JPS62204261A - Photomechanical process for positive type photosensitive printing plate - Google Patents
Photomechanical process for positive type photosensitive printing plateInfo
- Publication number
- JPS62204261A JPS62204261A JP4704486A JP4704486A JPS62204261A JP S62204261 A JPS62204261 A JP S62204261A JP 4704486 A JP4704486 A JP 4704486A JP 4704486 A JP4704486 A JP 4704486A JP S62204261 A JPS62204261 A JP S62204261A
- Authority
- JP
- Japan
- Prior art keywords
- light
- free radical
- printing plate
- exposed
- absorption wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 16
- 230000008569 process Effects 0.000 title description 2
- 150000003254 radicals Chemical class 0.000 claims abstract description 23
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 19
- 238000010521 absorption reaction Methods 0.000 claims abstract description 17
- 239000002253 acid Substances 0.000 claims abstract description 7
- 230000003595 spectral effect Effects 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 230000001678 irradiating effect Effects 0.000 abstract description 4
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 5
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- 238000006303 photolysis reaction Methods 0.000 abstract 1
- 230000015843 photosynthesis, light reaction Effects 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 239000007864 aqueous solution Substances 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- -1 aromatic hydroxy compound Chemical class 0.000 description 10
- 239000000975 dye Substances 0.000 description 10
- 238000007689 inspection Methods 0.000 description 10
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 229910001507 metal halide Inorganic materials 0.000 description 6
- 150000005309 metal halides Chemical class 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QPQKUYVSJWQSDY-UHFFFAOYSA-N 4-phenyldiazenylaniline Chemical compound C1=CC(N)=CC=C1N=NC1=CC=CC=C1 QPQKUYVSJWQSDY-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000001045 blue dye Substances 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 3
- 229930003836 cresol Chemical group 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- WNZQDUSMALZDQF-UHFFFAOYSA-N 2-benzofuran-1(3H)-one Chemical compound C1=CC=C2C(=O)OCC2=C1 WNZQDUSMALZDQF-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 241000238633 Odonata Species 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 150000003459 sulfonic acid esters Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000001043 yellow dye Substances 0.000 description 2
- LIZLYZVAYZQVPG-UHFFFAOYSA-N (3-bromo-2-fluorophenyl)methanol Chemical compound OCC1=CC=CC(Br)=C1F LIZLYZVAYZQVPG-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- CMYZTJCWFRFRIW-UHFFFAOYSA-N 1-bromo-4-(4-methoxyphenyl)benzene Chemical compound C1=CC(OC)=CC=C1C1=CC=C(Br)C=C1 CMYZTJCWFRFRIW-UHFFFAOYSA-N 0.000 description 1
- GUKYYIQMUCVKHI-UHFFFAOYSA-N 2-(2,4-dichlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC1=CC(Cl)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 GUKYYIQMUCVKHI-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- HBRCDTRQDHMTDA-UHFFFAOYSA-N 2-[[4-(diethylamino)phenyl]diazenyl]benzoic acid Chemical compound C1=CC(N(CC)CC)=CC=C1N=NC1=CC=CC=C1C(O)=O HBRCDTRQDHMTDA-UHFFFAOYSA-N 0.000 description 1
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- LBBOQIHGWMYDPM-UHFFFAOYSA-N 2-tert-butylphenol;formaldehyde Chemical compound O=C.CC(C)(C)C1=CC=CC=C1O LBBOQIHGWMYDPM-UHFFFAOYSA-N 0.000 description 1
- JCYPECIVGRXBMO-UHFFFAOYSA-N 4-(dimethylamino)azobenzene Chemical compound C1=CC(N(C)C)=CC=C1N=NC1=CC=CC=C1 JCYPECIVGRXBMO-UHFFFAOYSA-N 0.000 description 1
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 1
- VBNIYPOGDJUMEM-UHFFFAOYSA-N 4-[2-(4-methoxyphenyl)ethenyl]-6-(trichloromethyl)-1,3,5-triazin-2-amine Chemical compound C1=CC(OC)=CC=C1C=CC1=NC(N)=NC(C(Cl)(Cl)Cl)=N1 VBNIYPOGDJUMEM-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- AEAYCTGEHOJKBI-UHFFFAOYSA-N 4-methyl-6-(tribromomethyl)-1,3,5-triazin-2-amine Chemical compound CC1=NC(N)=NC(C(Br)(Br)Br)=N1 AEAYCTGEHOJKBI-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical group [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical group OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- SJJISKLXUJVZOA-UHFFFAOYSA-N Solvent yellow 56 Chemical compound C1=CC(N(CC)CC)=CC=C1N=NC1=CC=CC=C1 SJJISKLXUJVZOA-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229940010556 ammonium phosphate Drugs 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- IQFVPQOLBLOTPF-HKXUKFGYSA-L congo red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(/N=N/C3=CC=C(C=C3)C3=CC=C(C=C3)/N=N/C3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-HKXUKFGYSA-L 0.000 description 1
- OBRMNDMBJQTZHV-UHFFFAOYSA-N cresol red Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C=C(C)C(O)=CC=2)=C1 OBRMNDMBJQTZHV-UHFFFAOYSA-N 0.000 description 1
- 150000001896 cresols Chemical group 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 229940116349 dibasic ammonium phosphate Drugs 0.000 description 1
- 229940111685 dibasic potassium phosphate Drugs 0.000 description 1
- 229940061607 dibasic sodium phosphate Drugs 0.000 description 1
- 239000001177 diphosphate Substances 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- XJRPTMORGOIMMI-UHFFFAOYSA-N ethyl 2-amino-4-(trifluoromethyl)-1,3-thiazole-5-carboxylate Chemical compound CCOC(=O)C=1SC(N)=NC=1C(F)(F)F XJRPTMORGOIMMI-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 229940006116 lithium hydroxide Drugs 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- STZCRXQWRGQSJD-GEEYTBSJSA-M methyl orange Chemical compound [Na+].C1=CC(N(C)C)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-GEEYTBSJSA-M 0.000 description 1
- 229940012189 methyl orange Drugs 0.000 description 1
- CEQFOVLGLXCDCX-WUKNDPDISA-N methyl red Chemical compound C1=CC(N(C)C)=CC=C1\N=N\C1=CC=CC=C1C(O)=O CEQFOVLGLXCDCX-WUKNDPDISA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- VXLFYNFOITWQPM-UHFFFAOYSA-N n-phenyl-4-phenyldiazenylaniline Chemical compound C=1C=C(N=NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 VXLFYNFOITWQPM-UHFFFAOYSA-N 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229940093932 potassium hydroxide Drugs 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 229940074415 potassium silicate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229940083608 sodium hydroxide Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 229940032158 sodium silicate Drugs 0.000 description 1
- LXMSZDCAJNLERA-ZHYRCANASA-N spironolactone Chemical compound C([C@@H]1[C@]2(C)CC[C@@H]3[C@@]4(C)CCC(=O)C=C4C[C@H]([C@@H]13)SC(=O)C)C[C@@]21CCC(=O)O1 LXMSZDCAJNLERA-ZHYRCANASA-N 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
Landscapes
- Physics & Mathematics (AREA)
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Abstract
Description
【発明の詳細な説明】 〔発明の分野〕 本発明は感光性印刷版の製版方法に関するものである。[Detailed description of the invention] [Field of invention] The present invention relates to a method for making a photosensitive printing plate.
