JPS6221072B2 - - Google Patents
Info
- Publication number
- JPS6221072B2 JPS6221072B2 JP55137022A JP13702280A JPS6221072B2 JP S6221072 B2 JPS6221072 B2 JP S6221072B2 JP 55137022 A JP55137022 A JP 55137022A JP 13702280 A JP13702280 A JP 13702280A JP S6221072 B2 JPS6221072 B2 JP S6221072B2
- Authority
- JP
- Japan
- Prior art keywords
- halogen
- acid
- same
- reaction
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 thiazoline azetidinone derivative Chemical class 0.000 claims description 30
- 229910052736 halogen Inorganic materials 0.000 claims description 29
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 20
- 150000002367 halogens Chemical class 0.000 claims description 16
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 14
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 7
- 239000011780 sodium chloride Substances 0.000 claims description 7
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 4
- 125000004423 acyloxy group Chemical group 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 239000003791 organic solvent mixture Substances 0.000 claims description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 3
- 235000010755 mineral Nutrition 0.000 claims description 3
- 239000011707 mineral Substances 0.000 claims description 3
- 150000007524 organic acids Chemical class 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 150000008282 halocarbons Chemical class 0.000 claims description 2
- 125000003262 carboxylic acid ester group Chemical class [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 24
- 150000001875 compounds Chemical class 0.000 description 19
- 239000000047 product Substances 0.000 description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 238000005868 electrolysis reaction Methods 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000002140 halogenating effect Effects 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000005658 halogenation reaction Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical group 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- IXZDIALLLMRYOU-UHFFFAOYSA-N tert-butyl hypochlorite Chemical compound CC(C)(C)OCl IXZDIALLLMRYOU-UHFFFAOYSA-N 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229930186147 Cephalosporin Natural products 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- DFPAKSUCGFBDDF-UHFFFAOYSA-N Nicotinamide Chemical group NC(=O)C1=CC=CN=C1 DFPAKSUCGFBDDF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229940107816 ammonium iodide Drugs 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- NKQIMNKPSDEDMO-UHFFFAOYSA-L barium bromide Chemical compound [Br-].[Br-].[Ba+2] NKQIMNKPSDEDMO-UHFFFAOYSA-L 0.000 description 1
- 229910001620 barium bromide Inorganic materials 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910001626 barium chloride Inorganic materials 0.000 description 1
- SGUXGJPBTNFBAD-UHFFFAOYSA-L barium iodide Chemical compound [I-].[I-].[Ba+2] SGUXGJPBTNFBAD-UHFFFAOYSA-L 0.000 description 1
- 229910001638 barium iodide Inorganic materials 0.000 description 1
- 229940075444 barium iodide Drugs 0.000 description 1
- RTEXIPZMMDUXMR-UHFFFAOYSA-N benzene;ethyl acetate Chemical compound CCOC(C)=O.C1=CC=CC=C1 RTEXIPZMMDUXMR-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- MDHYEMXUFSJLGV-UHFFFAOYSA-N beta-phenethyl acetate Natural products CC(=O)OCCC1=CC=CC=C1 MDHYEMXUFSJLGV-UHFFFAOYSA-N 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 229940124587 cephalosporin Drugs 0.000 description 1
- 150000001780 cephalosporins Chemical class 0.000 description 1
- 150000001804 chlorine Chemical group 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 150000002496 iodine Chemical class 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 1
- 229910001623 magnesium bromide Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- BLQJIBCZHWBKSL-UHFFFAOYSA-L magnesium iodide Chemical compound [Mg+2].[I-].[I-] BLQJIBCZHWBKSL-UHFFFAOYSA-L 0.000 description 1
