JPH0412407A - Flat insulated wire - Google Patents
Flat insulated wireInfo
- Publication number
- JPH0412407A JPH0412407A JP2114549A JP11454990A JPH0412407A JP H0412407 A JPH0412407 A JP H0412407A JP 2114549 A JP2114549 A JP 2114549A JP 11454990 A JP11454990 A JP 11454990A JP H0412407 A JPH0412407 A JP H0412407A
- Authority
- JP
- Japan
- Prior art keywords
- insulating layer
- varnish
- thickness
- insulated wire
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002966 varnish Substances 0.000 claims abstract description 31
- 239000004020 conductor Substances 0.000 claims abstract description 26
- 229920000642 polymer Polymers 0.000 claims abstract description 19
- 239000000839 emulsion Substances 0.000 claims abstract description 16
- 125000005462 imide group Chemical group 0.000 claims abstract description 7
- 238000004070 electrodeposition Methods 0.000 claims description 19
- 150000003949 imides Chemical class 0.000 claims description 5
- 238000006798 ring closing metathesis reaction Methods 0.000 claims description 5
- 150000001408 amides Chemical class 0.000 claims description 4
- 238000009413 insulation Methods 0.000 abstract description 5
- 125000003368 amide group Chemical group 0.000 abstract description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000001035 drying Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 239000004962 Polyamide-imide Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 229920002312 polyamide-imide Polymers 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000004963 Torlon Substances 0.000 description 2
- 229920003997 Torlon® Polymers 0.000 description 2
- 229920004738 ULTEM® Polymers 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- -1 nitrogen-containing compound Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Insulated Conductors (AREA)
- Paints Or Removers (AREA)
- Organic Insulating Materials (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、超薄膜の耐熱性絶縁層を有する平角状絶縁電
線に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a rectangular insulated wire having an ultra-thin heat-resistant insulating layer.
従来の技術及び課題
従来、平角状絶縁電線における絶縁層の薄膜化の限界は
lOμ■程度であった。これは、予め目的厚さ等に形成
した平角状導体にワニスを塗布する方式では、その塗布
時や焼付時におけるワニスの流動で平角状導体のコーナ
一部に必要厚の絶縁層が形成されないためであり他方、
絶縁層を付与した丸形等の導体を圧延処理する方式では
、絶縁層の残留応力で耐電圧性や耐ヒートシヨツク性等
が低下し、絶縁層にヒビ割れ等が発生して実用に耐えな
いものとなるためである。BACKGROUND TECHNOLOGY AND PROBLEMS Conventionally, the limit for reducing the thickness of an insulating layer in rectangular insulated wires has been approximately 10μ. This is because in the method of applying varnish to a rectangular conductor that has been formed to the desired thickness in advance, an insulating layer of the required thickness cannot be formed at some of the corners of the rectangular conductor due to the flow of the varnish during application and baking. On the other hand,
In the method of rolling a round conductor with an insulating layer, the voltage resistance and heat shock resistance decrease due to residual stress in the insulating layer, and cracks occur in the insulating layer, making it unusable. It is to become something.
しかし、電気機器の軽量小型化の進展にf’lい平角状
絶縁電線の更なる薄型化が要求されており、そのため絶
縁層の超薄膜化が課題となっている。However, as electric equipment becomes lighter and smaller, there is a demand for thinner rectangular insulated wires, and therefore, making the insulating layer ultra-thin is a challenge.
かつその場合に、超薄膜におけるl(熱特11−の(i
頼11を確保ずべ(、耐熱性に優れる絶縁層であること
も課題となっている。And in that case, the (i
It is also a challenge to ensure that the insulation layer has excellent heat resistance.
課題を解決するだめの手段
本発明者らは、特殊な耐熱性ポリマー系のエマルジョン
型電着ワニスの焼付層により超薄膜化を達成できて前記
の課題を克服できることを見出し、本発明をなすに至っ
た。Means for Solving the Problems The present inventors have discovered that the above-mentioned problems can be overcome by achieving an ultra-thin film by using a baked layer of an emulsion-type electrodeposited varnish made of a special heat-resistant polymer. It's arrived.