更に詳しくは、ポジ型感光性印刷版に優れた検版性を与
えることのできる製版方法に関するものである。More specifically, the present invention relates to a plate-making method that can provide positive photosensitive printing plates with excellent plate inspection properties.
ポジ型感光性印刷版は光照射により現像液に対する溶解
性が大きくなることを利用して作られる。Positive-working photosensitive printing plates are produced by taking advantage of the fact that the solubility in a developer increases upon irradiation with light.
この感光性印刷版の感光層に染料を含ませておき、製版
時や印刷時、画像を見易くさせることは従来より行なわ
れている。又、画像露光すると直ちに当該画像に対応し
た可視的コントラストを与える、所謂焼き出し性を付与
させたポジ型感光性印刷版も公知である。例えば、特開
昭50−36209号には、0−キノンジ了シト化合゛
物のスルホン酸エステル又はスルホン酸アミドとノボラ
ック樹脂からなるポジ型感光性組成物中に、光照射によ
り遊離基を発生する化合物としての0−ナフトキノフジ
アジド−4−スルホン酸ハロゲニドと塩形成能を有する
有機染料を添加することによって、焼き出し性を付与し
たポジ型感光性組成物が記載されている。It has been conventional practice to impregnate the photosensitive layer of this photosensitive printing plate with a dye to make the image easier to see during plate making or printing. Furthermore, positive-working photosensitive printing plates are also known which are provided with so-called print-out properties, which immediately provide visible contrast corresponding to the image upon exposure. For example, JP-A-50-36209 discloses that free radicals are generated by light irradiation in a positive photosensitive composition consisting of a sulfonic acid ester or sulfonic acid amide of an 0-quinone diphosphate compound and a novolak resin. A positive-working photosensitive composition is described in which print-out properties are imparted by adding 0-naphthoquinofdiazide-4-sulfonic acid halide as a compound and an organic dye having salt-forming ability.
従来より、ポジ透明原画を感光層の表面に真空焼枠にて
密着させて活性光線により露光(画像露光)し、現像液
にて、現像、水洗した後、不必要な画像部分(透明原画
や真空焼枠のガラスに付着したゴミによるもの、フィル
ムエツジ、レジスターマーク等)に消去液を筆などで塗
布し、次いで水洗して消去し、しかる後ガム引きを行な
い印刷版を得る方法が広く採用されている。又、はりこ
みテープや、ゴミや、真空ひき不足でボケが生ずること
があり、それを印刷前に検版をして確認している。この
様な消去や検版作業においては画像部の色をできるだけ
濃くし細かい部分を見易くすることが都合がよい。一方
露光作業においては位置決めの為、感光性印刷版の決っ
た場所に青色ボールペンで十形のマーク(トンボという
)を入れ、これとポジ透明原画に焼きこまれた十形マー
クとを重ね合せることが広く行われている。この際、青
色ボールペンでつけた十形マークを見易くするには印刷
版の色はできるだけ薄いことが望ましい。Conventionally, a positive transparent original image is brought into close contact with the surface of a photosensitive layer using a vacuum printing frame, exposed to actinic light (image exposure), developed with a developer, washed with water, and unnecessary image parts (transparent original image and A widely used method is to apply erasing liquid to dirt attached to the glass of the vacuum printing frame, film edges, register marks, etc. with a brush, wash with water to erase, and then apply gum to obtain a printing plate. has been done. In addition, blurring may occur due to embedded tape, dust, or insufficient vacuuming, so this is checked by inspecting the plate before printing. In such erasing and plate inspection work, it is convenient to make the color of the image area as dark as possible to make the fine details easier to see. On the other hand, during exposure work, for positioning purposes, a ten-shaped mark (called a dragonfly) is made with a blue ballpoint pen at a fixed location on the photosensitive printing plate, and this is superimposed on the ten-shaped mark imprinted on the positive transparent original. is widely practiced. At this time, it is desirable that the color of the printing plate be as light as possible in order to make the 10-shaped mark made with a blue ballpoint pen easier to see.
以上の様な相反する要求があるので、従来の感光性印刷
版は通常どちらの作業も可能な程度の濃度(D=0.7
〜1.0)にしである。このためいずれの作業の際にも
満足のいくものではなく、製版作業の効率化をはばんで
いた。Due to the conflicting demands mentioned above, conventional photosensitive printing plates usually have a density (D = 0.7
~1.0) Nishishi. For this reason, none of the operations were satisfactory, and the efficiency of the plate-making operations was hindered.
この様な問題点を解決するのには、版の色が露光前には
薄く検版時には濃くなっていればよい。In order to solve these problems, the color of the plate should be light before exposure and dark during plate inspection.
したがって発色型の焼出し剤を添加しておけば、露光前
は色が薄く、光照射後は濃くすることができる。ところ
で、ポジ型感光性印刷版は露光部分がアルカリ可溶化し
て非画像部を形成し、未露光部分が画像部を形成するも
のである。従って検版のために画像部の色を濃くするに
は露光・現像後、曝光し、画像部を発色させてやる必要
がある。ところが画像部に光があたると0−キノンジア
ジドが光反応してカルボン酸型となり、曙光前にはなか
った不都合な点が生じる。その一つはバーニング効果の
減少である。0−キノンジアジドと7ユノール樹脂から
なる感光性組成物は一般に220℃以上の温度で3分以
上加熱する(以下これを「バーニング処理」という)こ
とにより、極めて強固な膜となり、バーニング処理のな
い時に比べ耐刷力が2.5〜3倍に向上する。ところが
0−キノンジアジドが光反応してカルボン酸型になった
ものは、バーニング処理しても効果が弱く、せいぜい1
.5〜2倍程度にしか上らない。Therefore, if a color-forming printing-out agent is added, the color can be made lighter before exposure and darker after exposure. Incidentally, in a positive-working photosensitive printing plate, exposed areas are alkali-solubilized to form non-image areas, and unexposed areas form image areas. Therefore, in order to deepen the color of the image area for plate inspection, it is necessary to expose the image area to light after exposure and development to cause the image area to develop color. However, when the image area is exposed to light, 0-quinonediazide undergoes a photoreaction and becomes a carboxylic acid form, causing a disadvantage that did not exist before dawn. One of them is a reduction in the burning effect. A photosensitive composition composed of 0-quinonediazide and 7-unol resin is generally heated at a temperature of 220°C or higher for 3 minutes or more (hereinafter referred to as "burning treatment") to form an extremely strong film, which can be used without burning treatment. The printing durability is improved by 2.5 to 3 times. However, when 0-quinonediazide photoreacts to form a carboxylic acid, burning treatment has a weak effect;
.. It only increases by about 5 to 2 times.
