JPS62266166A - Preparation of monomolecular film - Google Patents
Preparation of monomolecular filmInfo
- Publication number
- JPS62266166A JPS62266166A JP61108844A JP10884486A JPS62266166A JP S62266166 A JPS62266166 A JP S62266166A JP 61108844 A JP61108844 A JP 61108844A JP 10884486 A JP10884486 A JP 10884486A JP S62266166 A JPS62266166 A JP S62266166A
- Authority
- JP
- Japan
- Prior art keywords
- group
- hydrophilic
- monomolecular film
- groups
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims abstract description 18
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 17
- 125000006239 protecting group Chemical group 0.000 claims abstract description 15
- 150000002430 hydrocarbons Chemical group 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 13
- 150000002894 organic compounds Chemical class 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 7
- 239000002994 raw material Substances 0.000 abstract description 4
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 2
- 229930195733 hydrocarbon Natural products 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000000126 substance Substances 0.000 description 8
- 230000001186 cumulative effect Effects 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000002356 single layer Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- UGAGPNKCDRTDHP-UHFFFAOYSA-N 16-hydroxyhexadecanoic acid Chemical compound OCCCCCCCCCCCCCCCC(O)=O UGAGPNKCDRTDHP-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GSLKSFLKAMCJOZ-UHFFFAOYSA-N 16-[dimethyl(propan-2-yl)silyl]oxyhexadecanoic acid Chemical compound CC(C)[Si](C)(C)OCCCCCCCCCCCCCCCC(O)=O GSLKSFLKAMCJOZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- PQLVXDKIJBQVDF-UHFFFAOYSA-N acetic acid;hydrate Chemical compound O.CC(O)=O PQLVXDKIJBQVDF-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- -1 dimethylisopropylsilyl group Chemical group 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000010902 straw Substances 0.000 description 1
- 125000000213 sulfino group Chemical group [H]OS(*)=O 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Manufacturing & Machinery (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は有機単分子膜、特に親水性基材に吸着可能で
あり、かつ吸着後に気体側(基材と反対側)に親水性基
、もしくは反応性親水性基を有することを特徴とする有
機単分子膜の製造方法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention is capable of adsorbing onto an organic monomolecular film, particularly a hydrophilic substrate, and after adsorption, a hydrophilic group, Alternatively, the present invention relates to a method for producing an organic monomolecular film characterized by having a reactive hydrophilic group.
[従来の技術]
有機化合物の単分子膜、累積膜には数多くの用途がある
。エレクトロニクスの分野では、例えば、膜厚を正確に
制御した半導体装置用絶縁膜、磁気ディスク装置等の保
護潤滑膜、光電変換膜、光学的情報記録膜、光学的情報
記憶膜などへの応用が検討されている。これらの目的の
ために、単分子膜、累積膜を作製する方法として、水面
上で両親媒性物質を高度に分子配向させて単分子層とし
、その単分子層を基材上に写し取る方法、いわゆるラン
グミュア−プロジェット法が多く用いられている。[Prior Art] Monomolecular films and cumulative films of organic compounds have many uses. In the field of electronics, for example, applications are being considered for insulating films for semiconductor devices with precisely controlled film thickness, protective lubricant films for magnetic disk drives, photoelectric conversion films, optical information recording films, optical information storage films, etc. has been done. For these purposes, methods for producing monomolecular films and cumulative films include a method in which amphiphilic substances are highly oriented on the water surface to form a monomolecular layer, and the monomolecular layer is transferred onto a substrate; The so-called Langmuir-Prodgett method is often used.
[発明が解決しようとする問題点]
しかしながら、この方法で作製される単分子膜、累積膜
を構成する材料分子は、一般に長鎖アルキル基の一方の
末端のみに親水基を有するものである。かかる構成分子
から成る単分子膜、累積膜を作製する場合は、熱力学的
な安定性の問題から、膜の支台、すへね15基材と逆側
である気体側に疎水性部分を露出ざi!た膜構成にして
ale<必要かある。もし気体側に親水基部分を露出さ
せておいても、放置して33<たけC゛構成分子の反転
が起こり、表面は疎水性に変わってしま′うことが知ら
れている。[Problems to be Solved by the Invention] However, the material molecules constituting the monomolecular film and the cumulative film produced by this method generally have a hydrophilic group at only one end of a long chain alkyl group. When producing a monomolecular film or a cumulative film made of such constituent molecules, due to thermodynamic stability issues, it is necessary to add a hydrophobic portion to the gas side, which is the side opposite to the membrane abutment and shank 15 base material. Exposure! Is it necessary to have a film structure with ale<? It is known that even if the hydrophilic group portion is exposed on the gas side, if left untreated, the 33<C> constituent molecules will undergo inversion and the surface will become hydrophobic.
