JPS62190340U - - Google Patents
Info
- Publication number
- JPS62190340U JPS62190340U JP1986078202U JP7820286U JPS62190340U JP S62190340 U JPS62190340 U JP S62190340U JP 1986078202 U JP1986078202 U JP 1986078202U JP 7820286 U JP7820286 U JP 7820286U JP S62190340 U JPS62190340 U JP S62190340U
- Authority
- JP
- Japan
- Prior art keywords
- ray
- thin film
- absorber pattern
- support frame
- convex portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000006096 absorbing agent Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 description 4
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986078202U JPS62190340U (enExample) | 1986-05-26 | 1986-05-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986078202U JPS62190340U (enExample) | 1986-05-26 | 1986-05-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62190340U true JPS62190340U (enExample) | 1987-12-03 |
Family
ID=30926925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986078202U Pending JPS62190340U (enExample) | 1986-05-26 | 1986-05-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62190340U (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54142071A (en) * | 1978-04-27 | 1979-11-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating xxray exposure mask |
| JPS58207635A (ja) * | 1982-05-28 | 1983-12-03 | Seiko Epson Corp | メンブラン・マスクの製造方法 |
-
1986
- 1986-05-26 JP JP1986078202U patent/JPS62190340U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54142071A (en) * | 1978-04-27 | 1979-11-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of fabricating xxray exposure mask |
| JPS58207635A (ja) * | 1982-05-28 | 1983-12-03 | Seiko Epson Corp | メンブラン・マスクの製造方法 |