JPS62231212A - Production of optical shutter element - Google Patents

Production of optical shutter element

Info

Publication number
JPS62231212A
JPS62231212A JP7375286A JP7375286A JPS62231212A JP S62231212 A JPS62231212 A JP S62231212A JP 7375286 A JP7375286 A JP 7375286A JP 7375286 A JP7375286 A JP 7375286A JP S62231212 A JPS62231212 A JP S62231212A
Authority
JP
Japan
Prior art keywords
substrate
grooves
electrode
groove
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7375286A
Other languages
Japanese (ja)
Inventor
Yukio Toyoda
幸夫 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP7375286A priority Critical patent/JPS62231212A/en
Publication of JPS62231212A publication Critical patent/JPS62231212A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To easily form an optical shutter element by grinding away the other metallic film except the metallic films formed in grooves or further depositing and forming a pair of power feed electrodes which connect the parallel arranged grooves for the electrodes alternately at every other grooves. CONSTITUTION:A substrate 10 is sliced to a square plate shape from a sintered PLZT body having 9atom% substitution quantity of La with Pb and 65/35 Zr/Ti ratio. Such substrate is provided with the grooves by machining with a cutter edged on the outside periphery at the set width of the light transmission surface. More specifically, the grooves 11, 12 for the electrodes cut from one long side end toward the other side end are alternately disposed in such a manner that the directions thereof are made opposite from each other. The substrate is then subjected to a stress relief heat treatment in the atm. and in succession, the substrate 10 is immersed in an electroless copper plating liquid and is subjected to an electroless copper plating treatment by which a copper film 13 for the electrode is deposited over the entire surface of the substrate 10. Both the main faces of the substrate 10 are polished to the required roughness by a lapping machine and the short side end faces are cut.

Description

【発明の詳細な説明】 利用産業分野 この発明は、電気光学効果を利用した光シャッタ素子の
製造方法に係り、一対の櫛歯状溝型電極を対向させ、相
互の溝を平行に配置した構成からなり、深溝かつ狭幅の
電極溝を設けた光シャッタ素子の製造方法に関する。
[Detailed Description of the Invention] Field of Application The present invention relates to a method of manufacturing an optical shutter element using an electro-optic effect, and has a structure in which a pair of comb-shaped groove electrodes are opposed and their grooves are arranged parallel to each other. The present invention relates to a method of manufacturing an optical shutter element having deep and narrow electrode grooves.

背景技術 電気光学効果を利用した光シャッタは、偏光方向が相互
に直交する一対の偏光子間に、(PbLa)(ZrTL
 ) o3. LLNbOs、 BL+z SLO2o
等のセラミックス基板からなり、電界方向が入射光の偏
光方向と45°の交差角度を形成した光シャッタ素子を
配置して構成し、光学式プリンタの書込みデバイス、光
学カメラのシャッタなど、あるいは、立体眼鏡や溶接用
保護眼鏡などの多用途の適用が考えられている。
BACKGROUND ART An optical shutter that utilizes the electro-optic effect uses (PbLa) (ZrTL) between a pair of polarizers whose polarization directions are orthogonal to each other.
) o3. LLNbOs, BL+z SLO2o
It is constructed by arranging an optical shutter element whose electric field direction forms an intersection angle of 45° with the polarization direction of incident light, and is used as a writing device of an optical printer, a shutter of an optical camera, etc., or a three-dimensional Multipurpose applications such as eyeglasses and protective goggles for welding are being considered.

かかる光シャッタ素子として、第6図に示す如く、予め
鏡面研摩された基板(1)の表裏面の各々に、一対の柵
状の平面電極(2)(3)を、その歯状部を交互に入り
込ませて配置し、給電部(2a) (3a)と電極部(
2b) (3b)とからなる所謂平面電極型構成が知ら
れている。
As such an optical shutter element, as shown in FIG. 6, a pair of fence-shaped planar electrodes (2) and (3) are placed on each of the front and back surfaces of a substrate (1) which has been mirror-polished in advance, with the toothed portions alternately arranged. Place the power supply part (2a) (3a) and the electrode part (
2b) A so-called planar electrode type structure consisting of (3b) is known.

