JPS62252452A - Polyamide film - Google Patents

Polyamide film

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Publication number
JPS62252452A
JPS62252452A JP9485586A JP9485586A JPS62252452A JP S62252452 A JPS62252452 A JP S62252452A JP 9485586 A JP9485586 A JP 9485586A JP 9485586 A JP9485586 A JP 9485586A JP S62252452 A JPS62252452 A JP S62252452A
Authority
JP
Japan
Prior art keywords
film
polyamide
silicon dioxide
nylon
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9485586A
Other languages
Japanese (ja)
Inventor
Hirozo Kamijo
上條 博造
Shiro Kawashima
川島 四郎
Katsuhide Nitani
二谷 克英
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP9485586A priority Critical patent/JPS62252452A/en
Publication of JPS62252452A publication Critical patent/JPS62252452A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To contemplate well-balanced improvements in slipperiness, surface gloss and transparency of a polyamide film, by dispersing wet-process amorphous silicon dioxide having specified physical properties in a polyamide. CONSTITUTION:A polyamide film is obtd. from a blend obtd. by dispersing 0.05-1.0pt.wt. wet-process amorphous silicon dioxide (A) having an average particle size of 0.1-6mu, a specific surface area of 50-300m<2>/g and a sodium content (in terms of Na2O) of 0.1-1.0% as measured by flame analysis in 100pts. wt. polyamide (B). Any of conventional polyamides such as nylon 6, nylon 6,6, etc., can be used.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明はポリアミドフィルムに関し、更に詳しくは、良
好な滑り性、表面光沢性および透明性をバランスよく有
するポリアミドフィルムに関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Field of Application) The present invention relates to a polyamide film, and more particularly to a polyamide film having good slipperiness, surface gloss, and transparency in a well-balanced manner.

(従来の技術) ポリアミドフィルムは、透明性、耐ピンホール性、酸素
ガス遮断性、耐熱性および耐油性等の諸物件が優れてい
るため、主に食品包装の分野で汎用されている。このフ
ィルムは、延伸フィルムおよび未延伸フィルムに分けら
れている。
(Prior Art) Polyamide films are widely used mainly in the field of food packaging because they have excellent properties such as transparency, pinhole resistance, oxygen gas barrier properties, heat resistance, and oil resistance. This film is divided into stretched film and unstretched film.

一般に、ポリアミドフィルムは滑り性が悪く、ポリアミ
ドの吸水性等のため高湿度下でこの傾向が特に顕著とな
る。この滑り性が悪いと、成膜あるいは巻取の際のみな
らず、ラミネート工程ないしは印刷工程等の後加工の際
にトラブルを招くため、ポリアミドフィルムには、滑り
性の改善が切望されてきた。
In general, polyamide films have poor slip properties, and this tendency becomes particularly noticeable under high humidity conditions due to polyamide's water absorption properties. Poor slipperiness causes trouble not only during film formation or winding, but also during post-processing such as lamination or printing, so there has been a strong desire for polyamide films to have improved slipperiness.

この滑り性の改善には、金属石けん類、ビスアミド類、
ポリオレフィン類又は種々の無機粒子を添加することが
知られているが、なかでも二酸化ケイ素、タルク、カオ
リン等の不活性無機粒子を配合することが効果的である
。このフィルムの滑り性はフィルムの表面構造に支配さ
れ、無機粒子を添加した系では無機粒子による表面突起
の大きさおよび量に比例して滑り性が増すが、同時にこ
の表面突起によりフィルムの表面光沢は失われる。すな
わち、フィルムの滑り性を十分に改善するためには無機
粒子の添加量を多くする必要があり、その結果、フィル
ムの透明性及び表面光沢が損なわれ、包装用としての商
品価値は失われてしまう、特に、延伸ポリアミドフィル
ムの場合には、表面光沢が重視されるため、表面光沢の
低下とそれに基づく商品価値の低下は大きな問題である
To improve this slipperiness, metal soaps, bisamides,
Although it is known to add polyolefins or various inorganic particles, it is particularly effective to incorporate inert inorganic particles such as silicon dioxide, talc, and kaolin. The slipperiness of this film is controlled by the surface structure of the film, and in systems containing inorganic particles, the slipperiness increases in proportion to the size and amount of surface protrusions caused by the inorganic particles, but at the same time, these surface protrusions cause the surface gloss of the film. is lost. In other words, in order to sufficiently improve the slipperiness of the film, it is necessary to increase the amount of inorganic particles added, and as a result, the transparency and surface gloss of the film are impaired, and the commercial value for packaging is lost. Particularly in the case of stretched polyamide films, surface gloss is important, so a reduction in surface gloss and a resulting reduction in commercial value are a major problem.

