JPH09249984A - Production of optically active epoxide derivative - Google Patents

Production of optically active epoxide derivative

Info

Publication number
JPH09249984A
JPH09249984A JP8085834A JP8583496A JPH09249984A JP H09249984 A JPH09249984 A JP H09249984A JP 8085834 A JP8085834 A JP 8085834A JP 8583496 A JP8583496 A JP 8583496A JP H09249984 A JPH09249984 A JP H09249984A
Authority
JP
Japan
Prior art keywords
group
optically active
formula
general formula
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8085834A
Other languages
Japanese (ja)
Inventor
Shigeru Torii
滋 鳥居
Hideo Tanaka
秀雄 田中
Michio Sasaoka
三千雄 笹岡
Yutaka Kameyama
豊 亀山
Akira Kikuchi
亮 菊池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Chemical Co Ltd
Original Assignee
Otsuka Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Chemical Co Ltd filed Critical Otsuka Chemical Co Ltd
Priority to JP8085834A priority Critical patent/JPH09249984A/en
Publication of JPH09249984A publication Critical patent/JPH09249984A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Catalysts (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an optically active epoxide deriv. of high purity at high yield by electrolyzing an olefin compd. in a two-layer liquid of an org. solvent and a halide on the presence of an optically active manganese catalyst. SOLUTION: An olefin compd. expressed by formula I is electrolyzed in a two-layer system of an org. solvent and a halogenated compound aqueous soln. in the presence of an optically active manganese catalyst expressed by formula II so as to obtain an optically active epoxide deriv. expressed by formula III. In formula I, R<1> to R<4> are hydrogen atom or alkyl, alkenyl groups or the like which may have substitutents. In formula II, R<5> and R<8> form a cycloalkane having 5 to 8 carbon atoms, and R<6> and R<7> are hydrogen atoms, etc. In formula III, R<14> to R<17> are the same as R<1> to R<4> in formula I. Thereby, an optically active epoxide deriv. can be produced without using a large amt. of a hazardous oxidizing agent or without producing a large amt. of wastes.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】光学活性エポキシド誘導体
は、例えば、Tetrahedron,50,8885(199
4)に記載されている如く、有機合成上有用であり、生
理活性物質、機能性材料の製造に重要な化合物である。
たとえば、強誘電性液晶の製造にあたっては不斉炭素の
導入が不可欠で、光学活性エポキシドは重要な原料とな
る。本発明は、これらの有機合成上有用な光学活性エポ
キシド誘導体、また、生理活性物質、機能性材料の重要
な光学活性エポキシド誘導体の製造方法に関するもので
ある。
BACKGROUND OF THE INVENTION Optically active epoxide derivatives are described, for example, in Tetrahedron, 50, 8885 (199).
As described in 4), it is a compound that is useful in organic synthesis and is important for the production of physiologically active substances and functional materials.
For example, the introduction of asymmetric carbon is essential in the production of ferroelectric liquid crystals, and optically active epoxide is an important raw material. The present invention relates to an optically active epoxide derivative useful for these organic syntheses, and a method for producing an optically active epoxide derivative which is important for physiologically active substances and functional materials.

【0002】[0002]

【従来の技術】従来、一般式(III)で表わされる光学
活性エポキシド誘導体の製造方法としては、J.Am.
Chem.Soc.,102,5974(1980)に記載の
如く、一般式(IV)で表わされるオレフィン化合物、す
なわちアリルアルコール誘導体を、チタン触媒と光学活
性酒石酸の存在下、tert−ブチルヒドロパーオキシドを
作用させる、いわゆるSharplessの不斉エポキシ化反
応、および、例えば、国際特許公開WO93/0383
8に記載の如く、一般式(I)(式中R1、R2、R3、R
4は前記に同じ。)で表わされるオレフィン化合物を、
一般式(II)(式中R5、R6、R7、R8、R9、R10
11、R12、R13、Yは前記に同じ。)で表される光学
活性マンガン触媒の存在下、酸化剤(ヨードシルベンゼ
ン、m−クロロ過安息香酸等)を作用させる方法が報告
されている。
2. Description of the Related Art Conventionally, as a method for producing an optically active epoxide derivative represented by the general formula (III), J. Am.
Chem. Soc., 102, 5974 (1980), an olefin compound represented by the general formula (IV), that is, an allyl alcohol derivative is reacted with tert-butyl hydroperoxide in the presence of a titanium catalyst and optically active tartaric acid. A so-called Sharpless asymmetric epoxidation reaction, and, for example, International Patent Publication WO93 / 0383.
As described in 8, the general formula (I) (in the formula, R 1 , R 2 , R 3 , R
4 is the same as above. ) The olefin compound represented by
General formula (II) (in the formula, R 5 , R 6 , R 7 , R 8 , R 9 , R 10 ,
R 11 , R 12 , R 13 and Y are as defined above. ), A method of reacting an oxidizing agent (iodosylbenzene, m-chloroperbenzoic acid, etc.) in the presence of an optically active manganese catalyst is reported.

【0003】[0003]

【化4】 (式中R1、R2、R3は前記に同じ。)Embedded image (In the formula, R 1 , R 2 and R 3 are the same as above.)

【0004】これらの方法は、酸化剤を大量に使用する
必要があるため、危険な酸化剤の大量貯蔵および反応後
の大量の廃棄物を処理しなければならず、これらの欠点
を克服する、より実用的な製造方法の開発が望まれてい
る。
Since these methods require the use of large amounts of oxidants, they must deal with large amounts of hazardous oxidant storage and large amounts of waste after reaction, which overcome these drawbacks. Development of a more practical manufacturing method is desired.

【0005】[0005]

【発明が解決しようとする課題】本発明の目的は、上記
従来の製造方法に見られる欠点を克服し、高収率、高純
度で目的とする光学活性エポキシド誘導体を製造し得る
方法を提供することにある。
The object of the present invention is to provide a method capable of producing the desired optically active epoxide derivative with high yield and high purity by overcoming the drawbacks found in the above-mentioned conventional production methods. Especially.

【0006】[0006]

【課題を解決するための手段】本発明は、一般式(I)
で表わされるオレフィン化合物を、一般式(II)で表わ
される光学活性マンガン触媒の存在下、有機溶媒とハロ
ゲン化物水溶液の二層系で電解することにより、一般式
(III)で表わされる光学活性エポキシド誘導体を得る
ことを特徴とする、光学活性エポキシド誘導体の製造方
法に係る。
The present invention has the general formula (I)
The olefin compound represented by the formula (II) is electrolyzed in the presence of the optically active manganese catalyst represented by the general formula (II) in a two-layer system of an organic solvent and an aqueous solution of a halide to give an optically active epoxide represented by the general formula (III). The present invention relates to a method for producing an optically active epoxide derivative, which comprises obtaining the derivative.

【0007】[0007]

【化5】 (式中R1、R2、R3、R4は水素原子、置換基を有して
いても良い、アルキル基、アルケニル基、アルキニル
基、芳香族化合物残基、複素芳香族化合物残基、アルコ
キシ基、アシル基、保護されていても良い、ヒドロキシ
ル基、アミノ基、カルボキシル基、ハロゲン原子、ニト
ロ基、シアノ基を示す。)
Embedded image (In the formula, R 1 , R 2 , R 3 and R 4 are a hydrogen atom and may have a substituent, an alkyl group, an alkenyl group, an alkynyl group, an aromatic compound residue, a heteroaromatic compound residue, (Alkoxy group, acyl group, optionally protected hydroxyl group, amino group, carboxyl group, halogen atom, nitro group, cyano group.)

