JPS62265368A - Production of electrodeposition coating composition - Google Patents
Production of electrodeposition coating compositionInfo
- Publication number
- JPS62265368A JPS62265368A JP10830386A JP10830386A JPS62265368A JP S62265368 A JPS62265368 A JP S62265368A JP 10830386 A JP10830386 A JP 10830386A JP 10830386 A JP10830386 A JP 10830386A JP S62265368 A JPS62265368 A JP S62265368A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- organic polymer
- group
- imide
- molecular material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004070 electrodeposition Methods 0.000 title claims description 13
- 239000008199 coating composition Substances 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000002904 solvent Substances 0.000 claims abstract description 19
- 239000000839 emulsion Substances 0.000 claims abstract description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000005462 imide group Chemical group 0.000 claims abstract description 11
- 150000003949 imides Chemical class 0.000 claims abstract description 9
- 239000007788 liquid Substances 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 125000003368 amide group Chemical group 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 7
- 238000000576 coating method Methods 0.000 claims abstract description 7
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims abstract description 3
- 150000002576 ketones Chemical class 0.000 claims abstract 2
- 229920000620 organic polymer Polymers 0.000 claims description 22
- 239000002243 precursor Substances 0.000 claims description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 8
- 229920000642 polymer Polymers 0.000 description 16
- 239000002966 varnish Substances 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 229920005575 poly(amic acid) Polymers 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 4
- 238000005187 foaming Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000004962 Polyamide-imide Substances 0.000 description 3
- -1 nitrogen-containing compound Chemical class 0.000 description 3
- 229920002312 polyamide-imide Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000004963 Torlon Substances 0.000 description 2
- 229920003997 Torlon® Polymers 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000006798 ring closing metathesis reaction Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010011224 Cough Diseases 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- HTLZVHNRZJPSMI-UHFFFAOYSA-N N-ethylpiperidine Chemical compound CCN1CCCCC1 HTLZVHNRZJPSMI-UHFFFAOYSA-N 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000005576 amination reaction Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
産呈上皇且里公立
本発明は、マグネットワイヤー、各種電気、電子機器の
導電体の電気絶縁層を形成するのに適した新規な電着用
コーティング組成物の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a novel electrodeposition coating composition suitable for forming an electrically insulating layer of a magnet wire and a conductor of various electrical and electronic devices. .
従来の ′ネ一並びにンを すべき間 ウ従来、電着用
コーティング組成物として知られているものは、アクリ
ル系ポリマーを水あるいは水と有機溶剤との混合物に溶
解あるいは分散させたものがほとんどであり、もっばら
自動車、家電製品、建材等の表面塗装に使用されており
、電気絶縁用としては、限られた分野で使用されていた
にすぎなかった。電着用コーティング組成物の長所は、
膜厚の調整が電圧や電流の制御により容易にでき、しか
も穿孔部や凹凸のある部分でも均一な膜厚がコーティン
グできることにあるが、従来の電着用コーティング組成
物をより広汎な電気材料分野あるいは電子材料分野へ応
用する場合、耐熱性の点で問題があった。特に電子材料
分野ではハンダ工程が260〜350℃の温度で数分間
行われるところがほとんどであり、アクリル系の材料を
主体とした従来の電着用組成物では耐熱性の面で問題が
あった。Until now, most of the known electrodeposition coating compositions have been made by dissolving or dispersing an acrylic polymer in water or a mixture of water and an organic solvent. It was mostly used for surface coating of automobiles, home appliances, building materials, etc., and was only used in a limited number of fields for electrical insulation. The advantages of electrodeposition coating compositions are:
The film thickness can be easily adjusted by controlling voltage and current, and a uniform film thickness can be coated even on perforated areas and uneven areas. When applied to the field of electronic materials, there was a problem with heat resistance. Particularly in the field of electronic materials, most soldering processes are carried out at a temperature of 260 to 350° C. for several minutes, and conventional electrodeposition compositions mainly composed of acrylic materials have problems in terms of heat resistance.
