JPS62181381A - Near infrared ray absorbing composition - Google Patents
Near infrared ray absorbing compositionInfo
- Publication number
- JPS62181381A JPS62181381A JP61028711A JP2871186A JPS62181381A JP S62181381 A JPS62181381 A JP S62181381A JP 61028711 A JP61028711 A JP 61028711A JP 2871186 A JP2871186 A JP 2871186A JP S62181381 A JPS62181381 A JP S62181381A
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituted
- infrared
- layer
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- 125000000217 alkyl group Chemical group 0.000 claims abstract description 18
- 125000003118 aryl group Chemical group 0.000 claims abstract description 8
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 7
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims abstract description 6
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 2
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- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 70
- 230000003287 optical effect Effects 0.000 description 29
- 238000000034 method Methods 0.000 description 28
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 27
- 239000000243 solution Substances 0.000 description 24
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
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- 238000000926 separation method Methods 0.000 description 5
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- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000000020 Nitrocellulose Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 4
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- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
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- 239000003638 chemical reducing agent Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 230000009931 harmful effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 229920001220 nitrocellulos Polymers 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- 150000004782 1-naphthols Chemical class 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 108010010803 Gelatin Proteins 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000008273 gelatin Substances 0.000 description 3
- 229920000159 gelatin Polymers 0.000 description 3
- 235000019322 gelatine Nutrition 0.000 description 3
- 235000011852 gelatine desserts Nutrition 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 239000003094 microcapsule Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
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- 239000011241 protective layer Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical group [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 239000003795 chemical substances by application Substances 0.000 description 2
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- 150000004696 coordination complex Chemical class 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- OSWPMRLSEDHDFF-UHFFFAOYSA-N methyl salicylate Chemical compound COC(=O)C1=CC=CC=C1O OSWPMRLSEDHDFF-UHFFFAOYSA-N 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
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- 150000004989 p-phenylenediamines Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
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- 239000000049 pigment Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 230000035945 sensitivity Effects 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000000344 soap Substances 0.000 description 2
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- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 2
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- SYUYTOYKQOAVDW-UHFFFAOYSA-N 2-nitrosonaphthalen-1-ol Chemical class C1=CC=C2C(O)=C(N=O)C=CC2=C1 SYUYTOYKQOAVDW-UHFFFAOYSA-N 0.000 description 1
- HAEQAUJYNHQVHV-UHFFFAOYSA-N 3-[4-(aminomethyl)-6-(trifluoromethyl)pyridin-2-yl]oxy-N-phenylbenzamide Chemical compound NCC1=CC(=NC(=C1)C(F)(F)F)OC=1C=C(C(=O)NC2=CC=CC=C2)C=CC=1 HAEQAUJYNHQVHV-UHFFFAOYSA-N 0.000 description 1
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- 241000974482 Aricia saepiolus Species 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
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- 239000012964 benzotriazole Substances 0.000 description 1
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- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
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- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
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- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Chemical group 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical group [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
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- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Chemical group 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- 125000000332 coumarinyl group Chemical class O1C(=O)C(=CC2=CC=CC=C12)* 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- WMKGGPCROCCUDY-PHEQNACWSA-N dibenzylideneacetone Chemical compound C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 WMKGGPCROCCUDY-PHEQNACWSA-N 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 239000001046 green dye Substances 0.000 description 1
- 230000012010 growth Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 229910052945 inorganic sulfide Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000003588 lysine group Chemical group [H]N([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(N([H])[H])C(*)=O 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical group CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 1
- 229960001047 methyl salicylate Drugs 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229960001679 octinoxate Drugs 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Chemical group 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- HKSGQTYSSZOJOA-UHFFFAOYSA-N potassium argentocyanide Chemical compound [K+].[Ag+].N#[C-].N#[C-] HKSGQTYSSZOJOA-UHFFFAOYSA-N 0.000 description 1
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical compound [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000005336 safety glass Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000007226 seed germination Effects 0.000 description 1
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 1
- 229940098221 silver cyanide Drugs 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- SDKPSXWGRWWLKR-UHFFFAOYSA-M sodium;9,10-dioxoanthracene-1-sulfonate Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)[O-] SDKPSXWGRWWLKR-UHFFFAOYSA-M 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 125000003696 stearoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005556 structure-activity relationship Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical class [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
- B41M5/465—Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Filters (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は近赤外線を吸収する近赤外線吸収組成物に関す
る。さらに詳しくは、波長が720nm以上の近赤外光
を吸収する光学フィルターあるいは近赤外光を光源とし
た記録層等に有用な近赤外線吸収組成物に関する。DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a near-infrared absorbing composition that absorbs near-infrared rays. More specifically, the present invention relates to a near-infrared absorbing composition useful for optical filters that absorb near-infrared light having a wavelength of 720 nm or more or recording layers using near-infrared light as a light source.
「従来の技術」
720 nmの波長の遠赤色光ないし近赤外光を選択的
に吸収する組成物には各種の用途が考えられ、従前より
強く要望されていたが、今まで適当なものが得られなか
った。従来の赤外線吸収性組成物の用途の例を以下に説
明する。``Prior Art'' Compositions that selectively absorb far-red light or near-infrared light with a wavelength of 720 nm have been considered for various uses and have been strongly desired, but until now there has been no suitable material. I couldn't get it. Examples of uses of conventional infrared absorbing compositions will be explained below.
■ 赤外感光性の感光材料用セーフライトフィルター
近年ハロゲン化銀感光材料(以下「感材」という)とし
て、波長200nm以上の遠赤色光ないし近赤外光に感
光性を有するものが多数開発されて来ている。これKは
白黒あるいはカラーを問わず、また通常型はもちろんイ
ンスタント型あるいは熱現像型のものも含めハロゲン化
銀感材に赤外感光性を具備せしめ、資源調査などに供す
る疑似カラー写真としたり、あるいはまた、半導体レー
ザーや赤外域に発光するダイオードを使って露光しうる
ようにしたものがある。■ Safelight filter for infrared-sensitive photosensitive materials In recent years, many silver halide photosensitive materials (hereinafter referred to as "sensitized materials") that are sensitive to far-red or near-infrared light with a wavelength of 200 nm or more have been developed. It's coming. This K is a silver halide photosensitive material that has infrared sensitivity, regardless of whether it is black and white or color, as well as ordinary type, instant type or heat developable type, and can be used to create pseudo-color photographs for use in resource surveys, etc. Alternatively, there are devices that can be exposed using semiconductor lasers or diodes that emit light in the infrared region.
従来はこれらの感材に適切なセーフライトフィルターは
開発されていなかった。セーフライトフィルターとして
は、近赤外部の光を吸収し、可視域を実質的に透過する
フィルターの開発が望まれている。Until now, safelight filters suitable for these sensitive materials had not been developed. As a safelight filter, it is desired to develop a filter that absorbs near-infrared light and substantially transmits visible light.
■ 植物の生育の制御
種子の発芽、茎の伸長、葉の展開、花芽や塊茎の形成な
ど、植物体の生長と分化に関するいわゆる形態形成が光
によって影響されることは古くから知られており、光形
態形成作用として研究されている。■ Control of plant growth It has been known for a long time that light affects the so-called morphogenesis related to plant growth and differentiation, such as seed germination, stem elongation, leaf expansion, and flower bud and tuber formation. It is being studied as a photomorphogenetic effect.
700 nm以上の波長の光を選択的に吸収するプラス
チックフィルムが得られれば、例えば、特定の時期に作
物を近赤外線吸収フィルムで被覆し、波長70θnm以
上の光を遮断することによって出穂時期を遅らせたり、
成長を制御する効果が期待される(稲田勝美「植物の化
学調節」第6巻、第1号(/り2/年)参照)。If a plastic film that selectively absorbs light with a wavelength of 700 nm or more could be obtained, for example, crops could be coated with a near-infrared absorbing film at a specific time to block light with a wavelength of 70θ nm or more, thereby delaying the time of heading. Or,
It is expected to have the effect of controlling growth (see Katsumi Inada, "Chemical Regulation of Plants", Vol. 6, No. 1 (2017)).
■ 熱線の遮断
太陽の輻射エネルギーのうち波長/ o o nm以上
の近赤外および赤外領域の光は物体に吸収されて熱エネ
ルギーに転化する。しかも、そのエネルギー分布の大部
分は波長100−2θθonmの近赤外部に集中してい
る。従って、近赤外線を選択的に吸収するフィルムは太
陽熱の遮断洗極めて有効であム可視光を十分にとり入れ
ながら、室内の温度の上昇を抑制することができる。こ
れは、園芸用温室の他、住宅、事務所、店舗、自動車あ
るいは航空機等の窓にも応用できる。これらの場合、可
視光の透過性は非常に重要なことである。■ Blocking of heat rays Of the solar radiant energy, light in the near-infrared and infrared regions with a wavelength of 0 nm or more is absorbed by objects and converted into thermal energy. Moreover, most of the energy distribution is concentrated in the near-infrared region with a wavelength of 100-2θθonm. Therefore, a film that selectively absorbs near-infrared rays is extremely effective in blocking solar heat, and can suppress the rise in indoor temperature while allowing in sufficient visible light. This can be applied not only to horticultural greenhouses but also to windows of houses, offices, stores, automobiles, airplanes, etc. In these cases, visible light transmission is of great importance.
従来、熱線の遮断用としてはプラスチックフィルムの表
面にごく薄い金属層を蒸着したものあるいは、ガラス中
に無機化合物、たとえばFeOを分散させたものが使用
されている。Conventionally, to block heat rays, a plastic film with a very thin metal layer deposited on the surface, or a glass with an inorganic compound such as FeO dispersed therein have been used.
■ 人間の目の組織に有害な赤外線カットフィルター
太陽光中に含まれる赤外線または溶接の際に放射される
光線中などに含まれる赤外線は、人間の目の組織に対し
て、有害な効果を有する。赤外線カットフィルターの主
要な用途の一つは、このような有害な赤外線を含む光線
から人間の目を保護する眼鏡として用いることである。■ Infrared rays that are harmful to human eye tissue Infrared rays contained in sunlight and infrared rays emitted during welding have a harmful effect on human eye tissue. . One of the main uses of infrared cut filters is as eyeglasses that protect human eyes from such harmful infrared rays.
たとえば、サングラス、溶接者用保護眼鏡などである。For example, sunglasses, safety glasses for welders, etc.
この場合も可視光の実質的な透過性は非常に重要なこと
である。In this case as well, substantial transparency of visible light is very important.
■ 半導体受光素子の赤外線カットフィルターカメラな
どの自動露出計に用いられている光検出装置の受光素子
としては、現在、主にシリコンフォトダイオード(以下
、SPDという)が使用されている。(2) Infrared cut filter for semiconductor photodetector Currently, silicon photodiodes (hereinafter referred to as SPDs) are mainly used as photodetectors for photodetectors used in automatic exposure meters such as cameras.
露出計用としてSPDを使用するためには入間の目には
感じない赤外領域の光をカットし、SPDの分光感度曲
線を比視感度曲線に相似させるようにする必要がある。In order to use an SPD as a light meter, it is necessary to cut out infrared light that is invisible to Iruma's eyes, and to make the spectral sensitivity curve of the SPD similar to the specific luminous efficiency curve.
特に波長700〜//θ0nmの光に対しては、SPD
の出力が大きく、かつこの領域の光は目に感じないので
露出計の誤動作の一因となる。そのために可視部では吸
収が少なく、7θθ〜/ / 00 nnlの赤外部を
全域にわたって吸収する赤外線吸収プラスチックフィル
ムを用いることができれば、可視領域の光透過率が大き
く、SPDの出力が大きくなり、従って露出計の性能を
著しく向上し得ることが明らかである。Especially for light with a wavelength of 700~//θ0nm, SPD
The output of this area is large, and the light in this area is not perceptible to the human eye, which can cause the exposure meter to malfunction. For this reason, if it is possible to use an infrared absorbing plastic film that has low absorption in the visible region and absorbs the entire infrared region of 7θθ ~ / / 00 nnl, the light transmittance in the visible region will be large, and the output of the SPD will be large. It is clear that the performance of light meters can be significantly improved.
従来、この種の光検出装置としては、無機の赤外線吸収
剤を用いたガラスの赤外線カットフィルターがSPDの
前面にとり付けられ、実用に供されていた。Conventionally, this type of photodetection device has been put into practical use by attaching a glass infrared cut filter using an inorganic infrared absorbing agent to the front of the SPD.
