JPS62237994A - Apparatus for controlling injection of chlorine - Google Patents
Apparatus for controlling injection of chlorineInfo
- Publication number
- JPS62237994A JPS62237994A JP8004586A JP8004586A JPS62237994A JP S62237994 A JPS62237994 A JP S62237994A JP 8004586 A JP8004586 A JP 8004586A JP 8004586 A JP8004586 A JP 8004586A JP S62237994 A JPS62237994 A JP S62237994A
- Authority
- JP
- Japan
- Prior art keywords
- chlorine
- water
- residual
- concentration
- chlorine injection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052801 chlorine Inorganic materials 0.000 title claims abstract description 113
- 239000000460 chlorine Substances 0.000 title claims abstract description 113
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims abstract description 111
- 239000007924 injection Substances 0.000 title claims abstract description 54
- 238000002347 injection Methods 0.000 title claims abstract description 54
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 55
- 239000002351 wastewater Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims abstract description 12
- 238000012937 correction Methods 0.000 claims abstract description 10
- 239000000126 substance Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 2
- 238000002156 mixing Methods 0.000 abstract description 14
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 239000003651 drinking water Substances 0.000 abstract description 2
- 235000020188 drinking water Nutrition 0.000 abstract description 2
- 230000003472 neutralizing effect Effects 0.000 abstract description 2
- 230000001360 synchronised effect Effects 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 241000196324 Embryophyta Species 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000249 desinfective effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000012899 standard injection Substances 0.000 description 1
Landscapes
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明は、残留塩素を含む排水を返送して原水と混合し
再利用する浄水場の塩素注入制御装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a chlorine injection control device for a water purification plant that returns wastewater containing residual chlorine, mixes it with raw water, and reuses it.
(従来の技術)
浄水場における塩素注入制御は、原水の酸化や消毒のた
めに重要であると共に、水処理プロセスである沈でん池
・ろ過池の保護を行ったり、塩素の過剰注入による処理
水品質の低下を防止したり。(Conventional technology) Chlorine injection control in water treatment plants is important for oxidizing and disinfecting raw water, as well as protecting sedimentation basins and filtration basins that are part of the water treatment process, and controlling the quality of treated water due to excessive chlorine injection. and prevent the decline of
薬品費の節約などのために重要な運転操作である。This is an important operation to save on chemical costs.
前塩素注入制御では、原水の塩素要求量の変化や、日射
による残留塩素の分解、風による残留塩素の飛散等が生
じる。このほか、残留塩素を含むろ過池の洗浄排水を返
送して原水とともにrIi利用する場合は、排水返送水
に含まれる塩素と、原水中の塩素消費物質が塩素注入点
に達するまでの間に反応するので、塩素注入点における
処理水中の塩素要求量は、処理水に対する排水返送水の
比率変化とともに変動する。このため排水の返送は制御
外乱となり、処理水の水質を不安定にしていた。Pre-chlorine injection control causes changes in the chlorine demand of raw water, decomposition of residual chlorine due to solar radiation, and scattering of residual chlorine due to wind. In addition, when cleaning wastewater from a filtration basin containing residual chlorine is returned and used for rIi together with raw water, the chlorine contained in the returned wastewater and chlorine-consuming substances in the raw water react before reaching the chlorine injection point. Therefore, the amount of chlorine required in the treated water at the chlorine injection point changes as the ratio of wastewater return water to treated water changes. For this reason, returning the wastewater caused a control disturbance, making the quality of the treated water unstable.
従来このような外乱要素に対しては、塩素注入実行後の
塩素注入率と、塩素注入点より下流で測定した残留塩素
濃度との差から、処理水の塩素要求量を計算し、これに
残留塩素濃度の設定目標値を加えた値を塩素注入率とす
る方法が用いられた。Conventionally, for such disturbance elements, the chlorine demand of the treated water is calculated from the difference between the chlorine injection rate after chlorine injection and the residual chlorine concentration measured downstream of the chlorine injection point, and the residual chlorine is A method was used in which the chlorine injection rate was determined by adding the set target value for the chlorine concentration.
このほか、実行した塩素注入率と残留塩素濃度の測定値
との比から塩素消費率を計算し、この塩素消費率で残留
塩素濃度の目標値を除した値を基準注入率とし、この基
準注入率にさらに残留塩素濃度の用いるPID演算によ
るフィードバック注入率を加算した値を実行すべき塩素
注入率とする方法などがあった。In addition, the chlorine consumption rate is calculated from the ratio of the executed chlorine injection rate and the measured value of the residual chlorine concentration, and the value obtained by dividing the target value of the residual chlorine concentration by this chlorine consumption rate is set as the standard injection rate. There has been a method of setting the chlorine injection rate to be executed as a value obtained by adding a feedback injection rate based on PID calculation using the residual chlorine concentration to the residual chlorine concentration.