従来、かかる改良を目的としたフィルム成形用のポリア
ミド組成物としては、■ポリアミド、α、β−不飽和カ
ルボン酸−オレフイン共重合体および無機粒子からなる
組成物(特開昭52−32945号公報参照)、■ポリ
アミド、有機ベントナイトおよび2ル以下の平均粒径を
有する無機粒子からなる組成物(特公昭51〜2830
7号公報参照)、■ポリアミド、粒径がtop以上の粒
子を実質的に含有しないタルクおよびHLBが10〜1
5の範囲である非イオン性界面活性剤からなる組成物(
特公昭57−4741号公報参照)等が提案されている
Conventionally, polyamide compositions for film forming aimed at such improvements include (1) a composition comprising polyamide, an α,β-unsaturated carboxylic acid-olefin copolymer, and inorganic particles (Japanese Unexamined Patent Publication No. 52-32945; (see Japanese Patent Publication No. 51-2830
(Refer to Publication No. 7), ■ Polyamide, talc that does not substantially contain particles with a particle size of top or more, and HLB of 10 to 1
A composition consisting of a nonionic surfactant having a range of
(see Japanese Patent Publication No. 57-4741) have been proposed.

(発明が解決しようとする問題点) しかし、特に二軸延伸ポリアミドフィルムのように非常
に薄く、しかも高いレベルの滑り性及び透明性が要求さ
れるポリアミドフィルムに対しては、これらの技術では
実用上その改良効果は十分ではない。
(Problems to be Solved by the Invention) However, these techniques are not practical, especially for polyamide films that are extremely thin and require high levels of slipperiness and transparency, such as biaxially oriented polyamide films. Moreover, the improvement effect is not sufficient.

さらに、透明性及び滑り性という両立しない物性を同時
に改良するためには、添加する無機粒子の種類、粒径お
よび形状等の選択並びにその分散方法が重要であり、ポ
リエステル延伸フィルム等で数多くの提案がなされてい
るが、滑り性の悪いポリアミドフィルムではまだ十分な
検討はなされてない現状にある。
Furthermore, in order to simultaneously improve the physical properties of transparency and slipperiness, which are incompatible, it is important to select the type, particle size, shape, etc. of the inorganic particles to be added, as well as the method of dispersing them. However, sufficient studies have not yet been made on polyamide films, which have poor slip properties.

[発明の構成] (問題点を解決するための手段) 本発明者らは、上記した問題点を解決すべく鋭意研究を
重ねた結果、所定の平均粒径、比表面積およびナトリウ
ム含有量を有し、かつ所定の方法で合成された無定形二
酸化ケイ素をポリアミド中に特定量分散せしめることに
より、良好な滑り性、表面光沢性および透明性をバラン
スよく有するポリアミドフィルムが得られることを見い
出し、本発明を完成するに到った。
[Structure of the Invention] (Means for Solving the Problems) As a result of extensive research in order to solve the above-mentioned problems, the present inventors have found a method that has a predetermined average particle size, specific surface area, and sodium content. We discovered that by dispersing a specific amount of amorphous silicon dioxide synthesized by a predetermined method in polyamide, a polyamide film having a good balance of slipperiness, surface gloss, and transparency can be obtained, and we have developed this book. He has completed his invention.

すなわち、本発明のポリアミドフィルムは、(A)ポリ
アミド        100重量部中に。
That is, the polyamide film of the present invention contains (A) polyamide in 100 parts by weight.

(B)0.1〜6ルの平均粒径を有し、かつ50〜30
0m″/gの比表面積を有すると共に、炎光分析法によ
るナトリウム(N a)の含有量が酸化ナトリウム(N
a2O)に換算して0.1〜1.0%であり、かつ湿式
法で合成された無定形二酸化ケイ素 0.05〜1.0重量部 が分散してなるものである。
(B) have an average particle size of 0.1 to 6 µl, and 50 to 30 µl;
It has a specific surface area of 0 m''/g, and the content of sodium (Na) by flame spectroscopy is higher than that of sodium oxide (N
0.1 to 1.0% in terms of a2O), and 0.05 to 1.0 parts by weight of amorphous silicon dioxide synthesized by a wet method is dispersed therein.