しかし、上記構成では、所要電極部(2b)(3b)が
基板(1)表面に形成されているため、電界は基板(1
)内部に充分浸透せず、基板(1)表面に集中して駆動
電圧を高くする必要があるなどの問題があり、ざらに、
前記電極は鏡面仕上表面に形成するため、付着力が弱く
、高駆動電圧の印加により、剥離、損傷し易い問題があ
った。
However, in the above configuration, since the required electrode portions (2b) and (3b) are formed on the surface of the substrate (1), the electric field is
) There are problems such as not penetrating into the inside sufficiently, and it is necessary to increase the driving voltage to concentrate on the surface of the substrate (1).
Since the electrodes are formed on mirror-finished surfaces, they have weak adhesion and are easily peeled off and damaged by application of high driving voltages.

これを解消した構成の光シャッタ素子として、第7図に
示す所謂溝型構成が知られている。すなわち、基板(1
)に多数の平行溝を設け、基板(1)の両側端面に形成
した給電電極(4a) (5a)に、前記平行溝を1つ
おきに交互に電気的に接続して電極部(4b) (5b
)となした溝型電極(4X5)を配置した構成からなる
As an optical shutter element having a structure that eliminates this problem, a so-called groove type structure shown in FIG. 7 is known. That is, the substrate (1
) are provided with a large number of parallel grooves, and every other parallel groove is electrically connected alternately to power supply electrodes (4a) (5a) formed on both end surfaces of the substrate (1) to form an electrode portion (4b). (5b
) with groove-shaped electrodes (4 x 5) arranged.

溝表面に電極材料を被着させた溝型電極(4X5)構成
では、電界が基板(1)内部まで有効に浸透分布するた
め、前記の第6図の構成に比べて、駆動電圧の低減が図
られるが、さらに駆動電圧を下げ、基板(1)の光透過
面積を可能な限り拡げて透過損失の低減を図るには、溝
型電極の溝深さを深くし、かつ溝幅を狭くする必要があ
る。
In the groove-type electrode (4×5) configuration in which the electrode material is deposited on the groove surface, the electric field effectively penetrates and distributes to the inside of the substrate (1), so the driving voltage can be reduced compared to the configuration shown in FIG. 6 above. However, in order to further reduce the driving voltage and expand the light transmission area of the substrate (1) as much as possible to reduce transmission loss, the groove depth of the groove electrode should be made deeper and the groove width narrower. There is a need.

該溝型電極(4X5)の凹状溝部に、所要の電極材料を
被着させるには、公知のスパッタ、蒸着方法等の手段で
は形成困難であり、通常は、導電性ベーストを塗布する
方法が採用されているが、溝部表面に均一かつ所要の付
着強度にて電極材料を付着させるには、必然的に溝部の
深さ及び幅に制限を生じ、駆動電圧及び透過損失の低減
が困難であるばかりか、製造工程も煩雑で、工業的量産
規模で製造するには不適であり、製造性の改善が切望さ
れている。
It is difficult to apply the required electrode material to the concave grooves of the groove-shaped electrode (4×5) using known methods such as sputtering and vapor deposition, and a method of applying a conductive base is usually adopted. However, in order to adhere the electrode material uniformly and with the required adhesion strength to the groove surface, the depth and width of the groove are inevitably limited, making it difficult to reduce the driving voltage and transmission loss. Moreover, the manufacturing process is complicated, making it unsuitable for manufacturing on an industrial mass production scale, and there is a strong need for improvement in manufacturability.

発明の目的 この発明は、一対の櫛歯状溝型電極を対向させ、相互の
溝を平行に配置した構成からなる光シャッタ素子を容易
に製造できる製造方法を目的とし、均一かつ高付着強度
の金属膜を有する深溝かつ狭幅の溝型電極を設けること
ができる光シャッタ素子の製造方法を目的としている。
Purpose of the Invention The object of the present invention is to provide a manufacturing method that can easily manufacture an optical shutter element consisting of a pair of comb-shaped groove electrodes facing each other with their grooves arranged in parallel. The object of the present invention is to provide a method for manufacturing an optical shutter element that can provide a deep and narrow groove-type electrode having a metal film.

