JPS62197159A - Particle shape adjusting machine - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention is aimed at converting crushed products (materials to be ground) that have been primary or secondary crushed using a cone crusher, show crusher, etc. into a rounded product similar to that of natural aggregate. This relates to a machine that adjusts the grain shape.

[Prior Art] Artificial aggregates for civil engineering and construction are generally made by crushing rocks using compression type crushers such as cone crushers and show crushers. It has a pointed part.

When the above-mentioned crushed product is used as aggregate for concrete, for example, due to the influence of its particle shape, a large amount of cement etc. is required to make concrete with the same strength as concrete using natural aggregate. Because there is a problem,
It is desired to adjust the particle shape to a roundness similar to that of natural aggregate.

Conventionally, there has been no standalone machine for adjusting the particle shape of secondary or secondary crushed products; for example, as disclosed in Japanese Patent Publication No. 53-33785, there is a machine that adjusts the particle shape in conjunction with crushing. The device is known. This crushing device consists of a rotor that applies centrifugal force to the material to be crushed that is supplied from above and releases it horizontally, and an annular crushing chamber with a U-shaped cross section that is provided concentrically around the outer circumference of the rotor. The material to be crushed is impact-shattered by colliding with the slope of the hardened material deposited on the bottom plate of the annular crushing chamber at a predetermined angle of repose, and at the same time, the materials to be crushed are rubbed against each other. Therefore, grain shape adjustment is performed slightly incidentally.

[Problems to be Solved by the Invention] However, according to the conventional crushing device described above, the main purpose is crushing, and most of the energy applied to the material to be crushed is i.
Since it is spent on the blasting frame all at once, when the purpose is to adjust the particle size, there is a problem of over-pulverization (more powder is generated) and a low degree of particle shape improvement (generally the actual area ratio for particle size determination). be.

SUMMARY OF THE INVENTION Therefore, the present invention aims to provide a particle shape adjusting machine that can adjust the particle shape of a material to be ground into a rounded particle shape similar to that of natural aggregate without over-pulverizing the material.

[Means for Solving the Problems] In order to solve the above-mentioned problems, the grain shape adjusting machine of the present invention has a rotor that applies centrifugal force to the material to be ground that is supplied from above and releases it horizontally in the radial direction. , annular polishing chambers provided concentrically around the outer periphery of the rotor in order to cause the material to be ground discharged from the rotor to flow in an arc shape from below to above.
It consists of more than one stage.

[Operation] The material to be ground supplied from above is given horizontal kinetic energy by the rotor and released, flows in an arc from the bottom to the top in the annular grinding chamber, and after reaching the top, The process of falling naturally due to a decrease in kinetic energy is repeated two or more times, except for those that flow again together with the subsequent materials to be ground that are discharged from the rotor. In the flow process of the above-mentioned stages, the material to be ground is gradually adjusted to a rounded grain shape by grinding the weakly strong acute ridges due to collision grinding with each other, and the annular grinding at the bottom stage A granular product very similar to natural aggregate is discharged from the chamber.

[Example] An example of the particle shape adjuster of the present invention will be described with reference to FIGS. 1 and 2.

In the figure, reference numeral 1 denotes an upper housing in the form of a hollow circular plate. The upper housing 1 is connected to the upper end of a cylindrical lower housing 2 placed on a stand (not shown). At the center of the upper part of the upper housing 1, A supply hopper 3 is inserted for supplying material to be ground (not shown). The inside of the upper housing 1 is divided into two upper and lower stages by a circular plate-shaped partition wall 4, and the upper and lower stages are provided with a first annular polishing chamber 5 and a second annular polishing chamber 6 each having a C-shaped cross section. There is. The first annular polishing chamber 5 is for forcing the material to be ground discharged from the 10th tank (to be described later) to flow in an arc shape from the bottom to the top, thereby forming a hardened body of the material to be ground due to accumulation, etc. A circular plate-shaped lower repulsion guide plate 7 is attached to the upper surface of the gap M4 with a conical surface having a required inclination angle, and a lower repulsion guide plate 7 is attached to the inner side of the upper housing 1 so as to be connected to the outer periphery of the lower repulsion guide plate 7. A cylindrical side repulsion guide plate 8 is installed vertically along the cylindrical side repulsion guide plate 8, and a concave curved surface is attached to the ceiling of the upper housing 1 so as to face the lower repulsion guide plate 7 so as to be connected to the upper end of the side repulsion guide plate 8. It is formed from an upper repulsion guide plate 9 in the shape of a ring plate. And the lower repulsion guide plate 7
A funnel-shaped hopper 10 is integrally provided on the inner periphery of the grinding chamber 5 to supply the primary grinding material (not shown) that naturally falls from the upper part of the first annular grinding chamber 5 to the 20th tank, as will be described later. Further, the upper repulsion guide plate 9 is composed of segments divided from the center side in the radial direction into an inner peripheral part 9a, a ceiling part 9b, and an outer peripheral part 9c.