すなわち本発明は、平角状導体の周囲に、イミド系又は
アミド系のポリマーを成分とするエマルジョン型電着ワ
ニスの焼付層からなる厚さが5μm以下の耐熱性絶縁層
を有することを特徴とする特角状絶縁電線を提供するも
のである。That is, the present invention is characterized in that the rectangular conductor is surrounded by a heat-resistant insulating layer having a thickness of 5 μm or less and made of a baked layer of an emulsion-type electrodeposited varnish containing an imide-based or amide-based polymer as a component. The present invention provides a special square insulated wire.
作用及び効果
イミド系又はアミド系のポリマーをエマルジョンとして
含有する電着ワニスの焼付方式により、予め目的の厚さ
とした平角状導体のコーナ一部に対しても充分な厚さの
超薄膜型絶縁層を形成することができ、かつ耐熱性に優
れる、通例180ないし200℃以上の耐熱性を有する
超薄膜型の絶縁層を形成することができる。さらに、形
成された耐熱性絶縁層は、ピンホール数(JIS C3
003)が100個/m以下、通例70個/m以下と少
なく、絶縁性にも優れている。Functions and Effects By baking an electrodeposited varnish containing an emulsion of imide-based or amide-based polymers, an ultra-thin insulating layer with a sufficient thickness can be created even on a part of the corner of a rectangular conductor that has been pre-prepared to the desired thickness. It is possible to form an ultra-thin insulating layer which has excellent heat resistance, typically having heat resistance of 180 to 200° C. or higher. Furthermore, the formed heat-resistant insulating layer has a pinhole count (JIS C3
003) is as low as 100 pieces/m or less, usually 70 pieces/m or less, and has excellent insulation properties.
発明の構成要素の例示 第1図に本発明の平角状絶縁電線を例示した。Illustration of the components of the invention FIG. 1 illustrates the rectangular insulated wire of the present invention.
1が耐熱性絶縁層、2が平角状導体、21が平坦部、2
2がコーナ一部である。1 is a heat-resistant insulating layer, 2 is a rectangular conductor, 21 is a flat part, 2
2 is a part of the corner.
本発明においては、限定するものでないがその目的より
、極薄の平角状導体が好ましく用いられる。その例とし
ては、厚さが800μm以下、就中500IIm以下、
特にlO〜200叩で、幅が100μm〜10鵬程度の
ものがあげられる。アスペクト比は1/3〜1/100
程度が一般的である。平角状導体の材質としては導電性
の良好なものであればよい。その例としては通常の電気
銅、銅合金、アルミニウム、銅クラツドアルミニウムな
どがあげられる。In the present invention, although not limited thereto, an ultra-thin rectangular conductor is preferably used due to its purpose. As an example, the thickness is 800 μm or less, especially 500 IIm or less,
In particular, those having a width of about 100 μm to 10 μm and a thickness of 10 to 200 μm are mentioned. Aspect ratio is 1/3 to 1/100
The degree is common. The rectangular conductor may be made of any material as long as it has good conductivity. Examples include common electrolytic copper, copper alloys, aluminum, copper-clad aluminum, etc.
平角状導体の周囲に設けられる耐熱性絶縁層はイミド系
又はアミド系のポリマーを成分とするエマルジョン型電
着ワニスの焼付層として形成される。かかるエマルジョ
ン型電着ワニスの使用により目的とする超薄膜化が達成
される。形成する耐熱性絶縁層の厚さは5μm以下、就
中0.5〜4.0μm1特に0.8〜3.0μ−であ・
る。前記の電着方式においては、平角状導体のコーナ一
部(22)における厚さが平坦部(21)のそれよりも
厚(なる傾向にある。これは、コーナ一部に電界が集中
しやすいことより絶縁特性に有利に作用するが、その場
合において前記した耐熱性絶縁層の厚さは平角状導体の
平坦部(21)に基づく。なお、前記コーナ一部におけ
る耐熱性絶縁層の厚さは、平坦部のそれの通常1.05
〜IO倍程度である。The heat-resistant insulating layer provided around the rectangular conductor is formed as a baked layer of an emulsion-type electrodeposition varnish containing an imide-based or amide-based polymer as a component. By using such an emulsion type electrodeposition varnish, the desired ultra-thin film can be achieved. The thickness of the heat-resistant insulating layer to be formed is 5 μm or less, particularly 0.5 to 4.0 μm, especially 0.8 to 3.0 μm.