したがって従来は親水性基を気体側に露j、l−j l
ノた形の単分子膜を形成力ることは非常に困難て゛あり
、従つ−(−単分子膜あるいはぞの累積膜を作製後にぞ
の」二に親水性物質を吸若さぜたり膜に物質を反応させ
て新し・い機能をイ」−1〕するには、この困難さか人
きh問題と<>つていた。Therefore, in the past, the hydrophilic groups were exposed to the gas side j, l−j l
It is very difficult to form a monomolecular film of the following shape, and therefore, after producing a monomolecular film or a cumulative film, the second step is to absorb a hydrophilic substance to rejuvenate the film. This difficulty was associated with the human problem in creating new functions by reacting substances with molecules.
しかし、親水性基には−・般に反応1ノ1に富むものか
多く、−シシかかる膜か作成できれば、単分子膜、ある
いはぞの累積膜の表面に反応・1ノ1を(”t ’Jで
きることになる。親水″1)1基のこのよう<r反応″
[)1あるいは親水・[(1ぞのものを利用して、例え
ば、半導体装防用絶縁層、磁気ディスク装置等の保護潤
滑層、光電ゆ換機能を持つ層、光学的情報記録層、光学
的情報記憶ehとを単分子股上に設εJるJとがて゛さ
るようになるわりCある。However, hydrophilic groups are generally rich in reactive groups, and if it is possible to create a film that does so, it is possible to have reactive groups ("t") on the surface of a monomolecular film or a cumulative film. 'J can be done.Hydrophilic'1) One such <r reaction'
[) 1 or hydrophilic / There is a possibility that the amount of information stored on a single molecule will increase.
本発明の目的(1以上述べた問題点を解決するために、
新規4f単分子膜の製造方法を(;−焦り−る(二とに
あるか、具体的には、親水′[)1支台に吸容i)l
Fi旨であり、かつ吸@後に気体側、すなねら基材と反
対側に親水↑ノ1基を有−1−る口開単分子膜の製3j
Q R法を提供することにある。OBJECTS OF THE INVENTION (To solve one or more of the problems mentioned above,
A method for producing a new 4F monolayer (;-impatiently).
Production of an open-mouthed monomolecular film that is Fi and has one hydrophilic ↑ group on the gas side after absorption and on the side opposite to the base material 3j
Our goal is to provide the QR method.
[問題点を解決するための手段)
本発明は一般式:
X−R−X′()
(式中、XおよびX’ lよ−f1′;そ゛れ相¥!4
fる親水14基、1−<は炭素原子数が8以ト、望まし
くは14以1−の炭化水素基を示す)
C示される1種または2種以1−のfJ機化合物の一方
の親水11基を疎水性保護y^に変換し−C後、ラング
ミコアープ目ジTツ1〜法を用い′C−親水性阜椴七に
配向制御して吸容ざる事を特j毀どりる単分子膜の製造
方法C゛ある。[Means for Solving the Problems] The present invention is based on the general formula:
(1-< indicates a hydrocarbon group having 8 or more carbon atoms, preferably 14 or more) After converting 11 groups to hydrophobic protected y^, -C, the orientation is controlled to 'C-hydrophilic 7 using Langmicoarp's method, and the non-absorption is specially prevented. There is a method C for producing a monolayer.
本発明の要旨とするところは、!ji13る親水14星
を両末端に有づるイ1機化合物を1京rlとしく−、ラ
ングミ1アープ[−1ジエツト法を用いて親水性基材十
に基材側と気体側の両りに親水性基を持つ単分子膜を製
造り−るに際し、原料物質である異なる親水性基を両末
端に有する有機化合物の一方の親水性基のみを疎水性保
護基によって保護(〕ておくということである。The gist of the present invention is! A compound having 14 hydrophilic stars at both ends is 1 trillion rl, and Langmi 1 Arp [-1 is applied to a hydrophilic base material 10 on both the base material side and the gas side. When producing a monomolecular film with hydrophilic groups, only one hydrophilic group of the raw material, an organic compound having different hydrophilic groups at both ends, is protected by a hydrophobic protecting group. It is.