二つめの問題点は0−キノンジアジドがカルボン酸型と
なった画像部は溶解性が高くなって、印刷機上で使われ
る種々の薬品に対する抵抗性が弱くなってしまうことで
ある。例えばプレートクリーナーを使用すると感光した
画像部は、感光しない画像部に比べて侵される時間が早
く、実用に耐えないのである。The second problem is that the image area in which 0-quinonediazide is in the carboxylic acid form has high solubility and is less resistant to various chemicals used on printing presses. For example, if a plate cleaner is used, the exposed image area will be damaged more quickly than the unexposed image area, making it impractical.
この様に、画像部のキノンジアジドを感光すると大きな
問題を生じるので検版性を向上させるために画像部を光
照射するという方法は、実際には採用することができな
かった。As described above, exposing the quinone diazide in the image area to light would cause a big problem, so it was not possible to actually adopt the method of irradiating the image area with light in order to improve plate inspection properties.
従って、本発明の目的は画像露光及び現像後、画像部の
感光層に含まれている。−キノンジアジドを感光させる
ことなく、焼出し染料を発色させ優れた検版性を与える
方法を提供することである。Therefore, it is an object of the present invention to include a photosensitive layer in the image area after image exposure and development. - To provide a method of developing color with print-out dye and providing excellent plate inspection properties without exposing quinone diazide to light.
本発明者等は種々検討を重ねた結果、0−キノンジアジ
ドの吸収波長からはずれた所に吸収を持つ遊離基生成剤
を用い、かつこの遊離基生成剤を感光させるが、0−キ
ノンジアジドをあまり感光させない波長の光で画像部を
照射することにより上記目的が達成されることを見出し
、本発明を完成させるに至った。As a result of various studies, the inventors of the present invention found that they used a free radical generating agent that has an absorption wavelength that deviates from the absorption wavelength of 0-quinonediazide, and sensitized this free radical generating agent to light. The inventors have discovered that the above object can be achieved by irradiating the image area with light of a wavelength that does not interfere with the image area, and have completed the present invention.
すなわち本発明は、0〜キノンジアジドと、該0−キノ
ンジアジドの主吸収波長より低波長側に主吸収波長を有
する遊離基生成剤と、該遊離基生成剤が光分解した際に
生成する遊離酸と反応して変色する染料とを含有するポ
ジ型感光性印刷版を、画像露光し、現像したのち、主と
して遊離基生成剤が感光し、0−キノンジアジドが実質
的に感光しないような光を用いて全面露光することを特
徴とするポジ型感光性印刷版の製版方法である。That is, the present invention provides 0-quinonediazide, a free radical generating agent having a main absorption wavelength on the lower wavelength side than the main absorption wavelength of the 0-quinonediazide, and a free acid generated when the free radical generating agent is photodecomposed. After imagewise exposure and development of a positive-working photosensitive printing plate containing a dye that changes color upon reaction, the printing plate is exposed using light such that mainly the free radical generator is sensitized and the 0-quinonediazide is not substantially sensitized. This is a method for making a positive photosensitive printing plate, which is characterized by exposing the entire surface to light.
0−キノンジアジドは一般に360〜420nmに主吸
収波長をもっている。本発明はこの波長域に分光エネル
ギーを全く、あるいはほとんどもたない光を用いて全面
露光することにより、0−キノンジアジドを実質的に感
光させることなく、遊離基生成剤を感光させ、発色型焼
き出し剤を発色させ、検版性を向上させることを特徴と
するものである。O-quinonediazide generally has a main absorption wavelength in the range of 360 to 420 nm. The present invention uses light that has no or almost no spectral energy in this wavelength range to expose the entire surface to light, thereby exposing the free radical generator to light without substantially exposing the 0-quinone diazide, and color-forming printing. It is characterized by coloring the release agent and improving plate inspection properties.
遊離基生成剤としては360〜420nmの範囲外に、
たとえば320nmに主吸収波長を有するものが使用さ
れる。As a free radical generator, outside the range of 360 to 420 nm,
For example, one having a main absorption wavelength of 320 nm is used.
0−キノンジアジドの主吸収波長と、遊離基生成剤の主
吸収波長の差は、20nm以上が好ましく、更に好まし
くは30nm以上、最も好ましくは40nm以上である
。The difference between the main absorption wavelength of 0-quinonediazide and the main absorption wavelength of the free radical generating agent is preferably 20 nm or more, more preferably 30 nm or more, and most preferably 40 nm or more.
全面露光は、370nm以下に70%以上の分光エネル
ギーを有する光を用いて行うことが好ましい。また、3
60〜420nmの光を遮蔽し、より短波長の光を通過
させるフィルターを通して全面露光を行ってもよい。The entire surface exposure is preferably performed using light having spectral energy of 70% or more at 370 nm or less. Also, 3
The entire surface may be exposed through a filter that blocks light of 60 to 420 nm and allows light of shorter wavelengths to pass.
以下本発明の内容について詳細に説明する。The contents of the present invention will be explained in detail below.
本発明に使用されるポジ型感光性印刷版には以下の様な
0−キノンジアジド、遊離基発生剤、及び発色型焼き出
し染料を含有する感光性組成物が使われる。The positive-working photosensitive printing plate used in the present invention uses a photosensitive composition containing 0-quinone diazide, a free radical generator, and a color-forming printout dye as described below.
0−キノンジアジドとしては、例えば米国特許第3.0
46.110号、同第3.046.111号、同第3.
046.112号、同第3.046.115号、同第3
.046.118号、同第3゜046、119号、同第
3.046.120号、同第3.046.1.21号、
同第3.046.122号、同第3.046.123号
、同第3.061゜430号、同第3.102.809
号、同第3.106.465号、同第3.635.70
9号、同第3.647.443号の各明細書をはじめ、
多数の刊行物に記載されているものを好適に使用するこ
とができる。これらの内でも、特に芳香族ヒドロキシ化
合物のO−ナフトキノンジアジドスルホン酸エステルま
たは0−ナフトキノンジアジドカルボン酸エステル、お
よび芳香族アミノ化合物の0−ナフトキノンジアジドス
ルホン酸アミドまたは0−ナフトキノンジアジドカルボ
ン酸アミドが好ましく、特に米国特許第3.635.7
09号明細書に記されているピロガロールとアセトンと
の縮合物に0−ナフトキノンジアジドスルホン酸をエス
テル反応させたもの、米国特許第4.0’28゜1.1
1号明細書に記されている末端にヒドロキシ基を有する
ポリエステルに0−ナフトキノンジアジドスルホン酸、
または0−ナフトキノンジアジドカルボン酸をエステル
反応させたもの、米国特許第4.139.384号明細
書に記されているようなp−ヒドロキシスチレンのホモ
ポリマーまたはこれと他の共重合し得るモノマーとの共
重合体にO−ナフトキノンジアジドスルホン酸または0
−ナフトキノンジアジドカルボン酸をエステル反応させ
たもの、米国特許第3.759.711号明細書に記さ
れているようなp−アミノスチレンと他の共重合しうる
モノマーとの共重合体に0−ナフトキノンジアジドスル
ホン酸または0−ナフトキノンジアジドカルボン酸をア
ミド反応させたものは非常にすぐれている。As the 0-quinonediazide, for example, U.S. Patent No. 3.0
No. 46.110, No. 3.046.111, No. 3.