■ レーザー記録層
赤外線を吸収して熱に変換する作用を利用してレーザー
光を用いて記録する記録層、例えば光ディスクの記録層
やレーザーによる感熱発色記録体に使用される。(2) Laser recording layer A recording layer that uses laser light to record by absorbing infrared rays and converting it into heat, such as the recording layer of an optical disk or a thermosensitive color recording material using a laser.
例えば特開昭jf−J/4/、4コ号、特開昭j/−2
/7397号、特開昭!?−/2!2<ら号各公報には
ビIJ IJウム系色素を含有した記録層が提示されて
いる。For example, JP-A Sho JF-J/4/, No. 4, JP-A Sho J/-2
/ No. 7397, Tokukai Sho! ? -/2!2< et al. Each of the publications discloses a recording layer containing a bicarbonate dye.
■ インクジェットプリンタ用インク
インクジェットプリンタ用インクにエチルセロソルブの
ような溶媒と、赤外線吸収剤としてこの有機溶媒に溶け
る色素が用いられ、プリンタで描画した後画像を波長2
4t0〜900 nmの赤外線の光源を用いる光学的読
取装置で読み取る方法に使用される。従来このようなイ
ンクジェットプリンタ用赤外線吸収剤としてはニグロシ
ン、クロム錯塩など特開昭!≦−73j!乙?号に開示
されている化合物が用いられている。■ Ink for inkjet printers Ink for inkjet printers uses a solvent such as ethyl cellosolve and a dye that dissolves in this organic solvent as an infrared absorber.
It is used in a method of reading with an optical reader using an infrared light source of 4t0 to 900 nm. Conventional infrared absorbers for inkjet printers include nigrosine, chromium complex salts, etc. ≦−73j! Otsu? The compounds disclosed in No.
更に■バーコード用インク ■感光材のアンチハレーシ
ョン剤 [F]サウンドトラック用赤外線吸収色素を形
成する赤外カプラー等の用途も挙げられる。Further applications include: (1) ink for bar codes, (2) antihalation agent for photosensitive materials, and (F) infrared couplers forming infrared absorbing dyes for soundtracks.
[発明が解決しようとする問題点」
しかし従来の一般的な有機染料系の赤外線吸収剤は吸収
特性が長波長域につれて不安定となり・射光性、耐熱性
が小さく実用上満足すべきものはほとんどなかった。[Problems to be solved by the invention] However, the absorption characteristics of conventional general organic dye-based infrared absorbers become unstable as the wavelength range increases, and their light emitting properties and heat resistance are low, making them practically unsatisfactory. Ta.
また錯体を赤外線吸収剤として用いる場合は、耐光性、
耐熱性が良いものの有機溶媒への溶解度が不足し、これ
が薄層のプラスチックフィルムを作成する際に大きな欠
点となっていた。In addition, when using the complex as an infrared absorber, light resistance,
Although it has good heat resistance, it lacks solubility in organic solvents, which is a major drawback when creating thin plastic films.
すなわち、先に述べた如き用途は例えばSPD用フィル
ターとしては、極めて薄いフィルムで赤外線の吸収効率
の良いフィルムが望まれるが、そのためには、樹脂中に
多量の赤外mrf!に成剤が分散されねばならず、有機
溶媒に対する溶解度の小さい赤外線吸収剤はその目的を
満足させることができなかった。That is, for the above-mentioned applications, such as SPD filters, an extremely thin film with high infrared absorption efficiency is desired, but for this purpose, a large amount of infrared mRF! is required in the resin. Infrared absorbers with low solubility in organic solvents have not been able to satisfy this purpose.
したがって本発明の目的は第1に、有機溶媒への溶解度
が高い近赤外線吸収組成物を提供することである。Therefore, the first object of the present invention is to provide a near-infrared absorbing composition that has high solubility in organic solvents.
第2に、有機溶媒への溶解度が高く、かつプラスチック
フィルムとの相溶性のよい近赤外線吸収組成物を提供す
ることである。第3に、有機溶媒への溶解度が高く、か
つフィルム形成性バインダーとの相溶性のよい近赤外線
吸収組成物を提供することである。The second object is to provide a near-infrared absorbing composition that has high solubility in organic solvents and good compatibility with plastic films. Third, it is an object of the present invention to provide a near-infrared absorbing composition that has high solubility in organic solvents and good compatibility with film-forming binders.
本発明者らは、上記の目的を達成するため種々研究を重
ねた結果、本発明を完成するに至った。The present inventors have completed the present invention as a result of various studies to achieve the above object.
「問題点を解決するための手段J
前記諸口的は、下記一般式(I)で表わされかつ極大吸
収波を7201m以上に有する化合物の少なくとも1種
を含有することを特徴とする近赤外線吸収組成物によっ
て解決された。"Means for Solving Problems J" The above-mentioned near-infrared absorbing material is characterized by containing at least one compound represented by the following general formula (I) and having a maximum absorption wave at 7201 m or more. solved by the composition.
一般式N)
式中、Rは置換もしくは無置換のアルキル基、置換もし
くは無置換のアリール基(例えばフェニル基、ナフチル
基など)、置換もしくは無置換の複素環基を表わし、R
2及びR5は互いに同じでも異なっていても良く、水素
原子もしくはこれを置換可能な基を表わし R3及びR
4は互いに同じでも異なっていても良く、水素原子、・
・ロゲン原子(例えば塩素原子、臭素原子など)置換も
しくは無置換の炭素数7〜/、1′のアルコキシ基(例
えばメトキシ基、エトキシ基、オクトキシ基など)、置
換もしくは無置換のアルキル基を表わし、好ましくはR
3及びR4は炭素数/〜!のアルキル基(メチル基、エ
チル基など)を表わす。但し、R3とR4は同時に水素
原子であることはない。R6及びRは互いに同じでも異
なっていても良く、置換もしくは無置換のアルキル基、
置換もしくは無置換のアリール基(例えばフェニル基、
ナフチル基など)、アシル、!(例えばアセチル基、プ
ロピオニル基など)、スルホニル基(例えばメタンスル
ホニル基、エタンスルホニル基なト)又はR6とR7が
連結して!又は乙員項を形成するのに必要な非金属原子
群(例えばピロリジン環、ビはリジン環、モルホリン環
など)を表わす。General formula N) In the formula, R represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group (e.g., phenyl group, naphthyl group, etc.), a substituted or unsubstituted heterocyclic group, and R
2 and R5 may be the same or different and represent a hydrogen atom or a group capable of substituting it; R3 and R
4 may be the same or different from each other, and hydrogen atoms,
・Represents a substituted or unsubstituted alkoxy group (such as a methoxy group, ethoxy group, octoxy group, etc.) having 7 to 1' carbon atoms, or a substituted or unsubstituted alkyl group , preferably R
3 and R4 are carbon numbers/~! represents an alkyl group (methyl group, ethyl group, etc.). However, R3 and R4 are never hydrogen atoms at the same time. R6 and R may be the same or different from each other, and are substituted or unsubstituted alkyl groups,
Substituted or unsubstituted aryl groups (e.g. phenyl group,
naphthyl group), acyl,! (for example, acetyl group, propionyl group, etc.), sulfonyl group (for example, methanesulfonyl group, ethanesulfonyl group), or R6 and R7 are connected! Or it represents a nonmetallic atomic group necessary to form a member term (for example, a pyrrolidine ring, a lysine ring, a morpholine ring, etc.).
一般式(I)で表わされる化合物は R1゜R2、R3
、R4、R5、R6またはR7のうちのいずれかの基を
介して211:体を形成していても良い。The compound represented by general formula (I) is R1゜R2, R3
, R4, R5, R6 or R7 may form a 211: body.
R1、R6又はR7で表わされるアルキル基は互いに同
じでも異なっていても良く、炭素数/〜/?のアルキル
基(例えばメチル基、エチル基、プロピルL i−ブ
チル基、n−オクチルL n−ドデシル基、n−オク
タデシル基など)が好ましく、置換基(例えばシアン基
、水酸基、メトキシ基、エトヤーシ基などのアルコキシ
基、フェノキシ基などのアリーロキシ基、アセトアミド
基、メタンスルホンアミド基などのアミド基、塩素原子
、フッ素原子などのハロゲン原子など)を有しでいても
良い。The alkyl groups represented by R1, R6 or R7 may be the same or different, and have a carbon number of /~/? Alkyl groups (e.g. methyl group, ethyl group, propyl L i-butyl group, n-octyl L n-dodecyl group, n-octadecyl group, etc.) are preferable, and substituents (e.g. cyan group, hydroxyl group, methoxy group, etoyasi group) are preferable. , an aryloxy group such as a phenoxy group, an amide group such as an acetamide group or a methanesulfonamide group, or a halogen atom such as a chlorine atom or a fluorine atom).
R1、R6又はR7で表わされるアリール基は互いに同
じでも異なっていても良く、置換もしくは無置換のフェ
ニル基(置換基として例えば水酸基、シアノ基、ハロゲ
ン原子(例えば塩素原子、フッ素原子など)、炭素数2
〜/lのアシル基(例えばアセチル基、プロピオニル基
、ステアロイル基など)、炭素数/〜//のスルホニル
基(例Lij’メpンスルホニル基、エタンスルホニル
基、オクタンスルホニル基など)、炭素数/〜/lのカ
ルバモイル基(例えば無置換のカルバモイル基、メチル
カルバモイル基、オクチルカルバモイル基など)、炭素
数/〜//のスルファモイル基(例えば無置換のスルフ
ァモイル基、メチルスルファモイル基、ブチルスルファ
モイル基など)、炭素!!l〜/rのアルコキシカルボ
ニル基(例えばメトキシカルボニル基、トリクロロエト
キシカルボニル基、テシルオキシ力ルボニル基ナト)、
炭素数7〜/♂のアルコキシ基(例えばメトキシ基、ブ
トキシ基、ペンタデシルオキシ基など)、アミノ基(例
えばジメチルアミノ基、ジエチルアミノ基、ジエチルア
ミノ基など)など)又は置換もしくは無置換のナフチル
基(置換基としてはフェニル基の場合と同じものが好ま
しい)が好ましい。The aryl groups represented by R1, R6, or R7 may be the same or different, and may include a substituted or unsubstituted phenyl group (substituents include, for example, a hydroxyl group, a cyano group, a halogen atom (for example, a chlorine atom, a fluorine atom, etc.), a carbon Number 2
~/l acyl group (e.g. acetyl group, propionyl group, stearoyl group, etc.), carbon number /~// sulfonyl group (e.g. Lij' mep sulfonyl group, ethanesulfonyl group, octanesulfonyl group, etc.), carbon number /~/l carbamoyl group (e.g. unsubstituted carbamoyl group, methylcarbamoyl group, octylcarbamoyl group, etc.), carbon number /~// sulfamoyl group (e.g. unsubstituted sulfamoyl group, methylsulfamoyl group, butyl sulfamoyl group) Famoyl group, etc.), carbon! ! l~/r alkoxycarbonyl group (e.g. methoxycarbonyl group, trichloroethoxycarbonyl group, tethyloxycarbonyl group),
Alkoxy groups (e.g. methoxy group, butoxy group, pentadecyloxy group, etc.) having 7 to ♂ carbon atoms, amino groups (e.g. dimethylamino group, diethylamino group, diethylamino group, etc.) or substituted or unsubstituted naphthyl groups ( The same substituents as those for the phenyl group are preferred).
R1で表わされる置換もしくは無置換の複素環は単項の
複素環又は縮合複素環を表わし、例えば/、3へチアゾ
ール環、/、3.II−)リアゾール環、ベンゾチアゾ
ール環、ベンゾイミダゾール環、ベンゾオキサゾール環
、/、3.y−チアジアゾール環など(置換基としては
例えばメチル基、エチル基、オクチル基などのアルキル
基、メトキノ、エトキシ基、デシルオキシ基などのアル
コキシ基、水酸基など)が好ましい。The substituted or unsubstituted heterocycle represented by R1 represents a single heterocycle or a fused heterocycle, such as /, 3 hethiazole ring, /, 3. II-) Riazole ring, benzothiazole ring, benzimidazole ring, benzoxazole ring, /, 3. Preferred examples include a y-thiadiazole ring (substituents include alkyl groups such as methyl, ethyl, and octyl, alkoxy groups such as methoxy, ethoxy, and decyloxy, and hydroxyl).