本発明に使用される(A)成分であるポリアミのであれ
ばいかなるものであってもよく1例えば、6−ナイロン
、6.6−ナイロン、11〜ナイロン、12−ナイロン
、6.lO−ナイロン、6.11〜ナイロン、6.12
−ナイロン、ポリ(メタキシリレンアジパミド)、ポリ
(パラキシリレンアジパミド)が挙げられる。これらの
ポリアミドはブレンドしたものでもよく、さらに6−ナ
イロン/6,6−ナイロン、6−ナイロン/12−ナイ
ロン、6−ナイロン/6,10−ナイロン、6−ナイロ
ン76T−ナイロン(T:テレフタル酸成分)、6−ナ
イロン/6 、6−+イロン/12−ナイロン、6−ナ
イロン/6,6−ナイロン/6,10−ナイロン等の共
重合体も使用できる。
Any polyamide as component (A) used in the present invention may be used, such as 6-nylon, 6.6-nylon, 11-nylon, 12-nylon, 6. lO-Nylon, 6.11 ~ Nylon, 6.12
- Nylon, poly(methaxylylene adipamide), poly(para-xylylene adipamide). These polyamides may be blends, such as 6-nylon/6,6-nylon, 6-nylon/12-nylon, 6-nylon/6,10-nylon, 6-nylon 76T-nylon (T: terephthalic acid Copolymers such as 6-nylon/6, 6-+ylon/12-nylon, and 6-nylon/6,6-nylon/6,10-nylon can also be used.

本発明に使用されるCB)成分である二酸化ケイ素は、
平均粒径、比表面積(粒子表面の水酸基濃度)およびN
a含有量を前記した所定の範囲内とし、前記の所定方法
で合成された無定形二酸化ケイ素である。
Silicon dioxide, which is the component CB) used in the present invention, is
Average particle size, specific surface area (hydroxyl group concentration on particle surface), and N
The amorphous silicon dioxide is synthesized by the predetermined method described above with the a content within the predetermined range described above.

どの盤9竪−融lしにノ亨小五模飴欠礒(^ 1.。Which board 9 vertical - melting ni no hen small five imitation candy missing (^ 1..

未満では滑り性があまり改善されず、6#Lを超えると
フィルム表面に大きな突起が現れ、フィルムの表面光沢
性が悪くなる。無定形二酸化ケイ素の好ましい平均粒径
は、0.5〜6μである。なお、厚さが15終はどの薄
い延伸フィルムに対しては、延伸時のフィルムの破断を
防ぐため、10p以上の粒子を実質的に含まないように
分級および分散方法に配慮が望まれる。
If it is less than 6#L, the slipperiness will not be improved much, and if it exceeds 6#L, large protrusions will appear on the film surface and the surface glossiness of the film will deteriorate. The preferred average particle size of amorphous silicon dioxide is 0.5 to 6 microns. Note that for thin stretched films with a thickness of 15 mm or less, consideration should be given to the classification and dispersion method so as not to substantially contain particles of 10p or more in order to prevent the film from breaking during stretching.

比表面積が50m″/g未満ではポリアミドとの親和性
が低下すると共に、フィルムの透明性も低下し、300
ゴ/gを超えると粒子表面の水酸基が強く結合するため
1粒子の分散性が低下してフィルムの透明性を損なう、
好ましくは100〜2O0rrf/gである。
If the specific surface area is less than 50 m''/g, the affinity with polyamide will decrease and the transparency of the film will also decrease.
If it exceeds G/g, the hydroxyl groups on the particle surface will strongly bond, reducing the dispersibility of each particle and impairing the transparency of the film.
Preferably it is 100-200rrf/g.

ナトリウム含有量が0.1%未満では、粒子間の凝集力
が大きく、分散Φ分級が困難となり、1.0%を超える
と目的とする効果が得られない、好ましくは、0.2〜
0.6%である。
If the sodium content is less than 0.1%, the cohesive force between particles will be large, making dispersion Φ classification difficult, and if it exceeds 1.0%, the desired effect will not be obtained, preferably from 0.2 to
It is 0.6%.

無定形二酸化ケイ素の合成法としては、一般に乾式法、
湿式法およびケイ酸のゲル化法が挙げられるが、本発明
の効果は湿式法を適用して合成された無定形二酸化ケイ
素を用いた場合にのみ得られる。この湿式法による場合
はケイ酸塩を酸で分解して合成される。乾式法おるびゲ
ル化法による場合は、炎光分析法によるNa含有量がN
a2Oに換算して0.1%未満と少ないのに対し、湿式
法による場合は、Na2Oに換算して0.1%以上含有
する。
Generally, the methods for synthesizing amorphous silicon dioxide include dry method,
Examples include a wet method and a silicic acid gelling method, but the effects of the present invention can be obtained only when amorphous silicon dioxide synthesized by applying a wet method is used. In the case of this wet method, silicate is decomposed with acid to synthesize it. When using the dry method or the gelation method, the Na content determined by the flame analysis method is N
While the content is less than 0.1% in terms of a2O, in the case of the wet method, it is contained in an amount of 0.1% or more in terms of Na2O.