【0008】[0008]

【化6】 (式中R5、R6、R7、R8は、R5とR8でC5〜C8のシ
クロアルカンを形成し且つR6とR7は水素原子、また
は、R6とR7でC5〜C8のシクロアルカンを形成し且つ
5とR8は水素原子、あるいは、R5とR8がアリール基
で且つR6とR7は水素原子、または、R6とR7がアリー
ル基で且つR5とR8は水素原子を表す。R9、R10、R
11、R12、R13は、水素原子、置換基を有していても良
い、アルキル基、芳香族化合物残基、アルコキシ基、ア
シル基、保護基を有していても良い、ヒドロキシル基、
アミノ基、カルボキシル基、ハロゲン原子、ニトロ基、
シアノ基を示す。Yは、陰イオンを示す。)
[Chemical 6] (Wherein R 5 , R 6 , R 7 and R 8 together form a C 5 -C 8 cycloalkane with R 5 and R 8 and R 6 and R 7 are hydrogen atoms, or R 6 and R 7 To form a C 5 -C 8 cycloalkane and R 5 and R 8 are hydrogen atoms, or R 5 and R 8 are aryl groups and R 6 and R 7 are hydrogen atoms, or R 6 and R 7 are .R 9, R 10, R but representing a and R 5 and R 8 are hydrogen atoms with an aryl group
11 , R 12 and R 13 are each a hydrogen atom, an optionally substituted alkyl group, an aromatic compound residue, an alkoxy group, an acyl group, a hydroxyl group optionally having a protective group,
Amino group, carboxyl group, halogen atom, nitro group,
A cyano group is shown. Y represents an anion. )

【0009】[0009]

【化7】 (式中R14、R15、R16、R17は水素原子、置換基を有
していても良い、アルキル基、アルケニル基、アルキニ
ル基、芳香族化合物残基、複素芳香族化合物残基、アル
コキシ基、アシル基、保護されていても良い、ヒドロキ
シル基、アミノ基、カルボキシル基、ハロゲン原子、ニ
トロ基、シアノ基を示す。)
Embedded image (In the formula, R 14 , R 15 , R 16 and R 17 are a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aromatic compound residue, a heteroaromatic compound residue, which may have a substituent, (Alkoxy group, acyl group, optionally protected hydroxyl group, amino group, carboxyl group, halogen atom, nitro group, cyano group.)

【0010】本発明者らは光学活性エポキシド誘導体を
製造し得る汎用的な製造方法を提供するにあたり、ハロ
ゲン化物をメディエーターとする間接電解酸化反応に注
目した。すなわち、不斉エポキシ化反応の酸化活性種と
考えられている光学活性オキソマンガン錯体の再生循環
に供する酸化剤として、入手容易で危険性の無いハロゲ
ン化物水溶液を電解酸化することによって生ずる酸化活
性なハロゲン種を利用した。この際、ハロゲン活性種が
直接オレフィン化合物と反応してしまうと、収率、対掌
体過剰率の低下を引き起こしてしまう。対掌体過剰率
(enatiomeric excess)とは、両対掌体の比率の差で、
通常、両対掌体総量に対する百分率で比率を表し、その
差は%で表される。したがって、対掌体過剰率が低いこ
とは、望まない立体異性体(光学異性体)が生成するこ
とになり、望む化合物の収率が低いことになる。そこで
我々は、種々の電解酸化反応について鋭意検討を重ねた
結果、有機溶媒とハロゲン化物水溶液の二層系で、しか
も、光学活性マンガン触媒の対陰イオンを選択すること
により、目的とする光学活性エポキシド誘導体が高選択
的に得られるという新しい事実を見出し、本発明を完成
するに至った。
The inventors of the present invention focused on an indirect electrolytic oxidation reaction using a halide as a mediator in providing a general-purpose production method capable of producing an optically active epoxide derivative. That is, as an oxidant for recycling the optically active oxomanganese complex, which is considered to be an oxidatively active species for the asymmetric epoxidation reaction, the oxidative activity produced by electrolytically oxidizing an aqueous halide solution that is readily available and does not pose a risk A halogen species was used. At this time, if the halogen active species reacts directly with the olefin compound, the yield and the enantiomeric excess rate will decrease. Enantiomeric excess is the difference in the ratio of both enantiomers,
Usually, the ratio is expressed as a percentage of the total amount of both antipodes, and the difference is expressed as%. Therefore, a low enantiomeric excess ratio results in the production of an undesired stereoisomer (optical isomer), resulting in a low yield of the desired compound. Therefore, as a result of extensive studies on various electrolytic oxidation reactions, we have found that the target optically active manganese catalyst is selected by selecting the counter anion of the optically active manganese catalyst in a two-layer system of an organic solvent and an aqueous halide solution. The present invention has been completed by discovering a new fact that an epoxide derivative can be obtained with high selectivity.

【0011】[0011]

【発明の実施の態様】本明細書において示される各基
は、より具体的にはそれぞれ次のとおりである。尚、以
下の説明において特に断わらない限り、ハロゲン原子と
は、例えば、フッ素、塩素、臭素、ヨウ素などの原子を
意味する。低級アルキル基とは、例えば、メチル、エチ
ル、n−プロピル、イソプロピル、n−ブチル、イソブ
チル、sec−ブチル、tert−ブチルなどの直鎖または分
枝状のC1〜C4のアルキル基を意味する。また、アリー
ル基とは、例えば、フェニル、ナフチルなどを意味す
る。一般式(I)のR1、R2、R3、R4、および、一般
式(III)のR14、R15、R16、R17で示されるアルキ
ル基としては、低級アルキル基の他、直鎖または分枝状
のC1〜C20のアルキル基、および、R1とR3、また
は、R14とR16をC3〜C6のメチレン鎖で結んだ、環状
アルキル鎖を例示できる。一般式(I)のR1、R2
3、R4、および、一般式(III)のR14、R15
16、R17で示されるアルケニル基としては、直鎖また
は分枝状のC1〜C20のアルケニル基を例示できる。
BEST MODE FOR CARRYING OUT THE INVENTION More specifically, each group shown in the present specification is as follows. In the following description, unless otherwise specified, the halogen atom means an atom such as fluorine, chlorine, bromine or iodine. The lower alkyl group means, for example, a linear or branched C 1 -C 4 alkyl group such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl or tert-butyl. To do. Further, the aryl group means, for example, phenyl, naphthyl and the like. Examples of the alkyl group represented by R 1 , R 2 , R 3 , and R 4 of the general formula (I) and R 14 , R 15 , R 16 , and R 17 of the general formula (III) include a lower alkyl group. , A linear or branched C 1 to C 20 alkyl group, and a cyclic alkyl chain in which R 1 and R 3 or R 14 and R 16 are connected by a C 3 to C 6 methylene chain are exemplified. it can. R 1 , R 2 of the general formula (I),
R 3 , R 4 , and R 14 , R 15 of the general formula (III),
Examples of the alkenyl group represented by R 16 and R 17 include linear or branched C 1 to C 20 alkenyl groups.

