JPH04258902A - Production of substrate with color filter and liquid crystal display device - Google Patents
Production of substrate with color filter and liquid crystal display deviceInfo
- Publication number
- JPH04258902A JPH04258902A JP3041328A JP4132891A JPH04258902A JP H04258902 A JPH04258902 A JP H04258902A JP 3041328 A JP3041328 A JP 3041328A JP 4132891 A JP4132891 A JP 4132891A JP H04258902 A JPH04258902 A JP H04258902A
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- substrate
- liquid crystal
- polishing
- crystal display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 37
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000011521 glass Substances 0.000 claims abstract description 26
- 238000005498 polishing Methods 0.000 claims abstract description 24
- 239000011347 resin Substances 0.000 claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims description 17
- 239000010410 layer Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 241000501754 Astronotus ocellatus Species 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000006121 base glass Substances 0.000 description 2
- 238000004043 dyeing Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、無研磨の素板ガラスを
用いた大型カラー液晶表示装置用カラーフィルター付基
板の製法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a substrate with a color filter for a large color liquid crystal display device using unpolished glass.
【0002】0002
【従来の技術】図3に従来のカラー液晶表示用ガラス基
板の構成断面を示す。31は研磨したガラス基板、32
はカラーフィルター、33は樹脂層、34はITO膜で
ある。2. Description of the Related Art FIG. 3 shows a cross section of a conventional glass substrate for color liquid crystal display. 31 is a polished glass substrate, 32
3 is a color filter, 33 is a resin layer, and 34 is an ITO film.
【0003】まず、ガラス基板31に関しては現在の生
産技術では、その表面に高さ0.1μm程度、幅1cm
〜2cm程度の微小なうねりを持っており、高品位ST
N液晶表示基板用には、研磨加工を施さないと使用でき
ないのが現状である。First, regarding the glass substrate 31, with the current production technology, the surface has a height of about 0.1 μm and a width of 1 cm.
It has minute undulations of ~2cm, making it a high quality ST.
Currently, it cannot be used for N liquid crystal display substrates unless it is polished.
【0004】また、カラーフィルター32の製造方法は
、大別すると、以下の4種類に分類できる。
1)染色法
基板中上にゼラチン等の媒染層を設け、染色浴中で着色
する。
2)印刷法
基板上に顔料を直接印刷していく。
3)電着法
基板上に電極層を設け、電槽浴中で、電極層上に顔料を
析出させる。
4)ゾルゲル法
基板上に微細孔を有するゲル層を設け、染料を拡散させ
る。[0004] Furthermore, methods for manufacturing the color filter 32 can be broadly classified into the following four types. 1) Dyeing method A mordant layer of gelatin or the like is provided on the substrate and colored in a dye bath. 2) Printing method Pigment is printed directly onto the substrate. 3) Electrodeposition method An electrode layer is provided on the substrate, and a pigment is deposited on the electrode layer in a bath bath. 4) A gel layer having micropores is provided on the sol-gel method substrate, and the dye is diffused.
【0005】しかし、いずれの方法にしても、カラーフ
ィルター32の表面は凹凸しており、カラーフィルター
の表面(図3中35)あるいは、その上の樹脂層の表面
(図3中36)の平滑化が表示性能を満たすうえで不可
欠となっている。However, in either method, the surface of the color filter 32 is uneven, and the surface of the color filter (35 in FIG. 3) or the surface of the resin layer thereon (36 in FIG. 3) is smooth. It has become essential to achieve display performance.
【0006】従って、現在では素板ガラスの研磨、及び
カラーフィルターあるいは樹脂層の研磨と、研磨工程の
2工程が必要となっている。[0006] Therefore, at present, two steps are required: polishing the base glass, polishing the color filter or resin layer, and polishing.