Ru. In the above-mentioned electrodeposition method, the thickness at the corner part (22) of the rectangular conductor tends to be thicker than that at the flat part (21). This is because the electric field tends to concentrate at the corner part. In this case, the thickness of the heat-resistant insulating layer mentioned above is based on the flat part (21) of the rectangular conductor.In addition, the thickness of the heat-resistant insulating layer at the corner part is usually 1.05 of that in the flat area.
~about IO times.
本発明の平角状絶縁電線の製造は例えば、平角状導体上
にエマルジョン型電着ワニスからなる所定厚さの層を形
成し、その電着層を焼付処理することにより行うことが
できる。第2図にその工程例を示した。この製造工程で
は、まず直流電源(図示せず)の陽極側に接続した平角
状導体3を電着バス4に導入する。電着バス4内には、
所定のエマルジョン型電着ワニス5が充填されており、
円筒状の陰極6が配置されている。平角状導体3が円筒
状の陰極6内を通過する間に、電位差に基づいて電着ワ
ニス中のポリマー粒子が付着し、電着層が形成される。The rectangular insulated wire of the present invention can be manufactured, for example, by forming a layer of a predetermined thickness of emulsion-type electrodeposited varnish on a rectangular conductor, and then baking the electrodeposited layer. Figure 2 shows an example of the process. In this manufacturing process, first, a rectangular conductor 3 connected to the anode side of a DC power source (not shown) is introduced into an electrodeposited bus 4. Inside the electroplated bus 4,
A predetermined emulsion type electrodeposition varnish 5 is filled,
A cylindrical cathode 6 is arranged. While the rectangular conductor 3 passes through the cylindrical cathode 6, polymer particles in the electrodeposition varnish adhere to it based on the potential difference, forming an electrodeposition layer.
その際、好ましく用いうるエマルジョン型電着ワニスは
、閉環率が90%以上のイミド基を有するポリマー、ア
ミド基を有するポリマー、閉環率が90%以上のイミド
基とアミド基を有するポリマーの1種又は2種以上を溶
剤に溶解させ、その溶液をポリマー不溶性の分散媒中に
滴下方式等により添加し.エマルジョンとしたものであ
る。前記した閉環率が90%以上のイミド基を有するポ
リマーとは、下記の弐[1で表されるアミド酸基からな
る構造単位の90%以上が式[11]で表されるイミド
基構造に変化したものである。閉環率が90%以−トの
イミド基を有するポリマーの使用により、形成+1i着
層の焼付時におけるアミド酸基の閉環反応に伴う脱水を
低減でき、ピンポール等の原因となる発泡を防止、ない
し抑制することができろ。In this case, the emulsion type electrodeposition varnish that can be preferably used is one of the following: a polymer having an imide group with a ring closure rate of 90% or more, a polymer having an amide group, and a polymer having an imide group and an amide group with a ring closure rate of 90% or more. Alternatively, two or more species are dissolved in a solvent, and the solution is added to a polymer-insoluble dispersion medium by a dropwise method or the like. It is made into an emulsion. The aforementioned polymer having an imide group with a ring closure rate of 90% or more refers to a polymer in which 90% or more of the structural units consisting of amic acid groups represented by the following 2 [1] have an imide group structure represented by the formula [11]. It has changed. By using a polymer containing imide groups with a ring closure rate of 90% or more, it is possible to reduce dehydration associated with the ring closure reaction of the amic acid group during the baking of the formation + 1i adhesion layer, and to prevent foaming that causes pinholes, etc. Be able to suppress it.
[3[nl 前記したポリマーの例としては次のものがあげられる。[3[nl Examples of the above-mentioned polymers include the following.
(1)次式の構造を有するポリアミドイミド(例えば商
品名: Torlon 400(IT ;三菱製紙社製
)。(1) Polyamideimide having the structure of the following formula (for example, trade name: Torlon 400 (IT; manufactured by Mitsubishi Paper Mills).