R2及びR5で表わされる水素原子を置換可能な基は、
ハロゲン原子(例えばフッ素原子、塩素、原子、臭素原
子など)、水酸基、シアン基又は直接もしくは2価の連
結基を介して結合した置換もしくけ無置換の炭素数/〜
//のアルキル基(例えばメチル基、エチル基、ブチル
基、=−エチルヘキシル基、ステアリル基など)を表わ
し、2価の連結基は例えば−〇−1−N)ICO−1−
NH8O2−1′−NHCOO−1−NHCONH−1
−COO−1−CO−1−SO2−1−NR−(Rは水
素原子または置換もしくけ無置換の炭素数/〜/♂のア
ルキル基を表わす。)などを表わす。The groups capable of substituting hydrogen atoms represented by R2 and R5 are:
Number of substituted or unsubstituted carbon atoms bonded directly or via a halogen atom (e.g. fluorine atom, chlorine, atom, bromine atom, etc.), hydroxyl group, cyanide group, or a divalent linking group/~
// represents an alkyl group (for example, methyl group, ethyl group, butyl group, =-ethylhexyl group, stearyl group, etc.), and the divalent linking group is, for example, -〇-1-N)ICO-1-
NH8O2-1'-NHCOO-1-NHCONH-1
-COO-1-CO-1-SO2-1-NR- (R represents a hydrogen atom or a substituted or unsubstituted alkyl group having a carbon number of /~/♂).
更に好ましくば R1は複素環基を表わすか又はハメッ
トの置換基定数δ もしくはδ、の値が0.23より大
きい一価の基で置換されたフェニル基を表わす。ハメッ
トの置換基定数δ。もしくはδ、の値が0.23より大
きい一価の基としては、ハロゲン原子(フッ素原子、塩
素原子、臭素原子など)、シアン基、ホルミル基、カル
ボキシ基、カルバモイル基(無置換のカルバモイル基、
メチルカルバモイル基など)、アルコキシ力ルポニル基
(メトキシカルボニル基、エトキシカルボニル基など)
、アシル基(アセチル基、ベンゾイル基ナト)、ニトロ
基、スルファモイル基(無置換のスルファモイル基、メ
チルスルファモイル基ナト)、スルホニル基(メタンス
ルホニル基、ベンゼンスルホニル基など)等が好ましく
挙げられる。前記・・メットのδ もしくはδ、値は「
薬物の構造活性相関」(南江堂)第96頁(/979年
)に記載されており、この表に基づいて置換基を選ぶこ
とができる。More preferably, R1 represents a heterocyclic group or a phenyl group substituted with a monovalent group having a value of Hammett's substituent constant δ or δ greater than 0.23. Hammett's substituent constant δ. Or monovalent groups with a value of δ greater than 0.23 include halogen atoms (fluorine atoms, chlorine atoms, bromine atoms, etc.), cyan groups, formyl groups, carboxy groups, carbamoyl groups (unsubstituted carbamoyl groups,
methylcarbamoyl group, etc.), alkoxylponyl group (methoxycarbonyl group, ethoxycarbonyl group, etc.)
, an acyl group (acetyl group, benzoyl group), a nitro group, a sulfamoyl group (unsubstituted sulfamoyl group, methylsulfamoyl group), and a sulfonyl group (methanesulfonyl group, benzenesulfonyl group, etc.). Said...Met's δ or δ, the value is ``
It is described in "Structure-Activity Relationship of Drugs" (Nankodo), page 96 (/979), and substituents can be selected based on this table.
本発明に用いられる前記一般式(I)で表わされる化合
物の具体例を以下に示すが、本発明の範囲はこれらに限
定されるものではない。Specific examples of the compound represented by the general formula (I) used in the present invention are shown below, but the scope of the present invention is not limited thereto.
(+−/) ハ H5C2C2H5 (I−−?) (I−6) ・ N /\。(+-/) Ha H5C2C2H5 (I--?) (I-6) ・N /\.
I(5C2C2H5
(I−、f’)
(I−/I
H5C7\。2H5
(+−//)
α
(I−/り
α
ヘ
ハ
H5C2C2H5
(I−/−?)
(l−/ダ)
I−I5C2”CH2゜H2O)、
(I−/乙)
H5C2’\C2H3
(I−/、r)
H5C’;\。2H5
(I−コθ)
CH3CH3
(I−22>
H5C2’\。2H5
(I−,2−?)
(■−コグ)
115C2C2■(5
(I−2り
(I−,27)
(I−2?)
(I−,29)
(I−31
(I−、?/)
(l−32)
H5C/″″c2H5
(I−3J)
(I〜3グ)
(I−36>
一般式(I)で表わされる化合物はジアルキルアニリン
類とな一ニトロソナフトール類の濃硫酸中での縮合によ
る方法、α−ナフトール類とp −フェニレンジアミン
類とを塩基と酸化剤の共存下で縮合させる方法、q−ア
ミノ−/−ナフトール類とジアルキルアニリン類とを次
亜塩素酸ソーダ溶液で酸化縮合する方法、p−ニトロン
ジアルキルアニリン類とα−ナフトール類の縮合による
方法などによって合成するととができ、例えば特開昭!
θ−10θ//を号や特開昭tO−32F!7号やジャ
ーナル オブ オルガニック ケミストリ〜(S、Fu
jita著「Journal ofOrganic
ChemiatryJ 、<it 、i77〜/r3
(/9.1rJ))に記載の方法に準じて合成すること
ができる。I (5C2C2H5 (I-, f') (I-/I H5C7\.2H5 (+-//) α (I-/riα Heha H5C2C2H5 (I-/-?) (l-/da) I-I5C2 ”CH2゜H2O), (I-/Otsu) H5C2'\C2H3 (I-/, r) H5C';\.2H5 (I-koθ) CH3CH3 (I-22>H5C2'\.2H5 (I-, 2-?) (■-Cog) 115C2C2■(5 (I-2ri(I-,27) (I-2?) (I-,29) (I-31 (I-,?/) (l- 32) H5C/″″c2H5 (I-3J) (I~3g) (I-36> The compound represented by the general formula (I) is produced by condensation of dialkylanilines and mononitrosonaphthols in concentrated sulfuric acid. Method, method of condensing α-naphthols and p-phenylenediamines in the presence of a base and oxidizing agent, oxidative condensation of q-amino-/-naphthols and dialkylanilines with a sodium hypochlorite solution It can be synthesized by the condensation method of p-nitrone dialkylanilines and α-naphthols, for example, by the method disclosed in JP-A-Sho!
θ-10θ// issue and JP-A-Sho tO-32F! No. 7 and Journal of Organic Chemistry (S, Fu
“Journal of Organic” written by jita
ChemistryJ, <it, i77~/r3
(/9.1rJ)).
合成例/(例示化合物1−7の合成)
s−(g−7セチルフエニルカルパモイル)−7−ナフ
ドー/l/9.2g、 工p/−に7ノml及び酢酸エ
チル/!θmllの混合液に炭酸ナトリウム2/gの水
溶液2ノθmlとな−ジエチルアミノー−2,i<−ジ
メチルアニリンに、9gを加え、更に攪拌しながら過硫
酸アンモニウム/に、qgの水溶液20m1を3Q分か
けて滴下した。滴下後コ時間攪拌後、反応液を静置し、
酢酸エチル相をとり出し水洗後濃縮した。濃縮残渣をク
ロロホルムから再結晶し例示化合物/の緑青色の結晶り
。Synthesis Example/(Synthesis of Exemplified Compound 1-7) 9.2 g of s-(g-7 cetyl phenylcarpamoyl)-7-nafdo/l, 7 nml and ethyl acetate/! Add 9 g of an aqueous solution of 2/g of sodium carbonate to 2 θ ml of an aqueous solution of 2/g of sodium carbonate and dimethylaniline, and add 20 ml of an aqueous solution of qg to ammonium persulfate for 3Q minutes while stirring. It dripped. After stirring for several hours after dropping, the reaction solution was allowed to stand still.
The ethyl acetate phase was taken out, washed with water, and then concentrated. The concentrated residue was recrystallized from chloroform to give greenish-blue crystals of the exemplified compound.
/gel#l。融点2/9〜2200C1λCHCe3
aX
=2g!nm(ε=7.23×104 )合成例λ
α−ナフトール類とp−フェニレンジアミン類を下記第
1表に示す組み合わせで用いた以外は合成力/と同様に
して例示化合物を得た。結果も合わせて第1表に示す。/gel#l. Melting point 2/9~2200C1λCHCe3
aX = 2g! nm (ε=7.23×10 4 )Synthesis Example λ The exemplified compounds were obtained in the same manner as in Synthesis, except that α-naphthols and p-phenylenediamines were used in the combinations shown in Table 1 below. The results are also shown in Table 1.
本発明の近赤外線吸収組成物を光学フィルターとして用
いる場合は前記一般式(I)で表わされる化合物を、適
宜に結合剤中に含有させて用いることができる。結合剤
としては、近赤外線吸収性を発揮させるものであれば有
機、無機の区別なく用いることができ、例えば光学用フ
ィルターの場合はプラスチックのような高分子材料、ガ
ラスのような無機材料などが挙げられる。When the near-infrared absorbing composition of the present invention is used as an optical filter, the compound represented by the general formula (I) can be appropriately incorporated into a binder. Any binder, organic or inorganic, can be used as long as it exhibits near-infrared absorbing properties; for example, in the case of optical filters, polymeric materials such as plastics, inorganic materials such as glass, etc. can be used. Can be mentioned.
好ましくは、結合剤としては、透明性および機械的性質
の優れた結合剤が用いられる。このような結合剤の例と
しては、例えばポリエチレンテレフタレートで代表され
るポリエステル類、セルロースジアセテート、セルロー
ストIJアセテート、セルロースアセテートブチレート
などのセルロースエステル類、ホ’)エチレン、ポ+)
−iロビレンなどのポリオレフィン類、ポリ塩化ビニル
、ポリ塩化ビニリデン、塩化ビニル−酢酸ビニル共重合
体、ポリスチレンなどのポリビニル化合物、ポリメチル
メタクリレートなどのアクリル系付加重合体、ポリ炭酸
エステルから成るポリカーボネート、ウレタン系樹脂ま
たはゼラチンなど親水性バインダーなど公知のフィルム
形成性結合剤を挙げることができる。Preferably, a binder having excellent transparency and mechanical properties is used as the binder. Examples of such binders include polyesters represented by polyethylene terephthalate, cellulose esters such as cellulose diacetate, cellulose IJ acetate, and cellulose acetate butyrate;
-i Polyolefins such as Robylene, polyvinyl chloride, polyvinylidene chloride, vinyl chloride-vinyl acetate copolymers, polyvinyl compounds such as polystyrene, acrylic addition polymers such as polymethyl methacrylate, polycarbonates consisting of polycarbonate esters, urethanes Examples thereof include known film-forming binders such as resins and hydrophilic binders such as gelatin.
更に好ましくは透明性および機械的性質が優れている点
でセルロース) IJアセテートなどのセルロースエス
テル類を挙げることができる。More preferably, cellulose esters such as cellulose IJ acetate are preferred because of their excellent transparency and mechanical properties.
上述のプラスチック材料に前記一般式(I)の化合物を
添加、保持させてフィルムを形成する方法としては第一
にフィルム作成時にプラスチックス中に配合する方法が
ある。すなわち、式(I)の化合物を各種の添加剤と共
にポリマー粉末もしくははレットに混合し、溶融してT
ダイ法またはインフレーション法で押出すか、あるいは
カレンダー法でフィルム化すれば前記化合物が均一に分
散したフィルムが得られる。また流延法でポリマー溶液
からフィルムを製造する場合は該溶液中に前記一般式(
I)の化合物を含有させればよい。As a method for forming a film by adding and retaining the compound of general formula (I) to the above-mentioned plastic material, there is first a method of blending it into the plastic at the time of film production. That is, the compound of formula (I) is mixed with various additives into polymer powder or pellets, and then melted to form T.
A film in which the above compound is uniformly dispersed can be obtained by extruding by a die method or an inflation method, or by forming a film by a calendar method. In addition, when producing a film from a polymer solution by a casting method, the general formula (
The compound I) may be included.
