JPS62275319A - Magnetic recording medium having crack in protective layer - Google Patents
Magnetic recording medium having crack in protective layerInfo
- Publication number
- JPS62275319A JPS62275319A JP11967486A JP11967486A JPS62275319A JP S62275319 A JPS62275319 A JP S62275319A JP 11967486 A JP11967486 A JP 11967486A JP 11967486 A JP11967486 A JP 11967486A JP S62275319 A JPS62275319 A JP S62275319A
- Authority
- JP
- Japan
- Prior art keywords
- cracks
- protective layer
- magnetic
- crack
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 42
- 239000011241 protective layer Substances 0.000 title claims abstract description 25
- 239000010410 layer Substances 0.000 claims abstract description 30
- 238000003776 cleavage reaction Methods 0.000 claims abstract description 3
- 230000007017 scission Effects 0.000 claims abstract description 3
- 230000005294 ferromagnetic effect Effects 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 239000002344 surface layer Substances 0.000 claims description 2
- 230000001186 cumulative effect Effects 0.000 abstract 1
- 230000004304 visual acuity Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 238000001000 micrograph Methods 0.000 description 3
- -1 polyethylene Polymers 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000006247 magnetic powder Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018507 Al—Ni Inorganic materials 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910020632 Co Mn Inorganic materials 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910020678 Co—Mn Inorganic materials 0.000 description 1
- 229910020516 Co—V Inorganic materials 0.000 description 1
- 229910020514 Co—Y Inorganic materials 0.000 description 1
- 229910017135 Fe—O Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- QLOAVXSYZAJECW-UHFFFAOYSA-N methane;molecular fluorine Chemical compound C.FF QLOAVXSYZAJECW-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- FPVKHBSQESCIEP-JQCXWYLXSA-N pentostatin Chemical compound C1[C@H](O)[C@@H](CO)O[C@H]1N1C(N=CNC[C@H]2O)=C2N=C1 FPVKHBSQESCIEP-JQCXWYLXSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
（産業上の利用分野）
本発明は磁気記録媒体に関し、更に詳しくは磁気記録媒
体の保護層の形状に関する。Detailed Description of the Invention 3. Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a magnetic recording medium, and more particularly to the shape of a protective layer of a magnetic recording medium.
（従来の技術）
磁気記録に対して、その記録の高密度化が要求されるに
伴い、磁性層はバインダー中に磁性粉を分散させた磁性
塗料を塗布する塗布型磁性層から、磁性体を稠密に充填
できる真空蒸着法、スパッタリング法で磁性層を形成す
る薄膜型磁性層に移シ、更に従来の水平記録方式から飛
曙的に高密化が図れる垂直記録方式が着目され、実用化
の段階に到った。(Prior Art) As magnetic recording is required to have higher recording density, the magnetic layer has changed from a coated magnetic layer in which a magnetic coating with magnetic powder dispersed in a binder is applied, to a coated magnetic layer in which magnetic powder is dispersed in a binder. The vacuum evaporation method, which allows dense packing, and the sputtering method are used to form a magnetic layer, which is a thin film type.Furthermore, the perpendicular recording method, which can dramatically increase the density from the conventional horizontal recording method, has attracted attention and is at the stage of practical application. reached.
磁気記録の前記′一般的傾向は磁気、ｆイスク分野に於
ても映し出されている。即ち５インチディスク等の小型
高密度装置が開発されて小径のディスクが用いられるに
及び、該小径ディスクと磁気ヘッド間の相対速度の低下
による再生出力、ＳＺＮ比の劣化を出力の大きい高密度
化磁性層に換えることにより補償することが計られてい
る。The above-mentioned general trend in magnetic recording is also reflected in the field of magnetism and disk drives. That is, as compact high-density devices such as 5-inch disks were developed and small-diameter disks were used, the deterioration of the playback output and SZN ratio due to the decrease in the relative speed between the small-diameter disk and the magnetic head was reduced by increasing the output density. It has been attempted to compensate by replacing it with a magnetic layer.