【0007】[0007]
【発明が解決しようとする課題】上述のように、従来の
大型のカラー液晶表示基板、特に高品位のSTN(スー
パーツイストネマチック)方式の液晶表示基板の製造方
法においては、素板ガラスに存在する微細なうねりを除
去するためのガラスそのものの研磨の他に、そのガラス
を使用してカラーフィルター及びその保護層を形成した
際に、やはり微細なうねりが形成され、それを再度研磨
して平滑化しなければならなかった。[Problems to be Solved by the Invention] As mentioned above, in the manufacturing method of conventional large-sized color liquid crystal display substrates, especially high-quality STN (super twisted nematic) type liquid crystal display substrates, it is difficult to solve the problem of fine particles existing in the base glass. In addition to polishing the glass itself to remove large undulations, when the glass is used to form color filters and their protective layers, fine undulations are also formed, which must be polished again to smooth them out. I had to.
【0008】本発明の目的は従来技術が有していた2度
の研磨を1度で行うことにより双方のうねりを同時に平
滑化する方法を提供するものである。An object of the present invention is to provide a method for smoothing both undulations at the same time by performing two polishing steps, which were required in the prior art, at one time.
【0009】[0009]
【課題を解決するための手段】本発明は、前述の問題点
を解決すべくなされたものであり、無研磨のガラス基板
上に直接3μm以上の膜厚のカラーフィルターを形成し
、該カラーフィルター表面を研磨することを特徴とする
カラーフィルター付基板の製造方法、及び無研磨のガラ
ス基板上に直接カラーフィルターを形成し、その上から
樹脂層を3μm以上の膜厚ので形成し、該樹脂層表面を
研磨することを特徴とするカラーフィルター付基板の製
造方法を提供するものである。[Means for Solving the Problems] The present invention has been made to solve the above-mentioned problems, and includes forming a color filter with a thickness of 3 μm or more directly on an unpolished glass substrate, and forming the color filter directly on an unpolished glass substrate. A method for manufacturing a substrate with a color filter, characterized in that the surface is polished, and a color filter is formed directly on an unpolished glass substrate, and a resin layer is formed on top of the color filter with a thickness of 3 μm or more, the resin layer The present invention provides a method for manufacturing a substrate with a color filter, which is characterized by polishing the surface.
【0010】本発明の方法を実施例に従って説明する。
図1のガラス1はその表面に高さ0.1〜0.5μm程
度、幅1cm〜2cm程度の微小なうねりを持っている
研磨加工を施していないガラスである。The method of the present invention will be explained according to examples. The glass 1 in FIG. 1 is an unpolished glass having minute undulations on its surface with a height of about 0.1 to 0.5 μm and a width of about 1 cm to 2 cm.
【0011】カラーフィルター2あるいは樹脂層3を形
成する場合には、その膜厚を厚くすることが望ましく、
3μm以上の膜厚、さらに望ましくは10μm以上の膜
厚で形成するのが好ましい。形成方法及び材料は特に限
定されない。When forming the color filter 2 or the resin layer 3, it is desirable to increase the film thickness.
It is preferable to form the film with a thickness of 3 μm or more, more preferably 10 μm or more. The forming method and material are not particularly limited.
【0012】また面の平滑化を達成するために、カラー
フィルターに表面、あるいは樹脂層の表面を研磨するが
、その研磨機の一例であるオスカー式研磨機の概略図を
図2に示す。21は上定盤、22はガラス支持キャリア
、23は緩衝材、24は研磨パッド、25は下定盤を示
している。この方式では、下定盤25を回転させ、上定
盤21は往復運動の状態で、なおかつ自由回転できる様
になっている。被研磨物は上定盤21との間に緩衝材2
3を介して支持され、被研磨面は一定圧力で研磨パッド
24におさえつけられて研磨される。[0012] In order to smooth the surface, the surface of the color filter or the surface of the resin layer is polished. FIG. 2 shows a schematic diagram of an Oscar type polishing machine, which is an example of a polishing machine. 21 is an upper surface plate, 22 is a glass support carrier, 23 is a buffer material, 24 is a polishing pad, and 25 is a lower surface plate. In this method, the lower surface plate 25 is rotated, and the upper surface plate 21 is in a reciprocating state and can freely rotate. A buffer material 2 is placed between the object to be polished and the upper surface plate 21.
3, and the surface to be polished is pressed against a polishing pad 24 with a constant pressure and polished.