第二には適当な方法で製造された各種のプラスチックフ
ィルムまたはガラス板上の表面に前記一般式(I)の化
合物を含むポリマー溶液捷たは分散液を塗布することに
よって近赤外線吸収層を形成する方法がある。塗布液に
用いる結合剤としては、一般式(I)の化合物をできる
だけよく溶解し、しかも支持体となるプラスチックフィ
ルムまたはガラス板との接着性のすぐれたものが選ばれ
る。ポリメチルメタクリレート、セルロースアセテート
ブチレート、ポリカーボネートなどがこの目的に適して
いる。接着性を向上させるために支持体フィルムに適当
な下塗りをあらかじめ施してもよい。Second, a near-infrared absorbing layer is formed by applying a polymer solution or dispersion containing the compound of general formula (I) to the surface of various plastic films or glass plates manufactured by an appropriate method. There is a way to do it. As the binder used in the coating solution, one is selected that dissolves the compound of general formula (I) as well as possible and has excellent adhesiveness to the plastic film or glass plate serving as the support. Polymethyl methacrylate, cellulose acetate butyrate, polycarbonate, etc. are suitable for this purpose. The support film may be previously coated with a suitable primer to improve adhesion.
第三の方法としては、赤外線をカットされるべき素子の
光入射窓枠中に一般式(+)の化合物と主合成モノマー
を混合し、適当な重合開始剤を加え、熱または光を加え
て重合させ、生成したポリマーで窓枠にフィルターを形
成せしめる方法がある。この方法では、素子全体をエチ
レン性不飽和型重合性モノマーまたはエポキシ樹脂など
の重付加性組成物から生成するプラスチックスで包埋す
ることもできる。The third method is to mix the compound of general formula (+) and the main synthetic monomer in the light incident window frame of the element that is to be blocked from infrared rays, add an appropriate polymerization initiator, and apply heat or light. There is a method of polymerizing and forming a filter on the window frame using the resulting polymer. In this method, the entire device can also be embedded in plastics made from ethylenically unsaturated polymerizable monomers or polyaddition compositions such as epoxy resins.
第四の方法は、本発明に係る化合物(I)を適当な支持
体上に蒸着する方法である。この方法ではさらに保護層
として適当なフィルム形成性結合剤層を支持体より遠い
位置に設けてもよい。The fourth method is a method in which the compound (I) according to the present invention is vapor-deposited on a suitable support. In this process, a suitable film-forming binder layer may also be provided as a protective layer at a position remote from the support.
本発明の近赤外線吸収組成物より得られた光学フィルタ
ーは、特開昭j?−2ff/θ7号、同!ター93/7
号および同!9−30!09号に記載された如き色分離
フィルターに組合せて使用することもできる。The optical filter obtained from the near-infrared absorbing composition of the present invention is disclosed in JP-A-Shoj? -2ff/θ7, same! Tar 93/7
No. and same! It can also be used in combination with a color separation filter such as that described in No. 9-30!09.
本発明の近赤外線吸収組成物を光学フィルターとして用
いる場合は前記一般式(I)で表わされる化合物を2種
以上併用してもよい。When the near-infrared absorbing composition of the present invention is used as an optical filter, two or more compounds represented by the general formula (I) may be used in combination.
特に、吸収波長域の拡大などを改良するだめに下記一般
式(It)で表わされる化合物の添加が好ましい。In particular, in order to improve the expansion of the absorption wavelength range, it is preferable to add a compound represented by the following general formula (It).
一般式(n)
式中R8、R9、RIO、RN 、 R12、R13゜
RI4及びR15は水素原子、ハロゲン原子(例えば塩
素、臭素など)または直接もしくは2価の連結基(例え
ば−〇−、−NHCO−、−CO−。General formula (n) In the formula, R8, R9, RIO, RN, R12, R13゜RI4 and R15 are hydrogen atoms, halogen atoms (e.g. chlorine, bromine, etc.) or direct or divalent linking groups (e.g. -〇-, - NHCO-, -CO-.
−COO−、−8O2−、−NHCOO−、−NHCO
NH−。-COO-, -8O2-, -NHCOO-, -NHCO
NH-.
−NH8O2−など)を介してベンゼン環に結合した置
換もL <は無置換のアルキル基(例えばメチル基、エ
チル基、プロピル基、n−オクチル基など)を表わし、
Mはニッケル、コバルト、銅、パラジウムまたは白金を
表わし、好まL <はニッケルを表わす。-NH8O2-, etc.), L< represents an unsubstituted alkyl group (e.g., methyl group, ethyl group, propyl group, n-octyl group, etc.),
M represents nickel, cobalt, copper, palladium or platinum, preferably L< represents nickel.
cat Iriカチオン(例えばナトリウム、カリウム
、アンモニウム、第9級アンモニウム、第&級ホスホニ
ウムなど)を表わし、好ましくはI
ラムを表わし、更に好ましくは第9級ホスホニウムを表
わす。cat Iri cation (for example, sodium, potassium, ammonium, 9th ammonium, &th grade phosphonium, etc.), preferably I ram, more preferably 9th phosphonium.
L 1 、 L 2 、 L 3及びL4は炭素数/〜
20の置換もしくは無置換のアルキル基(例えばメチル
基、エチル基、n−ブチル基、n−ドデシル基、n−オ
クタデシル基など)又は炭素数2〜/4tの置換もしく
は無置換のアリール基(例えばフェニル基、トリル基、
α−ナフチル基など)を表わす。L 1 , L 2 , L 3 and L4 have carbon numbers/~
20 substituted or unsubstituted alkyl groups (e.g. methyl group, ethyl group, n-butyl group, n-dodecyl group, n-octadecyl group, etc.) or substituted or unsubstituted aryl groups having 2 to 4t carbon atoms (e.g. phenyl group, tolyl group,
α-naphthyl group, etc.).
前記一般式([1)で表わされる化合物のうち好ましい
ものを例示すれば次の通りであるが、本発明はこれらの
例示化合物に限定されるものではないことはもちろんで
ある。Preferred examples of the compounds represented by the general formula ([1)] are as follows, but it goes without saying that the present invention is not limited to these exemplified compounds.
(II−/)
(■−認)
(n、?)
(II−1
(n−1)
(■−に)
(n−7)
(■−♂)
(n−9)
B−10)
(II−//)
(n −/′コ)
(II−/3)
(I−/j)
(II−#)
(n−/7)
(II−//)
(■−/り)
(■−コθ)
(II−,2/)
(If−2−2)
F−一一一−ハ
工
本発明の近赤外線吸収組成物を光学フィルターとして用
いる場合は、!00〜≦o o nmの波長の光を実質
的に透過することが好ましい。更に、紫外線吸収剤を併
用しても良く、レゾルシフモノベンゾエート、サリチル
酸メチルなどの置換または無置換安息香酸エステル類、
コーオキシー3−メトキシケイ皮酸ブチルなどのケイ皮
酸エステル&−2.&−ジオキシベンゾフェノンなどの
ベンゾフェノン類、ジベンザルアセトンなどのα、β−
不飽和ケトン、!、7−シオキシクマリンなどのクマリ
ン類、/、4t−ジメチル−7−オキシカルボスチリル
などのカルボスチリル類、コーフェニルペンゾイミダゾ
ール、X−(、Z−ヒドロキンフェニル)ベンゾトリア
ゾールなどのアゾール類などが使用される。更に本発明
の近赤外線吸収組成物においては、黄色染料、シアン染
料を併用することができる。(II-/) (■-acknowledgement) (n,?) (II-1 (n-1) (■-ni) (n-7) (■-♂) (n-9) B-10) (II -//) (n -/'ko) (II-/3) (I-/j) (II-#) (n-/7) (II-//) (■-/ri) (■-ko θ) (II-,2/) (If-2-2) F-111-C When the near-infrared absorbing composition of the present invention is used as an optical filter,! It is preferable that light having a wavelength of 00 to ≦o nm is substantially transmitted. Furthermore, ultraviolet absorbers may be used in combination, such as substituted or unsubstituted benzoic acid esters such as resolcif monobenzoate and methyl salicylate;
Cinnamate esters such as butyl co-oxy-3-methoxycinnamate &-2. &-benzophenones such as dioxybenzophenone, α, β- such as dibenzalacetone, etc.
Unsaturated ketones! , coumarins such as 7-cyoxycoumarin, carbostyrils such as 4t-dimethyl-7-oxycarbostyryl, azoles such as cophenylpenzimidazole, X-(,Z-hydroquinphenyl)benzotriazole etc. are used. Furthermore, in the near-infrared absorbing composition of the present invention, a yellow dye and a cyan dye can be used in combination.
まだ本発明の近赤外線吸収性組成物を用いてコーティン
グ法で作成したフィルムの場合は、コーティング層の保
護、流滴性の付与などの目的でコーティング層の表面に
薄いプラスチックフィルムを貼り合わせたり、塗設した
りすることができる。In the case of a film made by a coating method using the near-infrared absorbing composition of the present invention, a thin plastic film may be attached to the surface of the coating layer for the purpose of protecting the coating layer, imparting droplet properties, etc. It can be painted.
例えば0.θtmm厚のポリ塩化ビニルフィルムを重ね
て/20〜/(70°CK加熱圧着すると積層状のフィ
ルムが得られる。For example 0. A laminated film is obtained by stacking polyvinyl chloride films with a thickness of θtmm and heat-pressing them at /20 to /(70°C).
本発明の近赤外線吸収組成物を光学フィルターとして用
いる場合は、前記一般式(I)で表わされる化合物を結
合剤700部当り重量で0.7〜!θ部、好ましくは0
.1〜10部含有させる。When the near-infrared absorbing composition of the present invention is used as an optical filter, the compound represented by the general formula (I) is added in a range of 0.7 to 700 parts by weight per 700 parts of the binder. θ part, preferably 0
.. Contain 1 to 10 parts.
本発明の近赤外線吸収組成物より得られる光学フィルタ
ーはその機能上遮断すべき波長域の透過率が所期の目的
を達成しつる程度に低ければよく、本発明の組成物を用
いるには、波長72θnm以上において、透過率が/θ
チ以下好ましくは2゜0%以下、特に好ましくは0.7
%以下の透過率となるように、結合剤当りの添加量およ
びフィルターの厚みを調節することが肝要である。更に
!00〜にoonmにおいて透過率が少くとも!チ以上
、好ましくは70%以上、特に好ましくは一〇チ以上有
することが好ましい。実用的な厚さは0.002mmな
いしθ、、tmmであるが、用途に応じこの範囲外の厚
さのフィルターにも設計可能である。The optical filter obtained from the near-infrared absorbing composition of the present invention only needs to have a transmittance in the wavelength range that should be blocked functionally as low as to achieve the intended purpose. At wavelengths of 72θnm and above, the transmittance is /θ
preferably 2.0% or less, particularly preferably 0.7%
It is important to adjust the amount added per binder and the thickness of the filter so that the transmittance is less than or equal to %. Even more! The transmittance is at least 00 to oonm! It is preferable to have at least 70%, preferably at least 70%, particularly preferably at least 100%. The practical thickness is 0.002 mm to θ, tmm, but it is possible to design a filter with a thickness outside this range depending on the application.
次に本発明の近赤外線吸収性組成物をレーザーによる光
記録媒体に用いる場合の実施態様を説明する。Next, an embodiment in which the near-infrared absorbing composition of the present invention is used in a laser-based optical recording medium will be described.
光記録媒体は基本的には基板と記録層とから構成される
ものであるが、さらに目的に応じて基板上に下引き層を
また記録層上に保護層を設けることができる。An optical recording medium basically consists of a substrate and a recording layer, but depending on the purpose, an undercoat layer can be provided on the substrate and a protective layer can be provided on the recording layer.
基板としては使用レーザに対して透明であれば既知のも
のを任意に使用することができる。その代表的な例には
ガラスまたはプラスチックがあり、プラスチックとして
はアクリル、ポリカーボネート、ポリスルホン、ポリイ
ミド、ポリエステルなどが用いられる。その形状はディ
スク状、カード状、シート状、ロールフィルム状など種
々のものが可能である。Any known substrate can be used as long as it is transparent to the laser used. Typical examples include glass or plastic, and examples of the plastic include acrylic, polycarbonate, polysulfone, polyimide, and polyester. Its shape can be various, such as a disk, card, sheet, or roll film.