前自己磁性層は高密度化を狙う限り薄膜型であることが
必須となるが真空蒸着或はスパッタリングで形成された
磁性層は、従来の如くバインダー等による磁性層或は磁
性体に対する緩衝作用、表面過擦に対する保護作用がな
く、磁性体は外界からの物理的＜＊ｉ 撃、化学的刺戟
に対し無防備に沫呈し、繰返される記録、再生に対する
磁気テープ、磁気ディスク等の耐用性は甚だ乏しい。As long as the pre-self-magnetic layer is aimed at high density, it is essential to be a thin film type, but the magnetic layer formed by vacuum evaporation or sputtering is conventionally buffered by a binder or the like against the magnetic layer or magnetic material. There is no protection against surface scratches, and magnetic materials are vulnerable to physical and chemical shocks from the outside world, and the durability of magnetic tapes, magnetic disks, etc. against repeated recording and playback is extremely poor. .
特にコンタクトスタートストップ（ａＳＳ）方式の磁気
ディスク装置で相当な高回転をする磁気ディスクに於て
は致命的損傷を蒙る。In particular, magnetic disks that rotate at considerably high speeds in contact start/stop (aSS) type magnetic disk drives are subject to fatal damage.
従って薄膜型磁性層を有する磁気記録媒体表面には保護
層を設けることが通常であシ、保護層として機械的保護
効果、滑面効果更に耐蝕性を兼備えるように、炭素、モ
リブデン、二硫化モリブデンその他の単体、化合物或は
それらの複合素材が工夫され、保護層素材の特性忙合わ
せて直流二極スパッタ法、高周波二極スパッタ法、化学
蒸着法（ＯＶＤ）或は塗布法その他によって、出力のス
ペースロスが許容範囲に収るように多くは０．１μｍ以
下の保護層が設けられる。Therefore, it is usual to provide a protective layer on the surface of a magnetic recording medium having a thin film magnetic layer. Molybdenum and other single substances, compounds, or composite materials thereof are devised, and the output can be increased by direct current bipolar sputtering, high-frequency bipolar sputtering, chemical vapor deposition (OVD), coating methods, etc., depending on the characteristics of the protective layer material. In most cases, a protective layer with a thickness of 0.1 μm or less is provided so that the space loss is within an allowable range.
また強磁性層上に潤滑性のオーバコート層を設け、或は
潤滑性の高い物質を含浸させ強磁性層の表面潤滑性を高
め、磁性層の損傷防止、特性劣化防止が図られている。In addition, a lubricating overcoat layer is provided on the ferromagnetic layer, or a highly lubricating substance is impregnated to increase the surface lubricity of the ferromagnetic layer, thereby preventing damage to the magnetic layer and preventing deterioration of its characteristics.
（発明が解決しようとする問題点）
前記高密度記録に用いられる強磁性層の特性を補完し且
つ継続保持を目的とする前記各技術は強磁性層の耐摩耗
性、走行性、耐久性及び耐用性の改善に於て効果を奏す
るが、一方に於て強磁性層に期待される高出力或は高分
解能を損っている。(Problems to be Solved by the Invention) Each of the above-mentioned technologies aims to complement and maintain the characteristics of the ferromagnetic layer used for high-density recording, and the above-mentioned techniques have been developed to improve the abrasion resistance, runnability, durability and Although this is effective in improving durability, on the other hand it impairs the high output or high resolution expected of the ferromagnetic layer.
従って本発明の目的は、高出力、高分解能を有し耐用性
のよい高密度磁気記録媒体の提供にある。Therefore, an object of the present invention is to provide a high-density magnetic recording medium that has high output, high resolution, and good durability.