- 229910001641 magnesium iodide Inorganic materials 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- HRDXJKGNWSUIBT-UHFFFAOYSA-N methoxybenzene Chemical group [CH2]OC1=CC=CC=C1 HRDXJKGNWSUIBT-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 150000002960 penicillins Chemical class 0.000 description 1
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 150000003385 sodium Chemical class 0.000 description 1
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000003115 supporting electrolyte Substances 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- UQFSVBXCNGCBBW-UHFFFAOYSA-M tetraethylammonium iodide Chemical compound [I-].CC[N+](CC)(CC)CC UQFSVBXCNGCBBW-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Landscapes
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Description
本発明はチアゾリンアゼチジノン誘導体の製造
方法、更に詳しくは一般式
(R1はアルキル、アルケニル、アルコキシ、置換
基を有し若しくは有しないアリール、アシル又は
アリールオキシメチル又は−CX1X2R3、X1、X2
は水素、ハロゲン、アルコキシ又はアシロキシ、
R3はR1と同じ、R2はカルボキシル又は保護され
たカルボキシルを示す)で表わされるチアゾリン
アゼチジノン誘導体を水−有機溶媒混合系中、ハ
ロゲン塩及びハロゲン酸の1種以上の存在下に電
解反応を行うことを特徴とする一般式
(R1及びR2は上記に同じ、Xはハロゲンを示す)
で表わされるハロゲン化チアゾリンアゼチジノン
誘導体の製造方法に関する。
本発明のハロゲン化チアゾリンアゼチジノン誘
導体2はセフアロスポリン系抗生物質の重要な中
間体である。上記化合物の従来の製造方法として
は種々のハロゲン化剤を用いる方法例えばN−ブ
ロモサクシンイミドを使用する方法(特開昭52−
100490号)、塩素ガスを作用させる方法(テトラ
ヘドロンレター、781(1980))、次亜塩素酸−t
−ブチルを使用する方法(テトラヘドロンレタ
ー、781(1980))等がある。しかしN−ブロモサ
クシンイミドを使用する方法はラジカル開始剤が
必要であり、またオレフインの異性化などの副反
応が起こり種々の化合物の混合物となり目的化合
物の収率は僅か10〜14%に過ぎない。又、塩素ガ
スを作用させる方法では4倍モル以上もの大量の
塩素ガスを必要とする他反応速度がきわめて遅
く、反応終了までに3日以上を要するなど多くの
欠点を有している。次亜塩素酸−t−ブチルを作
用させる方法は、室温下、短時間で収率60%で目
的の塩素化生成物(2)が得られる点では、上記(2)方
法より優れてはいるが、溶媒が限定されているこ
とと次亜塩素酸−t−ブチルを合成しなければな
らないという欠点を有している。
本発明は、上記ハロゲン化剤を使用することな
く、ハロゲン塩あるいはハロゲン酸の電解によつ
て反応系内に生成する活性なハロゲン化剤を調製
し、反応を行うべく電解条件を種々検討した結
果、水−有機溶媒混合系において、目的のハロゲ
ン化が効率良く進行することを見い出し、本発明
を完成するに至つた。
即ち本発明は一般式
(R1はアルキル、アルケニル、アルコキシ、置換
基を有し若しくは有しないアリール、アシル又は
アリールオキシメチル又は−CX1X2R3、X1、X2
は水素、ハロゲン、アルコキシ又はアシロキシ、
R3はR1と同じ、R2はカルボキシル又は保護され
たカルボキシルを示す)で表わされるチアゾリン
アゼチジノン誘導体を水−有機溶媒混合系中、ハ
ロゲン塩及びハロゲン酸の1種以上の存在下に電
解反応を行うことを特徴とする一般式
(R1及びR2は上記に同じ、Xはハロゲンを示す)
で表わされるハロゲン化チアゾリンアゼチジノン
誘導体の製造方法に係る。
本発明の出発原料である化合物(1)はペニシリン
誘導体から既報の方法、例えばR.D.G.Cooper、
J.A.C.S.92、2575(1970)に従い容易に合成する
ことができる。
一般式(1)のR1においてアルキルとしては例え
ばメチル、エチル、ブチル、ヘキシル等を、アル
ケニルとしてはビニル、アリル、ブテニル、ヘキ
セニル等を、アルコキシとしてはメトキシ、プロ
ポキシ、ヘキシルオキシ等を、置換基を有し若し
くは有しないアリール、アシル又はアリールオキ
シメチルとしてはフエニル、トリル、キシリル、
ナフチル、メチルナフチル、アセチル、プロピオ
ニル、バレリル、ベンゾイル、フエノキシメチ
ル、トリルオキシメチル、キシリルオキシメチ
ル、ナフチルオキシメチル等を挙げることができ
る。またX1、X2におけるハロゲンとしては弗
素、塩素、臭素、沃素を、アルコキシ及びアシロ
キシのアシルとしては上記と同様のものを例示で
きる。R2の保護されたカルボキシルとしてはエ
ステル基(CO2R′)、酸ハライド基(COX)、酸
アミド基(CONHR′)等を挙げることができる。
また一般式(2)のXとしては上記X1等と同様のハ
ロゲンを例示することができる。
本発明の目的化合物(2)は上記一般式(1)の化合物
を、水−有機溶媒混合系の均一又は不均一溶媒
中、ハロゲン塩及びハロゲン酸の1種以上の存在
下に電解反応を行うことにより得られる。尚本発
明においてはR1が−CX1X2R3であつて、X1、X2
のいずれか又は両方が水素である化合物を原料と
して本発明の電解反応に供した場合、該水素もハ
ロゲンによつて置換されることがある。具体例で
示せば後記実施例1〜3等に見られるようにR1
が−CH2C6H5である場合、この基は本発明の電
解反応により−CCl2C6H5に変換する。本発明は
斯かる場合に得られる化合物及び製造方法をも包
含するものである。有機溶媒としては例えば酢酸
メチル、酢酸エチル、酢酸ブチル、ギ酸メチル、
ギ酸エチル、プロピオン酸エチルなどのカルボン
酸エステル類、ジエチルエーテル、ジブチルエー
テル、テトラヒドロフラン、ジオキサン、エチレ
ングリコールジメチルエーテルなどのエーテル
類、ジクロロメタン、クロロホルム、四塩化炭
素、ジブロムエタンなどのハロゲン化炭化水素
類、アセトニトリル、ブチロニトリルなどのニト
リル類、メタノール、エタノール、イソプロパノ
ール、ブタノール、第三級ブタノールなどのアル
コール類、ペンタン、ヘキサン、シクロヘキサン
などの炭化水素類、ベンゼン、トルエン、キシレ
ン、クロルベンゼンなどの芳香族化合物などの中
から一つあるいは二つ以上選ばれる。
また支持電解質として添加するハロゲン塩は、
目的の一般式(2)で示されるハロゲン化物のハロゲ
ンの種類に応じて塩素塩、臭素塩、沃素塩等が用
いられる。ハロゲン塩としては例えば、塩化ナト
リウム、塩化カリウム、塩化リチウム、臭化ナト
リウム、臭化カリウム、臭化リチウム、沃化ナト
リウム、沃化カリウム、沃化リチウムなどのアル
カリ金属塩あるいは塩化マグネシウム、塩化バリ
ウム、塩化カルシウム、臭化マグネシウム、臭化
バリウム、沃化マグネシウム、沃化バリウムなど
のアルカリ土類金属塩、塩化アンモニウム、塩化
テトラメチルアンモニウム、塩化テトラエチルア
ンモニウム、塩化テトラブチルアンモニウム、臭
化アンモニウム、臭化テトラメチルアンモニウ
ム、臭化テトラエチルアンモニウム、沃化アンモ
ニウム、沃化テトラエチルアンモニウムなどのハ
ロゲン化アンモニウムおよび第4級アンモニウム
塩などがあげられる。
ハロゲン酸としては塩酸、臭化水素酸、沃化水
素酸等が使用される。さらに、上述のハロゲン塩
又はハロゲン酸を使用する時に同時にハロゲン酸
以外の鉱酸あるいは有機酸を加えてもよい。添加
される鉱酸としては硫酸、硝酸、炭酸、硫酸水素
カリウム、硫酸水素ナトリウム、リン酸などがあ
げられる。又、有機酸としてはギ酸、酢酸、プロ
ピオン酸、酪酸、シユウ酸、洒石酸、クエン酸、
フタル酸、リンゴ酸、パラトルエンスルホン酸な
どがあげられる。
本発明の電解反応は約5〜500mA/cm2の範囲
の電流密度で行なえるが好ましくは約10〜
50mA/cm2の範囲である。また電極は通常電解反
応に使用される白金、炭素、ステンレス、酸化
鉛、ニツケルなどが使用できる。電解は約−20〜
100℃の範囲の温度で行なえるが好ましくは約−
10〜50℃で行なうとよい。電解反応を行う場合隔
膜を用いても無隔膜でもよい。
本電解反応に必要な通電量は、電解槽の形状、
電極の種類、基質濃度、基質の反応性等により一
定しないが、約2〜50F/molの電気量を通電す
ることにより85〜95%の高収率で目的物がほぼ純
品として得られる。
本発明においてハロゲン化反応は、電解と同一
反応槽内で同時に行うことも電解槽とハロゲン化