【0012】一般式(I)のR1、R2、R3、R4、およ
び、一般式(III)のR14、R15、R16、R17で示され
るアルキニル基としては、直鎖または分枝状のC1〜C
20のアルキニル基を例示できる。一般式(I)のR1、R
2、R3、R4、および、一般式(III)のR14、R15、R
16、R17で示される複素芳香族化合物残基としては、例
えば、フリル、ピロリル、チエニル、オキサゾリル、チ
アゾリル、チアジアゾリル、テトラゾリル、ピリジルな
どの、酸素原子、窒素原子、硫黄原子を含む芳香族化合
物残基を例示できる。
As the alkynyl group represented by R 1 , R 2 , R 3 , and R 4 of the general formula (I) and R 14 , R 15 , R 16 and R 17 of the general formula (III), a straight-chain is shown. Or branched C 1 to C
20 alkynyl groups can be illustrated. R 1 and R in the general formula (I)
2 , R 3 , R 4 , and R 14 , R 15 , and R of the general formula (III)
Examples of the heteroaromatic compound residue represented by 16 and R 17 include an aromatic compound residue containing an oxygen atom, a nitrogen atom or a sulfur atom, such as furyl, pyrrolyl, thienyl, oxazolyl, thiazolyl, thiadiazolyl, tetrazolyl or pyridyl. A group can be illustrated.

【0013】一般式(I)のR1、R2、R3、R4、およ
び、一般式(III)のR14、R15、R16、R17で示され
るアルキル基、アルケニル基、アルキニル基、芳香族化
合物残基、複素芳香族化合物残基、アルコキシ基、アシ
ル基が有していても良い置換基としては、例えば、フェ
ニル、ナフチルなどのアリール基、例えば、フリル、ピ
ロリル、チエニル、オキサゾリル、チアゾリル、チアジ
アゾリル、テトラゾリル、ピリジルなどの、酸素原子、
窒素原子、硫黄原子を含む芳香族化合物残基、例えば、
フッ素、塩素、臭素、ヨウ素などのハロゲン置換基、例
えば、メトキシ、エトキシ、n−プロポキシ、イソプロ
ポキシ、n−ブトキシ、sec−ブトキシ、tert−ブトキ
シなどの直鎖または分枝状のC1〜C4の低級アルコキシ
基、例えば、ホルミルオキシ、アセトキシ、プロピオニ
ルオキシ、ブチリルオキシ、イソブチリルオキシ、ピバ
ロイルオキシなどの直鎖または分枝状のC1〜C5のアシ
ルオキシ基、例えば、ベンゾイルオキシ、トルオイルオ
キシなどのアロイルオキシ基、保護基を有していても良
い、ヒドロキシル基、アミノ基、カルボキシル基、ケト
基、ニトロ基、シアノ基などを例示できる。R1、R2
3、R4、R14、R15、R16、R17で示される上記置換
アルキル基、置換アルケニル基、置換アルキニル基は、
上記の置換基から選ばれる同一又は異なる種類の置換基
で、同一又は異なる炭素上に1つ以上置換されていても
良い。
Alkyl groups, alkenyl groups and alkynyl groups represented by R 1 , R 2 , R 3 and R 4 of the general formula (I) and R 14 , R 15 , R 16 and R 17 of the general formula (III). The group, the aromatic compound residue, the heteroaromatic compound residue, the alkoxy group, the substituent which the acyl group may have, for example, an aryl group such as phenyl, naphthyl, for example, furyl, pyrrolyl, thienyl, Oxygen atom, such as oxazolyl, thiazolyl, thiadiazolyl, tetrazolyl, pyridyl,
Aromatic compound residue containing nitrogen atom, sulfur atom, for example,
Halogen substituents such as fluorine, chlorine, bromine and iodine, for example, linear or branched C 1 -C such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, sec-butoxy and tert-butoxy. 4 lower alkoxy groups, for example, straight-chain or branched C 1 -C 5 acyloxy groups such as formyloxy, acetoxy, propionyloxy, butyryloxy, isobutyryloxy, pivaloyloxy, for example, benzoyloxy, toluoyloxy. Examples thereof include an aroyloxy group and a hydroxyl group, an amino group, a carboxyl group, a keto group, a nitro group, a cyano group, which may have a protective group. R 1 , R 2 ,
The substituted alkyl group, substituted alkenyl group and substituted alkynyl group represented by R 3 , R 4 , R 14 , R 15 , R 16 and R 17 are
One or more substituents on the same or different carbons may be substituted with the same or different kinds of substituents selected from the above substituents.

【0014】一般式(I)のR1、R2、R3、R4および
一般式(III)のR14、R15、R16、R17で示されるア
ルキル基、アルケニル基、アルキニル基が有していても
良いヒドロキシル基の保護基、また、一般式(I)の
1、R2、R3、R4および一般式(III)のR14
15、R16、R17で表わされるヒドロキシル基の保護基
としては、プロテクティブグループインオーガニックシ
ンセシス(Protective Group Inorganic Synthe
sis,Theodora W.Geene著、1981年、以下単に
「文献」と言う)の第2章(pp.10〜72)に記載さ
れている基を例示できる。
The alkyl group, alkenyl group and alkynyl group represented by R 1 , R 2 , R 3 and R 4 of the general formula (I) and R 14 , R 15 , R 16 and R 17 of the general formula (III) are A protecting group for a hydroxyl group which may be present, R 1 , R 2 , R 3 , R 4 of the general formula (I) and R 14 of the general formula (III),
Examples of the protecting group for the hydroxyl group represented by R 15 , R 16 and R 17 include Protective Group in Organic Synthesis (Protective Group Inorganic Synthesis).
sis, Theodora W. The groups described in Chapter 2 (pp. 10 to 72) of Geene, 1981, hereinafter simply referred to as "references" can be exemplified.

【0015】一般式(I)のR1、R2、R3、R4および
一般式(III)のR14、R15、R16、R17で示されるア
ルキル基、アルケニル基、アルキニル基が有していても
良いアミノ基の保護基、また、一般式(I)のR1
2、R3、R4および一般式(III)のR14、R15
16、R17で表わされるアミノ基の保護基としては、文
献の第7章(第218〜287頁)に記載されている各
種基の他、フェノキシアセトアミド、p−メチルフェノ
キシアセトアミド、p−メトキシフェノキシアセトアミ
ド、p−クロロフェノキシアセトアミド、p−ブロモフ
ェノキシアセトアミド、フェニルアセトアミド、p−メ
チルフェニルアセトアミド、p−メトキシフェニルアセ
トアミド、p−クロロフェニルアセトアミド、p−ブロ
モフェニルアセトアミド、フェニルモノクロロアセトア
ミド、フェニルジクロロアセトアミド、フェニルヒドロ
キシアセトアミド、チエニルアセトアミド、フェニルア
セトキシアセトアミド、α−オキソフェニルアセトアミ
ド、ベンズアミド、p−メチルベンズアミド、p−メト
キシベンズアミド、p−クロロベンズアミド、p−ブロ
モベンズアミド、フェニルグリシルアミドやアミノ基の
保護されたフェニルグリシルアミド、p−ヒドロキシフ
ェニルグリシルアミドやアミノ基及び水酸基の一方又は
両方が保護されたp−ヒドロキシフェニルグリシルアミ
ド等アミド類、フタルイミド、ニトロフタルイミド等イ
ミド類を例示できる。フェニルグリシルアミド及びp−
ヒドロキシフェニルグリシルアミドのアミノ基の保護基
としては、上記文献の第7章(第218〜287頁)に
記載されている各種基を例示できる。また、p−ヒドロ
キシフェニルグリシルアミドの水酸基の保護基として
は、上記文献の第2章(第10〜72頁)に記載されて
いる各種基を例示できる。
The alkyl group, alkenyl group and alkynyl group represented by R 1 , R 2 , R 3 and R 4 of the general formula (I) and R 14 , R 15 , R 16 and R 17 of the general formula (III) are An optionally protecting group for an amino group, R 1 in the general formula (I),
R 2 , R 3 , R 4 and R 14 , R 15 of the general formula (III),
Examples of the protecting group for the amino group represented by R 16 and R 17 include various groups described in Chapter 7 (pages 218 to 287) of the literature, phenoxyacetamide, p-methylphenoxyacetamide, p-methoxy. Phenoxyacetamide, p-chlorophenoxyacetamide, p-bromophenoxyacetamide, phenylacetamide, p-methylphenylacetamide, p-methoxyphenylacetamide, p-chlorophenylacetamide, p-bromophenylacetamide, phenylmonochloroacetamide, phenyldichloroacetamide, phenyl Hydroxyacetamide, thienylacetamide, phenylacetoxyacetamide, α-oxophenylacetamide, benzamide, p-methylbenzamide, p-methoxybenzamide p-chlorobenzamide, p-bromobenzamide, phenylglycylamide and phenylglycylamide with protected amino group, p-hydroxyphenylglycylamide and p-hydroxyphenyl with protected amino group and / or hydroxyl group Examples thereof include amides such as glycylamide and imides such as phthalimide and nitrophthalimide. Phenylglycylamide and p-
Examples of the protective group for the amino group of hydroxyphenylglycylamide include various groups described in Chapter 7 (pages 218 to 287) of the above literature. Examples of the hydroxyl-protecting group of p-hydroxyphenylglycylamido include various groups described in Chapter 2 (pages 10 to 72) of the above document.

