JPS62223041A - Production of decorative inorganic substrate - Google Patents
Production of decorative inorganic substrateInfo
- Publication number
- JPS62223041A JPS62223041A JP6462786A JP6462786A JPS62223041A JP S62223041 A JPS62223041 A JP S62223041A JP 6462786 A JP6462786 A JP 6462786A JP 6462786 A JP6462786 A JP 6462786A JP S62223041 A JPS62223041 A JP S62223041A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- board
- plate
- thermal expansion
- inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 title abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 45
- 239000005357 flat glass Substances 0.000 claims abstract description 26
- 239000011521 glass Substances 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 14
- 238000002844 melting Methods 0.000 claims abstract description 12
- 230000008018 melting Effects 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 8
- 150000007529 inorganic bases Chemical class 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 9
- 239000004568 cement Substances 0.000 abstract description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000378 calcium silicate Substances 0.000 abstract description 2
- 229910052918 calcium silicate Inorganic materials 0.000 abstract description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 abstract description 2
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 2
- 239000011147 inorganic material Substances 0.000 abstract description 2
- 229910052573 porcelain Inorganic materials 0.000 abstract description 2
- 239000005341 toughened glass Substances 0.000 abstract description 2
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- 230000035515 penetration Effects 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 238000003466 welding Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 229910015188 B2O5 Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 239000010433 feldspar Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910000953 kanthal Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】 利用分野 本発明は、板状ガラス装飾無機質基材の製法に関する。[Detailed description of the invention] Field of use The present invention relates to a method for manufacturing a plate-shaped glass decorative inorganic substrate.
詳しくは、装飾面を形成する板状ガラスおよび該ガラス
と一般に熱膨張糸数の異なる無機質基材を、効果的に融
着一体化してガラス板状の装飾表面を有する無機倹材料
を製造する方法に関する。本発明による製品は、そのガ
ラス状装飾表面を利用した建築材料およびその関連分野
に有用である。Specifically, the present invention relates to a method of manufacturing an inorganic material having a glass plate-like decorative surface by effectively fusing and integrating a plate glass forming a decorative surface and an inorganic base material generally having a different number of thermal expansion threads from the glass. . Products according to the invention are useful in construction materials and related fields that utilize their glassy decorative surfaces.
従来、陶磁質タイル、セメント成形板等の表面に施釉す
る表面装飾が知られている。施釉によって厚さが約1■
未満猾ラス質装飾コキきるが、それ以上の厚さのガラス
質面の形成は釉の流れおよび/または失透化等によって
困難であった。従って、薄いガラス質面に原因して、深
み、質感、立体感等の装飾性に関しては不満足であった
。BACKGROUND ART Surface decorations in which glaze is applied to the surfaces of ceramic tiles, cement molded boards, etc. have been known. Approximately 1cm thick depending on the glaze
Although it is possible to create a glassy surface with a thickness less than that, it is difficult to form a glassy surface with a thickness greater than that due to flow of the glaze and/or devitrification. Therefore, due to the thin glassy surface, decorative properties such as depth, texture, and three-dimensional effect were unsatisfactory.
先に本出願人は、ガラス板およびこれと同程度の熱膨脹
係数を有する特定のタイル素地を重ね。Previously, the applicant overlaid a glass plate and a specific tile substrate having a comparable coefficient of thermal expansion.
必要に応じて両者の界面にガラス粉末を適用し。Apply glass powder to the interface between the two if necessary.
該ガラス板の軟化点以上で融点以下の温度にて加熱して
1両者を一体化する方法を提案した。しかし、この方法
を他の無機質基材へ応用しようとすると、基材としては
ガラス板と同程度の熱膨張率の基材に限定され、また加
熱温度が高いためタイル以外の基材の場合は熱劣化およ
び/または変形等が生ずる等の問題があった。更に、一
般に無機質板状材料の熱膨張率を組成的に大きく変化さ
せるのは困難である。なお、タイルの場合でも最近の原
料事情から、上記のような特定のタイル素地を調製する
のは不都合である。We proposed a method of integrating the glass plates by heating them at a temperature above their softening point and below their melting point. However, when trying to apply this method to other inorganic substrates, the substrate is limited to substrates with a coefficient of thermal expansion comparable to that of glass plates, and because the heating temperature is high, it is difficult to apply this method to substrates other than tiles. There were problems such as thermal deterioration and/or deformation. Furthermore, it is generally difficult to significantly change the thermal expansion coefficient of an inorganic plate-like material compositionally. In addition, even in the case of tiles, it is inconvenient to prepare the above-mentioned specific tile bases due to recent raw material conditions.
