JPS6220129B2 - - Google Patents

Info

Publication number
JPS6220129B2
JPS6220129B2 JP58203761A JP20376183A JPS6220129B2 JP S6220129 B2 JPS6220129 B2 JP S6220129B2 JP 58203761 A JP58203761 A JP 58203761A JP 20376183 A JP20376183 A JP 20376183A JP S6220129 B2 JPS6220129 B2 JP S6220129B2
Authority
JP
Japan
Prior art keywords
fumed silica
filter
sintered metal
silica particles
combustion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58203761A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59102811A (ja
Inventor
Maikuru Kyanpu Deibitsudo
Hooru Sano Jon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS59102811A publication Critical patent/JPS59102811A/ja
Publication of JPS6220129B2 publication Critical patent/JPS6220129B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Filtering Materials (AREA)
JP20376183A 1982-11-01 1983-11-01 焼結金属フイルタ−による処理法 Granted JPS59102811A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43832182A 1982-11-01 1982-11-01
US438321 1995-05-10

Publications (2)

Publication Number Publication Date
JPS59102811A JPS59102811A (ja) 1984-06-14
JPS6220129B2 true JPS6220129B2 (en, 2012) 1987-05-06

Family

ID=23740192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20376183A Granted JPS59102811A (ja) 1982-11-01 1983-11-01 焼結金属フイルタ−による処理法

Country Status (2)

Country Link
JP (1) JPS59102811A (en, 2012)
DE (1) DE3338888A1 (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2616884B1 (fr) * 1987-06-19 1991-05-10 Air Liquide Procede de traitement d'effluents gazeux provenant de la fabrication de composants electroniques et appareil d'incineration pour sa mise en oeuvre
DE4322804A1 (de) * 1993-07-08 1995-01-12 Wacker Chemie Gmbh Verfahren zur Herstellung von hochdisperser Kieselsäure und Vorrichtung zur Durchführung des Verfahrens
JP3501631B2 (ja) * 1997-08-25 2004-03-02 電気化学工業株式会社 無機質球状粒子の製造方法及び装置
RU2468993C1 (ru) * 2011-03-30 2012-12-10 Открытое Акционерное Общество "Российский научно-исследовательский и проектный институт титана и магния" (ОАО "РИТМ") Способ переработки отходящих газов, образующихся в процессе получения пирогенного диоксида кремния высокотемпературным гидролизом хлоридов кремния
EP3778503A1 (en) * 2019-08-13 2021-02-17 Sterlite Technologies Limited Method for fabrication of glass preform
CN112194357A (zh) * 2019-08-13 2021-01-08 斯特里特技术有限公司 光纤烟灰预制棒的制造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE900339C (de) * 1951-07-05 1953-12-21 Degussa Verfahren und Vorrichtung zur Herstellung von kolloidaler Kieselsaeure in Aerogelform
JPS5472213A (en) * 1977-11-18 1979-06-09 Fujitsu Ltd Method of making raw glass for optical transmission fiber

Also Published As

Publication number Publication date
JPS59102811A (ja) 1984-06-14
DE3338888C2 (en, 2012) 1987-11-26
DE3338888A1 (de) 1984-05-03

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