【0016】一般式(I)のR1、R2、R3、R4および
一般式(III)のR14、R15、R16、R17で示されるア
ルキル基、アルケニル基、アルキニル基が有していても
良いカルボキシル基の保護基、また、一般式(I)の
1、R2、R3、R4および一般式(III)のR14
15、R16、R17で表わされるカルボキシル基の保護基
としては、文献の第5章(第152〜192頁)に記載
されている各種基の他、アリル基、ベンジル基、p−メ
トキシベンジル基、p−ニトロベンジル基、ジフェニル
メチル基、トリクロロメチル基、tert−ブチル基等を例
示できる。本電解不斉エポキシ化反応に供する、一般式
(II)の光学活性マンガン触媒におけるR5、R6
7、R8は、R5とR8でC5〜C8のシクロアルカンを形
成し且つR6とR7は水素原子、または、R6とR7でC5
〜C8のシクロアルカンを形成し且つR5とR8は水素原
子、あるいは、R5とR8がアリール基で且つR6とR7
水素原子、または、R6とR7がアリール基で且つR5
8は水素原子を表す。ここでR5とR8、または、R6
7で形成されるC5〜C8のシクロアルカンとしては、
特にシクロヘキサンが好ましく、また、R5とR8、また
は、R6とR7で示されるアリール基としては、フェニル
基、ナフチル基が例示できる。一般式(II)のR9、R
10、R11、R12、R13で示されるアルキル基としては、
メチル、エチル、n−プロピル、イソプロピル、n−ブ
チル、イソブチル、sec−ブチル、tert−ブチルなどの
直鎖または分枝状のC1〜C4の低級アルキル基などを例
示できる。
The alkyl group, alkenyl group and alkynyl group represented by R 1 , R 2 , R 3 and R 4 of the general formula (I) and R 14 , R 15 , R 16 and R 17 of the general formula (III) are A protecting group for a carboxyl group which may be present, R 1 , R 2 , R 3 and R 4 of the general formula (I) and R 14 of the general formula (III),
Examples of the protecting group for the carboxyl group represented by R 15 , R 16 and R 17 include allyl groups, benzyl groups and p-methoxy groups, in addition to various groups described in Chapter 5 (pages 152 to 192) of the literature. Examples thereof include a benzyl group, a p-nitrobenzyl group, a diphenylmethyl group, a trichloromethyl group and a tert-butyl group. R 5 , R 6 in the optically active manganese catalyst of the general formula (II), which is subjected to this electrolytic asymmetric epoxidation reaction,
R 7 and R 8 are R 5 and R 8 to form a C 5 to C 8 cycloalkane, and R 6 and R 7 are hydrogen atoms, or R 6 and R 7 are C 5
To C 8 cycloalkane and R 5 and R 8 are hydrogen atoms, or R 5 and R 8 are aryl groups and R 6 and R 7 are hydrogen atoms, or R 6 and R 7 are aryl groups. And R 5 and R 8 represent a hydrogen atom. Here, the C 5 to C 8 cycloalkane formed by R 5 and R 8 or R 6 and R 7 is
Cyclohexane is particularly preferable, and examples of the aryl group represented by R 5 and R 8 or R 6 and R 7 include a phenyl group and a naphthyl group. R 9 and R in the general formula (II)
Examples of the alkyl group represented by 10 , R 11 , R 12 , and R 13 include
Examples thereof include linear or branched C 1 to C 4 lower alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl and tert-butyl.

【0017】R9、R10、R11、R12、R13で示される
芳香族化合物残基としては、例えば、フェニル、ナフチ
ルなどを例示できる。R9、R10、R11、R12、R13
示されるアルコキシ基としては、例えば、メトキシ、エ
トキシ、n−プロポキシ、イソプロポキシ、n−ブトキ
シ、sec−ブトキシ、tert−ブトキシなどの直鎖または
分枝状のC1〜C4の低級アルコキシ基などを例示でき
る。R9、R10、R11、R12、R13で示されるアシル基
としては、例えば、ホルミル、アセチル、プロピオニ
ル、ブチリル、イソブチリル、ピバロイルなどの直鎖ま
たは分枝状のC1〜C5のアシル基、ベンゾイル、トルオ
イルなどのアロイル基などを例示できる。R9、R10
11、R12、R13で示される、ヒドロキシル基、アミノ
基、カルボキシル基が有していても良い保護基として
は、化合物(I)で説明したのと同様の保護基が例示で
きる。
Examples of the aromatic compound residue represented by R 9 , R 10 , R 11 , R 12 and R 13 include phenyl and naphthyl. Examples of the alkoxy group represented by R 9 , R 10 , R 11 , R 12 , and R 13 include linear groups such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, sec-butoxy, and tert-butoxy. Alternatively, a branched C 1 -C 4 lower alkoxy group and the like can be exemplified. Examples of the acyl group represented by R 9 , R 10 , R 11 , R 12 and R 13 include linear or branched C 1 to C 5 such as formyl, acetyl, propionyl, butyryl, isobutyryl and pivaloyl. Examples thereof include an acyl group, benzoyl, and an aroyl group such as toluoyl. R 9 , R 10 ,
Examples of the protecting group represented by R 11 , R 12 and R 13 that the hydroxyl group, amino group and carboxyl group may have include the same protecting groups as those described for the compound (I).