No. 046.112, No. 3.046.115, No. 3
.. No. 046.118, No. 3.046.119, No. 3.046.120, No. 3.046.1.21,
Same No. 3.046.122, Same No. 3.046.123, Same No. 3.061゜430, Same No. 3.102.809
No. 3.106.465, No. 3.635.70
Including the specifications of No. 9 and No. 3.647.443,
Those described in numerous publications can be suitably used. Among these, O-naphthoquinonediazide sulfonic acid ester or 0-naphthoquinonediazidecarboxylic acid ester of an aromatic hydroxy compound, and O-naphthoquinonediazide sulfonic acid amide or O-naphthoquinonediazidecarboxylic acid amide of an aromatic amino compound are particularly preferred. , especially U.S. Patent No. 3.635.7.
A condensate of pyrogallol and acetone described in the specification of No. 09 is subjected to an ester reaction with 0-naphthoquinonediazide sulfonic acid, US Patent No. 4.0'28゜1.1
0-naphthoquinonediazide sulfonic acid to the polyester having a hydroxyl group at the end described in Specification No. 1
or an ester reaction of 0-naphthoquinonediazidecarboxylic acid, a homopolymer of p-hydroxystyrene as described in U.S. Pat. No. 4,139,384, or other copolymerizable monomers therewith. copolymer with O-naphthoquinonediazide sulfonic acid or O
- ester reaction of naphthoquinone diazide carboxylic acid, copolymer of p-aminostyrene and other copolymerizable monomers as described in U.S. Pat. No. 3,759,711, and 0- Those obtained by subjecting naphthoquinonediazide sulfonic acid or 0-naphthoquinonediazidecarboxylic acid to an amide reaction are very good.
これらの0−キノンジアジド化合物は、単独で使用する
ことができるが、アルカリ可溶性樹脂と混合し、この混
合物を感光層として設けた方が好ましい。好適なアルカ
リ可溶性樹脂には、ノボラック型フェノール樹脂が含ま
れ、具体的には、フェノールホルムアルデヒド樹脂、0
−クレゾールホルムアルデヒド樹脂、m−クレゾールホ
ルムアルデヒド樹脂などが含まれる。更に米国特許第4
゜123、279号明細書に記されている様に上記のよ
うなフェノール樹脂と共に、t−ブチルフェノールホル
ムアルデヒド樹脂のような炭素数3〜8のアルキル基で
置換されたフェノールまたはクレゾールとホルムアルデ
ヒドとの縮合物とを併用すると、より一層好ましい。ア
ルカリ可溶性樹脂は、感光層中に約50〜約85重量、
より好ましくは60〜80重量%、含有させられる。Although these 0-quinonediazide compounds can be used alone, it is preferable to mix them with an alkali-soluble resin and provide this mixture as a photosensitive layer. Suitable alkali-soluble resins include novolak-type phenolic resins, specifically phenol formaldehyde resins,
-cresol formaldehyde resin, m-cresol formaldehyde resin, etc. Additionally, U.S. Patent No. 4
As described in No. 123, 279, condensation of phenol or cresol substituted with an alkyl group having 3 to 8 carbon atoms, such as t-butylphenol formaldehyde resin, and formaldehyde together with the above-mentioned phenol resin. It is even more preferable to use it in combination with The alkali-soluble resin is present in the photosensitive layer in an amount of about 50 to about 85% by weight;
More preferably, it is contained in an amount of 60 to 80% by weight.
次に上記0−キノンジアジドと吸収スペクトルが実質的
に重ならない遊離基発生剤としては、例えば下記一般式
(I)で示されるハロアルキル−s −) +J了ジン
化合物及び下記一般式(1’[)で示されるハロアルキ
ルオキサジ了ゾール化合物が適している。Examples of free radical generators whose absorption spectra do not substantially overlap with those of the above-mentioned 0-quinonediazide include haloalkyl-s-) +Jryojin compounds represented by the following general formula (I) and the following general formula (1'[) A haloalkyl oxadiolizole compound represented by is suitable.
(Xはハロゲン原子を表わす。Yは−CX3、NL 、
NHR’ 、NR’ 2 、OR’ を表わす。(X represents a halogen atom. Y is -CX3, NL,
Represents NHR', NR' 2 and OR'.
ここにR′ はアルキル基、アリール基を表わす。R' here represents an alkyl group or an aryl group.
また、Rはアルキル基、置換アルキル基、アリール基、
置換アリール基、置換アルケニル基を表わす。)
N □ N
R′
(ここでWは置換されていてもよいアリール基又は複素
環式環を示し、R′は水素原子、アルキル基又はアリー
ル基、Xは弗素原子、塩素原子又は臭素原子、nは1〜
3の整数を表わし、pはO又は1を示す。)
Wは置換基を有していてもよいアリール基(例えばフェ
ニル基、ナフチル基)又は複素環式環(例えばインドー
ル環など)であるが、その置換基として代表的なものは
、ニトロ、シアノ、ノ\ロゲン原子、フェニル、低級ア
ルキル(炭素数1から6)、低級アルコキシ(炭素数1
〜6)、フェノキシ、アセトキシ基である。Further, R is an alkyl group, a substituted alkyl group, an aryl group,
Represents a substituted aryl group or substituted alkenyl group. ) N □ N R' (where W represents an optionally substituted aryl group or heterocyclic ring, R' is a hydrogen atom, an alkyl group or an aryl group, X is a fluorine atom, a chlorine atom or a bromine atom, n is 1~
It represents an integer of 3, and p represents O or 1. ) W is an aryl group (e.g., phenyl group, naphthyl group) or a heterocyclic ring (e.g., indole ring, etc.) which may have a substituent, and typical examples of the substituent include nitro, cyano, etc. , nor\rogen atom, phenyl, lower alkyl (1 to 6 carbon atoms), lower alkoxy (1 to 6 carbon atoms)
~6), phenoxy, and acetoxy groups.
R′は水素原子、炭素数1〜6のアルキル基、又はアリ
ール基であるが、その代表例としてはメチル基、プロピ
ル基及びフェニル基を挙げることができる。R' is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or an aryl group, and representative examples thereof include a methyl group, a propyl group, and a phenyl group.
上記一般式(1)で示される遊離基発生剤の具体例とし
ては、苦杯ら著ブレティン・オブ・ケミカル・ソサエテ
ィ・オブ・ジャパン(口ull、Chem。Specific examples of the free radical generator represented by the above general formula (1) include those described in Bulletin of Chemical Society of Japan, written by Kuhai et al., Chem.