In addition, the second annular polishing chamber 6 is for forcedly flowing the primary ground material discharged from the 20th tank (to be described later) in an arc shape from below to upwards, and similarly to the first annular polishing chamber 5, it prevents accumulation, etc. A circular plate-shaped lower repulsion guide plate 11 is attached to the bottom of the upper housing 1 with a conical surface having a predetermined inclination angle that does not form a hardened body of the primary ground material, and the outside of the lower repulsion guide plate 11 is A cylindrical side repulsion guide plate 12 is arranged upright along the inner side of the upper housing 1 so as to be connected to the periphery, and a lower repulsion guide plate 11 is opposed to the side repulsion guide plate 11 so as to be connected to the upper end of the side repulsion guide plate 12. The upper repulsion guide plate 13 is formed from an annular plate-shaped upper repulsion guide plate 13 attached to the lower surface of the partition wall 4. It is made up of divided segments.

On the other hand, a vertical rotation shaft 1 is located at the axial center inside the lower housing 2.
4 is arranged by a bearing 15, a bearing housing 16, and a bracket 17 with its upper end facing the second annular polishing chamber 6. A 20th rotor 19 having a slightly larger diameter than the lower opening 18 of the upper housing 1 is connected to the upper end of the vertical rotation shaft 14 . The 20th rotor 19 applies a centrifugal force to the primary ground material supplied from the hopper 10, as will be described later, and releases it horizontally outward in the radial direction toward the lower repulsion guide plate 11 of the second annular polishing chamber 6. It is structured as follows.

That is, at the upper end of the vertical rotation shaft 14, the rotary table 2
゜ is fitted by its boss portion 20a. As detailed in FIG. 2, the rotary table 20 has discharge ports 21 at two opposing locations on the circumference facing the lower repulsion guide plate 11.
A rotor body 23 is mounted thereon, and the discharge passage 22 is provided with both side surfaces symmetrical with respect to the radius, and the width of the discharge passage 22 in the vicinity of the discharge port 21 is gradually narrowed. . A bottom liner 24 and side liners 25 are attached to the bottom surface of the discharge path 22 and both side surfaces near the discharge port 21 . The bottom liner 24 is prevented from moving horizontally by a shape similar to the bottom shape of the discharge channel 22, and
The side liner 25 has stepped portions 25a provided on the upper and lower sides thereof that engage with stepped portions 24a provided on both sides of the bottom liner 24, and a vertical groove 25b provided on the back surface of the side liner 25. Horizontal movement is prevented by engaging with the strip 23a. An upper lid 27 having a primary ground material inlet 26 in the center is removably attached to the rotor body 23 with a fastener (not shown) such as a bolt. An upper liner 28 corresponding to the bottom liner 24 is attached to the upper lid 27 with both sides thereof engaged with the steps 25a of the side liner 25. movement in the vertical direction is prevented.

A plurality of regulator blades 29 are hinged to the lower periphery of the 20th holder 19 so as to be out of phase with the discharge port 21 . The regulator plate 29 has a second
A part of the secondary grinding material that naturally falls from the upper part of the yJ-shaped grinding chamber 6 is made to flow again, and is constructed as follows. That is, as shown in FIG. 1, a cylindrical cover bracket 30 is vertically installed on the lower surface of the rotary table 20 of the 20th rotary table 20 so as to cover the upper part of the bearing housing 16. On the outer circumference of 28,
A support flange 31 is attached to the rotary table 20 with an appropriate spacing therebetween. The base ends of a plurality of horizontally extending regulator blades 29 are hinged between the rotary table 20 and the support flange 31 by vertical pins 32. The regulator blade 29 is the 20th
The length is such that the locus drawn by the tip when a centrifugal force due to the rotation of the 20th tab 19 is applied is larger than the outer diameter of the 20th tab 19.

