JPS6221001Y2 - - Google Patents
Info
- Publication number
- JPS6221001Y2 JPS6221001Y2 JP1981188486U JP18848681U JPS6221001Y2 JP S6221001 Y2 JPS6221001 Y2 JP S6221001Y2 JP 1981188486 U JP1981188486 U JP 1981188486U JP 18848681 U JP18848681 U JP 18848681U JP S6221001 Y2 JPS6221001 Y2 JP S6221001Y2
- Authority
- JP
- Japan
- Prior art keywords
- quartz
- sic
- rod
- pipe
- motherboard
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010453 quartz Substances 0.000 claims description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 35
- 239000004065 semiconductor Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000007787 solid Substances 0.000 description 8
- 230000007774 longterm Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000009172 bursting Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
Description
【考案の詳細な説明】
本考案は、半導体製造において、特に拡散,酸
化,CVD工程において使用する石英コロ付マザ
ーボートの構造に関するものである。[Detailed Description of the Invention] The present invention relates to the structure of a motherboard with quartz rollers used in semiconductor manufacturing, particularly in diffusion, oxidation, and CVD processes.
従来、拡散,酸化,CVD工程に使用している
石英ボートは、ウエハースの大型化及び1バツチ
での処理数アツプの要求から、はしご型ボートか
らマザーボートを用い、その上にカセツトボート
を使用するという方式へ変化してきた。そのマザ
ーボートの構造は、石英ムク棒が炉芯管とこすれ
石英粉が発生しないように、炉芯管との接触面積
が少ないコロを用いたものであつた。しかしなが
ら、前記の様な構造の為、比較的高温(800℃〜
1100℃)での長時間処理において、ボートの自重
及びウエハースの荷重の為に石英コロ付マザーボ
ートがたわんできて、炉芯管とこすれて石英粉の
発生及びボートの出し入れ作業の困難性という問
題が発生してきた。 Conventionally, the quartz boats used in the diffusion, oxidation, and CVD processes have changed from ladder-type boats to mother boats, and then cassette boats on top of them, due to the demands for larger wafers and increased processing numbers in one batch. This method has changed. The structure of the mother boat used rollers with a small contact area with the furnace core tube to prevent the quartz bar from rubbing against the furnace core tube and generating quartz powder. However, due to the structure described above, the temperature is relatively high (800℃~800℃).
During long-term processing at temperatures (1100℃), the mother boat with quartz rollers would bend due to the boat's own weight and the load of the wafers, which would rub against the furnace core tube, producing quartz powder and making it difficult to take the boat in and out. has occurred.
本考案は、石英コロ付マザーボートに、石英パ
イプを用い、パイプ内部に石英パイプの内径より
も小さな径のSiCムク棒を真空封入することで、
上記欠点を解消し、たわみのない石英コロ付マザ
ーボートを提供するものである。 This invention uses a quartz pipe in a motherboard with a quartz roller, and vacuum-seals a solid SiC rod with a diameter smaller than the inner diameter of the quartz pipe inside the pipe.
The object of the present invention is to eliminate the above drawbacks and provide a motherboard with quartz rollers that does not bend.
以下、図面を用いて本考案を詳細に説明する。 Hereinafter, the present invention will be explained in detail using the drawings.
第1図は、従来使用している石英コロ付マザー
ボートを示したものである。すなわち、石英ムク
棒に石英コロが設けられており、この上にカケツ
トボードをのせ、引き出し棒ひつかけ部1を利用
して反応管の中に出し入れしている。 FIG. 1 shows a conventionally used motherboard with quartz rollers. That is, a quartz roller is provided on a solid quartz rod, a bucket board is placed on this rod, and the drawer rod is inserted into and taken out of the reaction tube using the hook part 1.
第2図は本考案のSiC入り石英コロ付マザーボ
ートを示したものである。本考案は、第1図の石
英ムク棒3にかえ、石英パイプ4(内径8〜30
mm,肉厚0.5〜5mm)を使用し、そのパイプ4内
部に直径6〜25mmの高純度のSiCムク棒5を入
れ、融着後、パイプ4内部のガスの熱膨張による
パイプ4の破裂防止の為、開口6の部分より真空
引きした後、その真空引き口6を融着してマザー
ボートを形成する。 Figure 2 shows the motherboard with SiC-containing quartz rollers of the present invention. In this invention, instead of the solid quartz rod 3 in Fig. 1, a quartz pipe 4 (inner diameter 8 to 30 mm) is used.
A high-purity SiC rod 5 with a diameter of 6 to 25 mm is placed inside the pipe 4 to prevent the pipe 4 from bursting due to thermal expansion of the gas inside the pipe 4. Therefore, after evacuating the opening 6, the vacuum opening 6 is fused to form a motherboard.