この(B)成分の配合割合が0.05重量部未満では滑
り性が不足し、1.0重量部を超えると透明性が低下す
る。好ましくは0.1〜0.5重量部である。
If the blending ratio of component (B) is less than 0.05 parts by weight, slipperiness will be insufficient, and if it exceeds 1.0 parts by weight, transparency will decrease. Preferably it is 0.1 to 0.5 part by weight.

さらに、必要に応じて、着色剤、酸化防止剤、耐熱安定
剤、耐候性付与剤、帯電防止剤等を配合してもよい。
Furthermore, a coloring agent, an antioxidant, a heat stabilizer, a weather resistance imparting agent, an antistatic agent, etc. may be added as necessary.

つぎに、本発明のポリアミドフィルムの製造方法につい
て説明する。
Next, the method for manufacturing the polyamide film of the present invention will be explained.

まず、前記した(A)および(B)の各成分からなる混
合物を得、ついで得られた混合物に常用のフィルム成形
法を適用して容易に製造される。
First, a mixture consisting of the components (A) and (B) described above is obtained, and then a conventional film forming method is applied to the obtained mixture to easily produce the film.

上記した前段の混合物を得る工程において、前記した(
B)成分の添加は、ポリアミド成形品製造の任意の段階
で行うことができ、例えば1重合前のポリアミド原料に
添加してもよく、あるいは重合反応開始後の任意の時期
に添加してもよい。
In the step of obtaining the above-mentioned first-stage mixture, the above-mentioned (
Component B) can be added at any stage of polyamide molded product production, for example, it may be added to the polyamide raw material before one polymerization, or it may be added at any time after the start of the polymerization reaction. .

さらに、重合反応終了後ペレットに成形する前。Furthermore, after the polymerization reaction is completed and before being formed into pellets.

または成形時、あるいはペレット化後のポリアミドに添
加することもできる。(B)成分を重合前の原料に添加
する場合、例えばε−カプロラクタムを原料とし、水を
触媒として6−ナイロンを製造する場合には、(B)成
分をまず水または50〜80重量%の(−カプロラクタ
ム水溶液に分散させた後、添加すると均一に原料に配合
されるので望ましい、また、CB)成分を1.0重量%
以上の高濃度で含むポリアミド組成物を予め製造し、こ
れと(B)成分を含まないポリアミドをフィルムに成形
する前に適当に混合し、最終的にポリアミドに対して(
B)成分がO,OS〜1.0重量%含まれるようにして
もよい。
Alternatively, it can be added to the polyamide during molding or after pelletization. When adding component (B) to the raw material before polymerization, for example, when producing 6-nylon using ε-caprolactam as a raw material and using water as a catalyst, component (B) is first added to water or 50 to 80% by weight. (-It is preferable to add the component after dispersing it in the caprolactam aqueous solution because it will be uniformly blended into the raw material, and the CB) component is 1.0% by weight.
A polyamide composition containing the above-mentioned high concentration is prepared in advance, and this and a polyamide containing no component (B) are appropriately mixed before being formed into a film, and finally the polyamide (
Component B) may be contained in an amount of O, OS to 1.0% by weight.

前記した後段のフィルムを得る工程においては、得られ
た混合物を22O〜300℃の押出温度で押出機より押
出し、冷却は、キャスティング法(Tダイ法)の場合に
はキャスティングロール面上で行うか、あるいは、チュ
ーブラ−法の場合には空冷あるいは水冷することにより
行う、又、ポリオレフィン等との共押出法による各種多
層フィルムの成形も行われる。さらに、延伸フィルムの
場合には、キャスティング法またはチューブラ−法で成
形した未延伸フィルムを50〜180℃の延伸温度マー
軸延伸または二軸延伸し、必要に応じて12O℃以上、
融点より10℃低い温度で熱固定するのが一般的である
。二軸延伸の場合は、テンター法二輌延伸法またはチュ
ーブラ−法二軸延伸法等公知の方法を適用すればよい。
In the step of obtaining the film in the latter stage described above, the obtained mixture is extruded from an extruder at an extrusion temperature of 220 to 300°C, and cooling is performed on the casting roll surface in the case of the casting method (T-die method). Alternatively, in the case of the tubular method, various multilayer films may be formed by air cooling or water cooling, or by coextrusion with polyolefin or the like. Furthermore, in the case of a stretched film, an unstretched film formed by a casting method or a tubular method is meraxially or biaxially stretched at a stretching temperature of 50 to 180°C, and if necessary, at a stretching temperature of 120°C or higher.
It is common to heat set at a temperature 10°C lower than the melting point. In the case of biaxial stretching, a known method such as a tenter two-vehicle stretching method or a tubular biaxial stretching method may be applied.

