JPS62280720A - Manufacture of liquid crystal display device - Google Patents
Manufacture of liquid crystal display deviceInfo
- Publication number
- JPS62280720A JPS62280720A JP12414186A JP12414186A JPS62280720A JP S62280720 A JPS62280720 A JP S62280720A JP 12414186 A JP12414186 A JP 12414186A JP 12414186 A JP12414186 A JP 12414186A JP S62280720 A JPS62280720 A JP S62280720A
- Authority
- JP
- Japan
- Prior art keywords
- polymer resin
- substrate
- liquid crystal
- high polymer
- recesses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 239000002952 polymeric resin Substances 0.000 claims abstract description 23
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims description 18
- 229920005989 resin Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 239000004744 fabric Substances 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】
3、発明の詳細な説明
〔産業上の利用分野〕
本発明は液晶表示装置の製造方法、!!#に配向層の形
成方法に関する。[Detailed Description of the Invention] 3. Detailed Description of the Invention [Field of Industrial Application] The present invention provides a method for manufacturing a liquid crystal display device! ! # relates to a method for forming an alignment layer.
従来の液晶表示装置の配向層の形成方法としては、Bi
b、ku等の傾斜蒸着法(特開昭49−17746号)
、又は基板上にポリイミド系高分子樹脂を塗布しt後、
布等で一定方向くラビングする(特開昭55−1435
25号)等で形成していた。As a conventional method for forming an alignment layer of a liquid crystal display device, Bi
Inclined deposition method of b, ku, etc. (Japanese Patent Application Laid-open No. 17746/1983)
, or after applying polyimide polymer resin on the substrate,
Rub in a certain direction with cloth etc. (Japanese Patent Application Laid-Open No. 55-1435
No. 25) etc.
しかし、紡述の傾斜蒸着法は、液晶に所定のプレティル
ト角を与えるのに大変有利であるが、反面真空蒸着であ
る為、10−’ Toff位の高真空h;必要であり、
又、基板を傾斜しなければならない為、量産性に乏しい
という欠点を有してい次。However, although the tilted deposition method of spinning is very advantageous in giving a predetermined pretilt angle to the liquid crystal, on the other hand, since it is a vacuum deposition method, a high vacuum h of about 10-' Toff is required.
In addition, since the substrate must be tilted, it has the disadvantage of poor mass production.
又、ラビング法は、液晶のプレティルト角を自由に設定
する、特にプレティルト角を犬きぐするのh;困難であ
う几。Furthermore, in the rubbing method, it is difficult to freely set the pretilt angle of the liquid crystal, and especially to finely adjust the pretilt angle.
本発明はこのような問題点を解決するもので、その目的
はチルト角の大きな均一配向を提倶するところくある。The present invention is intended to solve these problems, and its purpose is to provide uniform orientation with a large tilt angle.
本発明による液晶表示装置の製造方法は、基板の配向層
を形成する工種が、基板上に高分子樹脂を塗布する工種
、前記高分子樹脂をす7トオフする工種、さらに前記高
分子樹脂表面を布等で一定方向にラビング処理する工種
から成ることを特徴とする。The method for manufacturing a liquid crystal display device according to the present invention includes a process for forming an alignment layer of a substrate, a process for coating a polymer resin on the substrate, a process for removing the polymer resin, and a process for forming the surface of the polymer resin. It is characterized by a type of work that involves rubbing in a certain direction with cloth, etc.
さらに、前記高分子樹脂をり7トオフする工種が、1μ
mピッチ以下のパターンをり7トオ7法忙よって形成す
ることを特徴とする。Furthermore, the type of work for removing the polymer resin is 1 μm.
It is characterized in that a pattern with a pitch of m or less is formed by a 7-to-7 method.
本発明の作用を第1図に基づいて説明する。基板1上に
レジストを用いて、1μmピッチ以下のパターン2を形
成する(l[1図−り。次に前記基板表面に高分子樹脂
を塗布しt後、熱処理によって高分子樹脂被膜3を形成
する(第1図−■)。The operation of the present invention will be explained based on FIG. A pattern 2 with a pitch of 1 μm or less is formed on the substrate 1 using a resist (Fig. 1). Next, a polymer resin is applied to the surface of the substrate, and after that, a polymer resin coating 3 is formed by heat treatment. (Figure 1-■).
次にレジスト剥、離液を用い、レジストを剥離するとレ
ジスト上の高分子樹脂被膜が剥離され、基板表面に微細
な凹凸が形成される(t41図−■)。Next, when the resist is removed using a resist removal solution, the polymer resin coating on the resist is removed, and fine irregularities are formed on the substrate surface (Fig. t41-■).