(発明が解決しようとする問題点)
上記前者の方法は基本的にはフィードフォワード制御で
あるが、処理水の塩素要求量の計算に、異なる時刻の塩
素注入率と残留塩素濃度の測定値を用いているために、
これらの差から処理水の塩素要求量を正しく計算できな
い。後者の方法では、塩素消費率の計算に、同時刻の塩
素注入率と残留塩素濃度の測定値を用いることによって
前者の欠3一
点を改良している。しかし、後者の方法では、外乱であ
る処理水の塩素要求量の変動がない場合でも、塩素注入
率が高すぎる場合は、残留塩素濃度も高くなるので、前
述のように算出される塩素消費率は低下してしまう。ま
た逆に塩素注入率が低すぎる場合は残留塩素濃度が低く
なって、そのために塩素消費率が高くなる。このことか
ら後者の塩素注入制御は、処理水の塩素要求量の変動と
いう制御の目的である外乱を正しく補償するものではな
い。さらに、後者の方法では、基本的にPID演算によ
るフィードバック制御を使用しているために、塩素注入
点から検水を取水する点までの流下に要する時間や検水
を残留塩素濃度計に導水するまでの時間が制御同期に比
べかなり長いために、排水返送流量の大きな変動に対し
て、制御応答遅れが生じてしまうという問題もあった。(Problem to be solved by the invention) The former method above is basically feedforward control, but the measured values of the chlorine injection rate and residual chlorine concentration at different times are used to calculate the chlorine demand of the treated water. Because it is used,
Based on these differences, the amount of chlorine required for treated water cannot be calculated correctly. The latter method improves the deficiencies of the former by using the measured values of the chlorine injection rate and residual chlorine concentration at the same time to calculate the chlorine consumption rate. However, in the latter method, even if there is no disturbance in the chlorine demand of the treated water, if the chlorine injection rate is too high, the residual chlorine concentration will increase, so the chlorine consumption rate calculated as described above will increase. will decrease. On the other hand, if the chlorine injection rate is too low, the residual chlorine concentration will be low, resulting in a high chlorine consumption rate. For this reason, the latter chlorine injection control does not correctly compensate for the disturbance, which is the objective of the control, which is the fluctuation in the amount of chlorine required for the treated water. Furthermore, since the latter method basically uses feedback control based on PID calculation, there is also the time required for the flow from the chlorine injection point to the point where the sample water is taken, and the amount of time required to guide the sample water to the residual chlorine concentration meter. Since the time required for this is considerably longer than that for control synchronization, there is also the problem that a delay in control response occurs in response to large fluctuations in the flow rate of returned wastewater.
従って、上記のような方法に従って決定された塩素注入
率の制御は、充分に正確なものではなかった・
本発明の目的は、残留塩素を含んだ排水返送水が原水と
混合されるときに、排水返送流量が増減し、被処理水中
にしめる排水返送水の割合が変化したような場合でも、
この外乱に対応して塩素注入の過不足を防止した塩素注
入制御装置を提供することにある。Therefore, the control of the chlorine injection rate determined according to the method described above was not accurate enough. The purpose of the present invention is to control the chlorine injection rate when the wastewater return water containing residual chlorine is mixed with the raw water. Even if the flow rate of wastewater returned increases or decreases, and the ratio of returned wastewater to the treated water changes,
It is an object of the present invention to provide a chlorine injection control device that prevents excessive or insufficient chlorine injection in response to this disturbance.
(問題点を解決するための手段)
本発明は原水と、残留塩素を含む排水返送水とを混合し
た被処理水に対し、塩素を注入し、所定の残留塩素濃度
を得るべく制御を行う塩素注入制御装置に関するもので
、まず第1の演算手段にて塩素注入点の下流に設けた残
留塩素計による被処理水の残留塩素濃度と、予め設定し
た残留塩素濃度目標値との偏差に基づき塩素注入率Sn
を求める。(Means for Solving the Problems) The present invention provides chlorine that is controlled to obtain a predetermined residual chlorine concentration by injecting chlorine into treated water that is a mixture of raw water and wastewater return water containing residual chlorine. This relates to an injection control device, and first, a first calculation means calculates chlorine based on the difference between the residual chlorine concentration of the water to be treated measured by a residual chlorine meter installed downstream of the chlorine injection point and a preset residual chlorine concentration target value. Injection rate Sn
seek.