本発明における単分子膜の親水性基である前記一般式(
I)のXおよびX′としてはヒドロキシル基、カルボキ
シル基、メルカプ1へ基、チーオカルボキシル基、ジグ
オカルボキシル塁、スルフィノ基、スルホ基、カルバモ
イル
ル基、アミノ基、置換7ミノ阜なとがあげられ、単分子
膜形成物質は両末端にこれらの親水性基のうちの2種を
有する有機化合物である。The hydrophilic group of the monomolecular film in the present invention is the general formula (
X and X' in I) include a hydroxyl group, a carboxyl group, a mercap-1 group, a thiocarboxyl group, a diguocarboxyl group, a sulfino group, a sulfo group, a carbamoyl group, an amino group, and a substituted 7 amino group. The monolayer-forming substance is an organic compound having two of these hydrophilic groups at both ends.
また前記一般式(I>のRとしては二価の鎖式飽和炭化
水素基、鎖式不飽和炭化水素基またはこれらの炭化水素
基の一部に1個または2個以上の)Tニレン基を含む炭
化水素基があげられる。Further, in the general formula (I>, R is a divalent chain-type saturated hydrocarbon group, a chain-type unsaturated hydrocarbon group, or one or more T-nylene groups in a part of these hydrocarbon groups). Examples include hydrocarbon groups containing
これらの化合物は1種のみを用いてもよいし、しし必要
があれば2種以上を混合して用いてもよ− 4”l)
=
、ノ
い。These compounds may be used alone or in combination of two or more if necessary.
= , no.
本発明の方法によれば両末端の親水・l!i. 、、1
% (バー)への一方を疎水′;ノ1保護基(−保護リ
イ)ことによ・)でラングミー1)7ーブ[−1ジエツ
ト法を用い′C単分子膜を形成する(二とが一Cきる。According to the method of the present invention, both ends are hydrophilic and l! i. ,,1
% (bar) with a hydrophobic group; One C goes off.
す4Tわら、−・方の親水・1〕1基を疎水=11基(
J変換してお(−」ば通常1[1いら11でいる両親媒
付物質と全く同等(、二扱うことかC′きる。4T straw, - Hydrophilic 1] 1 group Hydrophobic = 11 groups (
If you convert it to J (-'), it is exactly equivalent to the amphiphilic substance which is normally 1 [1 to 11 (, 2) or C'.
本発明で用いられろ両末端1こ胃<−iる親水・1〕1
基を右する物質は、両末端に同一の親水↑JI Jtを
11づ−る物質に比し一C、親水・11早の選択的4c
保訴か容易であるという’Pj tlを持つ。このため
に用いることのできる疎水性保護基として(」、、1・
・リアルキルシリル基、ジメチルイソプロピルシリル基
、ジメチル9−シXlリープチルシリル基のような1へ
リアルキルシリル基、ジヒド[−1ピラニル基等を含む
丁−デル系保護基、同じくエステル系(!護基、]ヘリ
ノl’l[l酢酸j′ミド等のような)7ミド系保護基
イにど一般にす1−機合成化学の分野で用いられるもの
のうら適切イ(ものを使えばよい、、これらの疎水・l
’l保護桔の選択にあた・)では式(T)の化合物の−
・1ノの親水1ノ1基のみが選択的に保護されること、
および親水性基(Aに単分子膜を作製した後に、表面の
疎水性保護基が脱保護されやすいことなどを考慮して選
択される。また疎水性保護基の導入方法としては直接一
方の親水性基を疎水性保護基に変換する方法であっても
、あるいは両方の親水性基を疎水性保護基に変換した後
、一方の保護基のみを脱保護する方法であってもよい。Both terminals used in the present invention 1 <-i hydrophilic 1> 1
The substance on the right of the group has the same hydrophilic ↑ JI Jt on both ends. Compared to the substance with 11
It has 'Pj tl that it is easy to indemnify. As a hydrophobic protecting group that can be used for this purpose ('', 1.
- Realkylsilyl group, dimethylisopropylsilyl group, 1-heralkylsilyl group such as dimethyl9-si !protecting group, ] helinol [l [l] acetic acid j' mido, etc.). ,,these hydrophobic・l
'l When selecting a protective box, -) is used for the compound of formula (T).
・Only one hydrophilic group of 1 is selectively protected,
and a hydrophilic group (selected in consideration of the fact that the hydrophobic protecting group on the surface is easily deprotected after forming a monomolecular film on A. Also, as a method of introducing the hydrophobic protecting group, directly one of the hydrophilic groups The method may be a method in which a hydrophilic group is converted into a hydrophobic protecting group, or a method in which both hydrophilic groups are converted into a hydrophobic protecting group and then only one of the protecting groups is deprotected.