本発明のポリアミドフィルムは、良好な滑り性、表面光
沢性および透明性をバランスよく有するものであるため
、例えば食品包装、などの用途に適用されて極めて有用
なものである。
The polyamide film of the present invention has a good balance of slipperiness, surface gloss, and transparency, and is therefore extremely useful for applications such as food packaging.

以下において、実施例および比較例を掲げ、木発明をさ
らに詳しく説明する。なお、例中、無機粒子の物性は次
に示す手法に従って測定された。
In the following, the wood invention will be explained in more detail with reference to Examples and Comparative Examples. In addition, in the examples, the physical properties of the inorganic particles were measured according to the following method.

三ユ且1:顕微鏡によった。無機粒子を含むポリアミド
フィルムをカバーグラスにはさみ写真撮影後、各粒子の
最大粒径を測定し、さらにその平均粒径を算出した。
Three units and one: By microscopy. After photographing a polyamide film containing inorganic particles between cover glasses, the maximum particle size of each particle was measured, and the average particle size was calculated.

!IJi!i:窒素ガスを吸着させBETの吸着理論式
で算出した値を使用した。
! IJi! i: A value calculated using the BET adsorption theoretical formula after adsorbing nitrogen gas was used.

反主、旦治1: 110℃で2時間乾燥した二酸化ケイ
素について炎光分析法により測定した。
Hanshu, Danji 1: Measurements were made by flame spectroscopy on silicon dioxide dried at 110°C for 2 hours.

(実施例) 支嵐涜」 湿式法で合成した無定形二酸化ケイ素(平均粒径2.8
ル、比表面積140m″/g、Na2O含有量0.3%
)微粉末をQ−カプロラクタム水溶液に分散させたもの
を溶融(−カプロラクタムに添加し、常法により重合し
て、二酸化ケイ素含有量1.2重量%の6−ナイロンを
得た。この6−ナイロンペレット1重量゛部に二酸化ケ
イ素無添加6−ナイロンペレットを5重量部ブレンドし
、二酸化ケイ素添加量を0.2重量%とした。
(Example) Amorphous silicon dioxide (average particle size 2.8
specific surface area 140 m''/g, Na2O content 0.3%
) fine powder dispersed in an aqueous Q-caprolactam solution was added to melted (-caprolactam) and polymerized in a conventional manner to obtain 6-nylon with a silicon dioxide content of 1.2% by weight. 5 parts by weight of silicon dioxide-free 6-nylon pellets were blended with 1 part by weight of pellets, and the amount of silicon dioxide added was 0.2% by weight.

このブレンドした6−ナイロンペレットを用いて押出機
により250℃でTダイより溶融押出し、40℃の冷却
ロール上に押出し、厚さ140ILの未延伸フィルムを
得た。該フィルムを延伸温度12O℃および縦横の各延
伸倍率3.0倍で同時二軸延伸し、190℃で熱固定し
、厚さ15牌の二輪延伸フィルムを得た。
The blended 6-nylon pellets were melt-extruded from a T-die at 250°C using an extruder and extruded onto a cooling roll at 40°C to obtain an unstretched film with a thickness of 140IL. The film was simultaneously biaxially stretched at a stretching temperature of 120° C. and a stretching ratio of 3.0 times in the longitudinal and lateral directions, and heat-set at 190° C. to obtain a two-wheel stretched film with a thickness of 15 tiles.

得られたフィルムの透明性および滑り性について次の評
価を実施した。結果を第1表に併せて示す。
The transparency and slipperiness of the obtained film were evaluated as follows. The results are also shown in Table 1.

色豆亘=日本理学工業製スリップテスターを使用して、
ASTM  01894−63に準じ23℃、相対湿度
65%の雰囲気下で静摩擦係数(ルS)を測定した。
Wataru Iromame = Using a slip tester made by Nippon Rigaku Kogyo,
The coefficient of static friction (S) was measured in accordance with ASTM 01894-63 at 23° C. and in an atmosphere of 65% relative humidity.

11五:スガ試験機社製直読式ヘーズメーターにより、
ASTM  D−1003に準じフィルムの震度(ベー
ズ)を、また、スガ試験機社製デジタル変角光沢計によ
り、ASTM  D−523に準じフィルムの表面光沢
度(グロス)を測定した。
115: Using a direct reading haze meter manufactured by Suga Test Instruments,
The seismic intensity (baize) of the film was measured according to ASTM D-1003, and the surface glossiness (gloss) of the film was measured according to ASTM D-523 using a digital variable angle gloss meter manufactured by Suga Test Instruments.