（問題点を解決するための手段）
高密度記録用の強磁性層に対する保護層に関し種々検討
した結果、基板上に強磁性層を設けた磁気記録媒体に於
て、該媒体の表層をなす保護層に亀裂を設けることによ
って本発明の目的が達成されることを見出した。(Means for solving the problem) As a result of various studies regarding protective layers for ferromagnetic layers for high-density recording, we found that in magnetic recording media in which a ferromagnetic layer is provided on a substrate, a protective layer that forms the surface layer of the medium It has been found that the object of the invention is achieved by providing cracks in the layer.
更に本発明の態様に於ては前記亀裂は保護層全域に亘っ
て無定方向及び／または任意方向をもって存在し、且亀
裂密度は１００〜１０００本／舅翼が好しく、また亀裂
の開裂幅は０．０５〜０．５μｍであることが好しい。Further, in an aspect of the present invention, the cracks are present in an arbitrary direction and/or in an arbitrary direction over the entire protective layer, and the crack density is preferably 100 to 1000 cracks/leg wing, and the crack width is is preferably 0.05 to 0.5 μm.
前記亀裂密度は亀裂に最多交する直線を引き該直線の１
ｎ当υ直線を横切る亀裂の本数で定義する。The crack density is determined by drawing a straight line that intersects most cracks and
Defined by the number of cracks that cross the n line.
前記亀裂は相互に独立した閉じだループ或は某状の非連
続の亀裂群でありてもよいし、またこれらが相互に連結
した連続亀裂であってもよい。The cracks may be mutually independent closed loops or a group of discontinuous cracks, or may be continuous cracks in which these cracks are interconnected.
また本発明に係る保護層は磁性層の形状（例えば亀裂の
有無等）によって塗布方式によつてもよく、また気相堆
積方式によってもよいが好しくけ気相堆積方式である。Further, the protective layer according to the present invention may be formed by a coating method depending on the shape of the magnetic layer (for example, the presence or absence of cracks, etc.), or may be formed by a vapor deposition method, but a vapor phase deposition method is preferred.
本発明に於て１使用される気相堆積方式としては、真空
蒸着法、スパッタリング法、イオンプレーテング法、化
学蒸着法或は対向ターゲットスパッタ法等が挙げられる
。Examples of the vapor deposition method used in the present invention include a vacuum evaporation method, a sputtering method, an ion plating method, a chemical vapor deposition method, and a facing target sputtering method.
本発明に用いる保護層素材としては、クロム、非磁性ニ
ッケル、ロジウム、白金、酸化珪素、窒化珪素、酸化ク
ロム、カーボン、弗化黒鉛或は高分子物質等が各素材の
特性に適した条件で適用される。更に素材としては機械
的な保護効果、過擦防止効果が大きく更に化学的に耐蝕
性の大きなものが好ましい。The protective layer materials used in the present invention include chromium, non-magnetic nickel, rhodium, platinum, silicon oxide, silicon nitride, chromium oxide, carbon, graphite fluoride, polymeric substances, etc. under conditions suitable for the characteristics of each material. Applicable. Furthermore, it is preferable that the material has a high mechanical protection effect, a high abrasion prevention effect, and a high chemical corrosion resistance.
更に保護層の作用効果を上げるため特性を異にする複数
層としてもよい。Furthermore, in order to enhance the effect of the protective layer, it may be formed of multiple layers having different characteristics.
また保護層は出力のスペーシ７グロスヲ抑エルために薄
い方がよいが、薄すぎると保護効果を失うので、０．０
１〜０．１５μｍが好ましい。In addition, the thinner the protective layer is, the better to suppress the output space 7 gloss, but if it is too thin, the protective effect will be lost, so 0.0
1 to 0.15 μm is preferable.