このようにして一方の親水性基を疎水性保護基で保護し
た化合物を用い、水面上で単分子膜として配向させてラ
ングミコ−アープロジェット法によって親水性基材上に
写し取る。水面+ではその保護基がはずれないように、
水中の各種イオン濃度、水の温度、水面上での展開時間
などの諸条件を適切に選択する必要がある。さらに、水
中には、水面の単分子膜の塩を生成するような金属イオ
ンが含まれていてもよい。Using a compound in which one hydrophilic group is protected with a hydrophobic protecting group in this way, it is oriented as a monomolecular film on the water surface and transferred onto a hydrophilic substrate by the Langmico-Arplojet method. To prevent the protective group from being removed at the water surface,
It is necessary to appropriately select various conditions such as the concentration of various ions in water, the temperature of the water, and the time of development on the water surface. Furthermore, the water may contain metal ions that form a salt of a monomolecular film on the water surface.
得られる単分子膜は表面か疎水性保護基で保護されてい
るので適当に調整した試薬溶液の中に浸すか、適当な試
薬蒸気に曝すなどの方法によって遊離の親水性基とする
ことができる。Since the surface of the resulting monomolecular film is protected with a hydrophobic protecting group, it can be made into free hydrophilic groups by immersing it in an appropriately prepared reagent solution or by exposing it to an appropriate reagent vapor. .
[作 用1
両末端に異なる親水性基を有する有機化合物を原料とし
、保護基とぞの11;(保護条1′1を適切に選択する
ことにより、・y〕の親水1ノロJのみを保護した後、
ラングミニLアー−f[1シ[ツ1〜法によって、親水
性基材上に、表面に親水1)1阜を持たt!Iこ1(1
分子膜を作製することかできる。本発明の方法によると
片末端の親水↑/l !;4を角氷↑)1保H,1q4
にJ、り疎水化しておくため、水面上で単分子膜として
容易に配向させることができる。親木1ノロ、を材に写
し取った後の脱保護は、表面に[i的通りの親水4/U
基を設(プるための手段である1゜
[実施例]
次に本発明を実施例によつC説明する。[Action 1 Using an organic compound having different hydrophilic groups at both ends as a raw material, only the hydrophilic 1 NoroJ of the protective group 11; (by appropriately selecting the protective strip 1'1, y)] After protecting
By Lang Mini L-f[1] method, a hydrophilic substrate is coated with a hydrophilic layer on the surface. Iko1 (1
It is possible to create molecular membranes. According to the method of the present invention, one end is hydrophilic ↑/l! ; 4 with ice cubes ↑) 1 H, 1q4
Since J is made more hydrophobic, it can be easily oriented as a monomolecular film on the water surface. After copying the mother tree 1 thick onto the material, deprotection is performed on the surface [i.
EXAMPLES Next, the present invention will be explained with reference to examples.
実施例
16−ジしド日キシl\)号ア′カン(4111moJ
! )のテトラヒドロフラン(20mi2)溶液に2−
21H!のジメチルイソプI−1ビルシリルク1]リド
と2.2倍量のトリエチルアミンを加え、30分間50
℃で加熱した。O′Cに冷却後、ヘキサンを30m加え
、0℃のpH4,5の塩酸水溶液(3X 3M >で洗
浄し、続いて0℃の蒸留水(3X 30rdりで洗浄し
た。硫酸マグネシウムで乾燥後、溶媒を減圧で除去し、
16−(ジメチルイソプロピルシリルオキシ)ヘキサデ
カン酸を得た。この物質をクロロホルムに溶解して、蒸
留水上に展開し、表面圧を25dyn/Cm2に保ちつ
つ、石英基板上に写し取った。写し取ったままの基板表
面の表面エネルギーを液滴の接触角から計算すると、1
8erg/cm2であり、非常に疎水性が大きかった。Example 16 - Akan (4111moJ)
! ) in tetrahydrofuran (20mi2) solution with 2-
21H! of dimethylisoprop I-1 virsilyl chloride and 2.2 times the amount of triethylamine were added, and the
Heated at ℃. After cooling to O'C, 30 m of hexane was added and washed with an aqueous solution of hydrochloric acid (3X 3M) at pH 4,5 at 0 °C, followed by distilled water (3X 30 ml) at 0 °C. After drying over magnesium sulfate, The solvent was removed under reduced pressure;
16-(dimethylisopropylsilyloxy)hexadecanoic acid was obtained. This substance was dissolved in chloroform, spread on distilled water, and transferred onto a quartz substrate while maintaining the surface pressure at 25 dyn/Cm2. Calculating the surface energy of the surface of the substrate as it was copied from the contact angle of the droplet, it is 1
8erg/cm2, and was extremely hydrophobic.