【0018】一般式(II)の化合物中、Yで示される陰
イオンとしては、例えば、塩化物、臭化物、ヨウ化物等
のハロゲン化物イオン、過塩素酸等のハロゲン酸イオ
ン、ギ酸、酢酸、酪酸、吉草酸等の低級カルボン酸イオ
ン、メタンスルホン酸、ヘキサンスルホン酸、ベンゼン
スルホン酸、トルエンスルホン酸などのスルホン酸イオ
ン、ヘキサフルオロフォスフェート等のリン酸イオン等
を例示できるが、塩化物イオン、酢酸イオン、ヘキサフ
ルオロフォスフェートイオンが好ましい。
Examples of the anion represented by Y in the compound of the general formula (II) include halide ions such as chloride, bromide and iodide, halogenate ions such as perchloric acid, formic acid, acetic acid and butyric acid. , Lower carboxylic acid ion such as valeric acid, methanesulfonic acid, hexanesulfonic acid, benzenesulfonic acid, sulfonic acid ion such as toluenesulfonic acid, phosphate ion such as hexafluorophosphate, chloride ion, Acetate ion and hexafluorophosphate ion are preferred.

【0019】一般式(II)で表わされる光学活性マンガ
ン触媒は、例えば、J.Org.Chem.,56,2296
(1991)、Tetrahedron,Asymmetry,2,481
(1991)などに記載の如く、対応する光学活性ジア
ミン誘導体、対応する芳香族アルデヒドまたはケトン、
および適当なマンガン塩を用いて容易に合成し得る。一
般式(II)の化合物の具体的な例としては、例えば、
(1R,2R)−N,N'−ビス(4,6−ジ−tert−ブチ
ルサリチリデン)−1,2−シクロヘキサンジアミノマ
ンガン(III)クロリド(IIa)、(1S,2S)−N,
N'−ビス(4,6−ジ−tert−ブチルサリチリデン)−
1,2−シクロヘキサンジアミノマンガン(III)クロリ
ド(IIb)、(1R,2R)−N,N'−ビス(4,6−ジ
−tert−ブチルサリチリデン)−1,2−ジフェニルエ
チレンジアミノマンガン(III)クロリド(IIc)、
(1S,2S)−N,N'−ビス(4,6−ジ−tert−ブチ
ルサリチリデン)−1,2−ジフェニルエチレンジアミ
ノマンガン(III)クロリド(IId)などを例示でき
る。化合物(IIa)及び(IId)の構造式を下記に示
す。
The optically active manganese catalyst represented by the general formula (II) is described in, for example, J. Org. Chem., 56, 2296
(1991), Tetrahedron, Asymmetry, 2,481.
(1991) and the like, the corresponding optically active diamine derivative, the corresponding aromatic aldehyde or ketone,
And can be readily synthesized using the appropriate manganese salt. Specific examples of the compound of the general formula (II) include, for example,
(1R, 2R) -N, N'-bis (4,6-di-tert-butylsalicylidene) -1,2-cyclohexanediaminomanganese (III) chloride (IIa), (1S, 2S) -N,
N'-bis (4,6-di-tert-butylsalicylidene)-
1,2-Cyclohexanediaminomanganese (III) chloride (IIb), (1R, 2R) -N, N'-bis (4,6-di-tert-butylsalicylidene) -1,2-diphenylethylenediaminomanganese (III) chloride (IIc),
Examples include (1S, 2S) -N, N'-bis (4,6-di-tert-butylsalicylidene) -1,2-diphenylethylenediaminomanganese (III) chloride (IId). The structural formulas of the compounds (IIa) and (IId) are shown below.

【0020】[0020]

【化8】 Embedded image

【0021】本電解不斉エポキシ化反応は、適当な電解
槽中、一般式(I)で表わされるオレフィン化合物と一
般式(II)で表わされる光学活性マンガン触媒とを有機
溶媒とハロゲン化物水溶液の二層系に溶解し、適当な電
極を使用し通電することにより行うことができる。化合
物(II)の使用量としては、化合物(I)に対して0.1
〜200mol%が良く、好ましくは1〜50mol%が適当
である。本反応に供する有機溶媒としては、化合物
(I)および(II)を溶解し、使用するハロゲン化物水
溶液と二層になるものであれば良く、具体的には、蟻酸
メチル、蟻酸エチル、蟻酸プロピル、蟻酸ブチル、酢酸
メチル、酢酸エチル、酢酸プロピル、酢酸ブチル、プロ
ピオン酸メチル、プロピオン酸エチル等の低級カルボン
酸の低級アルキルエステル類、アセトン、メチルエチル
ケトン、メチルプロピルケトン、メチルブチルケトン、
メチルイソブチルケトン、ジエチルケトン等のケトン
類、ジエチルエーテル、エチルプロピルエーテル、エチ
ルブチルエーテル、ジプロピルエーテル、ジイソプロピ
ルエーテル、ジブチルエーテル、メチルセロシルブ、ジ
メトキシエタン等のエーテル類、テトラヒドロフラン、
ジオキサン、ジオキソラン等の環状エーテル類、アセト
ニトリル、プロピオニトリル、ブチロニトリル、イソブ
チロニトリル、バレロニトリル等のニトリル類、ベンゼ
ン、トルエン、キシレン、クロロベンゼン、アニソール
等の置換もしくは未置換の芳香族炭化水素類、ジクロロ
メタン、クロロホルム、ジクロロエタン、トリクロロエ
タン、ジブロモエタン、プロピレンジクロライド、四塩
化炭素、フロン類等のハロゲン化炭化水素類、ペンタ
ン、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素
類、シクロペンタン、シクロヘキサン、シクロヘプタ
ン、シクロオクタン等のシクロアルカン類等を挙げるこ
とができる。これらは1種単独で又は2種以上混合して
使用される。これらの溶媒は、一般式(I)の化合物1k
g当たり、通常1〜200L程度、好ましくは5〜10
0L程度使用されるのが良い。
In this electrolytic asymmetric epoxidation reaction, an olefin compound represented by the general formula (I) and an optically active manganese catalyst represented by the general formula (II) are mixed with an organic solvent and an aqueous halide solution in a suitable electrolytic cell. It can be carried out by dissolving in a two-layer system and using an appropriate electrode and applying current. The amount of compound (II) used is 0.1 with respect to compound (I).
˜200 mol%, preferably 1 to 50 mol%. The organic solvent used in this reaction may be any one that dissolves the compounds (I) and (II) and forms a double layer with the aqueous halide solution used, and specific examples include methyl formate, ethyl formate and propyl formate. Lower alkyl esters of lower carboxylic acids such as butyl formate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl propionate, ethyl propionate, acetone, methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone,
Methyl isobutyl ketone, ketones such as diethyl ketone, diethyl ether, ethyl propyl ether, ethyl butyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, methyl cellosylbu, ethers such as dimethoxyethane, tetrahydrofuran,
Cyclic ethers such as dioxane and dioxolane, nitriles such as acetonitrile, propionitrile, butyronitrile, isobutyronitrile and valeronitrile, and substituted or unsubstituted aromatic hydrocarbons such as benzene, toluene, xylene, chlorobenzene and anisole. , Halogenated hydrocarbons such as dichloromethane, chloroform, dichloroethane, trichloroethane, dibromoethane, propylene dichloride, carbon tetrachloride and freons, aliphatic hydrocarbons such as pentane, hexane, heptane, octane, cyclopentane, cyclohexane, cyclo Examples thereof include cycloalkanes such as heptane and cyclooctane. These may be used alone or as a mixture of two or more. These solvents are compounds of general formula (I) 1k
Usually about 1 to 200 L, preferably 5 to 10 per g
It is better to use about 0L.