支五血ヱ上11」 実施例1でブレンド比を変えて、二酸化ケイ素添加量を
0.5重量%及び0.09重量%とじた以外は、実施例
1と同様に成膜し延伸した。結果を第1表に示す。
A film was formed and stretched in the same manner as in Example 1, except that the blend ratio was changed and the amount of silicon dioxide added was 0.5% by weight and 0.09% by weight. The results are shown in Table 1.

支施皇A 湿式法で合成した無定形二酸化ケイ素(平均粒径2.0
.、比表面積250rrf/g、Na2O含有量0.5
%)を用いて、実施例1と同様に重合した(二酸化ケイ
素含有量0.2重量%)、このペレットを用いて実施例
1と同様な成膜・延伸を行った。結果を第1表に示す。
Amorphous silicon dioxide synthesized by wet method (average particle size 2.0
.. , specific surface area 250rrf/g, Na2O content 0.5
%) was polymerized in the same manner as in Example 1 (silicon dioxide content: 0.2% by weight), and film formation and stretching were performed in the same manner as in Example 1 using this pellet. The results are shown in Table 1.

Xム1J 湿式法で合成した無定形二酸化ケイ素(平均粒径0.7
g、比表面積80m″/g、Na2O含有量0.2%)
を用いて、実施例1と同様に重合した(二酸化ケイ素含
有量0.3重量%)、このペレットを用いて実施例1と
同様な成膜・延伸を行った。結果を第1表に示す。
Xmu1J Amorphous silicon dioxide synthesized by wet method (average particle size 0.7
g, specific surface area 80 m''/g, Na2O content 0.2%)
was polymerized in the same manner as in Example 1 (silicon dioxide content: 0.3% by weight), and film formation and stretching were performed in the same manner as in Example 1 using this pellet. The results are shown in Table 1.

比較±ユニ」 平均粒径および比表面積の異なる、湿式法で合成した無
定形二酸化ケイ素を用いて、実施例1と同様に重合した
。このペレットを用いて実施例1と同様な成膜・延伸を
行った。結果を第1表に示す。
Comparison ±Uni” Polymerization was carried out in the same manner as in Example 1 using amorphous silicon dioxide synthesized by a wet method and having different average particle diameters and specific surface areas. Using this pellet, film formation and stretching were performed in the same manner as in Example 1. The results are shown in Table 1.

平均粒径が0.051Lと非常に小さい場合は滑り性が
不足しく比較例1)、比表面積が40m’/gと小さい
場合は透明性が悪化しく比較例2)、逆に比表面積が4
00m″/gと大きい場合は二酸化ケイ素の分散性が悪
くなり、透明性を損なう(比較例3)、平均粒径及び比
表面積がこの範囲にあっても、添加量が1.2重量%と
多い場合は透明性が悪くなり(比較例4)、逆に0.0
4重量%と少ない場合は滑り性が悪くなる(比較例5)
When the average particle size is very small as 0.051L, the slipperiness is insufficient (Comparative Example 1), when the specific surface area is as small as 40 m'/g, the transparency deteriorates (Comparative Example 2), and conversely, when the specific surface area is 4.
If it is as large as 00 m''/g, the dispersibility of silicon dioxide becomes poor and transparency is impaired (Comparative Example 3). Even if the average particle size and specific surface area are within this range, the amount added is 1.2% by weight. When the amount is too high, the transparency deteriorates (Comparative Example 4), and on the other hand, when it is 0.0
When it is as low as 4% by weight, slipperiness deteriorates (Comparative Example 5)
.

堤蚊舊J 乾式法で合成したアエロジル(AERO9IL) 2O
0(商品名、日本アエロジル■製、平均粒径3:2g、
比表面積2O0ni”/ gt N a2O含有率0.
1%以下)を用いて、実施例1と同様に重合した(二酸
化ケイ素含有率0.3重量%)、このペレットを用いて
実施例1と同様な成膜・延伸を行った。結果を第1表に
示す。
Tsutsumi Mojo J Aerosil (AERO9IL) 2O synthesized by dry method
0 (trade name, manufactured by Nippon Aerosil ■, average particle size 3:2g,
Specific surface area 2O0ni”/gt Na2O content 0.
1% or less) and polymerized in the same manner as in Example 1 (silicon dioxide content: 0.3% by weight). Using this pellet, film formation and stretching were performed in the same manner as in Example 1. The results are shown in Table 1.