(2)次式の構造を有する芳香族ポリアミド(例えば商
品名: ATC、三菱製紙社製)。(2) Aromatic polyamide having the structure of the following formula (for example, trade name: ATC, manufactured by Mitsubishi Paper Mills).
(3)次式の構造を有するポリエーテルイミド(例えば
商品名 ULTEM 11000 : G E社製)。(3) Polyetherimide having the structure of the following formula (for example, trade name ULTEM 11000: manufactured by GE).
(4〉次式の構造を有するポリイミド(例えばボッイミ
ドHUpjohn社製)。(4) Polyimide having a structure of the following formula (for example, manufactured by Boimide HUpjohn).
ただし、上記した式(1)、(2〉、(3)、(4)に
おいて、R1は、
とである。R2、R:lは
である。R4は
ポリマーを溶解させるための溶剤としては、Nメチル−
2−ピロリドン、N、N−ジメチルホルムアミド、ジメ
チルスルホキシド、ジメチルアセトアミドなどの極性溶
剤、ないしその混合溶剤があげられる。However, in the above formulas (1), (2>, (3), and (4), R1 is as follows. R2, R:l is. R4 is a solvent for dissolving the polymer, and N-methyl-
Examples include polar solvents such as 2-pyrrolidone, N,N-dimethylformamide, dimethylsulfoxide, and dimethylacetamide, or mixed solvents thereof.
ポリマー不溶性の分散媒としては、アセトン、メヂルエ
ヂルケトン、ジエチルケトン、シクロヘキサノン、メチ
ルイソブチルケトンなどのケトン類が好ましく用いられ
る。As the polymer-insoluble dispersion medium, ketones such as acetone, methyl edyl ketone, diethyl ketone, cyclohexanone, and methyl isobutyl ketone are preferably used.
溶剤と分散媒の使用割合は、調製エマルジョンの安定性
の点より前者/後者の重量比で10./90〜5015
0が適当である。From the viewpoint of stability of the prepared emulsion, the ratio of the solvent to the dispersion medium to be used is set at a weight ratio of 10. /90~5015
0 is appropriate.
エマルジョンの調製に際しては、電着ポリマーの化学当
量を上げるべく、例えばトリメチルアミン、トリエチル
アミン、トリn−プロピルアミン、トリn−ブチルアミ
ン、ピリジン、N−エヂルピペリシンなどの窒素含有化
合物を必要に応じ添加してもよい。その添加量は、溶剤
100重量部あたり0.5〜3重量部が通例である。な
お窒素含有化合物は、ポリマー溶液側に添加することが
好ましい。When preparing the emulsion, nitrogen-containing compounds such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, and N-edylpipericine may be added as necessary to increase the chemical equivalent of the electrodeposited polymer. good. The amount added is usually 0.5 to 3 parts by weight per 100 parts by weight of the solvent. Note that the nitrogen-containing compound is preferably added to the polymer solution side.
調製するエマルジョン型電着ワニスの濃度は0.1〜I
O重量%、就中0.3〜5重量%が適当である。The concentration of the emulsion type electrodeposition varnish to be prepared is 0.1 to I
O content of 0.3 to 5% by weight is suitable.
その濃度が0.1重量%未満ではピンホールが増加して
絶縁性に乏しい場合があり、10重量%を超えると良好
な超薄膜を形成し難くなる。またエマルジョンにおける
粒子の大きさは通常1μm以下、好ましくは0 、5p
m以下程度であり、大きすぎると超薄膜形成性に乏しく
なる。If the concentration is less than 0.1% by weight, pinholes may increase and the insulation may be poor, and if it exceeds 10% by weight, it becomes difficult to form a good ultra-thin film. In addition, the particle size in the emulsion is usually 1 μm or less, preferably 0.5p
m or less; if it is too large, the ability to form an ultra-thin film will be poor.