反応容器を別々にして反応を行うことも出来る。
本発明は、装置が非常に簡単である電解法とい
う手段を用いることにより、特殊なハロゲン化剤
を使用することなく、簡単な操作で常温、常圧と
いう温和な条件下、高収率で選択的に目的物を得
ることができる点が従来法と比べ優れている。
次に実施例をあげて本発明を説明する。
実施例 1
2―(3―ジクロルフエニルメチル―7―オキ
ソ―4―チオ―2,6―ジアザビシクロ
〔3.2.0〕ヘプト―2―エン―6―イル)―3―
クロロメチル―3―ブテン酸メチルの合成
塩化ナトリウム1gを水3c.c.に溶解し、これに
濃硫酸0.07c.c.、塩化メチレン5c.c.、2―(3―ベ
ンジル―7―オキソ―4―チオ―2,6―ジアザ
ビシクロ〔3.2.0〕ヘプト―2―エン―6―イ
ル)―3―メチル―3―ブテン酸メチル50mgを加
え電解液を調製する。3cm2の白金板電極を装入し
30mA定電流、1.6〜1.8V、25℃で約2時間電解を
行う。電解終了後塩化メチレン(30ml)で抽出を
行う。抽出液は亜硫酸ナトリウム水、重ソウ水、
食塩水で洗浄後無水硫酸ナトリウムで乾燥し、溶
媒を除去して淡黄色の液体74mgを得た。このもの
をシリカゲルカラムを用い、ベンゼン:酢酸エチ
ル(5:1)の混合溶媒で展開すると目的化合物
が62.5mg(収率96%)得られた。
(IR)1780 1745cm-1
NMR(CDCl3)3.75(3H s COOCH3)
3.81(2H s −CH2Cl)
5.14(2H s C=CH2)
5.41(1H s
The present invention relates to a method for producing thiazoline azetidinone derivatives, more specifically, the general formula (R 1 is alkyl, alkenyl, alkoxy, aryl with or without substituents, acyl or aryloxymethyl, or -CX 1 X 2 R 3 , X 1 , X 2
is hydrogen, halogen, alkoxy or acyloxy,
A thiazoline azetidinone derivative (R 3 is the same as R 1 , R 2 is carboxyl or protected carboxyl) is electrolyzed in a water-organic solvent mixture system in the presence of one or more halogen salts and halogen acids. General formula characterized by carrying out a reaction (R 1 and R 2 are the same as above, X represents halogen)
The present invention relates to a method for producing a halogenated thiazoline azetidinone derivative represented by: The halogenated thiazoline azetidinone derivative 2 of the present invention is an important intermediate for cephalosporin antibiotics. Conventional methods for producing the above compounds include methods using various halogenating agents, for example, methods using N-bromosuccinimide (Japanese Patent Application Laid-Open No. 52-1996-1)
100490), method of applying chlorine gas (Tetrahedron Letter, 781 (1980)), hypochlorous acid-t
- There is a method using butyl (Tetrahedron Letter, 781 (1980)), etc. However, the method using N-bromosuccinimide requires a radical initiator, and side reactions such as olefin isomerization occur, resulting in a mixture of various compounds, resulting in a yield of only 10 to 14% of the target compound. . In addition, the method of using chlorine gas has many drawbacks, such as requiring a large amount of chlorine gas of four times the mole or more, and the reaction rate is extremely slow, requiring three days or more to complete the reaction. The method using t-butyl hypochlorite is superior to the above method (2) in that the desired chlorinated product (2) can be obtained in a short time at room temperature with a yield of 60%. However, it has the drawbacks that the solvent is limited and that t-butyl hypochlorite must be synthesized. The present invention was developed as a result of preparing an active halogenating agent that is generated in the reaction system by electrolyzing a halogen salt or halogen acid without using the above-mentioned halogenating agent, and examining various electrolytic conditions to carry out the reaction. They have discovered that the desired halogenation can proceed efficiently in a water-organic solvent mixed system, and have completed the present invention. That is, the present invention is based on the general formula (R 1 is alkyl, alkenyl, alkoxy, aryl with or without substituents, acyl or aryloxymethyl, or -CX 1 X 2 R 3 , X 1 , X 2
is hydrogen, halogen, alkoxy or acyloxy,
A thiazoline azetidinone derivative (R 3 is the same as R 1 , R 2 is carboxyl or protected carboxyl) is electrolyzed in a water-organic solvent mixture system in the presence of one or more halogen salts and halogen acids. General formula characterized by carrying out a reaction (R 1 and R 2 are the same as above, X represents halogen)
The present invention relates to a method for producing a halogenated thiazoline azetidinone derivative represented by: Compound (1), which is the starting material of the present invention, can be prepared from a penicillin derivative by a previously reported method such as RDGCooper.