本例においては、シリカの分散が悪く、透明性が悪かっ
た。
In this example, silica was poorly dispersed and transparency was poor.

比較11 ゲル化法で合成したサイロイド244(商品名、富士デ
ヴイソン化学■製、平均粒径3.5終、比表面積300
rn’/ g 、 N a2O含有率0.06〜0.1
%)を用いて、実施例1と同様に重合した(二酸化ケイ
素含有量0.3重量%)、このペレットを用いて実施例
1と同様な成膜Φ延伸を行った。結果を第1表に示す。
Comparison 11 Thyroid 244 synthesized by gelation method (trade name, manufactured by Fuji Davison Chemical ■, average particle size 3.5, specific surface area 300
rn'/g, Na2O content 0.06-0.1
%), polymerized in the same manner as in Example 1 (silicon dioxide content: 0.3% by weight), and using this pellet, film formation and Φ stretching were performed in the same manner as in Example 1. The results are shown in Table 1.

本例において、フィルム表面での凹凸がひどいため、光
沢性および透明性が悪くなった。
In this example, the film surface was severely uneven, resulting in poor gloss and transparency.

ル笠1」 平均粒径1.6ILのタルクを用いて、実施例1と同様
に重合した(タルク含有量0.3重量%)、このペレッ
トを用いて実施例1と同様な成膜・延伸を行い、第1表
の結果を得た。
Lukasa 1'' was polymerized in the same manner as in Example 1 using talc with an average particle size of 1.6 IL (talc content: 0.3% by weight), and film formation and stretching were performed in the same manner as in Example 1 using this pellet. The results shown in Table 1 were obtained.

本例においては、タルクは核剤効果を有するため、結晶
化が進み、透明性が悪くなった。
In this example, since talc has a nucleating effect, crystallization progressed and transparency deteriorated.

比較遺J 平均粒径O,a=のカオリンを用いて、実施例1と同様
に重合した(カオリン含有量0.2重陽%)、このペレ
ットを用いて実施例1と同様な成膜・延伸を行い、第1
表の結果を得た。
Comparative Example J Using kaolin with an average particle size of O, a = polymerized in the same manner as in Example 1 (kaolin content 0.2%), film formation and stretching were performed in the same manner as in Example 1 using this pellet. and the first
Obtained the results in the table.

本例においては、フィルム表面の凹凸が激しいため滑り
性は良好であるが、表面光沢度が非常に悪くなった。
In this example, since the film surface was highly uneven, the slipperiness was good, but the surface gloss was very poor.

実」01j 6−ナイロンパウダー(粒径300メツシユ以下)85
重量部、実施例1で用いた湿式法により合成した二酸化
ケイ素10重量部および分散剤としてエチレンビスステ
アリルアミド5重量部をヘンシェルミキサーでブレンド
した。得られたブレンド品を二軸混練押出機により26
0℃で混練押出し、二酸化ケイ素含有量10重量%のマ
スターペレットを得た。このマスターペレット3重量部
と二酸化ケイ素無添加の6−ナイロンペレット97重量
部をブレンドし、二酸化ケイ素添加量を0.3重量%と
した。
Fruit” 01j 6-Nylon powder (particle size 300 mesh or less) 85
Parts by weight, 10 parts by weight of silicon dioxide synthesized by the wet method used in Example 1, and 5 parts by weight of ethylene bisstearylamide as a dispersant were blended in a Henschel mixer. The obtained blended product was mixed with a twin-screw extruder for 26 hours.
The mixture was kneaded and extruded at 0°C to obtain master pellets having a silicon dioxide content of 10% by weight. 3 parts by weight of this master pellet and 97 parts by weight of 6-nylon pellets containing no silicon dioxide were blended, and the amount of silicon dioxide added was 0.3% by weight.

このペレットを用い、押出機で250℃でTダイより押
出し、80℃の冷却ロール上で固化し、厚さ50ルのフ
ィルムとした。結果を第2表に示す。
Using this pellet, it was extruded through a T-die at 250°C using an extruder and solidified on a cooling roll at 80°C to form a film with a thickness of 50 l. The results are shown in Table 2.

本例においては、透明性および滑り性とも良好なフィル
ムが得られた。
In this example, a film with good transparency and slipperiness was obtained.

比較m 比較例6 (7)AERO9IL 2O0 (乾式法ニ
より合成)を用いた以外は、実施例6と同様なマスター
ペレット作成し、ついでフィルム成形を行った(二酸化
ケイ素添加量0,3重量%)、結果を第2表に示す。
Comparison m Comparative Example 6 (7) A master pellet was prepared in the same manner as in Example 6 except that AERO9IL 2O0 (synthesized by dry method) was used, and then film molding was performed (silicon dioxide addition amount: 0.3% by weight) ), the results are shown in Table 2.