本発明の主目的は、広範囲の無機質基材表面に実質的に
該基材を劣化させることなく、深み、質感、立体感等の
ある板状ガラス装飾をほどこすことである。The main object of the present invention is to apply plate glass decorations with depth, texture, three-dimensional effect, etc. to the surface of a wide range of inorganic substrates without substantially degrading the substrate.
本発明者らは、フリットは相対的に低融点のものが調製
でき、そして熱膨脹係数の調節が比較的容易であること
に着目し、無機質基材の熱膨脹係数と板状ガラスの該係
数との間の値の該係数を有する該ガラスよりも低融点の
フリットを用いて。The present inventors focused on the fact that a frit with a relatively low melting point can be prepared and that the coefficient of thermal expansion is relatively easy to adjust. With a frit of lower melting point than the glass with the coefficient of value between.
相対的に低温度にて加熱融着しかつ両材料間の熱膨張差
による歪を該フリット層によって緩和することにより、
上記の問題点を解決した。By heating and fusing at a relatively low temperature and relaxing the strain caused by the difference in thermal expansion between the two materials with the frit layer,
Solved the above problems.
すなわち本発明によって、無機質基材および該基材の表
面と実質的に同形状の裏面を有する板状ガラスの1司に
2両材料の熱膨脹係数の間にはさまれる値の熱膨脹係数
を有しそして該ガラスの材質よりも50’C以上低い融
点を有するフリット粉末を平方cm;hた9約0.00
5〜約0.20グラム実質的に均一に適用し、これらを
重ねて該フリットの実質的な溶融温度以上で該板状ガラ
スの実質的な熱変輪由妾形温度未満の温度に加熱して融
着一体化することを特徴とする。板状ガラス装飾無機質
基材の製法が提供される。That is, according to the present invention, an inorganic base material and a plate glass having a back surface having substantially the same shape as the front surface of the base material have a coefficient of thermal expansion between the coefficients of thermal expansion of the two materials. Frit powder having a melting point 50'C or more lower than that of the glass material is then added to a square cm; h area of about 0.00
5 to about 0.20 grams are applied substantially uniformly in layers and heated to a temperature above the substantial melting temperature of the frit and below the substantial thermal transformation temperature of the sheet glass. It is characterized by being fused and integrated. A method of making a plate glass decorative inorganic substrate is provided.
更に、上記の製法において、無機質基材と板状ガラスと
の線熱膨脹係数の差が約4x lo−’/℃以内好まし
くは約2Xto−’/’C以内の両材料を使用すると一
般的に該板状ガラス層が実質的に貫入を有さない構造の
製品が得られる。また2両材料の線熱膨脹係数の差が約
4X10”〜約20 X to−ゾ°C1好ましくは約
6X10−’〜約20 X 1O−7Cである両材料を
使用すると、一般的に該板状ガラス層が微細な貫入を有
しそして実用的な装飾強度を有する構造の製品が得られ
る。該係数の差が約20 X 10−6/′Cを越える
と1貫入ガラス層の強度が劣化する怖れがある。Furthermore, in the above manufacturing method, if the difference in linear thermal expansion coefficient between the inorganic base material and the sheet glass is within about 4x lo-'/'C, preferably within about 2Xto-'/'C, the difference in linear thermal expansion coefficient is generally achieved. A product having a structure in which the sheet glass layer has substantially no penetrations is obtained. Furthermore, when using two materials in which the difference in coefficient of linear thermal expansion between the two materials is about 4 x 10'' to about 20 A product with a structure in which the glass layer has minute penetrations and has practical decorative strength is obtained.If the difference in the coefficient exceeds about 20 x 10-6/'C, the strength of the glass layer with one penetration deteriorates. There is fear.