電着条件としては例えば、直流電圧:5〜100V1就
中7〜70V1電着時間・0.01〜30秒間、就中0
.03〜15秒間、ワニス温度、5〜40℃、就中lO
〜35℃などがあげられる。課電に際しては直流電圧に
加えて交流電圧を重畳させることもできる。Electrodeposition conditions include, for example, DC voltage: 5 to 100V, 7 to 70V, electrodeposition time: 0.01 to 30 seconds, 0.
.. 03-15 seconds, varnish temperature 5-40°C, especially lO
~35℃, etc. When charging, an alternating current voltage can be superimposed in addition to the direct current voltage.
電着バス4の出口には必要に応じて、例えばエアーワイ
パ、ローラーワイパ等のワイピング装置を設けて電着ワ
ニスの過分量を除去してもよい。If necessary, a wiping device such as an air wiper or a roller wiper may be provided at the exit of the electrodeposition bath 4 to remove an excess amount of the electrodeposition varnish.
これにより、焼付時に一層発泡し難くすることができ、
例えば50m/分以上の高速作業をよりスムーズに行う
ことができる。This makes it even more difficult to foam during baking.
For example, high-speed work of 50 m/min or more can be performed more smoothly.
電着バス4を通過した平角状導体は、次に焼付装置7に
導入される。焼付温度はj角常、200〜700°C1
就中250〜600℃である。焼付時に発泡等が生じや
すい場合などには、焼付処理の前工程に乾燥工程を設け
、乾燥処理と一工程で行う方式などもとりつる。その場
合には通常、処理温度が乾燥処理と焼付処理に適合する
よう温度変化させた焼付装置などが用いられる。乾燥温
度は使用溶剤等により適宜に決定されるが、一般には6
0〜300℃、就中100〜250℃とされる。The rectangular conductor that has passed through the electrodeposition bath 4 is then introduced into a printing device 7. Baking temperature is J angle, 200-700°C1
Among them, the temperature is 250 to 600°C. If foaming or the like is likely to occur during baking, a drying process may be provided as a pre-baking process to perform the drying process in one process. In that case, a baking device or the like is usually used in which the processing temperature is changed to suit the drying process and the baking process. The drying temperature is determined appropriately depending on the solvent used, etc., but is generally 6.
The temperature is 0 to 300°C, particularly 100 to 250°C.
なお第2図中の9は、形成された平角状絶縁型1i18
の巻取り機である。Note that 9 in FIG. 2 indicates the rectangular insulating type 1i18 formed.
This is a winding machine.
本発明の平角状絶縁電線には、それがコイルに巻かれる
場合の作業を助けるため自己融着11の層を耐熱性絶縁
層の上に設けてもよい。自己融着11の層は、電着ワニ
ス層が半硬化状態にある段階において設けることもでき
る。なお自己融着11の層は、絶縁性を有さなくてもよ
く、厚さも均一である必要はないので浸漬塗布方式など
の塗装方式で形成してもよく、フェルトなどでワニス絞
りを施してもよい。The rectangular insulated wire of the present invention may be provided with a layer of self-bonding 11 on top of the heat resistant insulating layer to aid in the operation when it is wound into a coil. The layer of self-fusion 11 can also be provided when the electrodeposited varnish layer is in a semi-cured state. Note that the layer of self-fusion 11 does not need to have insulation properties and does not need to have a uniform thickness, so it may be formed by a coating method such as a dip coating method, or by applying varnish drawing with felt or the like. Good too.
参考例1
芳香族ポリアミドイミド(Torlon 4000T)
100部(重量部、以下同じ〉をN−メチル−2−ピ
ロッドン1900部に溶解させ、得られた溶液をアセト
ン2000部中に滴下して、濃度2.5重量%のエマル
ジョンからなる電着ワニスを得た。Reference example 1 Aromatic polyamideimide (Torlon 4000T)
100 parts by weight (the same applies hereinafter) was dissolved in 1900 parts of N-methyl-2-pyrodone, and the resulting solution was dropped into 2000 parts of acetone to prepare an electrodeposition varnish consisting of an emulsion with a concentration of 2.5% by weight. I got it.