一方、従来のアクリル系材料の耐熱性向上をはかったも
のとして特開昭49−21435.同49−21427
に記載されているようなポリアミック酸を有機溶剤にて
エマルジョン化し、電着ワニス化させたものがある。し
かし、ポリアミック酸を用いた場合には、最終的にはイ
ミド閉環を行わせる必要があり、該ワニスを厚膜につけ
た場合、ボリアミンク酸よりイミド環に移行する時に脱
水反応が伴うため、発泡する問題がある。また、咳ワニ
スのエマルジョン濃度もポリアミック酸ポリマーを使用
した場合、1!11%以下でしか安定なエマルジョン形
成ができない問題もあった。On the other hand, Japanese Patent Application Laid-Open No. 49-21435 is an attempt to improve the heat resistance of conventional acrylic materials. 49-21427
There is an electrodeposited varnish made by emulsifying polyamic acid with an organic solvent as described in . However, when polyamic acid is used, it is necessary to finally perform imide ring closure, and when the varnish is applied to a thick film, a dehydration reaction occurs when the polyamic acid transfers to the imide ring, resulting in foaming. There's a problem. In addition, when a polyamic acid polymer is used in the emulsion concentration of cough varnish, there is a problem that a stable emulsion can only be formed at an emulsion concentration of 1.11% or less.
発明者等は、従来、ポリアミック酸タイプのポリマーを
エマルジョン化したいわゆる非水分エマルジョンワニス
に見られた上記のような欠点を解消すべく検討した結果
、意外にも、完全に閉環したイミド環のみを有するポリ
マー又はポリアミド基のみを有するポリマーあるいはこ
れらの基を両方とも有するポリマーに於いても、これら
ポリマーを溶解する溶剤と溶解しない非溶剤を用いて調
整したエマルジョン組成物でも、電着可能であり、しか
も従来より高濃度で安定なエマルジョンが得られること
を見出して本発明を完成した。The inventors investigated in order to eliminate the above-mentioned drawbacks of so-called non-water emulsion varnishes that were conventionally emulsified with polyamic acid type polymers, and surprisingly, they discovered that they were able to create a completely closed imide ring. It is possible to electrodeposit a polymer having only a polyamide group, a polymer having only a polyamide group, or a polymer having both of these groups, even with an emulsion composition prepared using a solvent that dissolves these polymers and a non-solvent that does not dissolve these polymers. Furthermore, the present invention was completed by discovering that a more concentrated and stable emulsion than conventional emulsions could be obtained.
。 占を”° るための
本発明は、イミド前駆体を含まず、閉環したイミド基を
有する有機高分子、アミド基を存する有機高分子、およ
びイミド前駆体を含まず、閉環したイミド基とアミド基
とを有するlir機高分子からなる群から選ばれた少な
くとも1種を溶剤に溶解した後、前記有機高分子に対し
て非溶剤性の液体中に上記の有機高分子溶液を滴下混合
してエマルジョンを形成することを特徴とする電着用コ
ーティング組成物の製造方法を提供しようとするもので
ある。. The present invention is directed to an organic polymer that does not contain an imide precursor and has a ring-closed imide group, an organic polymer that has an amide group, and an organic polymer that does not contain an imide precursor and has a ring-closed imide group and an amide group. After dissolving at least one selected from the group consisting of lir polymers having a group of It is an object of the present invention to provide a method for producing an electrodeposition coating composition, which is characterized by forming an emulsion.
昨月」じ8ζ肱栗
上記の有機高分子溶液を該有機高分子に対して非溶剤性
の液体中に滴下混合することにより、予想外に安定なエ
マルジョンが形成される。該エマルジョンは、!着用コ
ーティング組成物として使用可能であり、しかもそれを
使用して厚膜にコーティングしても溶剤の蒸発のみでイ
ミド閉環に伴う脱水反応が生じない。このため、発泡が
なく良好な外観を有する塗膜が得られる。By dropwise mixing the above organic polymer solution into a liquid that is a non-solvent for the organic polymer, an unexpectedly stable emulsion is formed. The emulsion is! It can be used as a wearable coating composition, and even when it is used to coat a thick film, only the solvent evaporates and no dehydration reaction occurs due to imide ring closure. Therefore, a coating film with good appearance without foaming can be obtained.
