JPS62180593A - Semiconductor memory device - Google Patents

Semiconductor memory device

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Publication number
JPS62180593A
JPS62180593A JP61023112A JP2311286A JPS62180593A JP S62180593 A JPS62180593 A JP S62180593A JP 61023112 A JP61023112 A JP 61023112A JP 2311286 A JP2311286 A JP 2311286A JP S62180593 A JPS62180593 A JP S62180593A
Authority
JP
Japan
Prior art keywords
electric potential
screening
fetqb
signal
word lines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61023112A
Other languages
Japanese (ja)
Inventor
Keiji Koishi
小石 啓二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP61023112A priority Critical patent/JPS62180593A/en
Publication of JPS62180593A publication Critical patent/JPS62180593A/en
Pending legal-status Critical Current

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  • For Increasing The Reliability Of Semiconductor Memories (AREA)

Abstract

PURPOSE:To shorten the time necessary to the test for screening by providing a driving means to be able to drive simultaneously plural word lines so as to select plural memory cells. CONSTITUTION:For respective gate circuits G of an X decoder 3, FETQB is respectively interposed between respective FETQ1,... QN and a low electric potential electric power source VSS, and the FETQB and a comparator 4 constitute a screening driving means 5. When the burn-in test for the screening is executed, with an external address signal A as the electric potential of a reference voltage signal VS or above, the output of the comparator 4 is made into the low electric potential of a threshold voltage or below of respective FETQB. For such a reason, the FETQB comes to be an off condition, and when a precharging signal phiP is a high electric potential, respective nodal points N of respective gate circuits G maintain the high electric potential. Thus, an internal signal phiA comes to be the high electric potential, and then, all word lines W are simultaneously driven and by driving a bit line B, plural memory cells are selected.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明はMO8RAM等の半導体記憶装置に係り、詳
しくは、効率的なスクリーニングを行うのに適した半導
体記憶装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a semiconductor memory device such as MO8RAM, and more particularly to a semiconductor memory device suitable for efficient screening.

〔従来の技術〕[Conventional technology]

一般に、半導体装置はスクリーニングとして烏温雰囲気
中でバイアス電圧を印加するバーンイン試験が実施され
るが、近年の半導体記憶装置t(以下、MO8几AMと
記す)にあっては、さらに電気的なストレスを与えてよ
り効果的なスクリーニングを行えるようにしたダイナミ
ックバーンイン試験が実施されている。
Generally, semiconductor devices are subjected to a burn-in test in which a bias voltage is applied in a cool-temperature atmosphere as a screening process, but recent semiconductor memory devices (hereinafter referred to as MO8C AM) are subjected to even more electrical stress. Dynamic burn-in tests have been conducted to provide more effective screening.

従来、この株のスクリーニングが施されるMO8RAM
としては、例えば第2図に示すようなものが知られてい
る。第2図において、lはメモリセルが行列状に配置さ
れたセルマトリクスであり、セルマトリクス1のメモリ
セルは複数Nのワード線Wと複数Mのビット線Bとに接
続されている。
Conventionally, MO8RAM was screened for this strain.
For example, the one shown in FIG. 2 is known. In FIG. 2, 1 is a cell matrix in which memory cells are arranged in rows and columns, and the memory cells of cell matrix 1 are connected to a plurality of N word lines W and a plurality of M bit lines B.

なお、上記N、Mは2以上の整数であり、また、ワード
線Wおよびビット線Bについては添字を付して特定する
。ワード線WはそれぞれがMO8電界効果型トランジス
i(以下、FETと略記する)Q* +(h+ −−−
QNk介してXデコーダ3に接続され、同様に、ビット
線BはYデコーダ2に接続されている。
Note that N and M are integers of 2 or more, and word lines W and bit lines B are specified by adding subscripts. Each word line W is an MO8 field effect transistor i (hereinafter abbreviated as FET) Q* + (h+ ---
The bit line B is connected to the X decoder 3 via QNk, and similarly, the bit line B is connected to the Y decoder 2.

Xデコーダ3は、ワード線Wの数Nと同数のゲ−ト回路
G(添字を付して特定する)を有し、このケート回路G
のそれぞれがF E T Q t * −−−QNを介
し、対応するワード線Wに接続されている。
The X decoder 3 has the same number of gate circuits G (specified by adding a subscript) as the number N of word lines W, and the gate circuits G
are connected to the corresponding word line W via FETQt* ---QN.

