JPS6226023B2 - - Google Patents
Info
- Publication number
- JPS6226023B2 JPS6226023B2 JP7503980A JP7503980A JPS6226023B2 JP S6226023 B2 JPS6226023 B2 JP S6226023B2 JP 7503980 A JP7503980 A JP 7503980A JP 7503980 A JP7503980 A JP 7503980A JP S6226023 B2 JPS6226023 B2 JP S6226023B2
- Authority
- JP
- Japan
- Prior art keywords
- frame
- photographic paper
- phototypesetting
- cutting
- sides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7503980A JPS57651A (en) | 1980-06-03 | 1980-06-03 | Device for sticking photocomposed photographic paper |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7503980A JPS57651A (en) | 1980-06-03 | 1980-06-03 | Device for sticking photocomposed photographic paper |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57651A JPS57651A (en) | 1982-01-05 |
JPS6226023B2 true JPS6226023B2 (enrdf_load_html_response) | 1987-06-05 |
Family
ID=13564657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7503980A Granted JPS57651A (en) | 1980-06-03 | 1980-06-03 | Device for sticking photocomposed photographic paper |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57651A (enrdf_load_html_response) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63293809A (ja) * | 1987-05-27 | 1988-11-30 | Hitachi Metals Ltd | コンデンサ− |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112643755B (zh) * | 2020-11-30 | 2021-09-07 | 山东大学 | 一种基于机器视觉对任意形状的片状物进行全自动等面积分块的方法及装置 |
-
1980
- 1980-06-03 JP JP7503980A patent/JPS57651A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63293809A (ja) * | 1987-05-27 | 1988-11-30 | Hitachi Metals Ltd | コンデンサ− |
Also Published As
Publication number | Publication date |
---|---|
JPS57651A (en) | 1982-01-05 |
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