本例においては、二酸化ケイ素の分散性が悪いため、フ
ィシュアイが発生して透明性が非常に悪かった。
In this example, fish eyes were generated due to poor dispersibility of silicon dioxide, resulting in very poor transparency.

ルl」1L1 比較例7のサイロイド244(ゲル化法により合成)を
用いた他は、実施例6と同様なマスターペレット作成し
、ついでフィルム成形を行った(二酸化ケイ素添加量0
.3重量%)、結果を第2表に示す。
A master pellet was prepared in the same manner as in Example 6, except that Thyroid 244 of Comparative Example 7 (synthesized by a gelling method) was used, and then film molding was performed (silicon dioxide addition amount was 0).
.. 3% by weight), the results are shown in Table 2.

本例においては、やはり二酸化ケイ素の分散が悪く、フ
ィシュアイが発生し、透明性が悪化した。
In this example, the dispersion of silicon dioxide was still poor, fish eyes were generated, and the transparency was deteriorated.

[発明の効果] 以上に詳述した通り、本発明のポリアミドフィルムは良
好な滑り性、表面光沢性および透明性をバランスよく有
するものであるため、例えば食品包装用として有用なも
のであり、その実用的価値は極めて大である。
[Effects of the Invention] As detailed above, the polyamide film of the present invention has good slipperiness, surface gloss, and transparency in a well-balanced manner, and therefore is useful for food packaging, for example. The practical value is extremely large.

Claims (1)

【特許請求の範囲】 (A)ポリアミド100重量部 中に、 (B)0.1〜6μの平均粒径を有し、かつ50〜30
0m^2/gの比表面積を有すると共に、炎光分析法に
よるナトリウムの含有量 が酸化ナトリウム(Na_2O)に換算して0.1〜1
.0%であり、かつ湿式法で合 成された無定形二酸化ケイ素 0.05〜1.0重量部 が分散してなることを特徴とするポリアミドフィルム。
Scope of Claims: (A) in 100 parts by weight of polyamide, (B) having an average particle size of 0.1 to 6μ, and 50 to 30μ
It has a specific surface area of 0 m^2/g, and the sodium content measured by flame spectroscopy is 0.1 to 1 in terms of sodium oxide (Na_2O).
.. A polyamide film comprising 0.05 to 1.0 parts by weight of amorphous silicon dioxide synthesized by a wet method.
JP9485586A 1986-04-25 1986-04-25 Polyamide film Pending JPS62252452A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9485586A JPS62252452A (en) 1986-04-25 1986-04-25 Polyamide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9485586A JPS62252452A (en) 1986-04-25 1986-04-25 Polyamide film

Publications (1)

Publication Number Publication Date
JPS62252452A true JPS62252452A (en) 1987-11-04

Family

ID=14121645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9485586A Pending JPS62252452A (en) 1986-04-25 1986-04-25 Polyamide film

Country Status (1)

Country Link
JP (1) JPS62252452A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01275659A (en) * 1988-04-28 1989-11-06 Du Pont Mitsui Polychem Co Ltd Packaging polyamide film
EP0719631A3 (en) * 1994-12-22 1997-03-19 Toyo Boseki Biaxially oriented polyamide resin film and production thereof
WO1997038043A1 (en) * 1996-04-08 1997-10-16 Kolon Industries, Inc. Polyamide film composition
EP0810259A1 (en) * 1996-05-28 1997-12-03 Bayer Ag Polyamid moulding compositions containing nanodisperse fillers and films or hollow articles containing such polyamid layer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5286471A (en) * 1976-01-12 1977-07-18 Teijin Ltd Two dimensional orientated film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5286471A (en) * 1976-01-12 1977-07-18 Teijin Ltd Two dimensional orientated film

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01275659A (en) * 1988-04-28 1989-11-06 Du Pont Mitsui Polychem Co Ltd Packaging polyamide film
EP0719631A3 (en) * 1994-12-22 1997-03-19 Toyo Boseki Biaxially oriented polyamide resin film and production thereof
CN1074988C (en) * 1994-12-22 2001-11-21 东洋纺绩株式会社 Double-axle orientation polyamide series resin film and preparation method
WO1997038043A1 (en) * 1996-04-08 1997-10-16 Kolon Industries, Inc. Polyamide film composition
EP0810259A1 (en) * 1996-05-28 1997-12-03 Bayer Ag Polyamid moulding compositions containing nanodisperse fillers and films or hollow articles containing such polyamid layer

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