【0022】本電解不斉エポキシ化反応のメディエータ
ーとなるハロゲン化物としては、種々の塩化物、臭化物
を用いることができ、例えば、塩化リチウム、塩化ナト
リウム、塩化カリウム、塩化カルシウム、塩化アンモニ
ウムなどの無機塩化物、塩化テトラエチルアンモニウ
ム、塩化テトラブチルアンモニウム、塩化エチルトリブ
チルアンモニウム、塩化ベンジルトリブチルアンモニウ
ムなどの四級アンモニウム塩化物、臭化リチウム、臭化
ナトリウム、臭化カリウム、臭化カルシウム、臭化アン
モニウムなどの無機臭化物、臭化テトラエチルアンモニ
ウム、臭化テトラブチルアンモニウム、臭化エチルトリ
ブチルアンモニウム、臭化ベンジルトリブチルアンモニ
ウムなどの四級アンモニウム臭化物を例示できる。これ
らのハロゲン化物は、通常、水1L当たり、0.001
〜5mol程度、好ましくは、0.01〜2mol程度溶解し
た水溶液を、一般式(I)の化合物1kg当たり、通常1
〜200L程度、好ましくは5〜100L程度使用され
るのが良い。
Various chlorides and bromides can be used as the halide serving as a mediator of the present electrolytic asymmetric epoxidation reaction. For example, inorganic materials such as lithium chloride, sodium chloride, potassium chloride, calcium chloride and ammonium chloride can be used. Quaternary ammonium chloride such as chloride, tetraethylammonium chloride, tetrabutylammonium chloride, ethyltributylammonium chloride, benzyltributylammonium chloride, lithium bromide, sodium bromide, potassium bromide, calcium bromide, ammonium bromide, etc. Examples thereof include quaternary ammonium bromide such as inorganic bromide, tetraethylammonium bromide, tetrabutylammonium bromide, ethyltributylammonium bromide, and benzyltributylammonium bromide. These halides are usually 0.001 per 1 L of water.
~ 5 mol, preferably about 0.01 to 2 mol of an aqueous solution is dissolved per 1 kg of the compound of the general formula (I), usually 1
It is good to use about -200 L, preferably about 5-100 L.

【0023】電解槽は種々の型のものが使用でき、例え
ば、ビーカー型などの陽極槽、陰極槽を分離しない非分
離型電解槽、例えば、多孔性ガラス、ナフィオンなどの
イオン交換樹脂などで陽極槽、陰極槽を隔てた分離型電
解槽で、反応を行うことができる。電極材料は、本電解
酸化系で腐食されにくいものであれば広く使用すること
ができる。通常、陽極としては、白金、ベーター型二酸
化鉛、各種ステンレススチールなどが使用でき、陰極と
しては、白金、各種ステンレススチール、鉛などが使用
できるが、これらの具体例に限定されるものではない。
必要ならば、これらのメッキ電極や合金も使用できる。
上記電解反応は、通常、定電流、定電圧、定電位などの
条件で、化合物(I)がほぼ消費されるまで行われる。
上記反応の反応温度は、通常30〜100℃程度、好ま
しくは10〜50℃程度である。得られる一般式(II
I)で表わされる光学活性エポキシドは、濃縮、クロマ
トグラフィー等の通常の精製操作により単離することも
できる。
Various types of electrolytic cells can be used. For example, a beaker type anode cell, a non-separation type electrolytic cell that does not separate the cathode cell, for example, porous glass, ion exchange resin such as Nafion, etc. The reaction can be carried out in a separate type electrolytic cell in which a cell and a cathode cell are separated. The electrode material can be widely used as long as it is not easily corroded by the electrolytic oxidation system. Usually, platinum, beta-type lead dioxide, various stainless steels, etc. can be used as the anode, and platinum, various stainless steels, lead, etc. can be used as the cathode, but the present invention is not limited to these specific examples.
If necessary, these plated electrodes and alloys can also be used.
The above electrolysis reaction is usually performed under conditions such as constant current, constant voltage, and constant potential until the compound (I) is almost consumed.
The reaction temperature of the above reaction is usually about 30 to 100 ° C, preferably about 10 to 50 ° C. The resulting general formula (II
The optically active epoxide represented by I) can also be isolated by a conventional purification operation such as concentration and chromatography.

【0024】[0024]

【実施例】以下に実施例を挙げ、本発明を具体的に説明
する。なおMeはメチル、Phはフェニルを示す。 実施例1 ビーカー型の電解槽に、化合物(Ia)(R1=Ph、R
3=Me、R2=R4=H)118mg、化合物(IIa)
[(R6、R7)=(CH2)4、R11=R13=t−Bu、R5
=R8=R9=R10=R12=H、Y=Cl)36mg(5mol
%)、塩化メチレン 5ml、1規定塩化ナトリウム水溶
液 15mlを計り取り、2枚の白金板(1.0×1.5c
m2)をそれぞれ陽極、陰極として、5〜0℃で撹拌しな
がら10mA定電流で24時間電解した。電解反応後、
塩化メチレン層を5%チオ硫酸ナトリウム水溶液で洗浄
した後、塩化メチレン溶液を濃縮し、残査をシリカゲル
カラムで分離精製すると、化合物(IIIa)(R14=P
h、R16=Me、R15=R17=H)(101mg、収率75
%)が得られた。得られた化合物(IIIa)を光学活性
カラム(DAICEL CHIRALCEL OB−
H)を装着した高速液体クロマトグラフィーで分析した
結果、対掌体過剰率は、81%であった。 IR(neat) 3064,2996,2968,293
0,1605,1496,1451,1358cm-1 1 H NMR(200MHz,CDCl3) δ1.07(d,J=5Hz,3H),2.93(dq,
J=4.5Hz,1H),3.46(d,J=4Hz,1
H),7.18〜7.41(m,5H)13 C NMR(50MHz,CDCl3) δ13.0,55.6,58.0,127.1,128.
0,128.5,136.1
EXAMPLES The present invention will be specifically described below with reference to examples. Me is methyl and Ph is phenyl. Example 1 In a beaker-type electrolytic cell, compound (Ia) (R 1 = Ph, R
3 = Me, R 2 = R 4 = H) 118 mg, compound (IIa)
[(R 6, R 7) = (CH 2) 4, R 11 = R 13 = t-Bu, R 5
= R 8 = R 9 = R 10 = R 12 = H, Y = Cl) 36 mg (5 mol
%), 5 ml of methylene chloride, and 15 ml of 1N sodium chloride aqueous solution are weighed out, and two platinum plates (1.0 × 1.5c)
m 2 ) was used as an anode and a cathode, respectively, and electrolysis was carried out at a constant current of 10 mA for 24 hours while stirring at 5 to 0 ° C. After the electrolytic reaction,
The methylene chloride layer was washed with a 5% aqueous sodium thiosulfate solution, the methylene chloride solution was concentrated, and the residue was separated and purified with a silica gel column to give compound (IIIa) (R 14 = P
h, R 16 = Me, R 15 = R 17 = H) (101 mg, yield 75)
%)was gotten. The obtained compound (IIIa) was used as an optically active column (DAICEL CHIRALCEL OB-
As a result of analysis by high performance liquid chromatography equipped with (H), the enantiomeric excess rate was 81%. IR (neat) 3064, 2996, 2968, 293
0, 1605, 1496, 1451, 1358 cm -1 1 H NMR (200 MHz, CDCl 3 ) δ 1.07 (d, J = 5 Hz, 3 H), 2.93 (dq,
J = 4.5Hz, 1H), 3.46 (d, J = 4Hz, 1
H), 7.18 to 7.41 (m, 5H) 13 C NMR (50 MHz, CDCl 3 ) δ 13.0, 55.6, 58.0, 127.1, 128.
0,128.5,136.1