Soc、Japan)第42巻、2924頁(1969
)記載の化合物たとえば2−フェニル−4,6ビス(ト
リクロルメチル)−s−)リアジン、2−(p−クロル
フェニル)−4,6−ビス(トリクロルメチル)−s−
)リアジン、2−(p−)リル)=4.6−ビス(トリ
クロルメチル)−s−)リアジン、2−(p−メトキシ
フェニル)−4,6−ビス(トリクロルメチル)−S−
)リアジン、2−(2’、4’−ジクロルフェニル)−
4,6−ビス(トリクロルメチル)−S−トリアジン、
2゜4.6−)リス(トリクロルメチル)−s−)リア
ジン、2−メチル−4,6−ビス(トリクロルメチル)
−s−)リアジン、2−n−ノニル−4゜6−ビス(ト
リクロルメチル)−S−)リアジン、2−(α、α、β
−トリクロルエチル)−4,6−ビス(トリクロルメチ
ル)−S−トリアジン等が挙げられる。また、英国特許
第1.388.492号明細書記載の化合物、たとえば
、2−スチリル−4゜6−ビス(トリクロルメチル)−
S−)リアジン、2−(p−メチルスチリル)−4,6
−ビス(トリクロルメチル)−s−)リアジン、2−(
p−メトキシスチリル14.6−ビス(トリクロルメチ
ル)−s−)り了ジン、2−(p−メトキシスチリル)
−4−アミノ−6−トリクロルメチル−S−トリアジン
等を挙げることができる。また、F、 c、シェー フ
y −(Schaefer)等によるジャーナル・オブ
・オーガニック・ケミストリー(J、Org。Soc, Japan) Vol. 42, p. 2924 (1969
2-phenyl-4,6-bis(trichloromethyl)-s-)riazine, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)-s-
) riazine, 2-(p-)lyl)=4,6-bis(trichloromethyl)-s-) riazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-S-
) riazine, 2-(2',4'-dichlorophenyl)-
4,6-bis(trichloromethyl)-S-triazine,
2゜4.6-)lis(trichloromethyl)-s-)riazine, 2-methyl-4,6-bis(trichloromethyl)
-s-) riazine, 2-n-nonyl-4゜6-bis(trichloromethyl)-S-) riazine, 2-(α, α, β
-trichloroethyl)-4,6-bis(trichloromethyl)-S-triazine and the like. Also, compounds described in British Patent No. 1.388.492, such as 2-styryl-4°6-bis(trichloromethyl)-
S-)Ryazine, 2-(p-methylstyryl)-4,6
-bis(trichloromethyl)-s-) riazine, 2-(
p-methoxystyryl 14.6-bis(trichloromethyl)-s-)riryojin, 2-(p-methoxystyryl)
-4-amino-6-trichloromethyl-S-triazine and the like can be mentioned. Additionally, the Journal of Organic Chemistry (J, Org.) by Schaefer et al.
Chem、) ;第29巻、1527頁(1964)記
載の化合物、たとえば2−メチル−4,6−ビス(トリ
ブロムメチル)−s−)リアジン、2.4.6−トリス
(トリブロムメチル)−S−)リアジン、2.4.6−
)リス(ジブロムメチル)−s−)リアジン、2−アミ
ノ−4−メチル−6−トリブロムメチル−S−トリアジ
ン、2−メトキシ−4−メチル−6−トリクロルメチル
ーS−)リアジン等を挙げることができる。Chem, ); Vol. 29, p. 1527 (1964), such as 2-methyl-4,6-bis(tribromomethyl)-s-)riazine, 2,4,6-tris(tribromomethyl) -S-) riazine, 2.4.6-
) lis(dibromomethyl)-s-) liazine, 2-amino-4-methyl-6-tribromomethyl-S-triazine, 2-methoxy-4-methyl-6-trichloromethyl-S-) riazine, etc. I can do it.
一般式(I)のうちYが−Cx3である化合物を用いた
場合が特に好ましい。It is particularly preferable to use a compound of general formula (I) in which Y is -Cx3.
他方、一般式(II)で示される遊離基生成剤の具体例
としては、次のようなものが含まれる。On the other hand, specific examples of the free radical generating agent represented by general formula (II) include the following.
CH3
l13
CH3
これらは、ポジ型感光性組成物の0.1〜5重量%の範
囲で含有させるのが適しており、更に好ましくは0.3
〜3重量%の範囲である。CH3 l13 CH3 It is suitable to contain these in the range of 0.1 to 5% by weight of the positive photosensitive composition, more preferably 0.3% by weight.
-3% by weight.
次に、発色型焼出し染料としては例えば以下の物が使用
可能であるが、これに限るものではない。Next, as the color-forming printout dye, for example, the following can be used, but the invention is not limited thereto.
コンゴーレッド、ベンゾバーブノン4B、メチルエロー
、ベンゼンアゾジフェニルアミン、オレンジ■、メチル
オレンジ、メチルレッド、エチルレッド
C)1. CH,0H等のアゾ染料
、クレゾールレッド、ブロモクレゾールパープル、ペン
タメトキシレッド等のp■指示薬、クリスタルバイオレ
ットラクトン、マラカイトグリーンラクトン等のフタリ
ド系発色剤、等のスピロピラン系発色剤。Congo Red, Benzobarbunone 4B, Methyl Yellow, Benzeneazodiphenylamine, Orange ■, Methyl Orange, Methyl Red, Ethyl Red C) 1. Azo dyes such as CH, 0H, p* indicators such as cresol red, bromocresol purple, and pentamethoxy red, phthalide color formers such as crystal violet lactone, malachite green lactone, and spiropyran color formers.
これらの発色型焼出し染料は多くの場合黄色から赤へ又
は赤から青へ変色するからこれとは別に青色染料を加え
て感光層に青味をつけ全体に落ちついた色調としてもよ
い。それには例えば以下の様な青色染料が使用できる。Since these color-forming print-out dyes often change color from yellow to red or from red to blue, a blue dye may be added separately to give the photosensitive layer a bluish tinge to give a subdued color tone to the entire photosensitive layer. For example, the following blue dyes can be used.
スミプラスト ブルー(Sumiplast Blue
) OR。Sumiplast Blue
) OR.
スミプラスト グリーン(Sumiplast Gre
en) G 。Sumiplast Green
en)G.
(以上、住人化学工業製)、アイゼン スピロンブルー
(Aizen 5piron Blue) GNII
(保土谷化学工業製)、オリエント オイル グリーン
(nrientOil Green) BG (オリ
エント化学前)。(Aizen 5piron Blue) GNII
(manufactured by Hodogaya Chemical Industry), Orient Oil Green BG (before Orient Chemical).
これらの染料によりポジ型感光性印刷版の色濃度が決る
が、大事なことは、露光前の感光性印刷版はトンボが十
分見易い薄い濃度(D=0.85以下)でなければなら
ず、しかも露光された部分の濃度は消去や検版し易い十
分濃い濃度(D=0.95以上)であることが必要だと
いうことである。These dyes determine the color density of the positive-working photosensitive printing plate, but the important thing is that the photosensitive printing plate before exposure must have a low density (D = 0.85 or less) that makes it easy to see the register marks. Furthermore, the density of the exposed area must be sufficiently high (D=0.95 or higher) to be easily erased and inspected.