In the center of the rotor body 23 in the 20th rotor 19,
A connecting shaft 33 having an appropriately smaller diameter than the inlet 26 of the upper lid 27 is erected with its upper end facing the first annular polishing chamber 5. The upper end of the connecting shaft 33 is connected to the lower opening 18 of the upper housing 1.
A tenth cylinder 34 having a slightly smaller diameter is provided in series. As will be described later, the tenth rotor 34 applies centrifugal force to the material to be ground supplied from the supply hopper 3 and releases it horizontally radially outward toward the lower repulsion guide plate 7 of the first annular polishing chamber 5. It is constructed like the same garment as No. 20-ta 19. That is, the rotary table 3 is attached to the upper end of the connecting shaft 33.
5 is fitted by its boss portion 35a. A rotor main body 38 is mounted on the rotary table 35 and has a diametrical discharge path 37 with two opposing locations on the circumference facing the lower repulsion guide plate 7 of the first annular polishing chamber 5 serving as discharge ports 36. A distributor 39 for distributing the material to be ground is provided in the middle of the discharge path 37. The discharge path 37 has both side surfaces provided symmetrically with respect to the radius, and the discharge port 3
The width around 6 is gradually narrowed. A bottom liner and side liners (both not shown) are attached to the bottom of the discharge path 37 and to both sides near the discharge port 36. The bottom liner is prevented from moving in the horizontal direction by a shape similar to the bottom shape of the discharge passage 37, and the side liners have stepped portions provided above and below the bottom liner and are engaged with the stepped portions provided on both sides of the bottom liner. This prevents horizontal movement. An upper M41 having an inlet 40 for introducing materials to be ground at the center is removably attached to the rotor main body 38 with a fastener (not shown) such as a bolt. An upper liner (not shown) corresponding to the bottom liner is attached to the top cover 41, with both sides of the upper liner engaging with stepped portions of the side liners. movement is prevented.

A plurality of regulator blades 42 are hinged around the lower part of the tenth tank 34, similar to the twentieth tank 19, with the regulator blades 42 out of phase with the discharge port 36.

The regulator blade 42 is used to re-flow a part of the primary ground material that naturally falls from the upper part of the first annular grinding chamber 5, as will be described later, and is configured as follows. That is, a support flange 43 is provided on the outer circumference of the upper end of the connecting shaft 33.
is attached at an appropriate distance from the rotary table 35, and between the support flange 43 and the rotary table 35, the base ends of a plurality of horizontally extending regulator blades 42 are connected by vertical pins 44. It is hinged. Each regulator blade 42 has a tip whose tip traces a locus at the tenth point 34 when centrifugal force due to the rotation of the tenth point 34 acts on it.
The length is larger than the outer diameter of 4.

The lower opening 18 of the upper housing 1, that is, the lower opening of the second annular polishing chamber 6 is provided with the lower housing 2.
A short cylindrical discharge adjustment ring 45 supported by is fitted so as to be vertically movable. The discharge adjustment ring 45 is configured to adjust the discharge resistance of the lower opening of the second annular polishing chamber 6.
It changes the gap between the 0-taper 19 and the regulator blade 29 and the lower opening edge of the 211th polishing chamber 6, and the height when moved to the uppermost position is equal to that of the discharge adjustment ring 45. 2nd T! The upper part of the secondary grinding material deposited on the lower repulsion guide plate 11 of the A-shaped grinding chamber 6 is the 20th-
In other words, the flow of the primary ground material discharged from the 20th tank 19 is not hindered by the accumulation of secondary ground material. It is set in.

A driven pulley 46 is attached to the lower end of the vertical rotating shaft 14, and the driven pulley 46 is connected to a driving pulley attached to the rotating shaft of an electric motor that is arranged outside the lower housing 2 and can rotate in forward and reverse directions, and a belt ( (both are not shown).

In order to adjust the grain shape of the material to be ground using the grain shape adjuster configured as described above, first, the electric motor is operated to
9 is rotated at a tip circumferential speed of about 40 m/s, and the material to be ground is fed from the supply hopper 3. The material to be ground is introduced into the tenth tank 34 through the inlet 40, accelerated through the discharge path 37 by centrifugal force, and then horizontally discharged outward in the radial direction from the discharge port 36.

The material to be ground discharged from the discharge port 36 of the tenth rotor 34 hits the lower repulsion guide plate 7 of the first annular polishing chamber 5 and is repulsed upward, and is also guided upward by the side repulsion guide plate 8 and the upper repulsion guide plate 7. After being repulsively guided by the guide plate 9 and forced to flow in an arc from the bottom to the top in the first annular polishing chamber 5, it falls naturally due to a decrease in kinetic energy. In the above-mentioned flow process, the sharp points of the material to be ground, which are weak in strength, are ground by mutual collision and grinding, and the material is adjusted to a slightly rounded grain shape.