It can be easily synthesized according to JACS 92 , 2575 (1970). In R 1 of the general formula (1), examples of alkyl include methyl, ethyl, butyl, hexyl, etc., examples of alkenyl include vinyl, allyl, butenyl, hexenyl, etc., examples of alkoxy include methoxy, propoxy, hexyloxy, etc., and substituents. Aryl, acyl or aryloxymethyl with or without phenyl, tolyl, xylyl,
Examples include naphthyl, methylnaphthyl, acetyl, propionyl, valeryl, benzoyl, phenoxymethyl, tolyloxymethyl, xylyloxymethyl, and naphthyloxymethyl. Examples of the halogen in X 1 and X 2 include fluorine, chlorine, bromine, and iodine, and examples of the acyl of alkoxy and acyloxy include those mentioned above. Examples of the protected carboxyl of R 2 include an ester group (CO 2 R'), an acid halide group (COX), and an acid amide group (CONHR').
Furthermore, as X in general formula (2), halogens similar to those mentioned above, such as X 1 , can be exemplified. The object compound (2) of the present invention is obtained by electrolytically reacting the compound of general formula (1) above in a homogeneous or heterogeneous water-organic solvent mixture in the presence of one or more halogen salts and halogen acids. It can be obtained by In the present invention, R 1 is −CX 1 X 2 R 3 and X 1 , X 2
When a compound in which either or both of these are hydrogen is used as a raw material in the electrolytic reaction of the present invention, the hydrogen may also be replaced by a halogen. To give a specific example, as shown in Examples 1 to 3 below, R 1
When is -CH2C6H5 , this group is converted to -CCl2C6H5 by the electrolytic reaction of the present invention. The present invention also includes the compounds obtained in such cases and the manufacturing methods. Examples of organic solvents include methyl acetate, ethyl acetate, butyl acetate, methyl formate,
Carboxylic acid esters such as ethyl formate and ethyl propionate, ethers such as diethyl ether, dibutyl ether, tetrahydrofuran, dioxane, and ethylene glycol dimethyl ether, halogenated hydrocarbons such as dichloromethane, chloroform, carbon tetrachloride, and dibromoethane, acetonitrile, Nitriles such as butyronitrile, alcohols such as methanol, ethanol, isopropanol, butanol, and tertiary butanol, hydrocarbons such as pentane, hexane, and cyclohexane, and aromatic compounds such as benzene, toluene, xylene, and chlorobenzene. Choose one or more from. In addition, the halogen salt added as a supporting electrolyte is
Chlorine salts, bromine salts, iodine salts, etc. are used depending on the type of halogen in the desired halide represented by general formula (2). Examples of halogen salts include alkali metal salts such as sodium chloride, potassium chloride, lithium chloride, sodium bromide, potassium bromide, lithium bromide, sodium iodide, potassium iodide, lithium iodide, magnesium chloride, barium chloride, Alkaline earth metal salts such as calcium chloride, magnesium bromide, barium bromide, magnesium iodide, barium iodide, ammonium chloride, tetramethylammonium chloride, tetraethylammonium chloride, tetrabutylammonium chloride, ammonium bromide, tetrabromide Examples include ammonium halides and quaternary ammonium salts such as methylammonium, tetraethylammonium bromide, ammonium iodide, and tetraethylammonium iodide. As the halogen acid, hydrochloric acid, hydrobromic acid, hydroiodic acid, etc. are used. Furthermore, when using the above-mentioned halogen salt or halogen acid, a mineral acid or organic acid other than the halogen acid may be added at the same time. Examples of the mineral acids to be added include sulfuric acid, nitric acid, carbonic acid, potassium hydrogen sulfate, sodium hydrogen sulfate, and phosphoric acid. In addition, organic acids include formic acid, acetic acid, propionic acid, butyric acid, oxalic acid, citric acid,
Examples include phthalic acid, malic acid, and para-toluenesulfonic acid. The electrolytic reaction of the present invention can be carried out at a current density in the range of about 5 to 500 mA/cm 2 , preferably about 10 to 500 mA/cm 2 .