ガラスまたはプラスチック基板には記録時のトラッキン
グを容易にするために案内溝を形成させてもよい。また
ガラスまだはプラスチック基板にはプラスチックバイン
ダーまだは無機酸化物、無機硫化物などの下引き層を設
けてもよい。基板よりも熱伝導率の低い下引き層が好ま
しい。A guide groove may be formed on the glass or plastic substrate to facilitate tracking during recording. Further, a subbing layer of a plastic binder, an inorganic oxide, an inorganic sulfide, or the like may be provided on the glass or plastic substrate. An undercoat layer having a lower thermal conductivity than the substrate is preferred.
記録層は、近赤外線吸収剤単独またはそれと他の材料と
の組合せそれ自体により構成されるもの、あるいは反射
層と前記近赤外線吸収剤を含有する光吸収層によって構
成されるものに分けられる。The recording layer is divided into one consisting of a near-infrared absorber alone or a combination thereof with other materials, and one consisting of a reflective layer and a light-absorbing layer containing the near-infrared absorber.
この近赤外線吸収剤単独またはそれと他の材料との組合
せによって構成される記録層は核近赤外線吸収剤を溶媒
に溶解させ、塗布する方式や基板に蒸着する方式、樹脂
溶液と混合して塗布する方式、他の色素との混合溶液を
塗布する方式、他の色素とともに樹脂溶液に溶解させて
塗布する方式などによって形成される。The recording layer composed of this near-infrared absorber alone or in combination with other materials can be prepared by dissolving the nuclear near-infrared absorber in a solvent and applying it, by vapor depositing it on a substrate, or by mixing it with a resin solution and applying it. It is formed by a method of coating a mixed solution with other pigments, a method of dissolving it together with other pigments in a resin solution, and applying it.
樹脂としては、PVAX PVP、ポリビニルブチラー
ル、ポリカーボネート、ニトロセルロース、ホリビニル
ホルマール、メチルビニルエーテル、無水マレイン酸共
重合体、スチレン−ブタジェン共重合体等既知のものが
用いられ、近赤外線吸収性組成物中における樹脂に対す
る前記一般式(I)で表わされる近赤外線吸収剤の重量
比は0,07以上であることが望捷しい。他の色素、例
えばトリアリールメタン系色素、メロシアニン色素、シ
アニン色素、アゾ色素、アントラキノン色素など半導体
レーザの波長域以外に吸収をもつものを用いると、半導
体レーザだけでな(、He−Neレーザなどでも記録で
きるので好適である。Known resins such as PVAX PVP, polyvinyl butyral, polycarbonate, nitrocellulose, polyvinyl formal, methyl vinyl ether, maleic anhydride copolymer, and styrene-butadiene copolymer are used as the resin, and in the near-infrared absorbing composition. It is desirable that the weight ratio of the near-infrared absorbent represented by the general formula (I) to the resin is 0.07 or more. When using other dyes, such as triarylmethane dyes, merocyanine dyes, cyanine dyes, azo dyes, and anthraquinone dyes, which have absorption outside the wavelength range of the semiconductor laser, it is possible to However, it is suitable because it can be recorded.
この記録層は7層又は2層以上設ける。Seven or more recording layers are provided.
記録層の膜厚け、通常0.07μm〜7μm1好ましく
はθ、O♂〜0.tμmの範囲である。The thickness of the recording layer is usually 0.07 μm to 7 μm, preferably θ, O♂ to 0. It is in the range of tμm.
反射読出しの場合は特に好ましくは読出しに使用するレ
ーザ波長の//<tの奇数倍である。In the case of reflective readout, it is particularly preferably an odd multiple of //<t of the laser wavelength used for readout.
半導体レーザまたはHe−Neレーザなどの反射層を設
ける場合は、基板に反射層を設は次の二の反射層の上に
前述したような方式によって記録層を設けることによる
か、あるいは基板に記録層を設け、次いでこの上に反射
層を設けるかのいずれかの方法がある。When providing a reflective layer for a semiconductor laser or a He-Ne laser, the reflective layer can be provided on the substrate by providing a recording layer on the next two reflective layers using the method described above, or by forming a recording layer on the substrate. One of the methods is to provide a layer and then provide a reflective layer thereon.
反射層は蒸着法、スパッタリング法、イオンブレーティ
ング法などの他の次のような方法によっても作ることが
できる。The reflective layer can also be formed by other methods such as vapor deposition, sputtering, and ion blating.
例えば水浴性樹脂(PVP、PVAなど)に金属塩また
は、金属錯塩を溶解させ、さらに、還元剤を加えた溶液
を基板に塗布し、!08C〜/!00C好ましくは≦0
0C〜7008Cで加熱乾燥させることによって形成さ
れる。For example, a metal salt or a metal complex salt is dissolved in a water bath resin (PVP, PVA, etc.), and a reducing agent is added to the solution, and the solution is applied to the substrate! 08C~/! 00C preferably ≦0
It is formed by heating and drying at 0C to 7008C.
樹脂に対する金属塩または金属錯塩の清はM量比でθ2
/〜10好捷しくは0.j〜7.5である。この際、記
録層の膜厚は金属粒子反射層が0゜0/〜0.1μmで
ありそして光吸収層が0.07〜7μmの範囲が適当で
ある。The purity of metal salt or metal complex salt to resin is M amount ratio θ2
/~10 preferably 0. j~7.5. In this case, the appropriate thickness of the recording layer is 0.0/-0.1 .mu.m for the metal particle reflective layer and 0.07-7 .mu.m for the light absorption layer.
金属塩まだは金属錯塩としては、硝酸銀、シアン化銀カ
リウム、シアン化金カリウム、銀アンミン錯体、銀シア
ン錯体、金塩または金シアン錯体などを使用できる。還
元剤としてはホルマリン、酒石酸、酒石酸塩、還元剤、
次亜燐酸塩、水素化硼素ナトリウム、ジメチルアミンボ
ランなどを使用できる。還元剤は金属塩または金属錯塩
1モルに対しθ、i〜70モル好ましくは0.5〜1モ
ルの範囲で使用できる。As the metal salt or metal complex salt, silver nitrate, potassium silver cyanide, potassium gold cyanide, silver ammine complex, silver cyanide complex, gold salt, or gold cyanide complex can be used. As a reducing agent, formalin, tartaric acid, tartrate, reducing agent,
Hypophosphite, sodium borohydride, dimethylamine borane, etc. can be used. The reducing agent can be used in an amount of θ, i to 70 mol, preferably 0.5 to 1 mol, per mol of the metal salt or metal complex salt.
光記録媒体において、情報の記録はレーザなどのスポッ
ト状の高エネルギービームを基板を通しであるいは基板
と反対側より記録層に照射することにより行われ、記録
層に吸収された光が熱に変換され、記録層にピット(穴
)が形成される。In optical recording media, information is recorded by irradiating the recording layer with a spot-shaped high-energy beam such as a laser through the substrate or from the opposite side of the substrate, and the light absorbed by the recording layer is converted into heat. and pits (holes) are formed in the recording layer.
また情報の読み出しはレーザビームを記録の閾値エネル
ギー以下の低出力で照射し、ピット部とピットが形成さ
れていない部分の反射光量の変化により検出する。Further, information is read by irradiating a laser beam with a low output power below a recording threshold energy, and detecting a change in the amount of reflected light from a pit portion and a portion where no pits are formed.
次に本発明の赤外線吸収性組成物をインクジェットイン
ク゛に用いる場合の実施態様について述べる。Next, embodiments in which the infrared absorbing composition of the present invention is used in inkjet inks will be described.
有機溶剤を溶媒に用いるインクジェットプリンタ用イン
クは主に静電加速型、静電空気流式などに用いられ、い
ずれもインクに高圧パルスを印加してインク流またはイ
ンク小滴の形成を可能にさせねばならない。これてはイ
ンクの電気的性質のみならず、表面張力、粘度などの流
動性に関係する物性値も問題となり、特開昭4t?−6
093,f号や特開昭rt−i3stter号公報に記
載されている方法に準じて実施することができる。Inkjet printer inks that use organic solvents as solvents are mainly used in electrostatic acceleration type and electrostatic air flow type, both of which apply high-pressure pulses to the ink to enable ink flow or ink droplet formation. Must be. This is a problem not only with the electrical properties of the ink but also with physical properties related to fluidity such as surface tension and viscosity. -6
It can be carried out according to the method described in No. 093, f and Japanese Patent Application Laid-open No. Sho rt-i3stter.
インクジェットプリンタ用インクとしては、近赤外線吸
収剤を用い、溶剤としてはエチルセロノルブ、トルエン
、エタノール、n−ブタノール、エチルメチルケトン、
メチルイソブチルケトン、ジクロルメタン、トリエタノ
ールアミン、ジメチルホルムアミド、イソアミルアセテ
ートなどに代表される有機溶剤を用い、これに粘度調節
のためにグリセリン、金属石鹸などを加える。The ink for inkjet printers uses a near-infrared absorber, and the solvents include ethylcelonorb, toluene, ethanol, n-butanol, ethyl methyl ketone,
Organic solvents such as methyl isobutyl ketone, dichloromethane, triethanolamine, dimethylformamide, and isoamyl acetate are used, and glycerin, metallic soap, etc. are added to adjust the viscosity.
含有量は粘度が常温で/θCp、以下、比抵抗が/×7
04〜/ X / 011Ω・Cmになるように有機溶
剤と粘度調節剤の組成比を選ぶ。The content is viscosity at room temperature /θCp, below, specific resistance is /×7
The composition ratio of the organic solvent and the viscosity modifier is selected so that it becomes 04~/X/011Ω·Cm.
溶剤に対する近赤外線吸収剤の含有比は溶剤/重量部に
対し、近赤外線吸収剤0.07〜0.2部であり、常県
において好ましくは溶解し、あるいは少なくとも平均粒
径θ、!μm以下に微分散していなければならない。場
合によっては該インク中に可視光線を吸収する色素も加
えてよい。The content ratio of the near-infrared absorber to the solvent is 0.07 to 0.2 part of the near-infrared absorber to solvent/part by weight, and preferably dissolves or at least has an average particle diameter of θ,! It must be finely dispersed to micrometers or less. In some cases, a dye that absorbs visible light may also be added to the ink.
本発明の近赤外線吸収組成物は有機もしくは金属錯体系
の公知の近赤外線吸収剤と併用することもできる。特に
吸収極大の異なった吸収剤と併用すると、吸収波長域を
広げることができる。The near-infrared absorbing composition of the present invention can also be used in combination with known organic or metal complex based near-infrared absorbers. In particular, when used in combination with absorbers having different absorption maximums, the absorption wavelength range can be expanded.
本発明の化合物は単独で用いても十分耐光性が高いが、
更に耐光性を高めるために特開昭!0−と2にゲタ、特
開昭!グー6.2♂2乙、特開昭!グー乙コ9/7、特
開昭!グー3j/♂よ、特開昭!グーご9よ♂θ、特開
昭!4’−72770、特開昭!グーr223’lX特
開昭!q−!コ3♂y1特開昭!グー?23rj、特開
昭!グー♂23/に、US−<t2に♂にθ!、US−
e、3乙330、特開昭!!−/コ/29、特開昭j≦
−/に7/3♂及び本出願人による昭和6/年7月2q
日(A)出願の「有機基体物質を光に対して安定化する
方法」の明細書に記載されている金属錯体と併用するこ
ともできる。Although the compound of the present invention has sufficiently high light resistance even when used alone,
In order to further increase light resistance, use Tokkai Sho! Tokukai Akira gets 0- and 2! Goo 6.2♂2 Otsu, Tokukai Akira! Gootsuko 9/7, Tokukai Akira! Goo 3j/♂, Tokukai Akira! Goo 9yo♂θ, Tokukai Akira! 4'-72770, Tokukai Sho! Goo r223'lX Tokukaisho! q-! Ko3♂y1 Tokukai Akira! Goo? 23rj, Tokukai Sho! Goo ♂23/, US-<t2, θ! , US-
e, 3 Otsu 330, Tokukai Sho! ! -/ko/29, Tokukai Shoj≦
-/7/3♂ and July 2q, 1939 by the present applicant
It can also be used in combination with a metal complex described in the specification of ``Method for stabilizing an organic substrate substance against light'' filed in Japan (A).
「発明の効果」
本発明によれば、光を実質的に透過し2且つ7コθnm
以上の近赤外線吸収組成物を得ることができるので光お
よび熱に対する堅牢性の優れる光学フィルターを得るこ
とができ、低コストの光学フィルターとすることができ
る。"Effects of the Invention" According to the present invention, light can be substantially transmitted and
Since the above near-infrared absorbing composition can be obtained, an optical filter with excellent fastness to light and heat can be obtained, and a low-cost optical filter can be obtained.