以上述べたごとく本発明に使用するポジ型感光性組成物
は、主に0−キノンジアジド、アルカリ可溶性樹脂遊離
基発生剤、発色型焼出し染料(及び必要により青色染料
)から構成されるが、更に必要に応じて他の染料や顔料
、可塑剤などを含有させることができる。As described above, the positive photosensitive composition used in the present invention mainly consists of 0-quinonediazide, an alkali-soluble resin free radical generator, and a color-forming print-out dye (and a blue dye if necessary). Other dyes, pigments, plasticizers, etc. can be contained as necessary.
この様なポジ型感光性組成物を親水性表面を有する支持
体に塗布した物がポジ型感光性平版印刷版(以下、ポジ
型PS版と称す。)である。A positive-working photosensitive lithographic printing plate (hereinafter referred to as a positive-working PS plate) is obtained by coating such a positive-working photosensitive composition on a support having a hydrophilic surface.
支持体には従来より平版印刷版の支持体として使用可能
な種々のものが含まれるが、特に好ましいものはアルミ
ニウム板である。好適なアルミニウム板には、純アルミ
ニウム板およびアルミニウム合金板が含まれ、更にアル
ミニウムがラミネートもしくは蒸着されたプラスチック
フィルムも含まれる。アルミニウム板の表面は砂目立て
処理、珪酸ソーダ、弗化ジルコニウム酸カリウム、燐酸
塩等の水溶液への浸漬処理、あるいは陽極酸化処理など
の表面処理がなされていることが好ましい。The support includes various types conventionally usable as supports for lithographic printing plates, but aluminum plates are particularly preferred. Suitable aluminum plates include pure aluminum plates and aluminum alloy plates, as well as plastic films laminated or vapor-deposited with aluminum. The surface of the aluminum plate is preferably subjected to a surface treatment such as graining treatment, immersion treatment in an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate, or the like, or anodization treatment.
また、砂目立てしたのちに、米国特許第2.714.0
66号明細書に記載されている如く珪酸す) IJウム
水溶液に浸漬処理されたアルミニウム板、特公昭47−
5125号公報に記載されているようにアルミニウム板
を陽極酸化処理したのちに、アルカリ金属珪酸塩の水溶
液に浸漬処理したもの、特公昭46−35685号公報
に記載されているようなアルミニウム板を陽極酸化した
のち、ポリビニルホスホン酸の水溶液に浸漬処理したも
のも好適に使用される。上記陽極酸化処理は、例えば、
燐酸、クロム酸、硫酸、硼酸等の無機酸、若しくは、蓚
酸、スルファミン酸等の有機酸またはこれらの塩の水溶
液又は非水溶液の単独又は二種以上を組み合わせた電解
液中でアルミニウム板に電流を流すことにより実施され
る。Also, after graining, U.S. Patent No. 2.714.0
Aluminum plate immersed in IJum aqueous solution as described in Specification No. 66, Japanese Patent Publication No. 1973-
As described in Japanese Patent Publication No. 5125, an aluminum plate is anodized and then immersed in an aqueous solution of an alkali metal silicate. Those obtained by oxidizing and then immersing in an aqueous solution of polyvinylphosphonic acid are also suitably used. The above anodizing treatment is, for example,
An electric current is applied to the aluminum plate in an electrolytic solution consisting of an aqueous solution or a non-aqueous solution of inorganic acids such as phosphoric acid, chromic acid, sulfuric acid, boric acid, etc., or organic acids such as oxalic acid, sulfamic acid, or their salts, or a combination of two or more of them. It is carried out by flowing.
また、米国特許第3.658.662号明細書に記載さ
れているようなシリケート電着も有効である。Also effective is silicate electrodeposition as described in US Pat. No. 3,658,662.
更には米国特許第4.087.341号明細書、特公昭
46−27481号公報、特開昭52−30503号公
報に開示されているような電解グレインを施した支持体
を上記のように陽極酸化処理したものも有用である。更
に、米国特許第3.834.998号明細書に記されて
いるような砂目立てしたのちに化学的にエツチングし、
しかるのちに陽極酸化処理したアルミニウム板も好まし
い。Furthermore, a support coated with electrolytic grains as disclosed in U.S. Pat. Oxidized products are also useful. Further, chemical etching after graining as described in U.S. Pat. No. 3,834,998,
An aluminum plate which is subsequently anodized is also preferred.
この様なポジ型23版は、従来と同様に透明原画を通し
てカーボンアーク灯、水銀灯、メタルハライドランプ、
キセノンランプなどの活性光線の豊富な光源により露光
されるが、本発明に使用されるポジ型23版は、トンボ
が見易く露光作業が楽なのが特徴である。露光されたポ
ジ型23版は現像液で現像すると、感光層の露光された
領域が除去されてその下の支持体の親水性表面が露出し
、平版印刷版が得られる。好ましい現像液としては珪酸
ナトリウム、珪酸カリウム、水酸化ナトリウム、水酸化
カリウム、水酸化リチウム、第三燐酸ナトリウム、第二
燐酸ナトリウム、第三燐酸カリウム、第二燐酸カリウム
、第三燐酸アンモニウム、第二燐酸アンモニウム、メタ
珪酸ナトリウム、重炭酸ナトリウム、アンモニア水など
のような無機アルカリ剤、例えばモノエタノールアミン
、ジェタノールアミンなどのような有機アルカリ剤のよ
うなアルカリを少なくとも1種含むアルカリ水溶液が使
用され、特に好ましいアルカリ水溶液の組成は米国特許
第4.259.434号明細書に詳しく記されている。This type of positive type 23 plate can be used to print carbon arc lamps, mercury lamps, metal halide lamps,
Exposure is performed using a light source rich in actinic rays such as a xenon lamp, and the positive type 23 plate used in the present invention is characterized by easy visibility of register marks and ease of exposure work. When the exposed positive-working 23 plate is developed with a developer, the exposed areas of the photosensitive layer are removed and the hydrophilic surface of the support underneath is exposed, yielding a lithographic printing plate. Preferred developing solutions include sodium silicate, potassium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic potassium phosphate, dibasic potassium phosphate, dibasic ammonium phosphate, dibasic An alkaline aqueous solution containing at least one alkali such as an inorganic alkaline agent such as ammonium phosphate, sodium metasilicate, sodium bicarbonate, aqueous ammonia, etc., or an organic alkaline agent such as monoethanolamine, jetanolamine, etc. is used. The composition of a particularly preferred alkaline aqueous solution is described in detail in US Pat. No. 4,259,434.
現像方法は、現像、ガム部両方をもつ自動現像機および
水洗部をもつ通常の自動現像機又は皿現像、手現像など
種々の手段で行なうことができる。The developing method can be carried out by various means such as an automatic developing machine having both a developing and gum section, a conventional automatic developing machine having a water washing section, dish development, and manual development.
