing the front side and the back side, the same positioning meeting as in Example 1 is performed.

この結果第2図(C)に示す工うに実施例1と同じ効果
が得られる。また、実施例1と2の組合わせによる両面
パターン形成が田米るため汎用性の利点がある。
As a result, the same effect as in Example 1 can be obtained in the structure shown in FIG. 2(C). Further, since patterns can be formed on both sides by combining Examples 1 and 2, there is an advantage of versatility.

〔発明の幼果〕[The young fruits of invention]

以上説明した=うに本発明は、基板ホルダー上の一直父
辺のY辺にそって2不の固定ピンとY辺にそって1本の
固定ピン全役け、さらにY辺に対向する他の辺のX方向
に該2不の固定ピンと同間隔で、かつ、′該2本の固定
ピン0位に刀為らY方向にY辺上の該1本の固定ピン迄
の距離と同距離で2本のピンを設けることにより、セラ
ミック基板に予め目合せマーク用穴明は加工が不要とな
る。
As explained above, the present invention has two fixing pins along the Y side of the straight father on the substrate holder, one fixing pin along the Y side, and another side opposite to the Y side. at the same distance as the two fixing pins in the X direction, and at the same distance as the distance from the blade to the one fixing pin on the Y side in the Y direction from the 0 position of the two fixing pins. By providing the real pins, there is no need to drill holes for alignment marks in the ceramic substrate in advance.

また、基板外形寸法精度の影響を極力少なくすることが
出来る。さらに、1枚目の基板のみ目合せすれば以後は
基板を連続的に固定ピンにセットするだけで基板両面の
相対する位置合せができ作業能率が向上する。
Further, the influence of the accuracy of the external dimensions of the substrate can be minimized. Furthermore, once only the first board is aligned, from then on, simply by successively setting the boards on the fixing pins, both sides of the boards can be aligned relative to each other, improving work efficiency.

【図面の簡単な説明】 第1図は本発明の実施例1を示す平面図お工ひ断面図、
第2図は本発明の実施例2を示す平面図お二ひ断面図で
ある。
[Brief Description of the Drawings] Figure 1 is a plan view and cross-sectional view showing Embodiment 1 of the present invention;
FIG. 2 is a plan view and a cross-sectional view showing a second embodiment of the present invention.

Claims (1)

【特許請求の範囲】[Claims]  真空吸着孔を有する四角形の基板ホルダー上の一直交
辺のX辺にそって2本の固定ピンとY辺にそって1本の
固定ピンを設け、さらにX辺に対向する他の辺のX方向
に該2本の固定ピンと同間隔で、かつ、該2本の固定ピ
ンの位置からY方向にY辺上の該1本の固定ピン迄の距
離と同距離で2本のピンを設けたことを特徴とする端面
基準用基板ホルダー。
Two fixing pins are provided along the X side of one orthogonal side on the rectangular substrate holder having vacuum suction holes, and one fixing pin is provided along the Y side, and further in the X direction of the other side opposite to the X side. Two pins are provided at the same interval as the two fixing pins, and at the same distance from the position of the two fixing pins in the Y direction to the one fixing pin on the Y side. A substrate holder for end-face reference.
JP61132540A 1986-06-06 1986-06-06 Substrate holder for edge reference Pending JPS62287640A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61132540A JPS62287640A (en) 1986-06-06 1986-06-06 Substrate holder for edge reference

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61132540A JPS62287640A (en) 1986-06-06 1986-06-06 Substrate holder for edge reference

Publications (1)

Publication Number Publication Date
JPS62287640A true JPS62287640A (en) 1987-12-14

Family

ID=15083668

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61132540A Pending JPS62287640A (en) 1986-06-06 1986-06-06 Substrate holder for edge reference

Country Status (1)

Country Link
JP (1) JPS62287640A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020050720A (en) * 2000-12-21 2002-06-27 구리다 히데유키 Processes for manufacturing multilayer flexible wiring boards

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020050720A (en) * 2000-12-21 2002-06-27 구리다 히데유키 Processes for manufacturing multilayer flexible wiring boards

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