JPS62267743A - Strippable developing device with reexposing section - Google Patents

Abstract

PURPOSE:To directly superpose base plates after pictures are formed, and to wind the base plates, by providing a reexposing section behind a strippable developing device. CONSTITUTION:A pair of base plate carrying belts 7, whose interval between each other is changeable in accordance with the width D of a base plate, is provided on the base plate carrying-out port side of a double-face strippable developing machine 5 and reexposing sections 6a and 6b which can photopolymerize a photopolymerized substance layer are provided above and below the belts 7. An exposed base plate 4a to be processed is put into the developing machine 5 and upper and lower surfaces of the base plate 4a are respectively subjected to developing processes. Thus prescribed pictures are formed. The processes base plate 4b is carried out from the developing machine 5 and is advanced under a condition where its both sides are held by the belts 7. In such case, the upper and lower surfaces of the base plate 4b are irradiated by the reexposing sections 6a and 6b at the optimum exposing light quantities and their unexposed parts 3 are photopolimerized. After the photopolimerization, the unexposed parts 3 become equal to exposed parts 2 in property and the tackiness is reduced. Therefore, the reexposed base plate 4c can be superposed.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a peeling and developing device used for manufacturing printed circuits and the like.

<Prior Art> For the production of printed circuits, etc., the above-mentioned photo-coating of an image-forming material consisting of a transparent support and a photopolymerizable composition layer coated on the support is applied to the surface of an image-forming substrate. The polymeric composition layer side is attached, the photopolymerizable composition layer is imagewise exposed to light to form a cured area, and the support is separated from the substrate to form an imagewise resist on the substrate. Image forming means and peeling and developing devices optimal for image formation have already been proposed.

In the peeling development method as described above, as shown in FIG. 1, the exposed portions 2 of the photopolymerizable composition layer, which have been exposed and cured in a pattern, are in close contact with the substrate 1 on which an image has been formed. Here, if we pay attention to the side surface of this exposed area 2, that is, the fractured surface of the unexposed area of the photopolymerizable composition layer that has been separated without being exposed, a small portion 3 of the unexposed area remains. ing.

However, since the remaining unexposed area 3 was originally designed to be attached to the substrate 1, it has adhesive strength itself. Therefore, if the substrates after image formation are stacked and left for a long time, the remaining unexposed portion 3 and the upper substrate 1' will come into close contact as shown in FIG. Similarly, when a substrate with images formed on both sides, such as a through-hole substrate, is crossed, the image planes iii will come into close contact with each other.

For this reason, when attempting to lift stacked substrates one by one to process them, a portion of the exposure section 2 may be damaged when peeling off the portions that are in close contact with each other, and a desired image may not be obtained. In addition, this required extra labor and generated static electricity, which led to the accumulation of dust and reduced workability.

The above-mentioned adhesion also occurs when a long base material is continuously peeled and developed and then wound up into a roll.
When unrolling a roll-shaped base material for post-processing,
As expected, images were damaged and dust adhered to them due to static electricity.

In order to prevent the above-mentioned drawbacks, conventionally, a sheet with release properties such as a film whose surface has been treated with silicon is inserted between the substrates, and when a long base material is rolled up, the release properties are removed. Methods such as stacking sheets and rolling them up were used. However, this method requires an auxiliary material such as a releasable sheet, and static electricity is generated when the sheet is removed, so it cannot be said to be a very effective method.

Further, as shown in FIG. 6, a rack 20 having a U-shaped groove
There is a method of inserting the substrate 4 to be processed into the substrate so that the unexposed area 3 and the substrate 1 do not come into contact with each other, but this method requires a large number of dedicated racks that are matched to the dimensions of the substrate and has the drawbacks of poor space efficiency. Ta.

This invention was made in view of the above points, and by re-exposing the substrate after image formation, the side surface of the exposed area of the photopolymerizable composition layer formed in a pattern is It is an object of the present invention to provide a peeling developing device that can reliably photopolymerize remaining unexposed areas and directly stack or wind up substrates after development.

<Means for Solving the Problems> In order to solve the above problems, the present invention peels off the transparent support and the unexposed part of the photopolymerizable composition layer from the substrate, and removes the photopolymerizable composition layer from the substrate. After leaving the exposed area on the substrate,
A re-exposure section for exposing the substrate again to a light source capable of photocuring the photopolymerizable composition is provided behind the peeling and developing section.