発明の構成 この発明は、電気光学効果を有する板状の基板表面に、
平行に配列した多数の電極用溝あるいはさらに給電用電
極溝を形成し、無電界めっき法にて基板全面に電極用金
属膜を形成したのち、少なくとも前記溝内に形成された
金属膜を残して、他面の金属膜を研削除去し、あるいは
さらに、平行配列した電極用溝を1つおきに交互に接続
する1対の給電用電極を被着形成したことを特徴とする
光シャッタ素子の製造方法である。
Structure of the Invention The present invention provides an electro-optic effect on the surface of a plate-shaped substrate.
After forming a large number of electrode grooves arranged in parallel or further forming a power feeding electrode groove, and forming an electrode metal film on the entire surface of the substrate by electroless plating, at least the metal film formed in the grooves is left. , manufacturing an optical shutter element characterized in that the metal film on the other surface is removed by polishing, or further a pair of power supply electrodes are formed by alternately connecting every other electrode groove arranged in parallel. It's a method.

ざらに詳述すると、この発明による製造方法は、ポッケ
ルス効果、カー効果等の電気光学効果を有する(PbL
a)(ZrTi) 03 (以下PLZTという)。
To explain in detail, the manufacturing method according to the present invention has electro-optic effects such as Pockels effect and Kerr effect (PbL
a) (ZrTi) 03 (hereinafter referred to as PLZT).

LL隆03. BL+2SLOro等の公知のセラミッ
クス基板に、 基板組成や溝の形状寸法等に応じて選定する外周刃カッ
ターによる機械加工、レーザー加工、エツチング等の方
法にて、所要の電極溝を形成し、また必要に応じて、歪
取り熱処理し、 前記基板全体に、無電界めっき法にて、Qt、 NL。
LL Takashi 03. The required electrode grooves are formed on a known ceramic substrate such as BL+2SLOro by a method such as machining with a peripheral blade cutter, laser processing, etching, etc. selected according to the substrate composition and the shape and size of the groove, etc. Accordingly, heat treatment is performed to remove strain, and Qt and NL are applied to the entire substrate by electroless plating.

M等の電極用金属を、通常11s〜3IXn程度の膜厚
で被着させ、 電極溝内に形成された金属膜及びこれに接続して給電用
電極を形成するように所要部の金属膜を残して、他面の
金属膜を研摩あるいは切削等にて研削除去するとともに
、光透過面を鏡面仕上げし、あるいは、電極溝内に形成
された金属膜を残して、他面の金属膜を研削除去すると
ともに、光透過面を鏡面仕上げし、ざらに、該電極溝を
1つおきに交互に接続する2の給電用電極を、別途被着
形成することを特徴とする。
Deposit an electrode metal such as M at a film thickness of usually about 11s to 3IXn, and then cover the metal film formed in the electrode groove and the metal film in the required parts so as to connect to this and form the power supply electrode. The metal film on the other side is removed by polishing or cutting, and the light transmitting surface is polished to a mirror finish, or the metal film on the other side is polished while leaving the metal film formed in the electrode groove. At the same time, the light transmitting surface is polished to a mirror finish, and two power feeding electrodes are separately formed to alternately connect every other electrode groove.

この発明による製造方法は、深溝かつ狭幅の溝部表面に
、Cu、 NL、 Al1等の電極用金属膜を均一でか
つ高付着強度で形成することができ、従来製法による光
シャッタ素子に比べて、電気抵抗及び駆動電圧が低く、
かつ透過損失の低減を図ることができる。
The manufacturing method according to the present invention can uniformly form an electrode metal film such as Cu, NL, Al1, etc. on the surface of a deep and narrow groove with high adhesion strength, and is superior to optical shutter elements manufactured using conventional methods. , low electrical resistance and driving voltage;
Moreover, transmission loss can be reduced.

発明の図面に基づく開示 第1図はこの発明による製造工程を示す斜視説明図であ
る。第2図から第5図はこの発明方法による光シャッタ
素子の斜視説明図である。なお、図面は全て溝部を誇張
して図示しである。
DISCLOSURE OF THE INVENTION BASED ON DRAWINGS FIG. 1 is a perspective explanatory view showing a manufacturing process according to the invention. 2 to 5 are perspective explanatory views of an optical shutter element according to the method of this invention. Note that in all the drawings, the groove portions are exaggerated.