On the other hand, the primary ground material that naturally falls from the upper part of the first annular grinding chamber 5 flows again together with the subsequent ground material discharged from the discharge port 36 of the 10th rotor 34, and is reflowed by the regulator blade 42. Except for those discharged in the direction of the first annular polishing chamber 5, they are introduced into the 20th tank 19 from the inlet 26 via the hopper 10.

The primary ground material introduced into the 20th tank 19 is
As in the case of the rotor 34, it is accelerated through the discharge path 22 by centrifugal force, is discharged horizontally from the discharge port 21 outward in the radial direction, hits the lower repulsion guide plate 11 of the second annular polishing chamber 6, and is repelled upward. At the same time, it is guided in repulsion by the side repulsion guide plate 12 and the upper repulsion guide plate 13, and is forced to flow in an arc shape within the second annular polishing chamber 6, and then falls naturally due to a decrease in kinetic energy. In the above flow process, the primary ground material is
The particle shape is further adjusted by mutual collision and abrasion, resulting in a rounded particle shape that is very similar to natural aggregate.

A part of the secondary ground material that naturally falls from the upper part of the second annular grinding chamber 6 is flowed together with the subsequent primary ground material discharged from the outlet 21 of the 20th-taper 19, and also It flows together with the ground material and is ejected again toward the second annular polishing chamber 6 by the regulator blade 29.
The remaining part is flowed at a relatively high concentration together with other primary ground materials flowing inside, and the remainder passes between the 20th meter 19, the regulator blade 29, and the discharge adjustment ring 45, and then exits from the discharge port 47 at the lower end of the lower housing 2. It becomes a product and is discharged.

Here, if one of the side liners 25 of each rotor 19.34 wears unevenly due to the continuation of the above operation, the electric motor is reversed and both rotors 19.34 are rotated in opposite directions for operation.

In the above embodiment, the annular polishing chamber 5.6 and the rotors 34, 19 are arranged in two stages, upper and lower. The chambers and rotor may be arranged in three or more upper and lower stages.

Further, the cross-sectional shape of the annular polishing chamber 5.6 is not limited to a constant shape, but may be variable.

The annular polishing chamber with a variable cross-sectional shape is composed of, for example, a plurality of segments divided in the circumferential direction, and is formed into a conical surface with a required inclination angle to prevent the formation of hardened materials such as materials to be polished due to accumulation, etc. 4. A lower repulsion guide plate in the form of a circular plate attached to the upper surface etc. with a variable inclination angle, and a cylinder vertically movable along the inner side of the upper housing 1 so as to be connected to the outer periphery of the lower repulsion guide plate. The upper end of the side repulsion guide plate is composed of a side repulsion guide plate having a shape of The upper repulsion guide plate is formed by an annular plate-shaped upper repulsion guide plate having a concave curved surface, which is attached to the ceiling of the upper housing 1 with a variable curvature so as to face the lower repulsion guide plate so as to be connected to the lower repulsion guide plate.

The cross-sectional shape of the annular polishing chamber can be changed, for example, by raising and lowering the outer periphery of each segment of the lower repulsion guide plate using a hydraulic jack or the like using the inner periphery of each segment as a fulcrum, thereby changing the inclination angle of the lower repulsion guide plate. or move the side repulsion guide plate up and down using hydraulic jacks, etc.
Alternatively, the inside of the inner periphery and the outside of the outer periphery of each segment of the upper repulsion guide plate may be raised and lowered using an appropriate lifting mechanism using the outside of the inner periphery and the inside of the outer periphery hinged to the ceiling as fulcrums, respectively. This is done by changing the curvature of the upper repulsion guide plate. By making the cross-sectional shape of the annular polishing chamber variable, the particle shape of the material to be ground can be adjusted under optimal conditions in response to changes in the particle size, specific gravity, and other properties of the material to be ground, or changes in the rotational speed of the rotor. It becomes possible to make adjustments.

Furthermore, the lower repulsion guide plates 7.11 of each annular polishing chamber 5, 6 are not limited to being installed statically, but may have a variable angle of inclination to prevent fine particles from adhering to the material to be polished. In some cases, for example, it may be made to vibrate up and down, or it may be made to rotate at a very low speed in the direction opposite to the direction of the rotor 34°19.

Furthermore, the rotors 34 and 19 are not limited to being rotatable in forward and reverse directions, but may be rotatable in one direction.