参考例2
ポリエーテルイミド(ULTEM 11000) 10
0部をN〜メチル−2−ピロリドン1900部に溶解さ
せて得た溶液をアセトン4000部中に滴下し、濃度1
.6重量%のエマルジョンからなる電着ワニスを得た。Reference example 2 Polyetherimide (ULTEM 11000) 10
A solution obtained by dissolving 0 parts in 1900 parts of N~methyl-2-pyrrolidone was added dropwise to 4000 parts of acetone to give
.. An electrodeposited varnish consisting of a 6% by weight emulsion was obtained.
参考例3
芳香族ポリアミドイミド(ATU) 100部をN−メ
チル−2−ピロリドン1900部に溶解させて得た溶液
をアセトン3000部中に摘下し、濃度2.5重量%の
エマルジョンからなる電着ワニスを得た。Reference Example 3 A solution obtained by dissolving 100 parts of aromatic polyamideimide (ATU) in 1900 parts of N-methyl-2-pyrrolidone was added to 3000 parts of acetone, and an electrolyte consisting of an emulsion with a concentration of 2.5% by weight was prepared. Got the varnish.
実施例1 竪型炉にて下記の条件で平角状絶縁電線を得た。Example 1 A rectangular insulated wire was obtained in a vertical furnace under the following conditions.
平角状導体:厚さ200μm×幅6鴫の銅箔電着ワニス
:参考例1
ワニス温度:20℃(以下同じ)
陰極:直径6 cw+ %長さ30cmの銅円筒(以下
同じ)極間距離:3cm(以下同じ)
電着電圧:直流15V(以下同じ)
線速:5.Om/分
乾燥温度:200℃(以下同じ)
焼付温度:420℃
実施例2
下記の条件で実施例1に準じ平角状絶縁電線を得た。Rectangular conductor: Copper foil electrodeposition varnish with thickness 200μm x width 6mm: Reference example 1 Varnish temperature: 20℃ (same below) Cathode: diameter 6cw+% copper cylinder with length 30cm (same below) Distance between electrodes: 3cm (same below) Electrodeposition voltage: DC 15V (same below) Line speed: 5. Om/min Drying temperature: 200°C (same below) Baking temperature: 420°C Example 2 A rectangular insulated wire was obtained according to Example 1 under the following conditions.
平角状導体:丸導体を圧延して平角状とした厚さ110
0u+ X輻700趨のアルミニウム導体電着ワニス:
参考例2
線速:20.Om/分
焼付温度=400℃
実施例3
下記の条件で実施例1に準じ平角状絶縁電線を得た。Rectangular conductor: A round conductor rolled into a rectangular shape with a thickness of 110 mm.
Aluminum conductor electrodeposition varnish of 0u+X 700 series:
Reference example 2 Linear speed: 20. Om/min Baking temperature=400°C Example 3 A rectangular insulated wire was obtained according to Example 1 under the following conditions.
平角状導体:厚さ500u111 x幅1.5mmの銅
クラツドアルミニウム箔
電着ワニス・参考例3
線速: 15.0m/分
焼付温度:400°C
比較例1
溶液型のポリイミドワニス(日東電工社製、商品名:
X−600W)を用いたほかは実施例1に準じて平角状
絶縁電線を得た。Rectangular conductor: Copper clad aluminum foil electrodeposited varnish, thickness 500u111 x width 1.5mm Reference example 3 Line speed: 15.0m/min Baking temperature: 400°C Comparative example 1 Solution type polyimide varnish (Nitto Denko) Manufactured by the company, product name:
A rectangular insulated wire was obtained in the same manner as in Example 1, except that a wire (X-600W) was used.
比較例2
電着ワニスとして水分散型アクリルワニスを用い、焼付
温度を380℃としたほかは実施例1に準じて平角状絶
縁電線を得た。Comparative Example 2 A rectangular insulated wire was obtained in accordance with Example 1, except that a water-dispersed acrylic varnish was used as the electrodeposited varnish and the baking temperature was 380°C.
評価試験
実施例、比較例で得た平角状絶縁電線につき下記の項目
について調べた。The following items were investigated for the rectangular insulated wires obtained in the evaluation test examples and comparative examples.