次に現像液の再曝光について照明する。本発明において
は、現像後面像を見易くするため後露光するのであるが
、その際、感光層の0−キノンジアジドを実質的に感光
させない波長の光を放射する再曙光装置を使うことが特
徴である。0−キノンジアジドを感光させる光を出さな
いようにする為には二つの方法がある。一つは0−キノ
ンジアジドの吸収波長域と重ならないような分光エネル
ギー分布を有する光を放射する光源を使用することであ
る。もう一つは、光源ランプとしては、通常のランプ(
メタルハライドなど)を使用するが、0−キノンジアジ
ドの吸収波長域の光をカットし、遊離基生成剤の感光す
る波長域の光を通すようなフィルターを通して曝光する
ことである。Next, the developer is illuminated for re-exposure. In the present invention, post-exposure is performed to make the image after development easier to see, and the feature is that a re-exposure device is used that emits light of a wavelength that does not substantially expose the 0-quinonediazide in the photosensitive layer. . There are two methods for preventing the emission of light that sensitizes 0-quinonediazide. One method is to use a light source that emits light having a spectral energy distribution that does not overlap with the absorption wavelength range of 0-quinonediazide. The other is a normal lamp (
Metal halide, etc.) is used, but the light is exposed through a filter that cuts light in the absorption wavelength range of 0-quinonediazide and passes light in the wavelength range to which the free radical generating agent is sensitive.
前者の目的には螢光ケミカルランプFL40BL、FL
40SBLBや健康線用ランプPL203E(以上東芝
製)の様な可視光線が少なく紫外線リッチな螢光ランプ
およびH400(岩崎電機製)の様な高圧水銀ランプな
どが適している。For the former purpose, fluorescent chemical lamps FL40BL, FL
Fluorescent lamps that emit little visible light and are rich in ultraviolet rays, such as 40SBLB and health line lamp PL203E (manufactured by Toshiba), and high-pressure mercury lamps, such as H400 (manufactured by Iwasaki Electric), are suitable.
後者の目的には、次の様な黄色フィルターを備えた露光
装置を使用すればよい。For the latter purpose, an exposure device equipped with a yellow filter as described below may be used.
ダイアレジン イエロー(口1aresin Yell
ow)HG (三菱化成製)、ソルベント イエロー(
Solvent Yellow 56 ) (C0
1,11021)、スピロン イxo −(Spilo
n Yellow) GR■(保土谷化学製)等の様な
黄色染料を透明ベース上に塗布したもの、0−キノンジ
アジドの吸収波長の光をカットする色ガラスフィルター
及び干渉フィルター。Diaresin Yellow
ow) HG (manufactured by Mitsubishi Kasei), Solvent Yellow (
Solvent Yellow 56) (C0
1,11021), Spilo
n Yellow) GR (manufactured by Hodogaya Chemical Co., Ltd.) coated with a yellow dye on a transparent base, colored glass filters and interference filters that cut light at the absorption wavelength of 0-quinonediazide.
この様な再曙光装置を使うことにより0−キノンジアジ
ドが感光することなく、画像部が発色してD=0.95
以上となり、消去、検版作業を容易に行なうことができ
るようになる。By using such a re-dawning device, 0-quinonediazide is not exposed to light and the image area develops color, resulting in D=0.95.
As described above, erasing and plate inspection work can be easily performed.
以下、本発明を実施例により更に詳細に説明する。 Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例1
厚さ0.24 mmのアルミニウム板をナイロン・ブラ
シと400メツシユのパミスー水懸濁液を用いその表面
を砂目立てした後、よく水で洗浄した。Example 1 The surface of an aluminum plate having a thickness of 0.24 mm was grained using a nylon brush and a 400 mesh pumice water suspension, and then thoroughly washed with water.
10%水酸化す) IJウム水溶液に50℃で20秒間
浸漬してエツチングした後流水(20℃)で1分間水洗
した。After etching was performed by immersing it in an IJium aqueous solution (10% hydroxide) at 50°C for 20 seconds, it was washed with running water (20°C) for 1 minute.
次に1.5%の硝酸水溶液を用い20℃において電圧1
0Vの正弦波の交流を用い、電気量900クーロン/d
m″において20秒間電気化学的グレイニングを行った
後、70℃の20%燐酸中に30秒間浸漬してデスマッ
ト処理を行った。十分に水洗後、15%硫酸水溶液(2
5℃)中で電圧22Vの直流によって3.09/m’の
陽極酸化皮膜を設けた。Next, using a 1.5% nitric acid aqueous solution, the voltage was 1 at 20°C.
Using 0V sine wave alternating current, the amount of electricity is 900 coulombs/d.
After electrochemical graining for 20 seconds at 70°C, the desmut treatment was performed by immersion in 20% phosphoric acid at 70°C for 30 seconds. After thorough washing with water, 15% sulfuric acid aqueous solution (2
An anodic oxide film of 3.09/m' was formed by direct current at a voltage of 22 V at a temperature of 3.09/m'.
この支持体の上に、次の感光液を塗布・乾燥して、乾燥
後の重量で2.59/m’の感光層を設け、ポジ型23
版を得た。On this support, the following photosensitive liquid was applied and dried to form a photosensitive layer having a weight of 2.59/m' after drying, and a positive type 23
Got the edition.
感光液:
クレゾール・ノボララック樹脂 1.98gp−
t−ブチルフェノール樹脂 0.05gベンゼン
アソアンェニルアミン 0.10g’スピロンブ
ルーGN8 0.05gエチレンジクロ
ライド 18 g2−メトキシエチル
アセテート 12 g以上の様にして得られた
ポジ型23版は反射濃度が0.70であり、その上に書
いたトンボが見易かった。Photosensitive liquid: Cresol novolak resin 1.98 gp-
t-Butylphenol resin 0.05 g Benzeneathoanhenylamine 0.10 g'Spirone Blue GN8 0.05 g Ethylene dichloride 18 g 2-methoxyethyl acetate 12 g The positive type 23 plate obtained in the above manner has a reflection density of 0. 70, and the dragonfly written on it was easy to see.
黄色フィルターの製作:
黄色染料ソルベント イエロー(SolventYel
low) 56 (1g )をメチレンクロライド1
00gに溶解させ透明ベース上にホワイラー塗布、乾燥
した。得られたフィルターのイエロー濃度は1.2であ
った。Production of yellow filter: Yellow dye Solvent Yellow (SolventYel)
low) 56 (1g) to methylene chloride 1
00g and coated with whiter on a transparent base and dried. The yellow density of the obtained filter was 1.2.
先のポジ型23版を透明原図を通してメタルハライドラ
ンプ2KW(アイグラフィックス製)にて1分間光照射
した後、S+Os/NaJのモル比が1.2で5I20
含量が1.5%の珪酸ナトリウム水溶液で現像した。After irradiating the above positive type 23 plate with light for 1 minute using a metal halide lamp 2KW (manufactured by Eye Graphics) through the transparent original, the molar ratio of S+Os/NaJ was 1.2 and it was 5I20.
It was developed with an aqueous sodium silicate solution having a content of 1.5%.
この様にして得られた印刷版を次のピ)、(ロ)の様の
様にして光照射した。The printing plate thus obtained was irradiated with light in the following manner.