【0025】実施例2 1規定塩化ナトリウム水溶液の代わりに1規定臭化ナト
リウム水溶液を用いて、実施例1と同様に化合物(I
a)を電解酸化したところ、化合物(IIIa)(94m
g、収率70%、対掌体過剰率80%)が得られた。 実施例3 化合物(Ib)(R1=Ph、R2=Me、R3=R4=H)
118mg、化合物(IIb)[(R5、R8)=−(CH2)4
−、R11=R13=t−Bu、R6=R7=R9=R10=R12
=H、Y=Cl)36mg(5mol%)を用い、実施例1と
同様に電解反応、後処理を行った結果、化合物(III
b)(R14=Me、R15=Ph、R16=R17=H)(74
mg、収率55%)が得られた。得られた化合物(III
b)を光学活性カラム(DAICEL CHIRALC
EL OB−H)を装着した高速液体クロマトグラフィ
ーで分析した結果、対掌体過剰率は、51%であった。 IR(neat)3032,2983,2933,281
6,2717,1604,1496,1447,132
8,1343cm-1 1 H NMR(200MHz,CDCl3) δ1.72(s,3H),2.88(ABq,J=6Hz,
2H),7.23〜7.39(m,5H)13 C NMR(50MHz,CDCl3) δ21.8,57.0,125.2,127.4,128.
3,129.0,141.1 実施例4〜9 実施例1と同様に表1に示す条件で化合物(Ia)を電
解酸化した。結果を表1示す。
Example 2 In the same manner as in Example 1 except that the 1N sodium bromide aqueous solution was used instead of the 1N sodium chloride aqueous solution, the compound (I
When a) was electrolytically oxidized, compound (IIIa) (94 m
g, yield 70%, enantiomeric excess 80%) were obtained. Example 3 Compound (Ib) (R 1 = Ph, R 2 = Me, R 3 = R 4 = H)
118 mg, compound (IIb) [(R 5 , R 8 ) =-(CH 2 ) 4
-, R 11 = R 13 = t-Bu, R 6 = R 7 = R 9 = R 10 = R 12
= H, Y = Cl) 36 mg (5 mol%), electrolytic reaction and post-treatment were carried out in the same manner as in Example 1. As a result, the compound (III
b) (R 14 = Me, R 15 = Ph, R 16 = R 17 = H) (74
mg, yield 55%) was obtained. Obtained compound (III
b) is an optically active column (DAICEL CHIRALC
As a result of high performance liquid chromatography equipped with ELOB-H), the enantiomeric excess rate was 51%. IR (neat) 3032, 2983, 2933, 281
6,2717,1604,1496,1447,132
8,1343 cm -1 1 H NMR (200 MHz, CDCl 3 ) δ 1.72 (s, 3 H), 2.88 (ABq, J = 6 Hz,
2H), 7.23 to 7.39 (m, 5H) 13 C NMR (50 MHz, CDCl 3 ) δ 21.8, 57.0, 125.2, 127.4, 128.
3, 129.0, 141.1 Examples 4 to 9 The compound (Ia) was electrolytically oxidized under the conditions shown in Table 1 in the same manner as in Example 1. Table 1 shows the results.

【0026】[0026]

【表1】 [Table 1]

【0027】実施例10 ビーカー型電解槽に代わりに多孔質ガラスフィルターで
仕切られた分離型電解槽を用い、陽極槽溶液として化合
物(Ia)118mg、化合物(IIa)36mg(5mol
%)の塩化メチレン溶液(5ml)、1規定塩化ナトリウ
ム水溶液 15ml、陰極槽溶液として1規定塩化ナトリ
ウム水溶液 20mlを計り取り、2枚の白金板(1.0×
1.5cm2)をそれぞれ陽極、陰極として、−5〜0℃で
撹拌しながら10mAの定電流で24時間電解した。電
解反応後、実施例1と同様の後処理を行った結果、化合
物(IIIa)(97mg,収率72%、対掌体過剰率79
%)が得られた。得られた化合物(IIIa)のスペクト
ルデータは実施例1のそれと完全に一致した。
Example 10 Instead of the beaker type electrolytic cell, a separation type electrolytic cell partitioned by a porous glass filter was used, and 118 mg of compound (Ia) and 36 mg (5 mol of compound (IIa) were used as an anode cell solution.
%) Methylene chloride solution (5 ml), 1N sodium chloride aqueous solution (15 ml), and 1N sodium chloride aqueous solution (20 ml) as a cathode bath solution, and the two platinum plates (1.0 x
1.5 cm 2 ) was used as an anode and a cathode, and electrolysis was carried out at a constant current of 10 mA for 24 hours while stirring at -5 to 0 ° C. After the electrolytic reaction, the same post-treatment as in Example 1 was performed. As a result, the compound (IIIa) (97 mg, yield 72%, enantiomeric excess 79
%)was gotten. The spectral data of the obtained compound (IIIa) completely coincided with that of Example 1.

【0028】実施例11 化合物(IIa)の代わりに化合物(IIc)(R6=R7
Ph,R11=R13=tBu,R5=R8=R9=R10=R12
H,Y=Cl)41mg(5mol%)を用いる以外は実施例
1と同様の反応を行った結果、化合物(IIIa)(98m
g,収率73%,対掌体過剰率74%)が得られた。得
られた化合物(IIIa)のスペクトルデータは実施例1
のそれと完全に一致した。
Example 11 Instead of the compound (IIa), the compound (IIc) (R 6 = R 7 =
Ph, R 11 = R 13 = tBu, R 5 = R 8 = R 9 = R 10 = R 12 =
H, Y = Cl) 41 mg (5 mol%) was used, and the same reaction as in Example 1 was carried out. As a result, the compound (IIIa) (98 m
g, yield 73%, enantiomeric excess 74%). The spectral data of the obtained compound (IIIa) is shown in Example 1.
It was an exact match with that.

【0029】参考例1(化合物IIIから機能性材料の製
造) 化合物(IIIa)(R14=Ph、R16=Me、R15=R17
=H)100mgにエチルマグネシウムブロミドを作用さ
せ、生成したアルコール誘導体にメタンスルホニルクロ
リドを作用させてメタンスルホネートとした後、リチウ
ムアルミニウムヒドリドで還元した。過酸化水素、塩化
アルミニウムでフェノール誘導体とし、p'−オクチル
ビフェニル−p−カルボン酸クロリドと反応させると、
液晶分子の一種である化合物(IVa)が41mg(総収率
12%)得られた。 IR(KBr) 3060,1716,1604cm-1 1 H NMR(200MHz,DMF−d7) δ 0.94〜2.47(m,28H)、6.81〜8.2
5(m,12H) 尚、化合物(IVa)は、例えば、「分子機能材料と素子
開発」清水剛夫、吉野勝美監修、発行所(株)エヌ・テ
ィー・エス の第2章、第11節、p.641に記載さ
れている。
Reference Example 1 (Production of Functional Material from Compound III) Compound (IIIa) (R 14 = Ph, R 16 = Me, R 15 = R 17
= H) 100 mg of ethylmagnesium bromide was allowed to act, and the produced alcohol derivative was allowed to act with methanesulfonyl chloride to give methanesulfonate, and then reduced with lithium aluminum hydride. When a phenol derivative is formed with hydrogen peroxide and aluminum chloride and reacted with p′-octylbiphenyl-p-carboxylic acid chloride,
41 mg (total yield 12%) of compound (IVa), which is one kind of liquid crystal molecule, was obtained. IR (KBr) 3060,1716,1604cm -1 1 H NMR (200MHz, DMF-d 7) δ 0.94~2.47 (m, 28H), 6.81~8.2
5 (m, 12H) Incidentally, the compound (IVa) is, for example, “Molecular Functional Materials and Device Development” Takeo Shimizu, Katsumi Yoshino, published by NTS Co., Ltd., Chapter 2, Section 11, p.641.