次に、この第1の演算手段にて求めた塩素注入率Snを
基に、第2の演算手段により被処理水流量に対する前記
排水返送水の割合の変化および前記原水中の塩素を消費
する物質の濃度を用いて補正を行い、実際に注入すべき
塩素注入率S。′を求めるものである。Next, based on the chlorine injection rate Sn determined by the first calculation means, the second calculation means determines the change in the ratio of the wastewater return water to the flow rate of the water to be treated and the substances that consume chlorine in the raw water. The actual chlorine injection rate S that should be corrected using the concentration of S. ′.
(作用)
本発明では、第1の演算手段で求めた、排水返送水量が
変化しない場合の塩素注入率に対し、第2の演算手段に
て排水返送水量が変化した場合の補正演算を行うので、
排水返送水の変化という外乱に対して塩素注入の過不足
を生じることなく制御することができる。(Function) In the present invention, the second calculation means performs a correction calculation when the amount of returned waste water changes with respect to the chlorine injection rate obtained by the first calculation means when the amount of returned waste water does not change. ,
Disturbances such as changes in wastewater return water can be controlled without over- or under-injection of chlorine.
(実施例) 本発明の一実施例を第1図を参照して説明する。(Example) An embodiment of the present invention will be described with reference to FIG.
第1図において図示しない取水源から取水された原水と
、排水返送水はそれぞれ別々に着水井1へ導水され、着
水井1で混合後、流量計2を経て混和池3へ流下する。In FIG. 1, raw water taken from a water intake source (not shown) and wastewater return water are each separately led to a landing well 1, mixed in the landing well 1, and then flowed down to a mixing pond 3 via a flow meter 2.
この着水井]−から混和池3へ流下する途中にて、塩素
が注入されると共に、凝集計や中和剤などが、それぞれ
対応する図示しない注入機から注入され、混和池3で混
合される。On the way from this landing well to the mixing pond 3, chlorine is injected, and a flocculometer, neutralizing agent, etc. are injected from corresponding injection machines (not shown) and mixed in the mixing pond 3. .
混和池3を流出した被処理水は、さらにフロック形成池
4へ流下する。被処理水の一部は混和池3の出10付近
で検水ポンプ5によって取水され、残留塩素濃度を測定
する残留塩素計(以下残塩計)6に導かれる。The water to be treated that has flowed out of the mixing pond 3 further flows down to the floc formation pond 4. A portion of the water to be treated is taken by a water test pump 5 near the outlet 10 of the mixing pond 3, and is led to a residual chlorine meter (hereinafter referred to as a residual salt meter) 6 that measures the residual chlorine concentration.
7は第1の演算手段で残塩計6の信号R8を入力し、設
定器8によって設定された残留塩素濃度の制御目標設定
値Svを用いて下記の数式により塩素注入率のフィード
バック修正量ΔSを演算する。7 is a first calculation means which inputs the signal R8 of the residual salt meter 6, and uses the control target set value Sv of the residual chlorine concentration set by the setting device 8 to calculate the feedback correction amount ΔS of the chlorine injection rate according to the following formula. Calculate.
E N = S V Re
”’(1)△5=Kp(EN EN’)+Ki・EN
・・・■ここでENは今回制御周期の入力偏差、EN’
は前回制御周期の入力偏差、KPは比例ゲイン、K。E N = S V Re
”'(1)△5=Kp(EN EN')+Ki・EN
...■Here, EN is the input deviation of the current control cycle, EN'
is the input deviation of the previous control cycle, KP is the proportional gain, and K.
は積分ゲインである。is the integral gain.
第1の演算手段7は上述のようにして得たフィードバッ
ク修正量△Sを用いて今回制御周期の塩素注入率目標値
Snを次式により計算する。The first calculation means 7 uses the feedback correction amount ΔS obtained as described above to calculate the target value Sn of the chlorine injection rate for the current control cycle according to the following equation.
5n=Sn−、+△S ・・・■ここでS
n−1は前回制御周期の塩素注入率目標値である。5n=Sn-, +△S...■Here S
n-1 is the chlorine injection rate target value of the previous control cycle.
第2の演算手段9は、排水返送水流量計10によって測
定した流量q、混和池3の入口に設けた流量計2の測定
流量Q、および残塩計6による混和池3の出口の残留塩
素濃度R0と、設定器11によって設定されたパラメー
タ、および第1の演算手段7からの出力値である塩素注
入率目標値S。を入力値として、塩素注入率目標値Sn
を次式によって修正する。The second calculation means 9 calculates the flow rate q measured by the wastewater return water flow meter 10, the measured flow rate Q of the flow meter 2 provided at the inlet of the mixing basin 3, and the residual chlorine at the outlet of the mixing basin 3 by the residual salt meter 6. The concentration R0, the parameters set by the setting device 11, and the chlorine injection rate target value S which is the output value from the first calculation means 7. As input value, chlorine injection rate target value Sn
is modified by the following equation.