In this case, both sides of the discharge channel 37.22 may be radially asymmetric and may not be provided with a rotationally forward side liner 25. In addition, the discharge ports 3 of the rotors 34, 19
6.21 and discharge path 37.22 are not limited to two locations, but ・1
It may be located at three or four locations that are axially symmetrical. In addition, the side liner 25 is not limited to the case where the inclination angle with respect to the radius is constant, but also depending on the properties of the object to be ground, the rotor 3, etc.
The angle may be variable depending on the rotation speed of 4.19.

Furthermore, the regulator blade 42 of the tenth terrestrial 34 is
The length is not limited to the length of the above embodiment, and may be such that the tip reaches into the first annular polishing chamber 5 when centrifugal force is applied, similar to the regulator blade 29 of the 20th rotor 19. By doing this, the vertical passage area of the primary ground material that naturally falls from the upper part of the first annular grinding chamber 5 is reduced, and the opportunity for reflow by the regulator blade 42 is increased, and the first annular grinding chamber 5 is The residence time of the material to be ground, etc., invited into the sliding chamber 5, in other words, the length of the material being combed, is increased, and the degree of improvement in the particle shape of the product is further improved.

Further, the interlocking between the vertical rotating shaft 14 and the electric motor is not limited to a pulley or a belt, but may also be a chain, a sprocket, etc., or the vertical rotating shaft 14 and the rotating shaft of the electric motor may be directly connected.

[Effects of the Invention] As described above, according to the grain shape adjusting machine of the present invention, the material to be ground supplied from above is given horizontal kinetic energy by the rotor and is released, and is sent downward in the annular grinding chamber. The process of falling naturally due to a decrease in kinetic energy is repeated two or more times, except for those that are forced to flow upward in an arc shape and reach the top, and then flow again together with the subsequent materials to be ground that are ejected from the rotor. In the flow process of each stage, the sharp points are ground by mutual collision and grinding, and the grain shape is gradually adjusted to a rounded shape. The particle shape is extremely similar to that of natural aggregate, and the actual area rate for determining the particle shape of the product can be greatly improved.

[Brief explanation of drawings]

FIG. 1 is a longitudinal cross-sectional view showing one embodiment of the grain shape adjuster of the present invention, and FIG. 2 is an exploded perspective view of the 20th part of the machine.

Claims (11)

[Claims] (1) A rotor that applies centrifugal force to the material to be ground that is supplied from above and releases it horizontally in the radial direction; A grain shape adjusting machine characterized by having two or more upper and lower stages of annular polishing chambers provided concentrically around the outer periphery. (2) The grain shape adjuster according to claim 1, wherein the rotor rotates in one direction. (3) The grain shape adjuster according to claim 1, wherein the rotor is rotatable in forward and reverse directions. (4) The grain shape adjuster according to claim 3, wherein the rotor has both side surfaces of a discharge path of the material to be ground that are symmetrical with respect to a radius. (5) The grain shape adjuster according to claim 1, 2, or 3, wherein the annular polishing chamber has a constant cross-sectional shape. (6) The annular polishing chamber includes a circular plate-shaped lower repulsion guide plate having a conical surface with a predetermined inclination angle, and a cylindrical side extending upright from the outer periphery of the lower repulsion guide plate. Claim 5, which comprises a lower repulsion guide plate and an annular plate-shaped upper repulsion guide plate having a concave curved surface and facing the lower repulsion guide plate so as to be connected to the upper end of the side repulsion guide plate. Particle shape adjuster. (7) The grain shape adjusting machine according to claim 1, 2 or 3, wherein the annular polishing chamber has a variable cross-sectional shape. (8) The annular polishing chamber includes a circular plate-shaped lower repulsion guide plate that has a conical surface with a required inclination angle and a variable angle, and is movable up and down so as to be connected to the outer periphery of the lower repulsion guide plate. It consists of an upright cylindrical side repulsion guide plate, and an annular plate-shaped upper repulsion guide plate having a concave curved surface with a variable curvature and facing the lower repulsion guide plate so as to be connected to the upper end of the side repulsion guide plate. A particle shape adjusting machine according to claim 7. (9) The grain shape adjuster according to claim 6 or 8, wherein the lower repulsion guide plate is static. (10) The grain shape adjuster according to claim 6 or 8, wherein the lower repulsion guide plate is capable of vertical vibration. (11) The grain shape adjuster according to claim 6 or 8, wherein the lower repulsion guide plate is capable of rotating at a very low speed in a direction opposite to that of the rotor.