続いてこの基板を酢酸−水(3: 1 )溶液に浸して
からよく水洗することにより基板上に16−ヒトロキシ
ヘキサデカン酸の単分子膜を得た。基板表面の表面エネ
ルギーは49erg/Cm2と大きく、高い親水性を示
した。この単分子膜の高い親水性は、室温で1週間放置
しておいても全く変化しなかった。Subsequently, this substrate was immersed in an acetic acid-water (3:1) solution and thoroughly washed with water to obtain a monomolecular film of 16-hydroxyhexadecanoic acid on the substrate. The surface energy of the substrate surface was as large as 49erg/Cm2, indicating high hydrophilicity. The high hydrophilicity of this monomolecular film did not change at all even after being left at room temperature for one week.
次に、この実施例で得られた16−シドロキシヘキサデ
カン酸が単分子膜として配向、吸着した石−〇 −
英基板上で、この単分子膜表面の親水性基(ここでは水
酸基)の反応性を利用した実験を行なった。Next, the 16-hydroxyhexadecanoic acid obtained in this example was oriented and adsorbed as a monolayer on a stone substrate, and the hydrophilic groups (here, hydroxyl groups) on the surface of this monolayer were reacted. We conducted an experiment using gender.
分子量約3000の重合体
0=C=N−CF2(C2F40)p−(CF20)q
−CF2−N=C=0(+):Q=1:1、各構造単位
は不規則である)をフレオンに溶解し、0.08重量%
の溶液を作製した。この溶液を水酸基が表面に設けられ
ている前記石英基板上に2500回/分の回転速度で回
転塗布し、100℃で焼成した後、フレオンで洗浄した
。Polymer 0=C=N-CF2(C2F40)p-(CF20)q with a molecular weight of about 3000
-CF2-N=C=0(+):Q=1:1, each structural unit is irregular) was dissolved in Freon, and 0.08% by weight
A solution was prepared. This solution was spin-coated onto the quartz substrate having hydroxyl groups on its surface at a rotation speed of 2500 times/min, baked at 100° C., and then washed with Freon.
得られた基板の表面エネルギーを重合体と接触させる前
と比較したところ、接触前の49から16erg/cm
2に大幅に減少していることがわかった。When the surface energy of the obtained substrate was compared with that before contacting with the polymer, it was found that it was 49 to 16 erg/cm before contact.
It was found that the number decreased significantly to 2.
もし水酸基とイソシアナート基が反応していなければ、
フレオンによる洗浄で重合体は単分子膜」−からはずれ
てしまうはずである。従って本発明の単分子膜上の親水
性基の反応性が有効にいかされ、単分子膜表面の水酸基
は重合体の末端のイソシアナ−1へ基と反応しているこ
とがわかる。If the hydroxyl group and isocyanate group do not react,
Washing with Freon should cause the polymer to separate from the monolayer. Therefore, it can be seen that the reactivity of the hydrophilic groups on the monomolecular film of the present invention is effectively utilized, and the hydroxyl groups on the surface of the monomolecular film react with the isocyanate-1 groups at the terminals of the polymer.
[発明の効果]
以上説明したように本発明の方法によって冑られる単分
子膜は親水性基をその表面に有しているので、親水・1
41基の反応性あるいは親水性そのものを利用して種々
の応用か期待される。[Effects of the Invention] As explained above, the monomolecular film removed by the method of the present invention has hydrophilic groups on its surface.
Various applications are expected by utilizing the reactivity or hydrophilicity of the 41 groups.
−11−’-11-'
Claims (1)
は炭素原子数が8以上の炭化水素基を示す) で示される1種または2種以上の有機化合物の一方の親
水性基を疎水性保護基に変換して後、ラングミュア−ブ
ロジエット法を用いて親水性基板上に配向制御して吸着
させる事を特徴とする単分子膜の製造方法。(1) General formula: X-R-X' (wherein, X and X' are different hydrophilic groups, R
represents a hydrocarbon group having 8 or more carbon atoms) After converting one hydrophilic group of one or more organic compounds represented by (representing a hydrocarbon group having 8 or more carbon atoms) into a hydrophobic protecting group, using the Langmuir-Blodget method. A method for producing a monomolecular film characterized by adsorption on a hydrophilic substrate while controlling orientation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61108844A JPS62266166A (en) | 1986-05-12 | 1986-05-12 | Preparation of monomolecular film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61108844A JPS62266166A (en) | 1986-05-12 | 1986-05-12 | Preparation of monomolecular film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62266166A true JPS62266166A (en) | 1987-11-18 |
Family
ID=14495013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61108844A Pending JPS62266166A (en) | 1986-05-12 | 1986-05-12 | Preparation of monomolecular film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62266166A (en) |
-
1986
- 1986-05-12 JP JP61108844A patent/JPS62266166A/en active Pending
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