本発明にて使用される無機質基材および板状ガラスは、
一般に平面状または曲面状の表面を有する。更に、無機
質基材の装飾すべき表面および該表面に重ね合せる板状
ガラスの裏面は、実質的に同形状の面を有する。該板状
ガラスの厚さは、釉層とは異なる装飾効果を発揮するた
め2通常約11以上の厚さである。一般に、約3瓢前後
の厚さの市販品が有利に使用される。The inorganic base material and sheet glass used in the present invention are:
Generally has a planar or curved surface. Furthermore, the surface of the inorganic base material to be decorated and the back surface of the sheet glass overlaid on the surface have surfaces of substantially the same shape. The thickness of the plate glass is usually about 11 or more in thickness in order to exhibit a decorative effect different from that of the glaze layer. Generally, commercially available products having a thickness of around 3 ounces are advantageously used.
無機質基材としては、アルミナ磁器板、セメント成形板
、珪酸カルシウム板、タイル素地、無機質発泡板、その
他の耐熱性建材板1等が例示される。板状ガラスとして
は、市販の窓ガラス板9着色ガラス根1強化ガラス板2
等が例示される。Examples of the inorganic base material include an alumina porcelain board, a cement molded board, a calcium silicate board, a tile base, an inorganic foam board, and other heat-resistant building material boards 1. As sheet glass, commercially available window glass plate 9 colored glass base 1 tempered glass plate 2
etc. are exemplified.
フリットとしては、一般に釉薬等に混入使用されるフリ
ットが使用できる。該フリット粉末は板状ガラスの材質
よりも約50°C以上、好ましくは約100℃以上低い
融点を有する。フリット粉末の使用量は、平方CrIM
あたり約0.005〜約0.2グラムの範囲であり1通
常は約0.02〜約O,OSグラム程度である。該フリ
ットは両材料の界面に実質的に均一に適用することが必
要でろ9.そのためフリット粉末をスラリー状として適
用し、適用後に乾燥するのが一般に好ましい。容易にス
ラリー化するために、可及的に小量のコロイド状鉱物粉
を添加するのも好ましい態様である。As the frit, a frit that is generally mixed into a glaze or the like can be used. The frit powder has a melting point lower than that of the material of the sheet glass by about 50° C. or more, preferably about 100° C. or more. The amount of frit powder used is square CrIM
The amount ranges from about 0.005 to about 0.2 grams per gram, and usually about 0.02 to about O.OS grams. 9. The frit must be applied substantially uniformly to the interface of both materials. Therefore, it is generally preferred to apply the frit powder as a slurry and dry it after application. It is also a preferred embodiment to add as small a amount of colloidal mineral powder as possible in order to easily form a slurry.
一般に、無機質基材の表面に該フIJ 7 ト粉末を実
質的に均一に適用し、その上に板状ガラスを重ねて、加
熱融着させる。加熱温度はフリットの実質的な溶融温度
以上で板状ガラスの実質的な熱変形温度未満の温度であ
ジ、そして加熱時間は約1〜2時間程度である。なお、
前記の従来技術では一般に約800℃にて4時間前後を
必要とするが。Generally, the IJ 7 powder is applied substantially uniformly to the surface of an inorganic substrate, a sheet glass is placed thereon, and the powder is heated and fused. The heating temperature is higher than the substantial melting temperature of the frit and lower than the substantial thermal distortion temperature of the sheet glass, and the heating time is about 1 to 2 hours. In addition,
The conventional technique described above generally requires about 4 hours at about 800°C.
本発明では加熱時間が大幅に短縮できる効果も得られる
。上記の熱変形温度未満とは、軟化温度と溶融温度の間
にある温度で、板状ガラスがその板状の形状を失わない
温度を意味する。The present invention also has the effect of significantly shortening the heating time. Below the heat distortion temperature mentioned above means a temperature between the softening temperature and the melting temperature, at which the plate glass does not lose its plate shape.