[絶縁層の厚さ]
平用部及びコーナ一部における絶縁層の厚さを測定した
。[Thickness of Insulating Layer] The thickness of the insulating layer in the flat part and part of the corner was measured.
[外観] 絶縁層の外観を目視判定した。[exterior] The appearance of the insulating layer was visually judged.
[ピンホールI
JISC3003−に準拠して絶縁層におけるピンホー
ルの数を調べた。[Pinhole I The number of pinholes in the insulating layer was investigated in accordance with JISC3003-.
[軟化温度1
JIS C3003に準拠して絶縁層の軟化温度を調べ
た。[Softening Temperature 1 The softening temperature of the insulating layer was investigated in accordance with JIS C3003.
[耐熱温度I
ASTM D23011′ニー準拠して2万時間寿命
の耐熱温度を調べた。[Heat Resistance Temperature I The heat resistance temperature for a life of 20,000 hours was investigated in accordance with ASTM D23011'.
上記の結果を表に示した。The above results are shown in the table.
*:コーナ一部において平角状導体の露出部分が殆どで
、実質的に絶縁層が形成されているとは認められなかっ
た。なお、平用部に形成された絶縁層部分には無数のピ
ンホールが認められた。*: Most of the rectangular conductor was exposed in a part of the corner, and it was not recognized that an insulating layer was substantially formed. In addition, numerous pinholes were observed in the insulating layer portion formed in the flat part.
第1図は実施例の断面図、第2図は製造工程例のフロー
チャートである。
1:耐熱性絶縁層
2.3:平角状導体
5:エマルジョン型電着ワニス
7 焼付装置
8:平角状絶縁電線
特許出願人 三菱電線工業株式会社代 理 人
藤 本 勉第2FIG. 1 is a sectional view of an embodiment, and FIG. 2 is a flowchart of an example of the manufacturing process. 1: Heat-resistant insulating layer 2.3: Rectangular conductor 5: Emulsion type electrodeposition varnish 7 Baking device 8: Rectangular insulated wire Patent applicant Mitsubishi Cable Industries, Ltd. Agent Tsutomu Fujimoto 2nd
Claims (2)
マーを成分とするエマルジョン型電着ワニスの焼付層か
らなる厚さが5μm以下の耐熱性絶縁層を有することを
特徴とする平角状絶縁電線。1. A rectangular insulated wire having a heat-resistant insulating layer having a thickness of 5 μm or less and made of a baked layer of an emulsion-type electrodeposited varnish containing an imide-based or amide-based polymer around a rectangular conductor.
ーがそのイミド基の閉環率が90%以上のものである請
求項1に記載の平角状絶縁電線。2. 2. The rectangular insulated wire according to claim 1, wherein the imide polymer in the emulsion type electrodeposition varnish has a ring closure rate of imide groups of 90% or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2114549A JP2699210B2 (en) | 1990-04-27 | 1990-04-27 | Flat rectangular insulated wire |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2114549A JP2699210B2 (en) | 1990-04-27 | 1990-04-27 | Flat rectangular insulated wire |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0412407A true JPH0412407A (en) | 1992-01-17 |
| JP2699210B2 JP2699210B2 (en) | 1998-01-19 |
Family
ID=14640571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2114549A Expired - Fee Related JP2699210B2 (en) | 1990-04-27 | 1990-04-27 | Flat rectangular insulated wire |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2699210B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005073986A1 (en) * | 2004-01-29 | 2005-08-11 | Mitsubishi Cable Industries, Ltd. | Electric cable, its usage method, and its manufacturing method |
| DE102006029511B4 (en) | 2005-06-29 | 2018-03-29 | Toyota Jidosha Kabushiki Kaisha | FUEL CELL STACK AND METHOD FOR PRODUCING A CONNECTING PLATE FOR A FUEL CELL STACK |
| CN114420379A (en) * | 2022-01-24 | 2022-04-29 | 松田电工(台山)有限公司 | Manufacturing method of micro-insulated square wire |
| JP2022164467A (en) * | 2021-04-16 | 2022-10-27 | 合同会社Hide Technology | Coating material for electrodeposition coating, method for producing coating material for electrodeposition coating, and method for manufacturing insulating material |