The range is 50mA/ cm2 . Further, the electrodes can be made of platinum, carbon, stainless steel, lead oxide, nickel, etc., which are commonly used in electrolytic reactions. Electrolysis is about −20~
It can be carried out at temperatures in the range of 100°C, but preferably about -
It is best to do this at a temperature of 10 to 50°C. When carrying out an electrolytic reaction, a diaphragm may be used or no diaphragm may be used. The amount of current required for this electrolytic reaction depends on the shape of the electrolytic cell,
Although it varies depending on the type of electrode, substrate concentration, substrate reactivity, etc., the target product can be obtained as an almost pure product with a high yield of 85 to 95% by applying electricity with an amount of electricity of about 2 to 50 F/mol. In the present invention, the halogenation reaction can be carried out simultaneously with electrolysis in the same reaction vessel, or can be carried out in separate electrolytic vessels and halogenation reaction vessels. By using an electrolytic method with a very simple device, the present invention achieves high yields under mild conditions at room temperature and pressure with simple operations and without the use of special halogenating agents. Compared to conventional methods, this method is superior in that it can obtain the desired product. Next, the present invention will be explained with reference to Examples. Example 1 2-(3-dichlorophenylmethyl-7-oxo-4-thio-2,6-diazabicyclo[3.2.0]hept-2-en-6-yl)-3-
Synthesis of methyl chloromethyl-3-butenoate Dissolve 1 g of sodium chloride in 3 c.c. of water, add 0.07 cc of concentrated sulfuric acid, 5 c.c. of methylene chloride, 2-(3-benzyl-7-oxo-4- Add 50 mg of methyl thio-2,6-diazabicyclo[3.2.0]hept-2-en-6-yl)-3-methyl-3-butenoate to prepare an electrolytic solution. Insert a 3 cm 2 platinum plate electrode.
Electrolyze at 30 mA constant current, 1.6 to 1.8 V, and 25°C for about 2 hours. After the electrolysis is complete, extract with methylene chloride (30ml). Extract liquid is sodium sulfite water, hydrogenated sodium water,
After washing with brine and drying over anhydrous sodium sulfate, the solvent was removed to obtain 74 mg of a pale yellow liquid. This product was developed using a silica gel column with a mixed solvent of benzene:ethyl acetate (5:1) to obtain 62.5 mg (yield: 96%) of the target compound. (IR) 1780 1745cm -1 NMR (CDCl 3 ) 3.75 (3H s COOCH 3 ) 3.81 (2H s −CH 2 Cl) 5.14 (2H s C=CH 2 ) 5.41 (1H s
【式】) 6.05(2H s【formula】) 6.05 (2H s
【式】)
7.3〜7.9(5H m フエニル)
実施例 2
NaCl1gを水5c.c.にとかし、濃硫酸0.07c.c.、酢
酸エチル5c.c.を加え、更に実施例1と同じ出発原
料50mgを加えて電解液を調製する。30mA定電
流、1.8〜1.9V、25〜27℃で2時間電解し、実施
例1と同様の処理をして目的の化合物61mg(93.5
%)を得た。化合物の確認はI.R、NMRで行い実
施例1と同様の結果を得て同定を行つた。
実施例 3
上記出発原料50mgを用いて実施例1と同様に実
験を行い、上記目的化合物を61mg(収率95%)得
た。
NMR(CDCl3)
1.38(9H s COO―t―Bu)
3.85(2H s ―CH2Cl)
5.12(2H s C=CH2)
5.41(1H s ―CHOO―t―Bu)
6.03(2H s CH)
7.3〜8.0(5H m フエニル)
実施例 4
出発原料として2―(3―ベンゾイル―7―オ
キソ―4―チオ―2,6―ジアザビシクロ
〔3.2.0〕ヘプト―2―エン―6―イル)―3―メ
チル―3―ブテン酸メチル50mgを用いて実施例1
と同様にして電解液を調製する。30mA定電流、
1.8〜2.0V、25〜26℃で40分電解を行つた。実施
例1と同様の処理を行つて目的の2―(3―ベン
ゾイル―7―オキソ―4―チオ―2,6―ジアザ
ビシクロ〔3.2.0〕ヘプト―2―エン―6―イ
ル)―3―クロロメチル―3―ブテン酸メチルを
51mg(収率93%)得た。
(IR)1780、1745、1660、1600、858
NMR(CDCl3)
3.79(3H s COOCH3)
4.16(2H s −CH2Cl)
5.23(2H d J=4Hz C=CH2)
5.55(1H s CH−COOCH3)
5.96(1H d J=4Hz[Formula]) 7.3-7.9 (5H m phenyl) Example 2 Dissolve 1 g of NaCl in 5 c.c. of water, add 0.07 cc of concentrated sulfuric acid and 5 c.c. of ethyl acetate, and then add 50 mg of the same starting material as in Example 1. Prepare the electrolyte. Electrolysis was carried out at 30mA constant current, 1.8-1.9V, 25-27℃ for 2 hours, and the same treatment as in Example 1 was carried out to obtain 61mg (93.5mg) of the target compound.