さらに本発明の近赤外線吸収組成物においては、前記一
般式(I)で表わされる化合物中の置換基を適宜選択し
、組合わせることにより溶剤に対する溶解性を調節でき
るので各種の結合剤を幅広く採用できるという利点を有
する。Furthermore, in the near-infrared absorbing composition of the present invention, the solubility in solvents can be adjusted by appropriately selecting and combining the substituents in the compound represented by the general formula (I), so that a wide variety of binders can be used. It has the advantage of being able to
本発明の近赤外線吸収組成物より得られる光学フィルタ
ーは近赤外線吸収材料として、赤外感光性の感材用セー
フライトフィルター、植物の生育の制御、熱線の遮断、
人間の目の組織に有害な赤外線カットフィルター、半導
体受光素子カラー固体撮像素子の赤外線カットフィルタ
ー用、電気と同時に光学的機能をもった素子を一緒に同
一基板上に組込んだオプトエレクトロ二ツク集積回路で
の赤外光カットフィルター用の外、各種の用途に用いる
ことができる。The optical filter obtained from the near-infrared absorbing composition of the present invention can be used as a near-infrared absorbing material, as a safelight filter for infrared-sensitive materials, for controlling plant growth, for blocking heat rays,
Infrared cut filters that are harmful to human eye tissues, infrared cut filters for semiconductor photodetectors and color solid-state image sensors, optoelectronic integrated devices that incorporate electrical and optical functions on the same substrate. In addition to being used as an infrared light cut filter in circuits, it can be used for a variety of other purposes.
さらにまた、本発明に係る組成物は、レーザーによる記
録媒体及びインクジェットプリンタ用インキに用いるこ
とができる。Furthermore, the composition according to the present invention can be used in laser recording media and inks for inkjet printers.
また本発明の組成物は吸収した近赤外光を熱に変換する
性質を有し、赤外線/熱交換剤としても利用できる。典
型例を挙げると、/)特開昭57−/グθ9!号または
同オアー/グoqt号に記載されたようなレーザー感熱
記録体に添加して、赤外域レーザーを照射し発生する熱
でひき起こされる混合発色反応を高めることができる。Furthermore, the composition of the present invention has the property of converting absorbed near-infrared light into heat, and can also be used as an infrared/heat exchange agent. A typical example is /) JP-A-57-/gθ9! It can be added to a laser heat-sensitive recording medium as described in the Orr/Gu OQT issue to enhance the mixed color reaction caused by the heat generated by irradiation with an infrared laser.
コ)レーザー光に基づく熱の作用により溶解性が変化す
るような、例えば特開昭オ?−4t02jrg号に記載
したレジスト材料に含有させることができる3)特開昭
!に一/4t324tコ号に記載されたような、熱乾燥
性または熱硬化性の組成物に本発明の化合物を含有せし
めると反応を促進させることができる。e) For example, JP-A Showo, whose solubility changes due to the action of heat based on laser light? -4t02jrg No. 3) JP-A-Sho! The reaction can be accelerated by incorporating the compound of the present invention into a heat-drying or thermosetting composition as described in No. 1/4t324t.
本発明に係る化合物はさらにまた特開昭!!−2/’l
/62号に記載されたように、半導体レーザーを光源と
した電子写真方式プリンターの電子写真用感光皮膜にも
利用できる。壕だ電子写真のトナー組成物に含有させて
熱定着性を改善することもできる。The compounds according to the present invention are also disclosed in JP-A-Sho! ! -2/'l
As described in No. 62, it can also be used as an electrophotographic photosensitive film for an electrophotographic printer using a semiconductor laser as a light source. It can also be incorporated into toner compositions for electrophotography to improve heat fixability.
上記の記載は本発明に係る化合物の使用用途を制限する
ものではないのはもちろんである。Of course, the above description does not limit the uses of the compounds according to the present invention.
「実施例」
次に本発明を実施例に基づきさらに詳細に説明する。な
お、重量を示す「部」は「重量部」を示す。"Examples" Next, the present invention will be described in more detail based on Examples. Note that "parts" indicating weight indicate "parts by weight."
実施例/
例示化合物1−tを用い下記の近赤外線吸収組成物を調
製し光学フィルターを作成した。すなわち、下に重量部
で示した組成で各成分を混合しよく攪拌してから、ろ通
抜、金属の支持体上に流延法により塗布して製膜後剥離
し、目的とする光学フィルターを得た。乾燥膜厚をθ、
Oコないし0゜3mmの間で変化させた数株の光学フィ
ルターを得た。このようにして得られた光学フィルター
(厚さ2!ミクロン)の光学濃度を第1図に示した。Example/ An optical filter was prepared by preparing the following near-infrared absorbing composition using Exemplified Compound 1-t. That is, each component is mixed with the composition shown below in parts by weight, stirred thoroughly, filtered, and coated on a metal support by a casting method. After film formation, the desired optical filter is peeled off. I got it. The dry film thickness is θ,
Several optical filters were obtained, varying in diameter from 0° to 0°3 mm. The optical density of the optical filter thus obtained (thickness: 2! microns) is shown in FIG.
三酢酸セルロース 720部トリフェ
ニルホスフエイ) 10部メチレンクロ
リド ♂00部メタノール
/にθ部例示化合物(I−5)
2部第7図かられかるように、可視光域は
透過率が高く近赤外線の透過率が低い光学フィルターが
得られた。Cellulose triacetate 720 parts triphenylphosphatide) 10 parts methylene chloride ♂00 parts methanol
/ to θ part Exemplary compound (I-5)
As can be seen from Figure 7 of Part 2, an optical filter with high transmittance in the visible light range and low transmittance in near-infrared light was obtained.
実施例2
実施例/と同様にして、一般式(I)で表わされる化合
物に加えて一般式(II)で表わされる化合物を含有す
る厚さ0.16mmの光学フィルターを作成した。流延
組成物の組成は下記に示した。Example 2 An optical filter with a thickness of 0.16 mm containing a compound represented by general formula (II) in addition to the compound represented by general formula (I) was prepared in the same manner as in Example. The composition of the casting composition is shown below.
このようにして得られた光学フィルターの光学濃度を第
2図に示しだ。The optical density of the optical filter thus obtained is shown in FIG.
三酢酸セルロース 770部トリフェ
ニルホスフェイト 70部メチレンクロリド
?0θ部メタノール
/にθ部例示化合物(l−オ)
2部例示化合物(U−3)
2物@2図かられかるように、実施例/と同様に近赤
外線の透過率が低い光学フィルターが得られた。Cellulose triacetate 770 parts Triphenyl phosphate 70 parts Methylene chloride ? 0θ part methanol
/ to θ part Exemplary compound (l-o)
Part 2 Exemplary Compound (U-3)
As can be seen from Fig. 2, an optical filter with low near-infrared transmittance was obtained similarly to Example.
実施例3
例示化合物(I−t)o、2部
油溶性青色染料 0.7部エチルセ
ロソルブ !部/、2−ペンツイ
ンチアゾロ
ン(防カビ剤) 0.007部グリセリン
3部上記成分を均質に混合し
、得られた組成物は、比抵抗103Ω・cm粘度tcp
、である。このインク組成物をインクジェット記録装置
にかけ、良好な画像が得られ、これは半導体レーザ(7
♂0nm )を光源とする読取装置で読取りが可能であ
った。Example 3 Exemplified Compound (I-t)o, 2 parts Oil-soluble blue dye 0.7 parts Ethyl cellosolve! Part/2-Pentinthiazolone (antifungal agent) 0.007 parts Glycerin 3 parts The above components were mixed homogeneously, and the resulting composition had a specific resistance of 103 Ω·cm and a viscosity of tcp.
, is. This ink composition was applied to an inkjet recording device, and a good image was obtained, which was obtained using a semiconductor laser (7
It was possible to read it with a reading device using a light source of ♂0 nm).
実施例グ
イソアミルアセテート 7部例示化合
物(I−t)o、7部
油溶性染料(オイルブラック
HBB) o、を部金属セッケ
ン 0.0μ部上記成分を均質に混
合し、得られたインク組成物は、比抵抗/θ7Ω・am
粘度4tcp、でインクジェット記録装置にかけ良好な
画像が得られ、これは半導体レーザ(2♂θnm )を
光源とする読取装置で読取りが可能であった。Example Guisoamyl acetate 7 parts Illustrative compound (I-t) 7 parts Oil-soluble dye (Oil Black HBB) 0.0 parts Metal soap 0.0 μ part Ink composition obtained by homogeneously mixing the above components is specific resistance/θ7Ω・am
A good image was obtained by applying it to an inkjet recording device with a viscosity of 4 tcp, which could be read by a reading device using a semiconductor laser (2♂θnm) as a light source.
実施例よ
例示化合物(■−32) o、qgニトロ
セルロース Ooにgジクロルメタン
7 ml上記組成の溶液をガ
ラス板に回転塗布し、り00Cで乾燥し、厚さ0.<1
0μmの記録層を得た。Example: Illustrated Compound (■-32) o, qg Nitrocellulose Oo, g Dichloromethane 7 ml A solution of the above composition was spin-coated on a glass plate, dried at 00C, and the thickness was 0. <1
A recording layer of 0 μm was obtained.
波長7♂onmにおける反射率および吸収率はそれぞれ
72%および3θチであった。The reflectance and absorption at a wavelength of 7♂onm were 72% and 3θ chi, respectively.
こうして得られた記録媒体に波長7♂onm、照射面で
amW、ビーム径75zμmの半導体レーザで/MHz
で信号を記録したところ、0.qμ秒の照射(/、乙n
J/pit)で直径/、/μmのピットが形成された。The thus obtained recording medium was heated with a semiconductor laser having a wavelength of 7♂onm, amW on the irradiation surface, and a beam diameter of 75zμm/MHz.
When I recorded the signal, it was 0. qμ seconds of irradiation (/,
A pit with a diameter of /, /μm was formed with J/pit).
この記録媒体を温度に0°C1室内光中、湿度90チで
77月保存したが、記録および読み出しの特性の変化は
なかった。This recording medium was stored for 77 months at a temperature of 0° C. in room light and a humidity of 90° C., but there was no change in the recording and reading characteristics.
実施例乙
例示化合物(I−/) 0.7gポリカ
ーボネート樹脂 /、θgC,1,アシ
ッドブルー♂3
(C,1,グコに3θ) i、2g7.2
−ジクロルエタン /2ml上記組成の溶
液を表面硬化したアクリル板に回転塗布し、ぶ00Cで
乾燥し厚さ0.9μmの記録層を得た。波長?θθnm
における反射率および吸収率はそれぞれ72チおよび2
2%であった。Example B Illustrated compound (I-/) 0.7g polycarbonate resin /, θgC, 1, acid blue ♂3 (C, 1, 3θ in Guco) i, 2g 7.2
-Dichloroethane/2 ml A solution having the above composition was spin-coated onto a surface-hardened acrylic plate and dried at 00C to obtain a recording layer with a thickness of 0.9 μm. wavelength? θθnm
The reflectance and absorption at are 72 and 2, respectively.
It was 2%.
また波長乙3θnmにおける反射率および吸収率はそれ
ぞれ77%および!♂チであった。この記録媒体を照射
面でgmW、ビーム径7.6μmの波長!θ0nmの半
導体レーザビームで0.41MHzで信号を記録したと
ころ7.0μ秒の照射(に、0nJ/pit)で直径7
.0μmのビットが形成された。またこの記録媒体にH
e −N eレーザを用いてビーム径/3gμm記録面
でのエネルギ−smWで、りMHzの信号を記録[〜だ
ところ0.qμ秒の照射(/、t nJ/pit)で/
。In addition, the reflectance and absorption rate at the wavelength O3θnm are 77% and ! It was a male. This recording medium has a wavelength of gmW on the irradiation surface and a beam diameter of 7.6 μm! When a signal was recorded at 0.41 MHz with a semiconductor laser beam of θ0 nm, a diameter of 7
.. A bit of 0 μm was formed. Also, this recording medium
An e-N e laser was used to record a MHz signal with a beam diameter of 3 gμm and an energy of smW on the recording surface [~0. With qμ seconds of irradiation (/, t nJ/pit)/
.
0μmのピントが形成された。A focus of 0 μm was formed.
実施例!と同様にして保存テストを行ったが特性の変化
はなかった。Example! A storage test was conducted in the same manner as above, but there were no changes in characteristics.