また、本発明に係る磁性体としてはＦｅ、Ｃｏ１Ｎｉそ
の他の磁性金属あるいは、Ｆｅ −Ｂａ、 Ｆｅ −Ｏ
ｏ、 Ｆｅ −ｋｌ、 Ｆｅ−Ｎｉ１Ｃｏ−Ｎｉ、 Ｆ
ｅ −８ｉ。Further, as the magnetic material according to the present invention, Fe, Co1Ni and other magnetic metals, Fe-Ba, Fe-O
o, Fe-kl, Fe-Ni1Co-Ni, F
e-8i.
Ｆｅ−Ｒｈ、 Ｆｅ−’１１Ｆｅ−Ｏｕ、 Ｆｅ −Ａ
ｕ、 Ｃｏ −Ｏｒ、 Ｃｏ−Ｐ、 Ｃｏ −Ｖ、 Ｃ
ｏ −Ｓｉ１．、Ｃｏ−Ｙ、 Ｃ。Fe-Rh, Fe-'11Fe-Ou, Fe-A
u, Co-Or, Co-P, Co-V, C
o-Si1. , Co-Y, C.
−Ｌａ、 Ｃｏ−０ｒ、 Ｃｏ−ＰｒｌＣｏ−８ｍ、
Ｃｏ −Ｍｎ。-La, Co-0r, Co-PrlCo-8m,
Co-Mn.
Ｃｏ−Ｐｔ１Ｎｉ−Ｏｕ、 Ｃｏ−Ｎｉ −Ｆｅ、 Ｆ
ｅ−Ａｌ−Ｎｉ、 Ｃｏ−Ｎ１−ＡＪ、Ｃｏ−Ｎｉ−０
ｒ１Ｃｏ−Ｎｉ −Ｚｎ、 Ｃｏ −８ｉ −Ａｌ、
Ｆｅ−８ｉ −ＡＡ！、 Ｍｎ−Ｂ１゜Ｍｎ −Ｓｂ
、 Ｍｎ −Ａ１等の合金系磁性金属及びそれらの酸化
物（例えば１− Ｆｅ２Ｏ３、Ｆｅ２Ｏ３、Ｂａ ７
ｘライト）等が挙げられる。ここで好ましくは、ｃ。Co-Pt1Ni-Ou, Co-Ni-Fe, F
e-Al-Ni, Co-N1-AJ, Co-Ni-0
r1Co-Ni-Zn, Co-8i-Al,
Fe-8i-AA! , Mn-B1゜Mn-Sb
, Mn-A1 and their oxides (e.g. 1-Fe2O3, Fe2O3, Ba7
x light), etc. Here, preferably c.
あるいはＣｏ −Ｎｉ合金（Ｎｉ含有率３０ｗｔ％以下
）、あるいはＣｏ −Ｏｒ金合金 Ｏｒ含有率２６ ｗ
ｔ ％以下）である。磁性層厚は０．０３〜０．６μｍ
であってよい。Or Co-Ni alloy (Ni content 30wt% or less), or Co-Or gold alloy Or content 26 w
t% or less). The magnetic layer thickness is 0.03 to 0.6 μm
It may be.
本発明に係る磁性層は塗布型でもよいし薄膜型でもよい
が前記した気相堆積方式或はメッキ法によった薄膜型が
好しい。The magnetic layer according to the present invention may be of a coating type or a thin film type, but a thin film type formed by the above-mentioned vapor deposition method or plating method is preferable.
また基板としては、Ａ１１陽極酸化被膜（例えばアルマ
イト処理）を設けたＡｌ、 Ｎｉ −Ｐメッキ処理をほ
どこしたＡｌ、ポリイミド、ポリアラミド、ポリカーボ
ネート、ポリアミドイミド、ポリアミド、ポリエチレン
、ポリエーテルエーテルケトン、ポリエーテルサルホン
、ポリサルホン、ポリエーテルイミド、ポリテトラフル
オロエチレン、ポリプロピレン等のプラスチックがある
。基板は盤状、フィルム状等種々であってよい。In addition, substrates include Al with an A11 anodized coating (e.g. alumite treatment), Al with Ni-P plating, polyimide, polyaramid, polycarbonate, polyamideimide, polyamide, polyethylene, polyetheretherketone, polyethersal. There are plastics such as carbon, polysulfone, polyetherimide, polytetrafluoroethylene, and polypropylene. The substrate may be in various shapes such as a disk shape or a film shape.
