JPS62277735A - Hydro-extracting drier - Google Patents

Abstract

PURPOSE:To hydro-extract and dry water droplets on the surfaces of all semiconductor wafers by centrifugal force by atomizing ultrafine fog into a tank housing a rotor. CONSTITUTION:A nozzle 12 is mounted into a tank 1 by a pipe 11 from an upper section through a suction port 8 in a cover 7, and fine fog 13 can be atomized from the nozzle. The fine fog 13 is formed in ultrafine fog having mean particle size such as 10mum or less so as not to moisten a body. Since a rotor 6 is turned, the rotational center side of the rotor is brought to negative pressure, clean air or a gas A for drying such as N2 gas is introduced into the tank 1 from the suction port 8, and the inside of the tank 1 is brought to a saturated state by fine fog 13 atomized by the nozzle 12 in the tank 1. Consequently, when the inside of the tank is brought to the saturated state, even extremely small water droplets adhering on the surfaces of semiconductor wafers 4 do not evaporate, thus allowing hydro-extracting by centrifugal force. Accordingly, the lowering of the yield of products and the deterioration of quality due to the remaining of spots and the like on the surfaces of the semiconductor wafers are prevented.

Description

[Detailed Description of the Invention] 3. Detailed Description of the Invention [Field of Industrial Application] This invention relates to a draining and drying device used for draining and drying thin-walled objects such as semiconductor wafers. .

[Conventional technology]

FIG. 2 shows a conventional drying device used when semiconductor wafers are drained and dried after being washed with water. That is, a table-shaped rotor 2 is drawn inside the tank 1, a plurality of cassette storage boxes 3 are fixed to this rotor 2, and a basket-shaped cassette 1 containing semiconductor wafers 4 to be dried is stored in the storage boxes 3. -5 should be set. In this state, the low-coupling drive motor 6.2 is activated and the low-coupling motor 2 is rotated at a high speed of, for example, around 100 Or, p, m, and the water droplets adhering to the semiconductor wafer 4 are blown off by the centrifugal force and drained. -j Get away.

On the other hand, by utilizing the negative pressure generated at the center of -C1 by the rotation of the cassette/soto storage box 3, the gas A sucked in from the air intake port 8 of the upper lid 7 dries the surface of the semiconductor wafer 4.

In addition, 9.10 in the figure is the drainage pipe 7 installed in the tank 1.
° and exhaust 1''.

[Problem to be solved by the invention] 9. In the conventional drain drying device configured as above, extremely small particles (for example, around 10011 m) attached to the convex surface of semiconductor sea urchins rotating at high speed together with the rotor. Since the water droplets evaporate within the time it takes to reach high speed rotation (they are not blown away by centrifugal force), stains remain on the convex surface of the semiconductor sea urchin, resulting in a decrease in product yield and quality.

The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a drying apparatus that has a simple structure and can remove and dry all water droplets on the surface of a semiconductor wafer by centrifugal force.

[Means for solving problems]

In the drain drying device according to the invention of B, the average particle diameter is, for example, 10. It is equipped with a nozzle that can spray ultra-microtremors under umJJ.

[Effect]

In the draining and drying device of this invention, as the rotor 2 rotates, gas is sucked into the tank from the intake port, and by bringing the gas into a saturated state with super eN, water droplets on the surface of the semiconductor wafer are removed in the tank. Drains and dries using centrifugal force without evaporation.

〔Example〕

An embodiment of the present invention will be described below with reference to FIG. In FIG. 1, numerals 1 to 10 are the same as those in FIG. 2 above, so their explanation will be omitted. A nozzle 12 is installed by a pipe 11 into the tank 1 from above through an inlet 8 of the lid 7, and is configured to spray microseismic particles 13 from this nozzle. In addition, this Wl'FA 13 is made to be ultra-long-lasting with an average particle diameter of, for example, 10 μm or less so as not to wet objects.

Next, the operation will be explained. As the 11-tor 6 rotates, the rotation center side of this loco becomes negative pressure,
Clean air or a drying gas A such as N2 gas enters the tank 1 through the intake port 8, where the inside of the tank 1 is brought into a saturated state by the tremors 13 sprayed from the nozzle 12. If the inside of the tank is saturated in this way, even the smallest water droplets attached to the surface of the semiconductor wafer 4 will not evaporate.
Water can be drained by centrifugal force.

〔Effect of the invention〕

As described above, according to the present invention, water droplets adhering to the surface of all semiconductor wafers can be drained and dried with a simple structure of arranging a nozzle in a tank without drying them naturally. This has the effect of preventing a decrease in yield and deterioration in quality.

[Brief explanation of the drawing]

FIG. 1 is a sectional view showing an embodiment of the present invention, and FIG. 2 is a sectional view showing a conventional semiconductor wafer draining and drying apparatus. In the figure, 1 is a tank, 2 is a rotor, 3 is a cassette storage box, 4 is a semiconductor wafer, 5 is a cassette, 6 is a motor, 1
1 is a pipe, 12 is a nozzle, and 13 is a pipe. Note that the same reference numerals in the figures indicate the same or corresponding parts. Agent Masu Oiwa 1: Kushi 7 2: 0-Tar J: rrty Tor ζ stone 5- 4-+4 pay; I＼ 12:/Spar

Claims (3)

[Claims] (1) In a dehydration drying device that holds an object to be dried in a rotor built in a tank and drains and dries the object, the tank is equipped with a nozzle for generating ultra-fine mist,
A drain drying device that is characterized by keeping the inside of the tank at high humidity. (2) A pipe is provided hanging down into the tank from the intake port of the upper lid of the tank, and a nozzle is attached to the lower end of this pipe, and this nozzle is made to face the center of the rotor as claimed in claim 1. Draining and drying equipment. (3) The drain drying device according to claim 1 or 2, wherein ultrafine mist having an average particle diameter of 10 μm or less is sprayed from the nozzle.