本発明においては、
(1)、イミド前駆体を含まず、閉環したイミド基を有
する有機高分子、
(2)、アミド基を有する有機高分子、および′(3)
、イミド前駆体を含まず、閉環したイミド基とアミド2
にとを有する有機高分子イミド前駆体、などの有機高分
子が使用対象となり、これらのうちの少なくとも1種を
単独使用してもよく、あるいはまた、これらのうちの少
なくとも2種以上を併用してもよい。In the present invention, (1) an organic polymer that does not contain an imide precursor and has a ring-closed imide group, (2) an organic polymer that has an amide group, and '(3)
, does not contain an imide precursor, has a ring-closed imide group and amide 2
Organic polymers such as organic polymer imide precursors having nitrogen can be used, and at least one of these may be used alone, or at least two or more of these may be used in combination. You can.
上記(1)〜(3)の有機高分子の例を下記に示す。Examples of the organic polymers (1) to (3) above are shown below.
例1:下記構造(1)を有するポリアミドイミドポリマ
ー(Torlon 4001T : 三菱化成社製)
例2:下記構造(2)を有する芳香族ポリアミドポリマ
ー(ATC: 三菱製紙社製)
ポリマー(ULTE門 #100: GE社、!り(
PI−2080: llpjohn社製)上記の式(
1) 、(2) 、(3) 、および(4)において、
R1は、
などであり、R4は、
などである。Example 1: Polyamide-imide polymer having the following structure (1) (Torlon 4001T: manufactured by Mitsubishi Kasei Corporation)
Example 2: Aromatic polyamide polymer having the following structure (2) (ATC: manufactured by Mitsubishi Paper Mills) Polymer (ULTE #100: GE,!
PI-2080: manufactured by llpjohn) The above formula (
In 1), (2), (3), and (4),
R1 is, etc., and R4 is, etc.
本発明においては、上記の有機高分子を溶解する溶剤の
例としては、N−メチル−2−ピロリドン、N、N’−
ジメチルホルムアミド、ジメチルアセトアミド、ジメチ
ルスルホキシド等の極性溶媒あるいはこの混合物が挙げ
られる。In the present invention, examples of the solvent that dissolves the organic polymer include N-methyl-2-pyrrolidone, N,N'-
Examples include polar solvents such as dimethylformamide, dimethylacetamide, dimethylsulfoxide, and mixtures thereof.
又、上記のwa高分子に対して非溶剤である液体として
は、ケトン系の溶剤が適当であり、例えば、アセトン、
メチルエチルケトン、ジエチルケトン、シクロヘキサノ
ン、メチルイソブチルケトンが挙げられる。In addition, as a liquid that is a non-solvent for the above-mentioned wa polymer, ketone-based solvents are suitable, such as acetone,
Examples include methyl ethyl ketone, diethyl ketone, cyclohexanone, and methyl isobutyl ketone.
本発明においては、ポリアミック酸ポリマーのアミン化
に必要であった含チッ素化合物は、必ずしも必須ではな
いが、使用する有機高分子材料によっては、添加した方
が電着樹脂の化学当量が大きくなるものもあるので好ま
しい。上記の含チン素化合物としては、たとえばトリメ
チルアミン、トリエチルアミン、トリn−プロピルアミ
ン、トリn−ブチルアミン、ピリジン、N−エチルピペ
リジン等が挙げられる。In the present invention, the nitrogen-containing compound required for amination of the polyamic acid polymer is not necessarily essential, but depending on the organic polymer material used, adding it will increase the chemical equivalent of the electrodeposited resin. It is preferable because there are some things. Examples of the above-mentioned tinine-containing compounds include trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, and N-ethylpiperidine.
上記の有機高分子に対する溶剤と非溶剤の使用比により
、生成するエマルジョンの安定性が異なる傾向にあり、
特にその重量比(溶剤/非溶剤)が20/80〜501
50の範囲で調整するのが好ましい。The stability of the emulsion produced tends to vary depending on the ratio of solvent and nonsolvent used for the above organic polymer.
In particular, the weight ratio (solvent/non-solvent) is 20/80 to 501.
It is preferable to adjust within a range of 50.
含チッ素化合物は、それを使用する場合、上記の溶剤1
00重量部に対して0.5〜3.0重量部添加するのが
好ましい。When using a nitrogen-containing compound, use the above solvent 1.