Sn’=So+K ・・・(ハ)ここ
でS。′は修正後の塩素注入率目標値、には次式に示す
ように、後述する条件Pによって異なる値をとる排水返
送流量による補正注入率である。Sn'=So+K...(c) Here S. ' is a corrected chlorine injection rate target value, which is a corrected injection rate based on the wastewater return flow rate, which takes a different value depending on the condition P described later, as shown in the following equation.
ここで、 qnは今回の制御周期の排水返送流量。Here, qn is the wastewater return flow rate for the current control cycle.
’In−5は前回の制御周期の排水返送流量、に、はパ
ラメータである。 またCdは原水に含まれている塩素
を消費する物質の濃度である。'In-5 is the waste water return flow rate in the previous control cycle, and is a parameter. Further, Cd is the concentration of a substance that consumes chlorine contained in raw water.
また条件Pは、次の3項目がすべて成立することである
。Further, condition P is that all of the following three items are satisfied.
一/− ■−〉k2である。1/- ■->k2.
■(qnっ> q nかつR6≧Rch)ではない。■(qn>qn and R6≧Rch) is not true.
■(qn−t<qnかつRc≦Rnj)ではない。(2) (qn-t<qn and Rc≦Rnj).
ただし、k2. Roh、 Ro、はパラメータである
。However, k2. Roh, Ro, is a parameter.
ここで、上記条件のが成立しない場合は、排水返送水量
’Tnが充分に少ないため、 その残留塩素による影響
がなく、補正をする必要がない。また、条件■が成立し
ない場合は、被処理水中の残留塩素濃度R9が高すぎ、
これを低下させる制御を行うが、今回の排水返送水量
が減少しているため、このままでも残留塩素濃度は低下
する。補正を行うど、低下の度合が反対に少なくなる。Here, if the above conditions do not hold, the amount of returned wastewater 'Tn is sufficiently small, so there is no influence from the residual chlorine and there is no need to make corrections. In addition, if condition ① does not hold, the residual chlorine concentration R9 in the water to be treated is too high.
Control is carried out to reduce this, but since the amount of wastewater returned this time has decreased, the residual chlorine concentration will continue to decrease. When correction is performed, the degree of decrease becomes smaller.
従って補正は行わない。条件■が成立しない場合は、条
件■と反対で、被処理水の残留塩素濃度R8が低すぎ、
これを高める制御を行うが、今回の排水返送水qnが増
えているので、 このままでも残留塩素濃度は上昇する
。補正を行うと上昇の度合が反対に少なくなる。従って
補正は行わない。Therefore, no correction is made. If condition ■ does not hold, it is the opposite of condition ■, and the residual chlorine concentration R8 of the water to be treated is too low.
Controls will be implemented to increase this, but since the amount of returned wastewater qn has increased, the residual chlorine concentration will continue to rise. If correction is performed, the degree of increase will be reduced. Therefore, no correction is made.
なおパラメータに1. k2. Rch、 RcJは、
プラント特有の定数で、プラントの運転データを解析す
ることによって決める。なお、第2の演算手段9には上
記のパラメータを手動設定できる設定器11を設け、オ
ペレータの判断にもとづいて、その値を修正することも
可能である。Note that the parameters are 1. k2. Rch, RcJ are
This is a plant-specific constant that is determined by analyzing plant operating data. It should be noted that the second calculation means 9 is provided with a setting device 11 that can manually set the above-mentioned parameters, and it is also possible to modify the values based on the operator's judgment.
上記第2の演算手段9によって塩素注入率目標値Sn′
を演算する過程を第2図に示す。The second calculation means 9 determines the target value Sn' of the chlorine injection rate.
The process of calculating is shown in Figure 2.
第3図に排水返送流量が変化した場合の効果を示す。従
来方法の場合では、排水返送流量が変化すると、混和池
の残留塩素濃度も変化し、水質が不安定である。本発明
による方法では、混和池の残留塩素濃度は急変すること
く、良好に塩素注入制御がおこなわれている。Figure 3 shows the effect when the wastewater return flow rate changes. In the case of the conventional method, when the wastewater return flow rate changes, the residual chlorine concentration in the mixing pond also changes, resulting in unstable water quality. In the method according to the present invention, the residual chlorine concentration in the mixing pond does not change suddenly, and chlorine injection is well controlled.