次に基板表面を布等で一定方向くラビング処理すること
Kよって、凹凸の一方向側が反対側より大きくけずられ
るため、凹凸の形状が方向性を有する様くなる(ts1
図−■)。この場合、凹凸の形状、密度はラビング処理
の総圧力、パターンピッチによって決められ、ラビング
総圧力数十〜百般士り、パターンピッチ1μm以下す−
望ましい。Next, by rubbing the surface of the substrate with a cloth or the like in a certain direction, one side of the unevenness is more dislocated than the other side, so the shape of the unevenness becomes directional (ts1
Figure -■). In this case, the shape and density of the unevenness are determined by the total pressure of the rubbing process and the pattern pitch.
desirable.
以上の処理により、演1図−■に示す様に液晶分子4F
iプレテイルト角θで一定方向く安定的に配列する。本
発明を用い之場合、プレティルト角は0〜30°の範囲
で制御可能である。As a result of the above processing, the liquid crystal molecules 4F as shown in Figure 1-■
They are arranged stably in a certain direction at an i-pretilt angle θ. When using the present invention, the pretilt angle can be controlled in the range of 0 to 30 degrees.
実施例を
透明電極を所定の形状にバターニングし之基板上にポジ
型レジスト(AZ−1350,7,シェプレー型)をス
ピンナ塗布した後、オープンで80℃、20分プリベー
クを行なっ几。次に1μmピッチのドツトパターンの7
オトマスクを用いて露光し九。次に専用現儂液NMD−
!i(東京応化製)を用い現像し比後、オープンで12
0℃、20分ボストベークを行なり念。次にポリイミド
系高分子樹脂を塗布し熱感ffKよってポリイミド被膜
を形成し、専用剥離液5T−10(東京応化製)を用い
てレジストを剥離した。この後、走査型電子顕微鏡(日
立!1)でポリイミド被膜表面を観察し比ところ、1
μmピッチの凹凸が確ψで11次にチラシを用いて総圧
カフ0障で一定方向にラビング処理し配向層を形成し九
。かかる基板を用いて液晶を挾持し。In this example, a transparent electrode was patterned into a predetermined shape, a positive resist (AZ-1350, 7, Shepley type) was applied onto the substrate using a spinner, and then prebaked at 80° C. for 20 minutes in an open environment. Next, we created a dot pattern with a pitch of 1 μm.
Exposure using an otomask. Next, special liquid NMD-
! i (manufactured by Tokyo Ohka), and after comparison, it was opened at 12
Bost bake for 20 minutes at 0°C. Next, a polyimide polymer resin was applied, a polyimide film was formed by thermal ffK, and the resist was removed using a special stripping liquid 5T-10 (manufactured by Tokyo Ohka). After this, the surface of the polyimide coating was observed using a scanning electron microscope (Hitachi! 1), and the ratio was 1.
When the unevenness with a μm pitch was confirmed ψ, an alignment layer was formed by rubbing in a certain direction using a leaflet with a total pressure of 0 cuff. The liquid crystal is held between such substrates.
プレティルト角を測定し次結果、約20°であった。The pretilt angle was measured and found to be approximately 20°.
又、前記基板を用いてスーパーTNWJ液晶表示装置を
11I成し次ところ1表示領域企画に均一な配向を有す
るディスプレイb−得られ友。In addition, a super TNWJ liquid crystal display device 11I is constructed using the above substrate, and then a display B-B having a uniform orientation in one display area is obtained.
実施例λ
ラビングの総圧力を100〜にし九以外は実施例1、と
同様に処理しt基板を用いて液晶を挾持し。Example λ The same procedure as in Example 1 was carried out except that the total rubbing pressure was set at 100 or more, except for 9, and the liquid crystal was held between the T substrates.
プレティルト角を測定し次結果、約15°でありft。I measured the pretilt angle and found it to be approximately 15 degrees ft.
実施例3゜
高分子樹脂としてポリビニールアルコールを使用し次以
外は実施例1と同様に処理し之基板を用いて液晶を挾持
し、プレティルト角を測定し九結果、約20°であり九
〇
実施例4゜
高分子樹脂として、ポリエーテルサルフォン(pzs)
を使用し之以外は実施例tと同様に処厚し九基板を用い
て液晶を挾持し、プレティルト角を測定し次結果、約2
0°であっto〔発明の効果〕
以上述べ北様に本発明によれば、配向層を形成する工@
h= 、基板上に高分子樹脂を塗布する工種。Example 3 Polyvinyl alcohol was used as the polymer resin, and the same process as in Example 1 was performed except for the following.A liquid crystal was held between the substrates, and the pretilt angle was measured. Example 4 Polyether sulfone (pzs) as polymer resin
The pretilt angle was measured by sandwiching the liquid crystal using nine substrates prepared in the same manner as in Example t, and the following result was approximately 2.