前記のようにして得られた本発明の磁気記録媒体の表面
組織を第１図に示す。The surface structure of the magnetic recording medium of the present invention obtained as described above is shown in FIG.
第１図の顕微鏡写真（Ｘ８００）に於て、閉じた曲線、
切れぎれの或は鋼状に連りた線は保護層の亀裂であシ、
該亀裂の開裂幅は走査型電子顕微鏡による観測結果（Ｘ
２０，０００）、０．１５〜０．２５μｍを与えた。ま
た亀裂密度は２５０〜４００本／龍である。In the micrograph (X800) in Figure 1, a closed curve,
Broken or steel-like lines are cracks in the protective layer.
The cleavage width of the crack is determined by the observation result using a scanning electron microscope (X
20,000) and 0.15 to 0.25 μm. Moreover, the crack density is 250 to 400 cracks/dragon.
また第２図に保護層をかける前の磁性層の表面組織写真
（Ｘ８００）を掲げた。In addition, FIG. 2 shows a photograph (X800) of the surface structure of the magnetic layer before applying the protective layer.
このように保護層に亀裂を設けることによって高出力、
高分解能及び耐用性を与えることができ、その効果はハ
ードディスクに於て特に顕著である。By creating cracks in the protective layer in this way, high output,
It can provide high resolution and durability, and its effects are particularly noticeable in hard disks.
（実施例）
次に本発明を実施例によりて具体的に説明するが本発明
の態様はこれらに限られるものではない。(Example) Next, the present invention will be specifically explained with reference to Examples, but the embodiments of the present invention are not limited to these.
例えば磁気テープ、可撓性磁気ディスク等に適用可能で
ある。For example, it is applicable to magnetic tapes, flexible magnetic disks, etc.
実施例、比較例には同一条件の基板、磁性層を用い、保
護層に連続亀裂（実施例１）、非連続亀裂（実施例２）
及び亀裂なしく比較例（１））の条件を与えて比較した
。In Examples and Comparative Examples, the same substrate and magnetic layer were used, and the protective layer had continuous cracks (Example 1) and discontinuous cracks (Example 2).
A comparison was made under the conditions of Comparative Example (1)) with no cracks.
また保護層は炭素をスパッタした０、０２μｍの炭素保
護層としたがモリブデン、クロムその他の単体或は複合
材料によっても同効果がえられた。The protective layer was a 0.02 .mu.m thick carbon protective layer sputtered with carbon, but the same effect could be obtained using molybdenum, chromium, or other single or composite materials.
基 板ニアルミ合金磁気ディスク基板
（１３０顛φ、１．９ｉｎ厚）
磁性層ニスバッタ法
第１層 クロム ０．５μｍ厚
第２層 ０ｏＮｉ ２０合金０．０８ μｍ厚各媒体と
も磁特性は次の通９であった。Substrate Ni-aluminum alloy magnetic disk substrate (130 mm φ, 1.9 inch thick) Magnetic layer Varnish Batter method 1st layer Chromium 0.5 μm thick 2nd layer 0oNi 20 alloy 0.08 μm thick The magnetic properties of each medium are as follows 9 Met.
抗磁力 Ｈｃ ＝ ７００ ｘ ／ｌ／ ／（テッド
（Ｏｅ）角型比 Ｓ几＝０．８５
各媒体を磁気ディスク評価機により出力、分解能を評価
した。Coercive force Hc = 700 x /l/ / (Oe) squareness ratio S = 0.85 Each medium was evaluated for output and resolution using a magnetic disk evaluation machine.
その結果を以下に記す。The results are described below.