以上説明したように、本発明の塩素2+入制御装置で塩
素注入を行えば、従来法では対応困難であった、残留塩
素を含む排水返送流量の変化時においても、塩素の自動
注入が可能となり、衛生的で安定した水質の飲料水の供
給ができる。As explained above, if chlorine is injected using the chlorine 2+ input control device of the present invention, it becomes possible to automatically inject chlorine even when the return flow rate of wastewater containing residual chlorine changes, which was difficult to deal with with conventional methods. , it is possible to supply drinking water of hygienic and stable quality.
第1図は本発明による塩素注入制御装置の−実施例を示
すブロック図、第2図は本発明の一実施例における制御
装置の計算の流れを示すフローチャート、第3図は本発
明による効果を従来と比較して示す特性図である。
1・・・着水井 2・・・流量計3・・・混和
池 5・・・検水ポンプ6・・残塩計
7・・・第1の演算手段8・・・設定器 9
・・・第2の演算手段10・・・排水返送流量計 11
・・・設定器代理人 弁理士 則 近 憲 佑
同 三俣弘文
第2図
崎間
(床束に;法) 特開
第3図Fig. 1 is a block diagram showing an embodiment of the chlorine injection control device according to the present invention, Fig. 2 is a flowchart showing the calculation flow of the control device in an embodiment of the present invention, and Fig. 3 shows the effects of the present invention. It is a characteristic diagram shown in comparison with the conventional one. 1... Water landing well 2... Flow meter 3... Mixing pond 5... Water test pump 6... Residual salt meter
7... First calculating means 8... Setting device 9
... Second calculation means 10 ... Drainage return flowmeter 11
...Setting device agent Patent attorney Nori Chika Ken Yudo Hirofumi Mitsumata Figure 2 Sakima (Tokoban; Law) Unexamined Patent Publication Figure 3
Claims (1)
水に対し、塩素を注入し、所定の残留塩素濃度を得るべ
く制御を行う塩素注入制御装置において、 塩素注入点の下流に設けた残留塩素計による被処理水の
残留塩素濃度と、予め設定した残留塩素濃度目標値との
偏差に基づき塩素注入率S_nを求める第1の演算手段
と、 この第1の演算手段にて求めた塩素注入率S_nを基に
、被処理水流量に対する前記排水返送水の割合の変化お
よび前記原水中の塩素を消費する物質の濃度を用いて補
正を行い、実際に注入すべき塩素注入率S_n′を求め
る第2の演算手段と、を備えたことを特徴とする塩素注
入制御装置。[Scope of Claim] A chlorine injection control device that injects chlorine into treated water that is a mixture of raw water and wastewater return water containing residual chlorine, and performs control to obtain a predetermined residual chlorine concentration, comprising: a first calculating means for calculating a chlorine injection rate S_n based on the deviation between the residual chlorine concentration of the water to be treated measured by the residual chlorine meter installed downstream of the point and a preset residual chlorine concentration target value; Based on the chlorine injection rate S_n obtained by the method, correction is made using the change in the ratio of the wastewater return water to the flow rate of the water to be treated and the concentration of the substance that consumes chlorine in the raw water, and the actual injection rate is determined. A chlorine injection control device comprising: second calculation means for determining a chlorine injection rate S_n'.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8004586A JPS62237994A (en) | 1986-04-09 | 1986-04-09 | Apparatus for controlling injection of chlorine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8004586A JPS62237994A (en) | 1986-04-09 | 1986-04-09 | Apparatus for controlling injection of chlorine |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62237994A true JPS62237994A (en) | 1987-10-17 |
Family
ID=13707270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8004586A Pending JPS62237994A (en) | 1986-04-09 | 1986-04-09 | Apparatus for controlling injection of chlorine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62237994A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01231990A (en) * | 1988-03-14 | 1989-09-18 | Toshiba Corp | Apparatus for controlling injection of chlorine into water purification plant |
JPH03165892A (en) * | 1989-11-22 | 1991-07-17 | Meidensha Corp | Controller for preinjection of chlorine in water purifying plant |
-
1986
- 1986-04-09 JP JP8004586A patent/JPS62237994A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01231990A (en) * | 1988-03-14 | 1989-09-18 | Toshiba Corp | Apparatus for controlling injection of chlorine into water purification plant |
JPH03165892A (en) * | 1989-11-22 | 1991-07-17 | Meidensha Corp | Controller for preinjection of chlorine in water purifying plant |
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