It is preferable to add 0.5 to 3.0 parts by weight per 00 parts by weight.
本発明の組成物は、銅、アルミニウム板、鉄、ステンレ
ス、ニラケンあるいはこれらの合金を陽極として電着し
、加熱硬化させた場合、従来の電着ワニスを使用した場
合と比較して良好な皮膜が得られ、且つ厚膜でも発泡の
程度の少ない良好な塗膜が形成される。When the composition of the present invention is electrodeposited using copper, aluminum plate, iron, stainless steel, Niraken, or an alloy thereof as an anode and cured by heating, it forms a better film than when using conventional electrodeposited varnish. is obtained, and a good coating film with a small degree of foaming is formed even if it is a thick film.
る。Ru.
実施例 1
芳香族ポリアミドイミドポリマー、Torlon400
1T (三菱化成社製’)100gをN−メチル−2
−ピロリドン1900gに溶解し、5重量%のポリマー
/8液を得た後、アセトン2000g中にこの溶液を滴
下し、濃度2.5重量%のエマルジョン組成物を得た。Example 1 Aromatic polyamideimide polymer, Torlon 400
1T (manufactured by Mitsubishi Kasei Corporation) 100g N-methyl-2
- After dissolving in 1900 g of pyrrolidone to obtain a 5% by weight polymer/8 solution, this solution was dropped into 2000 g of acetone to obtain an emulsion composition having a concentration of 2.5% by weight.
片面をマスキングした1、511ffのアルミニウム板
を陽極として150Vの電圧を印加し、40秒荷電後、
120℃で30分、ついで200℃で30分乾燥し、絶
縁アルミニウム板を得た。発泡もなく外観良好な塗膜が
得られた。A voltage of 150V was applied using a 1,511ff aluminum plate with one side masked as an anode, and after charging for 40 seconds,
It was dried at 120°C for 30 minutes and then at 200°C for 30 minutes to obtain an insulating aluminum plate. A coating film with good appearance and no foaming was obtained.
実施例、2
ポリエーテルイミドULTEMI O00(GE社製)
100gをN−メチル−2−ピロリドン1900gに?
3解後、4000gのアセトン中にこのン容ン夜を滴下
し、1.6重世%の電着ワニスを得た。実施例1と同様
の条件で電着し、絶縁アルミニウム板を得た。Example 2 Polyetherimide ULTEMI O00 (manufactured by GE)
100g to 1900g of N-methyl-2-pyrrolidone?
After 3 solutions, the solution was dropped into 4000 g of acetone to obtain an electrodeposited varnish with a concentration of 1.6%. Electrodeposition was performed under the same conditions as in Example 1 to obtain an insulating aluminum plate.
実施例 3
芳香族ポリアミドポリマーATU (三菱紙製)100
gをN−メチル−2−ピロリドン1900gに溶かし、
アセトン3000ccに滴下し、電着ワニスを得た。ア
ルミニウム板電圧250■で40秒の電着後、120℃
×30分、200℃×30分乾燥し外観良好な絶縁アル
ミニウム板を得た。Example 3 Aromatic polyamide polymer ATU (manufactured by Mitsubishi Paper) 100
Dissolve g in 1900 g of N-methyl-2-pyrrolidone,
It was dropped into 3000 cc of acetone to obtain an electrodeposition varnish. After electrodeposition on aluminum plate for 40 seconds at a voltage of 250μ, 120℃
After drying at 200° C. for 30 minutes and 30 minutes at 200° C., an insulating aluminum plate with a good appearance was obtained.
比較例 l
ポリアミドイミド(DuPont社 Pyre !IL
)100gをN−メチル−2−ピロリドン620gで
希釈後、アセトン1410gにトリエチルアミン4gを
入れ撹拌しながら上液ポリイミドワニスを滴下して電着
ワニスを得た。Comparative Example l Polyamideimide (DuPont Pyre!IL
) was diluted with 620 g of N-methyl-2-pyrrolidone, 4 g of triethylamine was added to 1410 g of acetone, and the upper liquid polyimide varnish was added dropwise with stirring to obtain an electrodeposited varnish.