作用および効果
本発明における主な作用は、無機質基材および板状ガラ
スの熱膨脹係数には一般にかなり相違があるが2両材料
の該係数の間にはさまれる熱膨脹係数を有しそして該ガ
ラスの材質よりも低融点のフリット粉末を用いて両材料
を融着一体化する操作によって2両材料間の熱膨張差に
よる歪をその中間の熱膨脹係数を有するフリット層によ
り緩和することにあると思考される。従って、無機質基
材が実質的に熱劣化することなく、熱膨張差にもかかわ
らず両者が強固に融着一体化される効果が得られる。更
に、使用する両材料の熱膨脹係数の差に応じて、板状ガ
ラス層に貫入を有さない製品および装飾的な貫入模様を
有しそして実用強度を有する製品が、簡単な工程で得ら
れる効果が達成される。Functions and Effects The main functions of the present invention are that although the coefficients of thermal expansion of the inorganic substrate and the sheet glass are generally quite different, the coefficient of thermal expansion of the glass is sandwiched between the coefficients of the two materials. It is believed that by fusing and integrating both materials using a frit powder with a lower melting point than the material, the strain caused by the difference in thermal expansion between the two materials is alleviated by a frit layer having a thermal expansion coefficient between the two materials. Ru. Therefore, the effect is obtained that the inorganic base material is not substantially thermally degraded and the two are firmly fused and integrated despite the difference in thermal expansion. Furthermore, depending on the difference in the thermal expansion coefficients of the two materials used, products with no penetration in the sheet glass layer and products with decorative penetration patterns and practical strength can be obtained through a simple process. is achieved.
実施例
以下の例では、線熱膨脹係数が約10 X 1 o−’
IGでありそして軟化点が約730°Cである厚さ3酎
の市販の板状ガラスを用い、これを951角に切断した
ものを使用した。フリット粉末としては、該係数が約c
+xto−/’cで、軟化点が約580°Cでありそし
て概略成分として5i02. Al2O3,B2O5,
Na2O,Cab。Examples In the following examples, the coefficient of linear thermal expansion is approximately 10 x 1 o-'
A commercially available plate glass having a thickness of 3 mm and having a softening point of about 730° C. was used, which was cut into 951 square pieces. As a frit powder, the coefficient is about c
+xto-/'c, the softening point is about 580°C, and the approximate composition is 5i02. Al2O3, B2O5,
Na2O, Cab.
MgOを含むフリットを板状ガラスと基材の間に平方c
nrあたり約0.06グラム実質的に均一に適用して使
用した。加熱は1箱型カンタル炉を使用し昇温速度10
°C/分にて実施し、焼成後に放冷した。A frit containing MgO is placed between the sheet glass and the substrate with a square c
Approximately 0.06 grams per nr was applied substantially uniformly. Heating is done using a one-box Kanthal furnace at a heating rate of 10.
The firing was carried out at °C/min and allowed to cool after firing.
例1
無機質基材として、線熱膨脹係数が約6xto−%″C
である1001角の色素地素焼タイルを用いた。該材料
をかさねて800℃にて約90分間加熱し、放冷した。Example 1 As an inorganic base material, the linear thermal expansion coefficient is approximately 6xto-%''C
A 1001 square dyed earth ceramic tile was used. The materials were heated in layers at 800° C. for about 90 minutes and allowed to cool.
微細な貫入のある融着良好なガラス装飾タイルが得られ
た。A glass decorative tile with fine penetrations and good welding was obtained.
なお、比較用に同条件にて、フリットを使用しないもの
およびその代りにガラス粉末を使用したものについて実
施したが、いずれも融着不良であった。For comparison, tests were conducted under the same conditions without using frit and with glass powder instead, but both resulted in poor fusion.
例2
同様にして線熱膨脹係数が約8XIO″6/″Cである
素戎タイルを用い、800°Cにて約60分間加熱し。Example 2 Similarly, a plain tile having a linear thermal expansion coefficient of about 8XIO''6/''C was heated at 800°C for about 60 minutes.
放冷した。融着が良好な貫入のないガラス装飾タイルが
得られた。It was left to cool. A glass decorative tile with good fusion bonding and no penetration was obtained.