実施例2
例示化合物(I−j) 0.9gニト
ロセルロース 0.7gジクロルメタ
ン =θml上記組成の塗布液を
ガラス板に回転塗布し、グθ0Cで乾燥し、厚さθ、4
tQμmの記録層を得た。波長7 J’ Onmにおけ
る反射率および吸収率はそれぞれ/乙チおよびに0%で
あった。Example 2 Exemplified Compound (I-j) 0.9 g Nitrocellulose 0.7 g Dichloromethane = θml A coating solution with the above composition was spin coated on a glass plate, dried at θ0C, and the thickness was θ, 4
A recording layer of tQ μm was obtained. The reflectance and absorption at a wavelength of 7 J' Onm were 0% and 0%, respectively.
こうして得られた記録媒体に波長7♂o nm 。The recording medium thus obtained had a wavelength of 7♂o nm.
照射面でymW、ビーム径/、乙μmの半導体レーザで
/MH2で信号を記録したところ、θ、3μ秒の照射(
/、コnJ/pit)で直径7.0μmのピットが形成
された。この記録媒体を温度にθQC1室内光中、湿度
90%で/ケ月保存したが、記録および読み出しの特性
の変化はなかつた。When a signal was recorded on the irradiation surface with a semiconductor laser of ymW and a beam diameter of /, μm at /MH2, it was found that the irradiation time of θ, 3 μs (
/, nJ/pit), a pit with a diameter of 7.0 μm was formed. This recording medium was stored at a temperature of θQC1 in room light and humidity of 90% for several months, but there was no change in the recording and reading characteristics.
実施例!
例示化合物 1−s 0.9gポリカ
ーボネート樹脂 θ、7gC,1,アシ
ッドプル=♂3
(C,1,4t、!に3θ) /・−2g/
Iコージクロルエタン /コml上記組成
の溶液を表面硬化したアクリル板に回転塗布し、600
Cで乾燥し厚さo、4tμmの記録層を得た。波長7
f Onmにおける反射率および吸収率はそれぞれハI
および59%であった。Example! Exemplary compound 1-s 0.9g Polycarbonate resin θ, 7gC, 1, acid pull = ♂3 (C, 1,4t, ! to 3θ) /・-2g/
Codichloroethane/comml A solution of the above composition was spin-coated on a surface-hardened acrylic plate, and
After drying at C., a recording layer having a thickness of o and 4t .mu.m was obtained. wavelength 7
The reflectance and absorption at f Onm are respectively
and 59%.
また波長≦30 nmにおける吸収率はそれぞれ73%
および60%であった。この記録媒体を照射面で+mW
、 ビーム径/、6μmの波長71θnmの半導体レ
ーザビームでO,gMHzで信号を記録したところθ、
3μ秒の照射(/、rnJ/pit)で直径/、0μm
のピットが形成された。In addition, the absorption rate at wavelength ≦ 30 nm is 73%.
and 60%. +mW on the irradiated surface of this recording medium
, When a signal was recorded at O, gMHz using a semiconductor laser beam with a beam diameter of 6 μm and a wavelength of 71 θ nm, θ,
Diameter /, 0 μm with 3 μs irradiation (/, rnJ/pit)
A pit was formed.
またこの記録媒体にHe−Neレーザを用いてビーム径
/、にμm記録面でのエネルギーrmWで、4tMHz
の信号を記録したところ0.4tμ秒の照射(/、≦n
J/pit)で/、0μmのピットが形成された。In addition, using a He-Ne laser for this recording medium, the beam diameter /, μm and the energy rmW on the recording surface are 4tMHz.
When the signal of 0.4tμsec was recorded (/, ≦n
J/pit), a pit of 0 μm was formed.
実施例2と同様にして保存テストを行ったが特性の変化
はなかった。A storage test was conducted in the same manner as in Example 2, but there was no change in characteristics.
実施例9
次の組成の液をポリカーボネート円板に回転塗布して、
厚さ0.72mの乾燥膜厚の下引層を得た。Example 9 A solution with the following composition was spin coated on a polycarbonate disk,
A subbing layer with a dry film thickness of 0.72 m was obtained.
セルロースアセテートブチレ
ート0.♂g
アセトン 32m1これに例
示化合物(I−j)を含む次の組成の液
例示化合物(I−、、t) 0.9gポ
リビニルホルマール 0.7gジクロルメ
タン 70gを回転塗布して厚
さ0.qμの乾燥膜厚の記録層を得た。さらにこの上に
銀を厚さ0.7μに真空蒸着し、記録媒体をつくり、銀
の而を向い合せにして、スペーサーを円板の中心部と周
囲に入れて二つの円板状の記録媒体をサンドイッチにし
て接合した記録媒体を得た。Cellulose acetate butyrate 0. ♂g Acetone 32ml A liquid having the following composition containing Exemplified Compound (I-j) was spin-coated with Exemplified Compound (I-,,t) 0.9g polyvinyl formal 0.7g dichloromethane 70g to a thickness of 0. A recording layer with a dry film thickness of qμ was obtained. Furthermore, silver was vacuum-deposited to a thickness of 0.7 μm on top of this to create a recording medium, and the silver layers were placed facing each other, and spacers were placed in the center and around the disks to form two disk-shaped recording media. A recording medium was obtained by sandwiching and bonding the two.
これに1ポリカーボネート板側より波長2rθnmのビ
ーム径/、にμmの半導体レーザビームを照射面でam
Wで照射し0.7μ秒の照射(4t。On this, a semiconductor laser beam with a wavelength of 2rθnm and a beam diameter of 1 μm is applied to the irradiation surface from the polycarbonate plate side.
Irradiated with W for 0.7 μs (4t.
、tnJ/aec)で直径0.9μmのピットが形成さ
れた。, tnJ/aec), a pit with a diameter of 0.9 μm was formed.
この記録媒体を室内光中♂θ0C19θチで一ケ月保存
したが記録および読み出しの特性の劣化は殆どなかった
。This recording medium was stored for one month under indoor light at ♂θ0C19θ, but there was almost no deterioration in the recording and reading characteristics.
実施例10
例示化合物(I−、?) 0.9gポリ
ビニルホルマール 0.7gジクロルメタ
ン /2ml上記組成の溶液をア
ルミニウムをθ、θ!μmの厚さに蒸着したポリカーボ
ネート樹脂板に回転塗布し、厚さθ、乙μmの光吸収層
を得た。波長7 f Onmにおける反射率および吸収
率は/!チおよび乙!係であった。この記録媒体に波長
710nmの半導体レーザを用い照射面エネルギー6m
W、 ビーム径/、にμmで基板側より、2MH2の
信号を記録したところ0.!μsecの照射時間で(3
,0nJ/pit)で直径o、qpmのピットが形成さ
れた。この記録媒体をgθQC1湿度90%で/ケ月保
存後も記録特性および記録されたピットの再生特性が劣
化しなかった。Example 10 Exemplary compound (I-,?) 0.9g polyvinyl formal 0.7g dichloromethane/2ml A solution of the above composition was mixed with aluminum at θ, θ! A polycarbonate resin plate deposited to a thickness of .mu.m was spin coated to obtain a light absorption layer having a thickness of .theta. and .mu.m. The reflectance and absorption at wavelength 7 f Onm are /! Chi and Otsu! He was in charge. A semiconductor laser with a wavelength of 710 nm is used for this recording medium, and the irradiation surface energy is 6 m.
When a 2MH2 signal was recorded from the substrate side with W and beam diameter/μm, it was 0. ! With an irradiation time of μsec (3
,0 nJ/pit), a pit with a diameter of o and qpm was formed. Even after this recording medium was stored at gθQC1 humidity of 90% for several months, the recording characteristics and the reproduction characteristics of the recorded pits did not deteriorate.
実施例//
ニトロセルロース 0.41gジクロ
ルメタン /θml上記組成の液
をアクリル板に回転塗布し下引き層をつくり、これに例
示化合物(I−j)を真空蒸着して、厚さ0.2μmの
層を得た。これにゼラチンθ、jgを水10m1に溶か
した液を回転塗布して厚さθ、!μmの保護層をつけた
。基板側より7?θnmの波長のレーザビームを実施例
2と同様に照射し、0952秒の照射(コ、θnJ/p
it)で直径0.9μmのピットが形成された。この記
録材料を室内光中で、温度600C1湿度90俤で7夕
月保存したが特性には変化がなかった。Example // Nitrocellulose 0.41 g dichloromethane / θml A liquid with the above composition was spin-coated on an acrylic plate to form an undercoat layer, and exemplified compound (I-j) was vacuum-deposited on this to form a 0.2 μm thick layer. Got layers. A solution prepared by dissolving gelatin θ,jg in 10ml of water was applied to this by spinning to a thickness of θ,! A protective layer of μm was applied. 7 from the board side? A laser beam with a wavelength of θnm was irradiated in the same manner as in Example 2, and the irradiation time was 0952 seconds (ko, θnJ/p
It), a pit with a diameter of 0.9 μm was formed. This recording material was stored in room light at a temperature of 600 C and a humidity of 90 m for 7 evenings, but there was no change in its characteristics.
実施例/2
ノーアニリノ−3−メチル−t−N−シクロヘキシル−
N−メチルアミノフルオランx、4を部、;−アニリノ
−3−クロロ−ぶ−ジエチルアミノフルオランj、4を
部(発色剤二ロイコ染料)、例示化合物(I−//)0
.3部をジインプロピルナフタレン2夕部に溶解し、芯
物質となる溶液を調製した。Example/2 Noanilino-3-methyl-t-N-cyclohexyl-
N-Methylaminofluorane
.. Three parts of the solution was dissolved in two parts of diimpropylnaphthalene to prepare a solution serving as a core material.
さらにキシリレ/ジインシアネート・トリメチロールプ
ロパン(J:/)付加物72部とメチレンクロライド7
7部を添加し、溶解した。In addition, 72 parts of xylylene/diincyanate trimethylolpropane (J:/) adduct and 7 parts of methylene chloride
7 parts were added and dissolved.
この発色剤の溶液を、ポリビニルアルコール3゜!部、
ゼラチン7.7部および/、Q−ジ(ヒドロキシエトキ
シ)ベンゼンコ、4を部が水!♂部に溶解している水溶
液に添加して一〇〇〇の温度で乳化分散させ、平均粒径
3μmの乳化液を得た。Add this coloring agent solution to 3° polyvinyl alcohol! Department,
7.7 parts of gelatin and/or Q-di(hydroxyethoxy)benzene, 4 parts of water! It was added to an aqueous solution dissolved in 1 part male and emulsified and dispersed at a temperature of 1000 to obtain an emulsion with an average particle size of 3 μm.
乳化液に水700部を加えて攪拌しなからに0°Cに加
温し、コ時間後に発色剤、着色防止剤および紫外線吸収
剤を芯物質に含有するマイクロカプセル液を得た。700 parts of water was added to the emulsion, and the mixture was heated to 0°C while stirring, and after a period of time, a microcapsule liquid containing a color former, a color inhibitor, and an ultraviolet absorber in the core substance was obtained.
別に、顕色剤としてビスフェノールA−! 0 部ヲ!
チポリビニルアルコール水溶液100部に加えてサンド
ミルで約29時間分散し、平均3μmのビスフェノール
Aの分散液を得た。Separately, bisphenol A-! Part 0!
The mixture was added to 100 parts of an aqueous polyvinyl alcohol solution and dispersed in a sand mill for about 29 hours to obtain a bisphenol A dispersion having an average diameter of 3 μm.
得られたマイクロカプセル液1部およびビスフェノール
A分散液3部を混合して塗布液とした。One part of the obtained microcapsule liquid and three parts of the bisphenol A dispersion were mixed to prepare a coating liquid.
この塗布液を平滑な上質紙(50g/m2)の表面に塗
布し、<10°Cの温度で30分間乾燥して、乾燥重量
が7g/m2の感熱記録層を設けた。This coating solution was applied to the surface of smooth high-quality paper (50 g/m2) and dried for 30 minutes at a temperature of <10°C to provide a heat-sensitive recording layer with a dry weight of 7 g/m2.
このようにして、マイクロカプセルに含有されてなる感
熱記録シートAを製造した。In this way, thermosensitive recording sheet A containing microcapsules was produced.
また別に例示化合物(I−//)を添加しない感熱記録
シートBを作製した。Separately, a heat-sensitive recording sheet B to which the exemplified compound (I-//) was not added was prepared.