(ハ)黄色フィルターを通してメタルハライドランプ(
2KW)で照射
(ロ)黄色フィルターを通さずメタルハライドランプ(
2KW)で照射
何)、(ロ)共、発色の為画像部濃度が1.05となっ
た物が得られどちらも満足すべき検版性を有していた。(c) Metal halide lamp (through a yellow filter)
Irradiation (2KW) with a metal halide lamp (2KW) without passing through a yellow filter.
Both of (2) and (2) were irradiated at 2 KW) and had a density of 1.05 in the image area due to color development, and both had satisfactory plate inspection properties.
0)@の両者を比較すると(イ)のフィルターを通して
曝光したものはプレートクリーナー:ウルトラ(^1口
、 C,Chemical Co、 製)に対して未
曝光と同じ強さを示したのに対し初のフィルターなしで
曝光したものはプレートクリーナー(ウルトラ)によっ
て画像部がすぐに侵されてしまった。この印刷版の耐刷
性はバーニングしないとき10万枚であったが、260
℃7分間バーニングするとげ)は30万枚にのびるのに
対し、側は15万枚までしかのびなかった。Comparing both 0) @, the one exposed through the filter in (a) showed the same strength against Plate Cleaner: Ultra (^1 mouth, manufactured by C, Chemical Co.) as the unexposed one, whereas the one exposed to light through the filter in (a) showed the same strength as the unexposed one. When exposed without a filter, the image area was immediately attacked by the plate cleaner (Ultra). The printing durability of this printing plate was 100,000 sheets without burning, but it was 260 sheets.
The thorns (burned for 7 minutes at ℃) grew to 300,000 sheets, while the sides only grew to 150,000 sheets.
実施例2
実施例1と同様にして現像法のポジ型98版をつくった
。この版を螢光ケミカルランプFL40SBLBで3c
n+の距離から2分間曝光した。比較例として実施例1
と同じメタルハライドランプ(2KW)で1分曝光した
ものをつくった。どちらも画像濃度が1.05にまで上
るが前者はプレートクリーナー(ウルトラ)で侵されな
いのに対し、比較例は画像部にプレートクリーナー(ウ
ルトラ)をつけ10分間放置すると画像部が溶けてしま
った。Example 2 A positive type 98 plate using the developing method was prepared in the same manner as in Example 1. This plate was exposed to 3C using a fluorescent chemical lamp FL40SBLB.
It was exposed to light for 2 minutes from a distance of n+. Example 1 as a comparative example
I made one by exposing it to the same metal halide lamp (2KW) for 1 minute. In both cases, the image density rises to 1.05, but the former is not affected by plate cleaner (Ultra), whereas in the comparative example, when plate cleaner (Ultra) is applied to the image area and left for 10 minutes, the image area melts. .
実施例3
実施例1と同様にして作った支持体の上に次の感光液を
塗布・乾燥して乾燥後の重量で2.59 /m”の感光
層を設はポジ型PS版を得た。Example 3 The following photosensitive solution was coated on a support prepared in the same manner as in Example 1 and dried to form a photosensitive layer having a dry weight of 2.59/m'' to obtain a positive PS plate. Ta.
感光液:
クレゾール・ノボララック樹脂 1.988p−
t−ブチルフェノール樹脂 0.058メチルエ
チルケトン 5g以上の様にして得
られたポジ型PS版は反射濃度が0.50であり、その
上に書いたトンボが非常に見易かった。更に実施例1と
同様に露光・現像を行ない、実施例1の(イ)の方法で
曝光した。画像濃度は1.0となり検版しやすくなった
。この物にプレートクリーナー(ウルトラ)をつけ10
分間放置したが画像部は全く侵されなかった。Photosensitive liquid: Cresol novolak resin 1.988p-
The positive PS plate obtained using t-butylphenol resin 0.058 methyl ethyl ketone 5 g or more had a reflection density of 0.50, and the register marks written on it were very easy to see. Further, exposure and development were carried out in the same manner as in Example 1, and exposure was carried out using the method (a) of Example 1. The image density was 1.0, making it easier to inspect the plate. Add plate cleaner (Ultra) to this item for 10 minutes.
Although it was left for a minute, the image area was not affected at all.
本発明によれば、位置合せが簡単で露光作業が容易にな
り、現像後の曝光処理により画像部が濃色になるので検
版作業が容易である。また、さらにバーニング処理する
ことにより十分に耐刷性が向上した印刷版が得られる。According to the present invention, alignment is easy and exposure work is easy, and the image area becomes dark in color by the light exposure process after development, so plate inspection work is easy. Moreover, by further performing a burning treatment, a printing plate with sufficiently improved printing durability can be obtained.
Claims (3)
主吸収波長より低波長側に主吸収波長を有する遊離基生
成剤と、該遊離基生成剤が光分解した際に生成する遊離
酸と反応して変色する染料とを含有するポジ型感光性印
刷版を、画像露光し、現像したのち、主として遊離基生
成剤が感光し、o−キノンジアジドが実質的に感光しな
いような光を用いて全面露光することを特徴とするポジ
型感光性印刷版の製版方法。(1) O-quinonediazide reacts with a free radical generating agent having a main absorption wavelength on the lower wavelength side than the main absorption wavelength of the o-quinonediazide, and a free acid generated when the free radical generating agent is photodecomposed. After imagewise exposure and development of a positive-working photosensitive printing plate containing a dye that changes color when the plate is exposed, the entire surface is exposed using light that primarily sensitizes the free radical generator and substantially does not sensitize the o-quinonediazide. A method for making a positive photosensitive printing plate, characterized by:
有する光で全面露光することを特徴とする特許請求の範
囲第(1)項記載の方法。(2) The method according to claim (1), characterized in that the entire surface is exposed to light having a spectral energy of 70% or more at 370 nm or less.
光を通過させるフィルターを通して全面露光することを
特徴とする特許請求の範囲第(1)項記載の方法。(3) The method according to claim (1), wherein the entire surface is exposed through a filter that blocks light of 360 to 420 nm and passes light of shorter wavelength.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4704486A JPS62204261A (en) | 1986-03-04 | 1986-03-04 | Photomechanical process for positive type photosensitive printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4704486A JPS62204261A (en) | 1986-03-04 | 1986-03-04 | Photomechanical process for positive type photosensitive printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62204261A true JPS62204261A (en) | 1987-09-08 |
Family
ID=12764168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4704486A Pending JPS62204261A (en) | 1986-03-04 | 1986-03-04 | Photomechanical process for positive type photosensitive printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62204261A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004163732A (en) * | 2002-11-14 | 2004-06-10 | Fuji Photo Film Co Ltd | Lithographic printing original plate |
JP2016533541A (en) * | 2013-10-15 | 2016-10-27 | アグフア・グラフイクス・ナームローゼ・フエンノートシヤツプ | How to provide a lithographic printing plate |
-
1986
- 1986-03-04 JP JP4704486A patent/JPS62204261A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004163732A (en) * | 2002-11-14 | 2004-06-10 | Fuji Photo Film Co Ltd | Lithographic printing original plate |
JP2016533541A (en) * | 2013-10-15 | 2016-10-27 | アグフア・グラフイクス・ナームローゼ・フエンノートシヤツプ | How to provide a lithographic printing plate |
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