例3
無機質基材として石綿セメント珪カル板およびゾノライ
ト板を用いて、700℃にて約90分間加熱し、放冷し
た。貫入のない融着良好なガラス装飾タイルがそれぞれ
得られた。Example 3 An asbestos cement silical board and a zonolite board were used as the inorganic base material and heated at 700° C. for about 90 minutes and allowed to cool. Glass decorative tiles with no penetration and good fusion bonding were obtained.
例4
同様にして、セメント珪砂成形板を用い、700°Cに
て約60分間加熱し、放冷した。貫入のない融着良好な
製品が得られた。Example 4 In the same manner, a cement silica sand molded plate was heated at 700°C for about 60 minutes and allowed to cool. A product with good welding and no penetration was obtained.
例、5
セメントシャモット成形板を用いて1例4と同様に実施
した。微細な貫入のある融着良好な製品が得られた。Example 5 The same procedure as in Example 4 was carried out using a cement chamotte molded plate. A product with fine penetrations and good welding was obtained.
例6
アルミナ長石系タイル素焼素地を用いて、約800℃に
て約60分間加熱し、放冷した。微細な貫入のある融着
良好な製品が得られた。Example 6 An unglazed alumina feldspar tile base was heated at about 800° C. for about 60 minutes and allowed to cool. A product with fine penetrations and good welding was obtained.
Claims (1)
数の差が20×10^−^6/℃以内である無機質基材
を材料として用い、該無機質基材の装飾する表面および
該基材表面と実質的に同形状の裏面を有する該板状ガラ
スの間に、両材料の熱膨脹係数の間の該係数値を有しそ
して該ガラスの材質よりも50℃以上低い融点を有する
フリット粉末を平方cmあたり0.005〜0.2グラ
ム実質的に均一に適用し、該材料を重ねて該フリットの
実質的な溶融温度以上で該板状ガラスの実質的な熱変形
温度未満の温度に加熱して融着一体化することを特徴と
する、板状ガラス装飾無機質基材の製法。(1) Using an inorganic base material having a linear thermal expansion coefficient difference of within 20 x 10^-^6/°C with plate glass and the material of the glass, the surface of the inorganic base material to be decorated and the base A frit powder having a coefficient of thermal expansion between the coefficients of thermal expansion of both materials and a melting point lower than the material of the glass by 50°C or more is placed between the plate glass having a back surface having substantially the same shape as the material surface. 0.005 to 0.2 grams per square centimeter of the material in a substantially uniform manner, and the material is layered to a temperature above the substantial melting temperature of the frit and below the substantial heat distortion temperature of the sheet glass. A method for manufacturing a plate-shaped glass decorative inorganic base material, which is characterized by heating and fusing and integrating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6462786A JPS62223041A (en) | 1986-03-20 | 1986-03-20 | Production of decorative inorganic substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6462786A JPS62223041A (en) | 1986-03-20 | 1986-03-20 | Production of decorative inorganic substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62223041A true JPS62223041A (en) | 1987-10-01 |
Family
ID=13263680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6462786A Pending JPS62223041A (en) | 1986-03-20 | 1986-03-20 | Production of decorative inorganic substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62223041A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393656A (en) * | 1989-09-04 | 1991-04-18 | Nippon Sheet Glass Co Ltd | Production of glass product having uneven pattern |
JPH0597535A (en) * | 1991-01-04 | 1993-04-20 | Shinagawa Refract Co Ltd | Two-layered glass artificial stone and its production |
JP2006205390A (en) * | 2005-01-25 | 2006-08-10 | Inax Corp | Decorative tile and its manufacturing method |
-
1986
- 1986-03-20 JP JP6462786A patent/JPS62223041A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393656A (en) * | 1989-09-04 | 1991-04-18 | Nippon Sheet Glass Co Ltd | Production of glass product having uneven pattern |
JPH0597535A (en) * | 1991-01-04 | 1993-04-20 | Shinagawa Refract Co Ltd | Two-layered glass artificial stone and its production |
JP2006205390A (en) * | 2005-01-25 | 2006-08-10 | Inax Corp | Decorative tile and its manufacturing method |
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