150Vの電圧で40秒アルミニウム板に電着した後、
160℃X20分、200℃×120分乾燥後、絶縁ア
ルミ板を得た。After electrodeposition on an aluminum plate for 40 seconds at a voltage of 150V,
After drying at 160°C for 20 minutes and at 200°C for 120 minutes, an insulating aluminum plate was obtained.
このワニスの場合、塗膜厚が20μ鋼以上になると、?
it@後におて皮膜がズレるため外観が悪くなる傾向が
顕著となった。In the case of this varnish, what happens when the coating thickness is 20μ or more?
After it@, there was a noticeable tendency for the film to shift and the appearance to deteriorate.
付図は、上記の各実施例、並びに比較例で得た電着ワニ
スの膜厚に対する絶縁破壊電圧を示したものである。な
お、比較例1で得たワニスは、上The attached figure shows the dielectric breakdown voltage with respect to the film thickness of the electrodeposited varnishes obtained in each of the above-mentioned Examples and Comparative Examples. The varnish obtained in Comparative Example 1 was
付図は、上記の各実施例、並びに比較例で得た電着ワニ
スの膜厚に対する絶縁破壊電圧を示したものである。The attached figure shows the dielectric breakdown voltage with respect to the film thickness of the electrodeposited varnishes obtained in each of the above-mentioned Examples and Comparative Examples.
Claims (1)
有機高分子、アミド基を有する有機高分子、およびイミ
ド前駆体を含まず、閉環したイミド基とアミド基とを有
する有機高分子からなる群から選ばれた少なくとも1種
を溶剤に溶解した後、前記有機高分子に対して非溶剤性
の液体中に上記の有機高分子溶液を滴下混合してエマル
ジョンを形成することを特徴とする電着用コーティング
組成物の製造方法。 2、非溶剤性の液体中に上記の有機高分子溶液を滴下混
合するに先立ち、該有機高分子溶液として含チッ素塩基
を含有するものを用いる特許請求の範囲第1項に記載の
電着用コーティング組成物の製造方法。 3、有機高分子の溶剤として、N−メチル−2−ピロリ
ドン、N,N′−ジメチルホルムアミド、ジメチルスル
ホキシド、またはジメチルアセトアミドを用いる特許請
求の範囲第1項または第2項に記載の電着用コーティン
グ組成物の製造方法。 4、非溶剤性の液体として、ケトン類を用いる特許請求
の範囲第1項または第3項に記載の電着用コーティング
組成物の製造方法。[Claims] 1. An organic polymer that does not contain an imide precursor and has a ring-closed imide group, an organic polymer that has an amide group, and an organic polymer that does not contain an imide precursor and has a ring-closed imide group and an amide group. After dissolving at least one selected from the group consisting of organic polymers in a solvent, the above organic polymer solution is mixed dropwise into a liquid that is a non-solvent for the organic polymer to form an emulsion. A method for producing an electrodeposition coating composition, characterized in that: 2. Electrode deposition according to claim 1, in which the organic polymer solution containing a nitrogen-containing base is used before dropwise mixing the organic polymer solution into a non-solvent liquid. Method for manufacturing coating composition. 3. Electrodeposition coating according to claim 1 or 2, in which N-methyl-2-pyrrolidone, N,N'-dimethylformamide, dimethyl sulfoxide, or dimethylacetamide is used as a solvent for the organic polymer. Method for manufacturing the composition. 4. A method for producing a coating composition for electrodeposition according to claim 1 or 3, in which ketones are used as the non-solvent liquid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10830386A JPS62265368A (en) | 1986-05-12 | 1986-05-12 | Production of electrodeposition coating composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10830386A JPS62265368A (en) | 1986-05-12 | 1986-05-12 | Production of electrodeposition coating composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62265368A true JPS62265368A (en) | 1987-11-18 |
Family
ID=14481274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10830386A Pending JPS62265368A (en) | 1986-05-12 | 1986-05-12 | Production of electrodeposition coating composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62265368A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0412407A (en) * | 1990-04-27 | 1992-01-17 | Mitsubishi Cable Ind Ltd | Flat insulated wire |
-
1986
- 1986-05-12 JP JP10830386A patent/JPS62265368A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0412407A (en) * | 1990-04-27 | 1992-01-17 | Mitsubishi Cable Ind Ltd | Flat insulated wire |
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