%) was obtained. The compound was confirmed by IR and NMR, and the same results as in Example 1 were obtained, and the compound was identified. Example 3 An experiment was conducted in the same manner as in Example 1 using 50 mg of the above starting material, and 61 mg (yield 95%) of the above target compound was obtained. NMR (CDCl 3 ) 1.38 (9H s COO-t-Bu) 3.85 (2H s -CH 2 Cl) 5.12 (2H s C=CH 2 ) 5.41 (1H s -CHOO-t-Bu) 6.03 (2H s CH) 7.3-8.0 (5H m phenyl) Example 4 50 mg of methyl 2-(3-benzoyl-7-oxo-4-thio-2,6-diazabicyclo[3.2.0]hept-2-en-6-yl)-3-methyl-3-butenoate as a starting material. Example 1 using
Prepare the electrolyte solution in the same manner as above. 30mA constant current,
Electrolysis was performed at 1.8-2.0V and 25-26°C for 40 minutes. The same treatment as in Example 1 was carried out to obtain the desired 2-(3-benzoyl-7-oxo-4-thio-2,6-diazabicyclo[3.2.0]hept-2-en-6-yl)-3-. Methyl chloromethyl-3-butenoate
51 mg (yield 93%) was obtained. (IR) 1780, 1745, 1660, 1600, 858 NMR (CDCl 3 ) 3.79 (3H s COOCH 3 ) 4.16 (2H s −CH 2 Cl) 5.23 (2H d J=4Hz C=CH 2 ) 5.55 (1H s CH −COOCH 3 ) 5.96 (1H d J = 4Hz
【式】) 6.37(1H d J=4Hz【formula】) 6.37 (1H d J = 4Hz
【式】)
7.4〜8.5(5H m フエニル)
実施例 5
上記反応を原料50mgを用いて実施例4と同様に
して実験を行い、目的物56.5mg(収率93.5%)を
得た。
NMR(CDCl3)
4.89(2H s −CH2CCl3)
4.10(2H s −CH2Cl)
5.20(2H d C=CH2)
5.55(1H s CH−COOCH2CCl3)
6.00(1H d CH)
7.4〜8.2(5H m フエニル)
実施例 6
2―(3―フエニルオキシメチル―7―オキソ
―4―チオ―2,6―ジアザビシクロ
〔3.2.0〕ヘプト―2―エン―6―イル)―3―
クロロメチル―3―ブテン酸メチルエステルの
合成
枝付き試験管に塩化ナトリウム1gを秤りとり
これに水3mlを加えて溶解する。このものに酢酸
0.05ml、塩化メチレン5ml、2―(3―フエニル
オキシメチル―7―オキソ―4―チオ―2,6―
ジアザビシクロ〔3.2.0〕ヘプト―2―エン―6
―イル)―3―メチル―3―ブテン酸メチルエス
テル50mgを加え均一溶液とする。これに撹拌機、
白金板(大きさ1.5×2cm2)2枚を取り付け、
30mA定電流、1.6〜2.0V、約25℃の条件下4F/
molの電流を通じて電解反応を行う。電解終了
後、水槽に5%希塩酸を加えてPH7に調製し、塩
化メチレン(20ml)で抽出する。抽出液は水洗後
乾燥濃縮すると粗生成物57mgが得られる。このも
のはシリカゲルカラムを用いベンゼン―酢酸エチ
ル(5:1)の混合溶媒で展開すると目的化合物
が50mg(収率91%)得られる。
IR(CHCl3) 1770、1743cm-1
NMR(CDCl3)3.74(3H s)
3.9(2H s)
4.88(2H s)
5.15(2H m)
5.44(1H s)
5.91(2H m)
6.72〜7.38(5H m)
実施例 7
反応容器に上記原料化合物50mg、臭化ナトリウ
ム1gを水3mlに溶解し、濃硫酸0.07ml、塩化メ
チレン5mlを入れる。白金板電極を装入し撹拌下
40mA、35℃で電解反応を行う。反応終了後実施
例1と同様の処理を行うと目的化合物55.5mg(収
率90.5%)を得た。IR、NMRより目的物である
ことを確認した。
実施例 8
35%塩酸3ml、実施例1と同じ原料化合物50
mg、塩化メチレン5mlを容器に入れ、3cm2の白金
電極を装入し実施例1と同様の操作により実施例
1と同一の目的物57.5mgを得る。収率88%、IR、
NMRより目的物であることを確認した。
実施例 9
塩化ナトリウム1gを水3mlに溶解し、クロロ
ホルム5mlを加え実施例1と同じ原料化合物50mg
を加えて実施例1と同様の操作を行うと目的物
57.0mgを得る。収率87.5%、IR、NMRより目的
物であることを確認した。
実施例 10
塩化ナトリウム1gを水3mlに溶解し、35%塩
酸0.5ml、塩化メチレン5mlを加え、実施例1と
同様の操作により目的物61.8mgを得る。収率95
%、IR、NMRにより目的物であることを確認し
た。
実施例 11
上記反応を原料化合物50mgを用いて行い、実施
例1と同様の操作、処理により上記目的化合物を
得た。
IR 1715cm-1
NMR(CDCl3)
4.20(2H s CH2Cl)
5.28(2H d C=CH2)
5.92(1H d CH)
6.42(1H d CH)
7.5〜8.4(5H m フエニル)
実施例 12
上記反応を原料化合物50mgを用いて行い、実施
例1と同様の操作により目的物48.2mg(収率89.8