次に、得られた各感熱記録シートを用いて感熱記録を行
なった。Next, thermal recording was performed using each of the obtained thermal recording sheets.
感熱記録シートをG…モード感熱プリンター(パナファ
ックス7.200. 日立製作所■製)に装填し、サー
マルヘッドを作動させて記録シート上に熱記録したとこ
ろ下記のようにいずれの感熱記録シートにも黒色の鮮明
な画像が得られた。When the thermal recording sheet was loaded into a G mode thermal printer (Panafax 7.200, manufactured by Hitachi, Ltd.) and the thermal head was activated to record heat on the recording sheet, the following results were obtained on each thermal recording sheet. A clear black image was obtained.
感熱記録シートA 感熱記録シートB(例示化合物有
) (例示化合物置)発色濃度 /、、23
/、θ9実施例/3
ヘキサハイドロフタル酸70g、テトラグリシジルイソ
シアヌレ−トコog、CX−22/ (チッソ■社製、
商品名)30g1イミダゾールθ。Thermal recording sheet A Thermal recording sheet B (with exemplified compound) (Exemplary compound location) Color density /,, 23
/, θ9 Example/3 70 g of hexahydrophthalic acid, tetraglycidyl isocyanurate og, CX-22/ (manufactured by Chisso ■,
Product name) 30g1 imidazole θ.
l!gを混合した可視光透過樹脂に例示化合物(I−j
)の近赤外線吸収剤θ、jgを溶解させてなる樹脂組成
物(A)を用いてカメラの光検出装置のシリコンダイオ
ードをモールドした。l! Illustrated compound (I-j
A silicon diode for a photodetector of a camera was molded using the resin composition (A) obtained by dissolving the near-infrared absorbers θ, jg.
モールドは/−tO0C程度に加温したモールド金型に
シリコンダイオードをセットし、樹脂組成物(A)をダ
イオードの表面上の厚さ2mm程度になるように流し込
み!分間硬化させ、樹脂組成物(A)でモールドされた
シリコンダイオードを金型より取り出し/!0°Cで約
2時間さらに硬化させ行なった。Set the silicon diode in the mold heated to about /-tO0C, and pour the resin composition (A) to a thickness of about 2 mm on the surface of the diode! After curing for minutes, the silicon diode molded with resin composition (A) is removed from the mold. It was further cured at 0°C for about 2 hours.
実施例/4を
厚さθ、rmmの透明ガラス基板上に例示化合物(I−
1)、熱硬化性アクリル樹脂およびジメチルホルムアミ
ドを/、、g:r:i(重81比)で含有する組成液を
塗布して厚さ3μmの近赤外線吸収用樹脂膜を形成し、
/!θ0C,20分間加熱して硬化させて赤外線遮断層
を形成した。Example 4 was deposited on a transparent glass substrate with a thickness of θ, rmm, and the exemplified compound (I-
1) A composition liquid containing a thermosetting acrylic resin and dimethylformamide in a ratio of /, g:r:i (weight ratio: 81) is applied to form a near-infrared absorbing resin film with a thickness of 3 μm,
/! The infrared ray blocking layer was formed by heating and curing at θ0C for 20 minutes.
この赤外線遮断層上にスパッタリング法によ9窒化クロ
ム層を!90への厚さに被着し、さらにその上にクロム
層を/!θOAの厚さに被着させた。次いでこのクロム
層上にAZ−itx!θレジスト(米国シラプレー社製
)を塗布後、所定のホトマスクにより露光して現像、乾
燥を行ない、次いで硝酸セリウムアンモン系のエツチン
グ液で露出しているクロム層、窒化クロム層をエツチン
グして除去した。その後、レジスト層を剥離して赤外線
遮断層上に所定のパターンをもったフォトシールド層を
形成する。このフォトシールド層はガラス面からの反射
率が7!チ以下となるためフレアーの問題はなくなる。A 9 chromium nitride layer is formed on this infrared blocking layer by sputtering! 90 to a thickness, and then a chrome layer on top of it! It was deposited to a thickness of θOA. Next, AZ-itx! is applied on this chromium layer. After applying a θ resist (manufactured by Silapray, USA), it was exposed to light using a prescribed photomask, developed, and dried, and then the exposed chromium layer and chromium nitride layer were removed by etching with a cerium ammonium nitrate-based etching solution. . Thereafter, the resist layer is peeled off to form a photoshield layer having a predetermined pattern on the infrared blocking layer. This photo shield layer has a reflectance of 7 from the glass surface! The problem of flare disappears because it is less than
次に、フォトシールド層をもった赤外線遮断層上に、カ
ゼイン−重クロム酸アンモニウムからなる水溶性感光液
を0.2μmの膜厚に塗布、乾燥後所定のホトマスクを
正確に位置合せして密着、露光し、温水により現像、所
定パターンをもった被染色層を形成し、この被染色層を
赤染色浴により染色し、Rの着色層を形成する。次いで
、所定の防染処理を行なった後、前記と同様の方法によ
り、水溶性感光液を0.2μmの膜厚に塗布、乾燥、露
光、現像後、緑色染色浴による染色を行なって所定パタ
ーンをもったGの着色層を形成し、コ色目の着色層を形
成した。さらに、2色目の着色層の形成方法と同様の方
法により、青色染色浴を用いて所定パターンをもった3
色目のBの着色層を形成した。こうして、所定パターン
をもったR、G、Hの着色層からなる色分離フィルタ一
層が得られる。その後、この色分離フィルタ一層上にア
クリル樹脂を7μmの膜厚に塗布し、保障膜を形成した
。色分離フィルターのチップサイズは固体撮像素子の感
光部のエリアのサイズとした。Next, a water-soluble photosensitive solution consisting of casein-ammonium dichromate is applied to a thickness of 0.2 μm on the infrared shielding layer with a photoshield layer, and after drying, a prescribed photomask is precisely aligned and adhered. The layer is exposed to light and developed with warm water to form a dyed layer having a predetermined pattern, and this dyed layer is dyed in a red dyeing bath to form an R colored layer. Next, after carrying out a predetermined resist dyeing treatment, a water-soluble photosensitive solution is applied to a film thickness of 0.2 μm using the same method as above, dried, exposed, developed, and then dyed with a green dyeing bath to form a predetermined pattern. A colored layer of G was formed, and a colored layer of C was formed. Furthermore, by the same method as the method for forming the second colored layer, three layers with a predetermined pattern were formed using a blue dyeing bath.
A colored layer of color B was formed. In this way, a color separation filter layer consisting of R, G, and H colored layers having a predetermined pattern is obtained. Thereafter, an acrylic resin was applied to a thickness of 7 μm on one layer of this color separation filter to form a security film. The chip size of the color separation filter was set to be the size of the photosensitive area of the solid-state image sensor.
この色分離フィルターは700nm以上の長波長光の遮
断能力の優れるものであった。This color separation filter had an excellent ability to block long wavelength light of 700 nm or more.
なお、上記において用いたR、G、Hの染色浴組成は次
のとおりである。The compositions of the R, G, and H dye baths used above are as follows.
赤色染色浴
カヤノールミーリングレッド
R8(日本火薬社製) 7部酢酸
6部水
100部緑色染色浴
ブリリアントインドブルー
(ヘキスト社製) 7部スミノー
ルイエローMR
(住友化学社製) 7部酢酸
3部水
/θO部青色染色浴
カヤノールシアニン6B
(日本火薬社製) 7部酢酸
3部水
/θO部Red dyeing bath Kayanol Milling Red R8 (manufactured by Nippon Kapaku Co., Ltd.) 7 parts acetic acid
6 parts water
100 parts green dye bath Brilliant India Blue (manufactured by Hoechst) 7 parts Suminol Yellow MR (manufactured by Sumitomo Chemical) 7 parts acetic acid
3 parts water
/θO part Blue dyeing bath Kayanol cyanine 6B (manufactured by Nippon Kapaku Co., Ltd.) 7 parts acetic acid
3 parts water
/θO section
第1図は実施例/によって得られた光学フィルターの、
また第2図は実施例コによって得られた光学フィルター
の波長と透過率の関係を示す。
特許出願人 富士写真フィルム株式会社第1図
波長(nm、)
第2図
大喪(nm)
手続補正書
昭和67年2月パー日
進FIG. 1 shows the optical filter obtained in Example/
Further, FIG. 2 shows the relationship between wavelength and transmittance of the optical filter obtained in Example 2. Patent applicant: Fuji Photo Film Co., Ltd. Figure 1 Wavelength (nm) Figure 2 Large mourning (nm) Procedural amendment February 1988 Per Nisshin
Claims (1)
0nm以上に有する化合物の少くとも1種を含有するこ
とを特徴とする近赤外線吸収組成物。 一般式( I ) ▲数式、化学式、表等があります▼ 式中、R^1は置換もしくは無置換のアルキル基、置換
もしくは無置換のアリール基又は置換もしくは無置換の
複素環基を表わし、R^2及びR^5は互いに同じでも
異なつていても良く、水素原子もしくはこれを置換可能
な基を表わし、R^3及びR^4は互いに同じでも異な
つていても良く、水素原子、ハロゲン原子、置換もしく
は無置換のアルコキシ基、又は置換もしくは無置換のア
ルキル基を表わし、R^6及びR^7は互いに同じでも
異なつていてもよく、置換もしくは無置換のアルキル基
、置換もしくは無置換のアリール基、アシル基、スルホ
ニル基又はR^6とR^7が互いに連結して5員又は6
員環を形成するのに必要な非金属原子群を表わす。但し
、R^3とR^4が同時に水素原子であることはない。[Claims] A compound represented by the following general formula (I) and having a maximum absorption wavelength of 72
A near-infrared absorbing composition comprising at least one compound having a wavelength of 0 nm or more. General formula (I) ▲There are numerical formulas, chemical formulas, tables, etc.▼ In the formula, R^1 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group, and R ^2 and R^5 may be the same or different from each other and represent a hydrogen atom or a group capable of substituting it; R^3 and R^4 may be the same or different from each other and represent a hydrogen atom, Represents a halogen atom, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted alkyl group, R^6 and R^7 may be the same or different from each other, and represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkyl group, An unsubstituted aryl group, acyl group, sulfonyl group, or R^6 and R^7 connected to each other to form a 5- or 6-membered
Represents a group of nonmetallic atoms necessary to form a membered ring. However, R^3 and R^4 are never hydrogen atoms at the same time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/331,075 US4923638A (en) | 1985-09-30 | 1989-03-28 | Near infrared absorbing composition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21731585 | 1985-09-30 | ||
JP60-217315 | 1985-09-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62181381A true JPS62181381A (en) | 1987-08-08 |
JPH0647667B2 JPH0647667B2 (en) | 1994-06-22 |
Family
ID=16702236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61028711A Expired - Fee Related JPH0647667B2 (en) | 1985-09-30 | 1986-02-12 | Near infrared absorbing composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0647667B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62246590A (en) * | 1986-04-17 | 1987-10-27 | Mitsubishi Chem Ind Ltd | Dithiophenolate based complex and optical recording medium containing said complex |
EP0285665A1 (en) * | 1986-10-07 | 1988-10-12 | Dai Nippon Insatsu Kabushiki Kaisha | Thermal transfer sheet |
EP0441282A1 (en) * | 1990-02-15 | 1991-08-14 | BASF Aktiengesellschaft | Bichromophore methine and azamethine dyestuffs and a process for their transfer |
US5312926A (en) * | 1990-03-30 | 1994-05-17 | Basf Aktiengesellschaft | Indonaphthol dyes and thermal transfer thereof |
-
1986
- 1986-02-12 JP JP61028711A patent/JPH0647667B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62246590A (en) * | 1986-04-17 | 1987-10-27 | Mitsubishi Chem Ind Ltd | Dithiophenolate based complex and optical recording medium containing said complex |
EP0285665A1 (en) * | 1986-10-07 | 1988-10-12 | Dai Nippon Insatsu Kabushiki Kaisha | Thermal transfer sheet |
EP0441282A1 (en) * | 1990-02-15 | 1991-08-14 | BASF Aktiengesellschaft | Bichromophore methine and azamethine dyestuffs and a process for their transfer |
US5312926A (en) * | 1990-03-30 | 1994-05-17 | Basf Aktiengesellschaft | Indonaphthol dyes and thermal transfer thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0647667B2 (en) | 1994-06-22 |
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