評価条件： Ｉ Ｆ ＝ １．２５ＭＨｚ ２ Ｆ ＝
２．５ＭＨｚ周速１３．８ ｍ／ｓ
ヘッド：ウィンチェスタ−ミニタイプ、浮上量０．３μ
ｍ
また耐久性評価のためコンタクト、スタート、ストップ
（ａＳＳ）テストを行った。Ｃ８Ｓテストとは同一トラ
ック上をヘッド、コンタクト、スタート、ストップを繰
り返しヘッド出力が初期値の９０係以下となる回数で表
す。Evaluation conditions: I F = 1.25MHz 2 F =
2.5MHz peripheral speed 13.8 m/s Head: Winchester mini type, flying height 0.3μ
A contact, start, stop (aSS) test was also conducted to evaluate durability. The C8S test is expressed as the number of times the head output is 90 times lower than the initial value by repeating head, contact, start, and stop on the same track.
分解能の測定
ディスクに記録される最低周波数ＩＦおよび最高周波数
２Ｆの信号を書き込み、そΩ出力の平均信号振幅の比（
２Ｆ／ＩＦ）のことを言う。通常パーセントで表す。Write the lowest frequency IF and highest frequency 2F signals recorded on the resolution measurement disk, and calculate the ratio of the average signal amplitude of the Ω output (
2F/IF). Usually expressed as a percentage.
ハードディスク（現行品）の場合２ Ｆ ＝ ２．５
ＭＨｚＩ Ｆ ＝ １．２５ ＭＨｚを使う。For hard disks (current products) 2 F = 2.5
MHzI F = 1.25 MHz is used.
第１図は保護層の表面組織の顕微鏡写真（ｘｓｏｏ）、
第２図は保護層をかける前の磁性層の表面組織の顕微鏡
写真（ｘｓｏｏ）である。
出願人 小西六写真工業株式会社
＜Ｘ ８００）
（ｘ ８００ ）Figure 1 is a micrograph (xsoo) of the surface structure of the protective layer.
FIG. 2 is a micrograph (xsoo) of the surface structure of the magnetic layer before applying the protective layer. Applicant Roku Konishi Photo Industry Co., Ltd. <X 800) (x 800)
Claims (3)
該媒体の表層をなす保護層に亀裂を設けたことを特徴と
する磁気記録媒体。(1) In a magnetic recording medium in which a ferromagnetic layer is provided on a substrate,
A magnetic recording medium characterized in that a protective layer forming a surface layer of the medium is provided with a crack.
たは任意方向をもって存在し且つ亀裂密度が１００〜１
０００本／ｍｍである特許請求の範囲第１項記載の磁気
記録媒体。(2) The cracks exist in an arbitrary direction and/or in an arbitrary direction over the entire protective layer, and the crack density is 100 to 1
000 lines/mm.
特許請求の範囲第１項または第２項記載の磁気記録媒体
。(3) The magnetic recording medium according to claim 1 or 2, wherein the crack has a cleavage width of 0.05 to 0.5 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11967486A JPS62275319A (en) | 1986-05-23 | 1986-05-23 | Magnetic recording medium having crack in protective layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11967486A JPS62275319A (en) | 1986-05-23 | 1986-05-23 | Magnetic recording medium having crack in protective layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62275319A true JPS62275319A (en) | 1987-11-30 |
Family
ID=14767243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11967486A Pending JPS62275319A (en) | 1986-05-23 | 1986-05-23 | Magnetic recording medium having crack in protective layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62275319A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61119674A (en) * | 1984-11-14 | 1986-06-06 | Shimano & Co Ltd | Wear resistant parts for bicycle |
-
1986
- 1986-05-23 JP JP11967486A patent/JPS62275319A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61119674A (en) * | 1984-11-14 | 1986-06-06 | Shimano & Co Ltd | Wear resistant parts for bicycle |
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