%)を得る。
NMR(CDCl3)
3.91(2H s CH2Cl)
4.98(2H s[Formula]) 7.4-8.5 (5H m phenyl) Example 5 The above reaction was carried out in the same manner as in Example 4 using 50 mg of the raw material, and 56.5 mg (yield: 93.5%) of the target product was obtained. NMR (CDCl 3 ) 4.89 (2H s - CH 2 CCl 3 ) 4.10 (2H s - CH 2 Cl) 5.20 (2H d C=CH 2 ) 5.55 (1H s CH-COOCH 2 CCl 3 ) 6.00 (1H d CH) 7.4-8.2 (5H m phenyl) Example 6 2-(3-phenyloxymethyl-7-oxo-4-thio-2,6-diazabicyclo[3.2.0]hept-2-en-6-yl)-3-
Synthesis of chloromethyl-3-butenoic acid methyl ester Weigh out 1 g of sodium chloride in a test tube with a branch, add 3 ml of water, and dissolve. This stuff has acetic acid
0.05ml, methylene chloride 5ml, 2-(3-phenyloxymethyl-7-oxo-4-thio-2,6-
Diazabicyclo [3.2.0] Hept-2-en-6
-3-methyl-3-butenoic acid methyl ester (50 mg) was added to make a homogeneous solution. This includes a stirrer,
Attach two platinum plates (size 1.5 x 2 cm 2 ),
30mA constant current, 1.6~2.0V, 4F/approximately 25℃ condition
Electrolytic reactions are carried out through mol of current. After electrolysis, add 5% diluted hydrochloric acid to the water bath to adjust the pH to 7, and extract with methylene chloride (20ml). The extract is washed with water and then dried and concentrated to obtain 57 mg of crude product. When this product is developed using a silica gel column with a mixed solvent of benzene-ethyl acetate (5:1), 50 mg (yield 91%) of the target compound is obtained. IR (CHCl 3 ) 1770, 1743 cm -1 NMR (CDCl 3 ) 3.74 (3H s) 3.9 (2H s) 4.88 (2H s) 5.15 (2H m) 5.44 (1H s) 5.91 (2H m) 6.72-7.38 (5H m) Example 7 In a reaction vessel, dissolve 50 mg of the above raw material compound and 1 g of sodium bromide in 3 ml of water, and add 0.07 ml of concentrated sulfuric acid and 5 ml of methylene chloride. Insert platinum plate electrode and stir
Perform the electrolytic reaction at 40mA and 35℃. After the reaction was completed, the same treatment as in Example 1 was performed to obtain 55.5 mg (yield 90.5%) of the target compound. It was confirmed by IR and NMR that it was the desired product. Example 8 3 ml of 35% hydrochloric acid, 50 mL of the same raw material compound as Example 1
5 ml of methylene chloride are placed in a container, a 3 cm 2 platinum electrode is inserted, and the same procedure as in Example 1 is carried out to obtain 57.5 mg of the same target product as in Example 1. Yield 88%, IR,
It was confirmed by NMR that it was the desired product. Example 9 Dissolve 1 g of sodium chloride in 3 ml of water, add 5 ml of chloroform, and add 50 mg of the same raw material compound as in Example 1.
By adding and performing the same operation as in Example 1, the target object is obtained.