Embodiments of the present invention will be described below with reference to the accompanying drawings.

Embodiment 1 As shown in Fig. 3, a double-sided peeling developer F115 that can peel and develop substrates that require images to be formed on both sides of the substrate, such as a substrate with through holes, is placed at the substrate exit side according to the width of the substrate. A pair of substrate transport belts 7 are installed which can vary their spacing. This substrate conveyance belt 7 has the function of holding and conveying the substrates to be processed 4a to 40 by several millimeters on both sides, and if it has the same function, it can be carried out using a conveyor chain, for example. Good too. Further, the gripping margin of the substrate of the conveyor belt 7 may be any number of millimeters as long as it does not affect the formed image.

Re-exposure sections 6a and 6b capable of photopolymerizing the photopolymerizable composition layer are provided both above and below this substrate conveyance belt.

Here, the substrate 4a to be processed after exposure is placed into a peeling and developing device n5 (not shown), and the upper and lower surfaces of the substrate are developed, respectively, to form a predetermined image. After the image formation has been completed, the substrate 4b to be processed is carried out from inside the peeling developing device 5, held on both sides by the substrate conveying belt 7, and advanced.

At this time, the substrate to be processed 4 is exposed by the re-exposure sections 6a and 6b.
The upper and lower surfaces of b are irradiated with light at the optimum exposure amount for re-exposure.

The inside of this re-exposure section is a body 60 as shown in FIG.
．． A re-exposure lamp 61, a reflector 62, an aperture 83,
and a lamp cooling device 64, and other sampling equipment (not shown). The degree of opening and closing of the diaphragm 63 is adjusted in response to changes in substrate processing speed, so that a constant re-exposed area can always be obtained.

By this re-exposure treatment, the unexposed area 3 shown in FIG. 1 is photopolymerized, becomes the same as the exposed area 2, and loses its tackiness. After the substrates 4c to be processed after the re-exposure process pass through the substrate conveyance belt 7, they can be stacked one by one using an unloader or the like.

<Example 2> In FIG. 5, a guide roll 1 is installed behind a peeling and developing device (not shown) that can continuously develop a long substrate 10.
1 to 13 are provided. Of these, guide rolls 12 and 1
3 to form an irradiation surface having a constant area. Then, a re-exposure process is performed by a re-exposure section 6C provided above the image forming surface of the base material. At this time, similarly to Example 1,
The diaphragm 63 shown in FIG. 4 is adjusted to irradiate the substrate 10 with an exposure amount that matches the transport speed of the substrate 10.

By this re-exposure process, the base material can be wound around the winding shaft 14 without overlapping auxiliary materials such as sheets having mold releasability.

<Effects of the Invention> As described above, according to the present invention, substrates after image formation can be directly stacked or rolled up without using auxiliary materials or special jigs. In that case, since the image forming surface and the substrate do not come into close contact with each other, there is no image Ill at all. In addition, static electricity is less likely to be generated, and the probability of dust adhesion is greatly reduced. Furthermore, in terms of workability, there are no elements that hinder work as in the past, so the process can be carried out in the same way as other processes.

[Brief explanation of drawings]

Figure 1 is a cross-sectional view of the substrate to be processed after image formation, Figure 2 is a cross-sectional view of the substrates stacked together, Figure 3 is a perspective view of a double-sided peeling development tank with a re-exposure section, and Figure 4. 5 is a sectional view of the re-exposure section, FIG. 5 is a side view of the rotation section when processing a long substrate, and FIG. 6 is a side view when the substrate is inserted into the dedicated rack. 1.1'...Substrate 2...Exposure section 3...
Unexposed area

Claims (1)

[Claims] An image forming material consisting of a transparent support and a photopolymerizable composition layer is laminated on the surface of a substrate on which an image is to be formed, and exposed in a pattern. In a peeling development device that peels off the exposed area from the substrate and leaves the exposed area of the photopolymerizable composition layer on the substrate, the re-exposed area is used to ensure that the pattern on the substrate after development is photopolymerized. A peeling and developing device having a re-exposure section provided at the rear of the peeling and developing device.