[Effects of the Invention] As described above, according to the present invention, the process for forming an alignment layer is
h = , A type of work that coats a polymer resin on a substrate.
前記高分子樹脂をリフトオフする工種、さら忙、前記高
分子樹脂表面を布等で一定方向にラビング処理する工種
、さらに、前記高分子樹脂をり7トオプする工種が、1
μmピッチ以下のパターンをリフトオフ法によって形成
することから成ることにより、方向性を有し几1μm以
下の凹凸が基板表面く形成される為、傾斜蒸漕法の様に
量産性を損なうことなく液晶のプレティルト角を0〜3
0°の範囲で制御できる。A type of work in which the polymer resin is lifted off, a type of work in which the surface of the polymer resin is rubbed in a certain direction with cloth, etc., and a type of work in which the polymer resin is further removed are 1.
By forming patterns with a pitch of 1 μm or less using the lift-off method, unevenness with a directionality of 1 μm or less can be formed on the substrate surface. Set the pretilt angle of 0 to 3
Can be controlled within a range of 0°.
これくより、本発明は特に近年注目を集めている複屈折
モードを用い九大型犬容を表示の液晶表示vk蓋に有効
である。Therefore, the present invention is particularly effective for a liquid crystal display (VK) lid that uses a birefringence mode to display a large-sized dog, which has been attracting attention in recent years.
第1図は本発明の作用を示す模式図。 1・・・・・・基板 2・・・・・・レジスト 3・・・・・・高分子樹脂被膜 4・・・・・・液晶分子 以 上 出願人 セイコーエプソン株式会社 (a) (C) (d) (e) 第1図 FIG. 1 is a schematic diagram showing the effect of the present invention. 1... Board 2...Resist 3...Polymer resin coating 4・・・・・・Liquid crystal molecules that's all Applicant: Seiko Epson Corporation (a) (C) (d) (e) Figure 1
Claims (2)
対の基板で液晶を挾持してなる液晶表示装置において、
少なくとも一方の前記配向層を形成する工程が、少なく
とも基板上に高分子樹脂を塗布する工程、該分子樹脂を
リフトオフする工程、及びラビング処理する工程から成
ることを特徴とする液晶表示装置の製造方法。(1) In a liquid crystal display device in which a liquid crystal is sandwiched between a pair of substrates each having a transparent electrode on the substrate and an alignment layer on the electrode,
A method for manufacturing a liquid crystal display device, wherein the step of forming at least one of the alignment layers comprises at least the steps of applying a polymer resin on a substrate, lifting off the molecular resin, and performing a rubbing treatment. .
とも1μmピッチ以下のパターンをリフトオフ法によっ
て形成することを特徴とする特許請求の範囲第1項記載
の液晶表示装置の製造方法。(2) The method for manufacturing a liquid crystal display device according to claim 1, wherein in the step of lifting off the polymer resin, a pattern with a pitch of at least 1 μm or less is formed by a lift-off method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12414186A JPS62280720A (en) | 1986-05-29 | 1986-05-29 | Manufacture of liquid crystal display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12414186A JPS62280720A (en) | 1986-05-29 | 1986-05-29 | Manufacture of liquid crystal display device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62280720A true JPS62280720A (en) | 1987-12-05 |
Family
ID=14877939
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12414186A Pending JPS62280720A (en) | 1986-05-29 | 1986-05-29 | Manufacture of liquid crystal display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62280720A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH022515A (en) * | 1988-06-16 | 1990-01-08 | Matsushita Electric Ind Co Ltd | Manufacture of orienting film for liquid crystal |
JPH0255330A (en) * | 1988-08-22 | 1990-02-23 | Matsushita Electric Ind Co Ltd | Production of oriented film for liquid crystal |
-
1986
- 1986-05-29 JP JP12414186A patent/JPS62280720A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH022515A (en) * | 1988-06-16 | 1990-01-08 | Matsushita Electric Ind Co Ltd | Manufacture of orienting film for liquid crystal |
JPH0255330A (en) * | 1988-08-22 | 1990-02-23 | Matsushita Electric Ind Co Ltd | Production of oriented film for liquid crystal |
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