【0030】[0030]

【化9】 Embedded image

【0031】[0031]

【発明の効果】本発明の一般式(I)で表わされるオレ
フィン化合物を、一般式(II)で表わされる光学活性マ
ンガン触媒の存在下、有機溶媒とハロゲン化物水溶液の
二相系で、電解することにより、一般式(III)で表わ
される光学活性エポキシド誘導体を、高収率、高純度
で、しかも、危険な酸化剤を大量に使用することなく、
また、大量の廃棄物を出すことなく製造することができ
る。
The olefin compound represented by the general formula (I) of the present invention is electrolyzed in the presence of the optically active manganese catalyst represented by the general formula (II) in a two-phase system of an organic solvent and an aqueous halide solution. As a result, the optically active epoxide derivative represented by the general formula (III) can be obtained in high yield and high purity without using a large amount of dangerous oxidizing agent.
In addition, it can be manufactured without producing a large amount of waste.

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C07M 7:00 (72)発明者 亀山 豊 徳島県徳島市川内町加賀須野463 大塚化 学株式会社徳島研究所内 (72)発明者 菊池 亮 徳島県徳島市川内町加賀須野463 大塚化 学株式会社徳島研究所内Continuation of front page (51) Int.Cl. 6 Identification number Internal reference number FI Technical indication location C07M 7:00 (72) Inventor Yutaka Kameyama 463 Kagasuno, Kawauchi Town, Tokushima City, Tokushima Prefecture Otsuka Chemical Co., Ltd. (72) Inventor Ryo Kikuchi 463 Kagasuno, Kawauchi Town, Tokushima City, Tokushima Prefecture Otsuka Chemical Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一般式(I)で表わされるオレフィン化
合物を、一般式(II)で表わされる光学活性マンガン触
媒の存在下、有機溶媒とハロゲン化物水溶液の二層系で
電解することにより、一般式(III)で表わされる光学
活性エポキシド誘導体を得ることを特徴とする、光学活
性エポキシド誘導体の製造方法。 【化1】 (式中R1、R2、R3、R4は水素原子、置換基を有して
いても良い、アルキル基、アルケニル基、アルキニル
基、芳香族化合物残基、複素芳香族化合物残基、アルコ
キシ基、アシル基、保護されていても良い、ヒドロキシ
ル基、アミノ基、カルボキシル基、ハロゲン原子、ニト
ロ基、シアノ基を示す。) 【化2】 (式中R5、R6、R7、R8は、R5とR8でC5〜C8のシ
クロアルカンを形成し且つR6とR7は水素原子、また
は、R6とR7でC5〜C8のシクロアルカンを形成し且つ
5とR8は水素原子、あるいは、R5とR8がアリール基
で且つR6とR7は水素原子、または、R6とR7がアリー
ル基で且つR5とR8は水素原子を表す。R9、R10、R
11、R12、R13は、水素原子、置換基を有していても良
い、アルキル基、芳香族化合物残基、アルコキシ基、ア
シル基、保護基を有していても良い、ヒドロキシル基、
アミノ基、カルボキシル基、ハロゲン原子、ニトロ基、
シアノ基を示す。Yは、陰イオンを示す。) 【化3】 (式中R14、R15、R16、R17は水素原子、置換基を有
していても良い、アルキル基、アルケニル基、アルキニ
ル基、芳香族化合物残基、複素芳香族化合物残基、アル
コキシ基、アシル基、保護されていても良い、ヒドロキ
シル基、アミノ基、カルボキシル基、ハロゲン原子、ニ
トロ基、シアノ基を示す。)
1. An olefin compound represented by the general formula (I) is electrolyzed in a two-layer system of an organic solvent and a halide aqueous solution in the presence of an optically active manganese catalyst represented by the general formula (II), A method for producing an optically active epoxide derivative, which comprises obtaining the optically active epoxide derivative represented by the formula (III). Embedded image (In the formula, R 1 , R 2 , R 3 and R 4 are a hydrogen atom and may have a substituent, an alkyl group, an alkenyl group, an alkynyl group, an aromatic compound residue, a heteroaromatic compound residue, An alkoxy group, an acyl group, an optionally protected hydroxyl group, an amino group, a carboxyl group, a halogen atom, a nitro group, and a cyano group are shown. (Wherein R 5 , R 6 , R 7 and R 8 together form a C 5 -C 8 cycloalkane with R 5 and R 8 and R 6 and R 7 are hydrogen atoms, or R 6 and R 7 To form a C 5 -C 8 cycloalkane and R 5 and R 8 are hydrogen atoms, or R 5 and R 8 are aryl groups and R 6 and R 7 are hydrogen atoms, or R 6 and R 7 are .R 9, R 10, R but representing a and R 5 and R 8 are hydrogen atoms with an aryl group
11 , R 12 and R 13 are each a hydrogen atom, an optionally substituted alkyl group, an aromatic compound residue, an alkoxy group, an acyl group, a hydroxyl group optionally having a protective group,
Amino group, carboxyl group, halogen atom, nitro group,
A cyano group is shown. Y represents an anion. ) (In the formula, R 14 , R 15 , R 16 and R 17 are a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aromatic compound residue, a heteroaromatic compound residue, which may have a substituent, (Alkoxy group, acyl group, optionally protected hydroxyl group, amino group, carboxyl group, halogen atom, nitro group, cyano group.)
JP8085834A 1996-03-13 1996-03-13 Production of optically active epoxide derivative Pending JPH09249984A (en)

Priority Applications (1)

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JPH09249984A true JPH09249984A (en) 1997-09-22

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002513734A (en) * 1998-05-01 2002-05-14 プレジデント・アンド・フェロウズ・オブ・ハーバード・カレッジ Asymmetric catalysts based on main group metals and their applications
US7057057B2 (en) 2002-05-22 2006-06-06 Errant Gene Therapeutics, Llc Histone deacetylase inhibitors based on alpha-ketoepoxide compounds
JP2020023742A (en) * 2018-07-31 2020-02-13 Jxtgエネルギー株式会社 Device of producing epoxy derivative, method of producing epoxy derivative, and method of producing epoxy-derivative production device
CN114981482A (en) * 2019-10-29 2022-08-30 株式会社大赛璐 Method for producing epoxy compound

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002513734A (en) * 1998-05-01 2002-05-14 プレジデント・アンド・フェロウズ・オブ・ハーバード・カレッジ Asymmetric catalysts based on main group metals and their applications
US7057057B2 (en) 2002-05-22 2006-06-06 Errant Gene Therapeutics, Llc Histone deacetylase inhibitors based on alpha-ketoepoxide compounds
US7579372B2 (en) 2002-05-22 2009-08-25 Errant Gene Therapeutics, Llc Histone deacetylase inhibitors based on alpha-ketoepoxide compounds
JP2020023742A (en) * 2018-07-31 2020-02-13 Jxtgエネルギー株式会社 Device of producing epoxy derivative, method of producing epoxy derivative, and method of producing epoxy-derivative production device
CN114981482A (en) * 2019-10-29 2022-08-30 株式会社大赛璐 Method for producing epoxy compound

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