Obtain 57.0 mg. The yield was 87.5%, and it was confirmed to be the desired product by IR and NMR. Example 10 Dissolve 1 g of sodium chloride in 3 ml of water, add 0.5 ml of 35% hydrochloric acid and 5 ml of methylene chloride, and perform the same procedure as in Example 1 to obtain 61.8 mg of the desired product. Yield 95
%, IR, and NMR confirmed that it was the desired product. Example 11 The above reaction was carried out using 50 mg of the starting compound, and the above target compound was obtained by the same operations and treatments as in Example 1. IR 1715cm -1 NMR (CDCl 3 ) 4.20 (2H s CH 2 Cl) 5.28 (2H d C=CH 2 ) 5.92 (1H d CH) 6.42 (1H d CH) 7.5-8.4 (5H m phenyl) Example 12 The above reaction was carried out using 50 mg of the starting compound, and the same procedure as in Example 1 was carried out to obtain 48.2 mg of the target product (yield: 89.8
%). NMR (CDCl 3 ) 3.91 (2H s CH 2 Cl) 4.98 (2H s
【式】) 5.20(2H d C=CH2) 6.72〜7.38(5H m フエニル)[Formula]) 5.20 (2H d C=CH 2 ) 6.72-7.38 (5H m phenyl)
Claims (1)
基を有し若しくは有しないアリール、アシル又は
アリールオキシメチル又は−CX1X2R3、X1、X2
は水素、ハロゲン、アルコキシ又はアシロキシ、
R3はR1と同じ、R2はカルボキシル又は保護され
たカルボキシルを示す)で表わされるチアゾリン
アゼチジノン誘導体を水−有機溶媒混合系中、ハ
ロゲン塩及びハロゲン酸の1種以上の存在下に電
解反応を行うことを特徴とする一般式 (R1及びR2は上記に同じ、Xはハロゲンを示す)
で表わされるハロゲン化チアゾリンアゼチジノン
誘導体の製造方法。 2 有機溶媒が低級カルボン酸エステル類又はハ
ロゲン化炭化水素類である特許請求の範囲第1項
に記載の方法。 3 ハロゲン塩がNaCl、KCl、NaBr又はKBrで
ある特許請求の範囲第1項に記載の方法。 4 ハロゲン酸がHCl又はHBrである特許請求の
範囲第1項に記載の方法。 5 ハロゲン酸以外の鉱酸又は有機酸を共存させ
る特許請求の範囲第1〜4項のいずれかに記載の
方法。 6 電解反応温度が約−20〜100℃である特許請
求の範囲第1項に記載の方法。 7 電解反応の電流密度が約5〜500mA/cm2で
ある特許請求の範囲第1項に記載の方法。[Claims] 1. General formula (R 1 is alkyl, alkenyl, alkoxy, aryl with or without a substituent, acyl or aryloxymethyl, or -CX 1 X 2 R 3 , X 1 , X 2
is hydrogen, halogen, alkoxy or acyloxy,
A thiazoline azetidinone derivative (R 3 is the same as R 1 , R 2 is carboxyl or protected carboxyl) is electrolyzed in the presence of one or more halogen salts and halogen acids in a water-organic solvent mixture system. General formula characterized by carrying out a reaction (R 1 and R 2 are the same as above, X represents halogen)
A method for producing a halogenated thiazoline azetidinone derivative represented by 2. The method according to claim 1, wherein the organic solvent is a lower carboxylic acid ester or a halogenated hydrocarbon. 3. The method according to claim 1, wherein the halogen salt is NaCl, KCl, NaBr or KBr. 4. The method according to claim 1, wherein the halogen acid is HCl or HBr. 5. The method according to any one of claims 1 to 4, in which a mineral acid or an organic acid other than halogen acid is allowed to coexist. 6. The method according to claim 1, wherein the electrolytic reaction temperature is about -20 to 100°C. 7. The method according to claim 1, wherein the current density of the electrolytic reaction is about 5 to 500 mA/ cm2 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55137022A JPS5759896A (en) | 1980-09-30 | 1980-09-30 | Production of thiazolineazetidinone derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55137022A JPS5759896A (en) | 1980-09-30 | 1980-09-30 | Production of thiazolineazetidinone derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5759896A JPS5759896A (en) | 1982-04-10 |
JPS6221072B2 true JPS6221072B2 (en) | 1987-05-11 |
Family
ID=15189000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55137022A Granted JPS5759896A (en) | 1980-09-30 | 1980-09-30 | Production of thiazolineazetidinone derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5759896A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4482491A (en) | 1981-05-01 | 1984-11-13 | Otsuka Kagaku Yakuhin Kabushiki Kaisha | Thiazolinoazetidinone derivatives and process for the preparation of the same |
JPS5955888A (en) * | 1982-09-24 | 1984-03-31 | Otsuka Chem Co Ltd | Azetidinone compound |
JPS59164771A (en) * | 1983-03-10 | 1984-09-17 | Otsuka Chem Co Ltd | Preparation of chlorinated azetidinone derivative |
-
1980
- 1980-09-30 JP JP55137022A patent/JPS5759896A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5759896A (en) | 1982-04-10 |
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