【0013】なお、今回の樹脂の様な非常に柔らかいも
のを研磨する場合には、加工圧力が10〜80gf/c
m2 程度と、ガラス研磨の場合の1割〜8割程度の加
工圧力で良い。従って、この研磨機においては上述の低
い圧力を十分に制御できる様な研磨機を用いることが望
ましい。[0013] When polishing a very soft material like the resin used this time, the processing pressure should be 10 to 80 gf/c.
A processing pressure of about 10% to 80% of that required for glass polishing is sufficient. Therefore, it is desirable to use a polishing machine that can sufficiently control the low pressure mentioned above.
【0014】[0014]
【実施例】図1は本発明の方法によって製造されたガラ
スフィルター付き基板を用いた液晶表示装置の一例の断
面図を示すものである。1は研磨加工を施していないガ
ラス基板、2はカラーフィルター、3はアクリル系樹脂
からなる樹脂層、4はITO膜、5は液晶である。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a cross-sectional view of an example of a liquid crystal display device using a substrate with a glass filter manufactured by the method of the present invention. 1 is an unpolished glass substrate, 2 is a color filter, 3 is a resin layer made of acrylic resin, 4 is an ITO film, and 5 is a liquid crystal.
【0015】まず、研磨加工を施していないガラス基板
1上にカラーフィルター2を前述の染色法を用いて形成
する。次にアクリル系の樹脂を適当な溶媒で希釈し、塗
布、加熱重合させ、樹脂層3を10〜20μm程度の厚
さに形成した。First, a color filter 2 is formed on an unpolished glass substrate 1 using the dyeing method described above. Next, an acrylic resin was diluted with a suitable solvent, applied, and polymerized by heating to form a resin layer 3 having a thickness of about 10 to 20 μm.
【0016】ここでガラス基板として使用したものは、
その表面に高さ0.1〜0.5μm程度、幅1cm〜2
cm程度の微小なうねりを持っている研磨加工を施して
いないガラスである。[0016] The glass substrate used here is:
The surface has a height of about 0.1 to 0.5 μm and a width of 1 cm to 2
It is unpolished glass with minute undulations on the order of cm.
【0017】次に樹脂層3の表面を、極微細なアルミナ
粉末を使い鏡面仕上げを施した。研磨パッドとしては、
非常に柔らかい発泡ポリウレタン系のものを使用し、研
磨圧力は50gf/cm2 で5分〜7分程度の研磨を
した。Next, the surface of the resin layer 3 was mirror-finished using ultrafine alumina powder. As a polishing pad,
A very soft foamed polyurethane material was used, and polishing was performed for about 5 to 7 minutes at a polishing pressure of 50 gf/cm2.
【0018】次にITO(インジウム−錫−酸化物)膜
4を低温スパッタ法で形成し、この時点で基板を観察し
た結果、それぞれの層の割れや剥離等は全くなかった。
次にポジ型レジストを用いた通常のフォトリソグラフィ
ー法で、前記ITO膜上に所望のレジスト膜のパターン
を形成し、塩酸系のエッチング液でエッチングした後、
よく水洗し、前記レジスト膜を除去して、液晶表示装置
を構成する片側の基板を得た。Next, an ITO (indium-tin-oxide) film 4 was formed by low-temperature sputtering, and the substrate was observed at this point, and as a result, there was no cracking or peeling of any of the layers. Next, a desired resist film pattern is formed on the ITO film by a normal photolithography method using a positive resist, and after etching with a hydrochloric acid-based etching solution,
By thoroughly washing with water and removing the resist film, one side of the substrate constituting the liquid crystal display device was obtained.
【0019】このようにして作製された基板と、対向電
極の形成された基板を用いて、STN型の液晶パネルを
作製した。配向処理はポリイミド層の塗布とラビング法
により行った。さらにこの上に液晶分子の捻れが逆方向
で、おなじ角度に捻れたSTN型液晶パネルを重ねた。
この後、偏光板、駆動回路部、光源を取り付けて液晶表
示装置を作製した。An STN type liquid crystal panel was manufactured using the substrate thus manufactured and the substrate on which the counter electrode was formed. The alignment treatment was performed by applying a polyimide layer and rubbing. Furthermore, an STN-type liquid crystal panel was placed on top of this, with the liquid crystal molecules twisted in the opposite direction but at the same angle. Thereafter, a polarizing plate, a drive circuit section, and a light source were attached to fabricate a liquid crystal display device.