上述の様にして、形成されたSiC棒6入り石英
コロ付マザーボートは、SiC棒6のすぐれた耐熱
性及び高強度性の為、従来の石英コロ付マザーボ
ートに比較して、高温(800〜1100℃)での長時
間処理においても、へたりはほとんどなく、マザ
ーボートと炉芯管のこすれにより発生する石英粉
はほとんどない。従つてウエハースの歩留向上に
もつながる。又、ボートの出し入れも、炉芯管と
の接触面積が長期間の使用でも一定に保てる為、
容易になる。しかも、SiCムク棒5は石英パイプ
4内に真空封止されている。したがつて、SiC棒
5の汚染が防止され、半導体製造の際の熱処理の
際に石英パイプ4内部のガスの膨張ということは
おこらず、石英パイプ4の破壊が防止される。ま
た、SiCムク棒5は石英パイプ4の内径も小さな
径を有するので、SiCムク棒5はその全表面にお
いて石英パイプ4の内壁に接触しておらず、部分
的に接触している。したがつて、石英パイプ4の
汚染や亀裂の影響がSiCムク棒5の全体に直接に
及ぶことはなく、長寿命化が達成される。これ
は、石英パイプ4が万一破損しても、SiCムク棒
5を再利用できることを意味する。 The SiC rod 6-equipped motherboard with quartz rollers formed as described above can withstand high temperatures (800°C) compared to conventional motherboards with quartz rollers due to the excellent heat resistance and high strength of the SiC rods 6. Even during long-term processing at temperatures up to 1100℃, there is almost no settling, and almost no quartz powder is generated due to rubbing between the mother boat and the furnace core tube. Therefore, it also leads to an improvement in the yield of wafers. Also, when loading and unloading the boat, the contact area with the furnace core tube can be kept constant even during long-term use.
becomes easier. Moreover, the SiC solid rod 5 is vacuum-sealed within the quartz pipe 4. Therefore, contamination of the SiC rod 5 is prevented, gas expansion inside the quartz pipe 4 does not occur during heat treatment during semiconductor manufacturing, and destruction of the quartz pipe 4 is prevented. Furthermore, since the SiC solid rod 5 has a smaller inner diameter than the quartz pipe 4, the SiC solid rod 5 does not contact the inner wall of the quartz pipe 4 on its entire surface, but only partially contacts it. Therefore, the influence of contamination or cracks in the quartz pipe 4 does not directly affect the entire solid SiC rod 5, and a longer life is achieved. This means that even if the quartz pipe 4 should be damaged, the SiC bar 5 can be reused.
又、SiCのすぐれた耐熱性,高強度性は、石英
コロ付マザーボートへの適用で、効果を発揮する
のみならず、高温で使用する引き出し棒等への応
用も考えられる。 In addition, SiC's excellent heat resistance and high strength are not only effective when applied to motherboards with quartz rollers, but can also be applied to pull-out rods that are used at high temperatures.
第1図は従来の石英コロ付マザーボートを示す
断面図、第2図は本考案の一実施例を示すSiC入
り石英コロ付マザーボートを示す断面図である。
1……マザーボート入出炉時の引き出し棒引つ
かけ部、2……石英コロ、3……石英ムク棒、4
……石英パイプ、5……SiCムク棒、6……真空
引き口。
FIG. 1 is a sectional view showing a conventional motherboard with quartz rollers, and FIG. 2 is a sectional view showing a motherboard with SiC-containing quartz rollers, which is an embodiment of the present invention. 1...Drawer rod hooking part when loading and unloading the motherboard, 2...Quartz roller, 3...Quartz bar, 4
...Quartz pipe, 5...SiC solid rod, 6...Vacuum opening.
Claims (1)
めのマザーボードに、内部にSiC棒を有する石英
パイプを用い、かつ前記SiC棒は前記石英パイプ
の内径よりも小さな径を有し、前記石英パイプ内
に真空封入されていることを特徴とする半導体製
造装置。 A quartz pipe having a SiC rod inside is used as a motherboard for loading and unloading semiconductor wafers into a reactor, and the SiC rod has a smaller diameter than the inner diameter of the quartz pipe, and a vacuum is placed inside the quartz pipe. A semiconductor manufacturing device characterized by being enclosed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18848681U JPS5892729U (en) | 1981-12-17 | 1981-12-17 | semiconductor manufacturing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18848681U JPS5892729U (en) | 1981-12-17 | 1981-12-17 | semiconductor manufacturing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5892729U JPS5892729U (en) | 1983-06-23 |
JPS6221001Y2 true JPS6221001Y2 (en) | 1987-05-28 |
Family
ID=29992095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18848681U Granted JPS5892729U (en) | 1981-12-17 | 1981-12-17 | semiconductor manufacturing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5892729U (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2676405B2 (en) * | 1989-04-25 | 1997-11-17 | 信越石英株式会社 | Quartz glass for semiconductor manufacturing equipment or jig and manufacturing method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5215168B2 (en) * | 1971-11-30 | 1977-04-27 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS543647Y2 (en) * | 1975-07-21 | 1979-02-20 | ||
JPS52145771U (en) * | 1976-04-27 | 1977-11-04 | ||
JPS5699851U (en) * | 1979-12-27 | 1981-08-06 |
-
1981
- 1981-12-17 JP JP18848681U patent/JPS5892729U/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5215168B2 (en) * | 1971-11-30 | 1977-04-27 |
Also Published As
Publication number | Publication date |
---|---|
JPS5892729U (en) | 1983-06-23 |
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