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|---|---|---|---|---|
| JPS4921435A (en) * | 1972-04-19 | 1974-02-25 | ||
| JPS4951578A (en) * | 1972-06-23 | 1974-05-18 | ||
| JPS49108600A (en) * | 1972-12-08 | 1974-10-16 | ||
| JPS52126438A (en) * | 1976-04-16 | 1977-10-24 | Mitsubishi Electric Corp | Electrodeposition paint |
| JPS6218482A (en) * | 1985-07-12 | 1987-01-27 | ウエスチングハウス エレクトリック コ−ポレ−ション | Emulsion for electrodeposition of polymer alloy and copolymer and its production |
| JPS62265368A (en) * | 1986-05-12 | 1987-11-18 | Mitsubishi Cable Ind Ltd | Production of electrodeposition coating composition |
| JPS63301428A (en) * | 1987-05-30 | 1988-12-08 | Nissha Printing Co Ltd | Insulating method of conductor with corners |
| JPS6443578A (en) * | 1987-08-10 | 1989-02-15 | Mitsubishi Electric Corp | Emulsion for electrodeposition |
| JPH0197304A (en) * | 1987-10-08 | 1989-04-14 | Mitsubishi Cable Ind Ltd | Insulating substrate |
| JPH03159014A (en) * | 1989-11-15 | 1991-07-09 | Mitsubishi Cable Ind Ltd | Manufacture of flat and square insulated cable |
| JPH03241609A (en) * | 1990-02-20 | 1991-10-28 | Mitsubishi Cable Ind Ltd | Flat-type superthin film insulated wire |
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1990
- 1990-04-27 JP JP2114549A patent/JP2699210B2/en not_active Expired - Fee Related
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4921435A (en) * | 1972-04-19 | 1974-02-25 | ||
| JPS4951578A (en) * | 1972-06-23 | 1974-05-18 | ||
| JPS49108600A (en) * | 1972-12-08 | 1974-10-16 | ||
| JPS52126438A (en) * | 1976-04-16 | 1977-10-24 | Mitsubishi Electric Corp | Electrodeposition paint |
| JPS6218482A (en) * | 1985-07-12 | 1987-01-27 | ウエスチングハウス エレクトリック コ−ポレ−ション | Emulsion for electrodeposition of polymer alloy and copolymer and its production |
| JPS62265368A (en) * | 1986-05-12 | 1987-11-18 | Mitsubishi Cable Ind Ltd | Production of electrodeposition coating composition |
| JPS63301428A (en) * | 1987-05-30 | 1988-12-08 | Nissha Printing Co Ltd | Insulating method of conductor with corners |
| JPS6443578A (en) * | 1987-08-10 | 1989-02-15 | Mitsubishi Electric Corp | Emulsion for electrodeposition |
| JPH0197304A (en) * | 1987-10-08 | 1989-04-14 | Mitsubishi Cable Ind Ltd | Insulating substrate |
| JPH03159014A (en) * | 1989-11-15 | 1991-07-09 | Mitsubishi Cable Ind Ltd | Manufacture of flat and square insulated cable |
| JPH03241609A (en) * | 1990-02-20 | 1991-10-28 | Mitsubishi Cable Ind Ltd | Flat-type superthin film insulated wire |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005073986A1 (en) * | 2004-01-29 | 2005-08-11 | Mitsubishi Cable Industries, Ltd. | Electric cable, its usage method, and its manufacturing method |
| DE102006029511B4 (en) | 2005-06-29 | 2018-03-29 | Toyota Jidosha Kabushiki Kaisha | FUEL CELL STACK AND METHOD FOR PRODUCING A CONNECTING PLATE FOR A FUEL CELL STACK |
| JP2022164467A (en) * | 2021-04-16 | 2022-10-27 | 合同会社Hide Technology | Coating material for electrodeposition coating, method for producing coating material for electrodeposition coating, and method for manufacturing insulating material |
| CN114420379A (en) * | 2022-01-24 | 2022-04-29 | 松田电工(台山)有限公司 | Manufacturing method of micro-insulated square wire |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2699210B2 (en) | 1998-01-19 |
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