【0020】この液晶表示装置は、コントラストや色再
現性等が良好であって、充分なフルカラー表示ができる
ことを確認した。It was confirmed that this liquid crystal display device had good contrast, color reproducibility, etc., and was capable of providing sufficient full-color display.
【0021】[0021]
【発明の効果】研磨したガラスを使用する場合と本発明
のように研磨加工を施していないガラスを使用する場合
との研磨時間は、後者の方が1分程度余分にかけるだけ
で、コントラストや色再現性等が良好であって、充分な
フルカラー表示を得ることができる。[Effects of the Invention] The polishing time when using polished glass and when using non-polished glass as in the present invention is only about 1 minute longer in the latter case, and the contrast is improved. The color reproducibility and the like are good, and a sufficient full color display can be obtained.
【図1】本発明の方法により製造したカラーフィルター
付基板を用いた液晶表示装置の一例の断面図。FIG. 1 is a cross-sectional view of an example of a liquid crystal display device using a color filter-equipped substrate manufactured by the method of the present invention.
【図2】(a) はオスカー式研磨機の断面図、(b)
はオスカー式研磨機の平面図。[Figure 2] (a) is a cross-sectional view of the Oscar type polishing machine, (b)
is a plan view of the Oscar-type polishing machine.
【図3】従来のカラーフィルター付基板の断面図。FIG. 3 is a cross-sectional view of a conventional color filter-equipped substrate.
1 研磨加工を施していないガラス基板2
カラーフィルター
3 樹脂層
4 ITO膜
5 液晶1 Glass substrate that has not been polished 2
Color filter 3 Resin layer 4 ITO film 5 Liquid crystal
Claims (3)
膜厚のカラーフィルターを形成し、該カラーフィルター
表面を研磨することを特徴とするカラーフィルター付基
板の製造方法。1. A method for producing a substrate with a color filter, which comprises forming a color filter with a thickness of 3 μm or more directly on an unpolished glass substrate, and polishing the surface of the color filter.
ターを形成し、その上から樹脂層を3μm以上の膜厚で
形成し、該樹脂層表面を研磨することを特徴とするカラ
ーフィルター付基板の製造方法。2. A substrate with a color filter, characterized in that a color filter is directly formed on an unpolished glass substrate, a resin layer is formed thereon with a thickness of 3 μm or more, and the surface of the resin layer is polished. manufacturing method.
たカラーフィルター付基板を用いた液晶表示装置。3. A liquid crystal display device using a substrate with a color filter manufactured by the method according to claim 1 or 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3041328A JPH04258902A (en) | 1991-02-13 | 1991-02-13 | Production of substrate with color filter and liquid crystal display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3041328A JPH04258902A (en) | 1991-02-13 | 1991-02-13 | Production of substrate with color filter and liquid crystal display device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04258902A true JPH04258902A (en) | 1992-09-14 |
Family
ID=12605453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3041328A Withdrawn JPH04258902A (en) | 1991-02-13 | 1991-02-13 | Production of substrate with color filter and liquid crystal display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04258902A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5677202A (en) * | 1995-11-20 | 1997-10-14 | Eastman Kodak Company | Method for making planar color filter array for image sensors with embedded color filter arrays |
-
1991
- 1991-02-13 JP JP3041328A patent/JPH04258902A/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5677202A (en) * | 1995-11-20 | 1997-10-14 | Eastman Kodak Company | Method for making planar color filter array for image sensors with embedded color filter arrays |
US5889277A (en) * | 1995-11-20 | 1999-03-30 | Eastman Kodak Company | Planar color filter array for CCDs with embedded color filter elements |
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Legal Events
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---|---|---|---|
A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980514 |