第1図に基づいて、この発明による製造工程を説明する
と、基板(10)は、円に対する1の置換量が9原子%
、Zr / Ti比が65/35からなるPLZT焼結
体より、スライス加工にて得た、幅30+rur+X長
さ40ff1mX厚み0.5mmの方形板状からなる。
To explain the manufacturing process according to the present invention based on FIG. 1, the substrate (10) has a substitution amount of 1 with respect to a circle of 9 at.
, a rectangular plate shape of width 30 + rur + x length 40 ff 1 m x thickness 0.5 mm obtained by slicing from a PLZT sintered body with a Zr / Ti ratio of 65/35.

つぎに基板(10)に、外周刃カッターにて機械加工し
て光透過面幅を0.21T1mに設定し、溝幅0.02
mmX深さ0.3mm寸法の溝が設けである。すなわち
、8図に示す如く、一方の長辺側端より他方側端へ向っ
て切られた電極用溝(11)(12)を方向が逆になる
よう交互に配置しておる。
Next, the substrate (10) is machined using a peripheral blade cutter to set the light transmission surface width to 0.21T1m, and the groove width to 0.02T1m.
A groove with dimensions of mm x depth 0.3 mm is provided. That is, as shown in FIG. 8, the electrode grooves (11) and (12) cut from one long side end to the other side end are alternately arranged so that the directions are reversed.

上記の溝加工を行なった後、500℃の大気中で、1時
間の歪み取り熱処理を行ない、続いて、60℃の無電界
銅めっき液中に、基板(10)を浸漬し、30分間の無
電界めっき処理し、基板(10)の全面に厚みO,00
2mmの電極用銅vA(13)を被着した。
After the above-mentioned groove processing, the substrate (10) was subjected to strain relief heat treatment for 1 hour in the air at 500°C, and then immersed in an electroless copper plating solution at 60°C for 30 minutes. Electroless plating is applied to the entire surface of the substrate (10) to a thickness of O.
2 mm of electrode copper vA (13) was deposited.

ざらに、ラップ盤にて、基板(10)の両主面を所要粗
度まで研摩し、短辺側端面を切削することにより、電極
用溝(11)(12)内及び長辺側端面の電極用銅膜(
13)を残し、D図に示すように、基板(10)に長辺
側端面の電極用銅膜を給電用電極(14a)(15a)
とする溝型電極(14)(15)を有し、光透過面(1
6)が鏡面研摩された光シャッタ素子を1ワることがで
きる。
Roughly polish both main surfaces of the substrate (10) to the required roughness using a lapping machine, and cut the short side end faces to form the inside of the electrode grooves (11) and (12) and the long side end faces. Copper film for electrodes (
13), and as shown in Figure D, the copper film for electrodes on the long side end face of the substrate (10) is attached to the power supply electrodes (14a) (15a).
It has groove-shaped electrodes (14) and (15) with a light transmitting surface (1
6) The mirror-polished optical shutter element can be manufactured by one wire.

また、第2図に示す光シャッタ素子は、基板(20)に
、レーザー加工にて、主面の長手方向両端側に帯状部を
残して複数の平行な電極用溝部を設けたのち、全面に無
電界めっき処理にて、所要の電極用金属膜を被着し、つ
いで、該溝部内の電極用金属膜を残して、他面を全て研
摩し、溝型の電極部(21b) (22b)を設け、ざ
らに、前記の帯状部に電極用金属膜を被着して、給電用
電極部(21a)(22a)となし、一対の櫛歯状溝型
電極(21) (22)を形成しである。
The optical shutter element shown in FIG. 2 is manufactured by forming a plurality of parallel electrode grooves on the substrate (20) by laser processing, leaving strips on both ends of the main surface in the longitudinal direction. A required metal film for electrodes is deposited by electroless plating, and then the entire other surface is polished, leaving the metal film for electrodes in the grooves, to form groove-shaped electrode parts (21b) (22b). A metal film for electrodes is roughly coated on the band-shaped portion to form the power feeding electrode portions (21a) (22a), and a pair of comb-teeth groove type electrodes (21) (22) are formed. It is.

第3図に示す光シャッタ素子は、レーザー加工により、
基板(30)に、長手方向の給電用電極溝(31a) 
(32a)に連続する多数の電極用溝(31b) (3
2b)を有する一対の櫛歯状の電極溝(31)(32)
を設け、基板(30)全体に無電界めっき処理にて所要
の電極用金属膜を被着し、さらに、表面を研摩して電極
溝(31)(32)内の金属膜以外のすべての金属膜を
除去し、溝間の光透過面を鏡面研摩面となし、溝表面に
均一かつ強固に付着した電極用金属膜を有する溝型電極
(31)(32)を形成したものである。
The optical shutter element shown in Fig. 3 is made by laser processing.
The substrate (30) has a longitudinal power feeding electrode groove (31a).
(32a) and a large number of electrode grooves (31b) (3
2b) a pair of comb-shaped electrode grooves (31) (32)
A required electrode metal film is deposited on the entire substrate (30) by electroless plating, and the surface is polished to remove all metals other than the metal film in the electrode grooves (31) and (32). The film is removed, the light transmitting surface between the grooves is made into a mirror-polished surface, and groove-shaped electrodes (31) and (32) having a metal film for electrodes uniformly and firmly adhered to the groove surface are formed.

第4図に示す光シャッタ素子は、円板状の基板(40)
主面に機械加工によって、一方が円周端面に達する溝部
を交互に方向を変えて配設し、その後、無電界めっき処
理にて所要厚みの金属膜を被着し、両主面並びに溝方向
に直交する直径方向の対向円周面部(43)の金属膜を
除去することにより、基板(40)の一方の円周端面の
電極用金属膜を給電用電極(41aH42a)とする溝
型電極(41)(42)を有し、光透過面が鏡面研摩さ
れた構成の光シャッタ素子である。
The optical shutter element shown in FIG. 4 has a disk-shaped substrate (40).
Grooves, one of which reaches the circumferential end surface, are arranged in alternating directions by machining on the main surface, and then a metal film of the required thickness is deposited by electroless plating, and the grooves are formed on both main surfaces as well as in the groove direction. By removing the metal film on the opposing circumferential surface part (43) in the diametrical direction perpendicular to , a groove-shaped electrode ( 41) and (42), and has a mirror-polished light transmitting surface.

第5図に示す光シャッタ素子は、レーザー加工により、
基板(50)に、円周方向の給電用電極溝(51a) 
(52a)に連続しである直径方向に平行な多数の電極
用溝(51b) (52b)を有する一対の櫛歯状の電
極溝(51)(52)を設け、基板(50)仝休に無電
界めっき処理にて所要の電極用金属膜を被着し、ざらに
、表面を研摩して電極溝(51H52)内の金属膜以外
のすべての金属膜を除去し、溝間の光透過面を鏡面研摩
面となし、溝表面に均一かつ強固に付着した電極用金属
膜を有する溝型電極(51)(52)を形成したもので
ある。
The optical shutter element shown in Fig. 5 is made by laser processing.
A power feeding electrode groove (51a) is provided in the circumferential direction on the substrate (50).
(52a) is provided with a pair of comb-shaped electrode grooves (51) and (52) having a large number of electrode grooves (51b) and (52b) that are continuous and parallel to the diameter direction, and the substrate (50) is A required metal film for electrodes is deposited by electroless plating, and the surface is roughly polished to remove all metal films except those in the electrode grooves (51H52), and the light-transmitting surface between the grooves is removed. Groove-shaped electrodes (51) and (52) are formed with a mirror-polished surface and a metal film for electrodes uniformly and firmly adhered to the groove surface.

発明の効果 ちなみに、第1図り図の光シャッタ素子を用い、その両
側に偏光子を配置して光シャッタに溝成し、波長0.6
331sのレーザ光を透過させたとき、駆動電圧75V
にて良好な作動を示した。
Effects of the invention Incidentally, using the optical shutter element shown in the first diagram, polarizers are placed on both sides of the optical shutter element to form a groove in the optical shutter, and the wavelength is 0.6.
When 331 seconds of laser light is transmitted, the driving voltage is 75V.
It showed good operation.

導電ペーストを塗布して製造する従来の一対の櫛歯状溝
型電極を有する光シャッタ素子は、量産規模にお(プる
溝寸法は、幅及び深さともに0.1mm程度が限度であ
ったが、この発明による製造方法では、均一にかつ付着
強度の高い金属膜を有する溝型電極を、深さ0.5mm
、溝幅0.01〜0.02 mm程度にまで深溝、狭幅
とすることができ、駆動電圧の低減、並びに透過面積に
拡大に伴ない透過損失の大幅な低減が可能となり、さら
には、安価な銅等の金属膜を短時間で簡単に被着させる
ことができ、製造工程数も少なく、光シャッタ素子を安
価に提供できる。
Conventional optical shutter elements with a pair of comb-shaped groove electrodes manufactured by applying conductive paste have been manufactured on a mass production scale (the groove dimensions were limited to approximately 0.1 mm in both width and depth). However, in the manufacturing method according to the present invention, a groove-shaped electrode having a uniform metal film with high adhesion strength is formed to a depth of 0.5 mm.
, it is possible to make the groove deep and narrow to about 0.01 to 0.02 mm, and it is possible to reduce the driving voltage and significantly reduce the transmission loss as the transmission area increases. An inexpensive metal film such as copper can be easily deposited in a short time, the number of manufacturing steps is small, and an optical shutter element can be provided at low cost.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明による製造工程を示ず斜視説明図であ
る。第2図から第5図はこの発明方法による光シャッタ
素子の斜視説明図である。第6図と第7図は従来方法に
よる光シャッタ素子の斜視説明図である。 1、10.20.30.40.50・・・基板、11.
12・・・電極用溝、13・・・電極用銅膜、14.1
5・・・溝型電極、14a、 15a、 21a、 2
2a、 41a、 42a・・・給電用電極、21b、
 22b、 31b、 32b、 51b、 52b・
・・電極用溝、31a、 32a、 sia、 52a
・・・給電用電極溝、(A)           (
B) (C)              (D)第2図 第3図 第6図 h 第7図
FIG. 1 is a perspective explanatory view without showing the manufacturing process according to the present invention. 2 to 5 are perspective explanatory views of an optical shutter element according to the method of this invention. 6 and 7 are perspective explanatory views of an optical shutter element according to a conventional method. 1, 10.20.30.40.50...substrate, 11.
12...Groove for electrode, 13...Copper film for electrode, 14.1
5... Groove electrode, 14a, 15a, 21a, 2
2a, 41a, 42a... power feeding electrode, 21b,
22b, 31b, 32b, 51b, 52b・
...Groove for electrode, 31a, 32a, sia, 52a
...Electrode groove for power feeding, (A) (
B) (C) (D) Figure 2 Figure 3 Figure 6 h Figure 7

Claims (1)

【特許請求の範囲】[Claims] 1 電気光学効果を有する板状の基板表面に、平行に配
列した多数の電極用溝あるいはさらに給電用電極溝を形
成し、無電界めっき法にて基板全面に電極用金属膜を形
成したのち、少なくとも前記溝内に形成された金属膜を
残して、他面の金属膜を研削除去し、あるいはさらに、
平行配列した電極用溝を1つおきに交互に接続する1対
の給電用電極を被着形成したことを特徴とする光シャッ
タ素子の製造方法。
1. On the surface of a plate-shaped substrate having an electro-optic effect, a large number of electrode grooves arranged in parallel or further electrode grooves for power feeding are formed, and a metal film for electrodes is formed on the entire surface of the substrate by electroless plating. At least the metal film formed in the groove is left and the metal film on the other side is removed by polishing, or further,
1. A method of manufacturing an optical shutter element, characterized in that a pair of power feeding electrodes are formed by alternately connecting every other electrode groove arranged in parallel.
JP7375286A 1986-03-31 1986-03-31 Production of optical shutter element Pending JPS62231212A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7375286A JPS62231212A (en) 1986-03-31 1986-03-31 Production of optical shutter element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7375286A JPS62231212A (en) 1986-03-31 1986-03-31 Production of optical shutter element

Publications (1)

Publication Number Publication Date
JPS62231212A true JPS62231212A (en) 1987-10-09

Family

ID=13527293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7375286A Pending JPS62231212A (en) 1986-03-31 1986-03-31 Production of optical shutter element

Country Status (1)

Country Link
JP (1) JPS62231212A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0296711A (en) * 1988-10-03 1990-04-09 Sumitomo Special Metals Co Ltd Production of optical shutter element

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5052997A (en) * 1973-09-10 1975-05-10
JPS59104623A (en) * 1982-12-06 1984-06-16 Murata Mfg Co Ltd Ceramic element and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5052997A (en) * 1973-09-10 1975-05-10
JPS59104623A (en) * 1982-12-06 1984-06-16 Murata Mfg Co Ltd Ceramic element and its manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0296711A (en) * 1988-10-03 1990-04-09 Sumitomo Special Metals Co Ltd Production of optical shutter element

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