ゲート回路Gは、プリチャージ信号φPがゲートに入力
するFETQPと、並列に接続されたN個F E T 
Q +t + −−−QINとを有している@これらN
個のFE T Q +t + −−−QINは、ワード
線Wに対応したアドレス信号X、、X2.X3.−−−
XNがそれぞれゲートに入力している。これらFETQ
PおよびI” E T Q■+ Qtz + −−−Q
INは高電位電源Vjcと低電位電源VSSとの間で直
列に接続され、これらFETQpとF E T Qtt
 r −−−QINとの間に設定された節点N 1 e
 −−−N NがそれぞれF E T Q鳳。
The gate circuit G includes N FETs connected in parallel to the FETQP to which the precharge signal φP is input to the gate.
Q +t + ---QIN @these N
The FET Q + t + --- QIN are used for the address signals X, , X2 . X3. ---
XN is input to each gate. These FETQ
P and I" E T Q■+ Qtz + ---Q
IN is connected in series between the high potential power supply Vjc and the low potential power supply VSS, and these FETQp and FETQtt
r --- Node N 1 e set between QIN
---N N is FET Q-ho respectively.

=−QNのゲートに接続されている。これらのFh T
Q r + −−−QNは、ソースかワード線Wに接続
され、読み出し、書き込みの動作時に高電位へ移行する
内部信号φ人がドレインに入力する。なお。
=-Connected to the gate of QN. These Fh T
Q r + ---QN is connected to the source or word line W, and an internal signal φ that shifts to a high potential during read and write operations is input to the drain. In addition.

各ケート回路Gは入力するアドレス信号X、、−−XN
を除いては同一構成であり、また、Yデコーダ2も周知
の構成であるため説明・図示を省略する。
Each gate circuit G receives an input address signal X, --XN
The configuration is the same except for the Y decoder 2, and the Y decoder 2 also has a well-known configuration, so explanation and illustration thereof will be omitted.

このようなM08RAMは、読み出し、書き込み動作前
のプリチャージ信号φPが高電位の時、各ゲート回路G
の節点Nが高電位にフリチャージされているが、読み出
し、豊き込み動作が開始されてアドレス信号Xの1つ(
例えばXl、以下同じ)が高電位へ移行すると、対応す
るケート回路Gs k除く他のケート回路Gの節点Nが
低電位へ移行する。このため、内部信号φAが高電位に
なると、オン状態の第1査目のFETQtによりワード
線W1が選択、すなわち駆動される。そして、同様に1
つのビット線Bが駆動され、メモリセルが選択される。
In such a M08RAM, when the precharge signal φP before a read or write operation is at a high potential, each gate circuit G
The node N of the address signal
For example, when Xl (the same applies hereinafter) shifts to a high potential, the nodes N of other gate circuits G except the corresponding gate circuit Gsk shift to a low potential. Therefore, when the internal signal φA becomes a high potential, the word line W1 is selected, that is, driven, by the first scanning FET Qt in the on state. And similarly 1
One bit line B is driven and a memory cell is selected.

〔この発明が解決しようとする問題点〕しかしながら、
このような従来の半導体記憶装置にあっては、電気的な
ストレスを与えた状態すなわちメモリセルが選択された
状態でバーンイン試験を行うにも、通常の読み出し、書
き込み動作時と同様に各ワード線とビット線とを順次駆
動してメモ、リセルを1ビツトずつ選択しなければなら
ず、その試験に要する時間が多く、スクリ−ニグを効率
的に行うことができな−いという問題点があった。特に
、近年にあっては、半導体記憶装置のメモリセルの数が
増大しているため、上記問題点も顕著で解決が要望され
ていた。
[Problems to be solved by this invention] However,
In such conventional semiconductor memory devices, even when performing a burn-in test under electrical stress, that is, when a memory cell is selected, each word line is It is necessary to select memory and reset bits one by one by sequentially driving the memory and bit lines, and there is a problem that the test requires a lot of time and screening cannot be carried out efficiently. Ta. In particular, in recent years, as the number of memory cells in semiconductor memory devices has increased, the above-mentioned problems have become more prominent and a solution has been desired.

〔問題点を解決するための手段〕[Means for solving problems]

この発明は、上記問題点を鑑みてなされたもので、複数
のワード線と複数のビット線にそれぞれ〜複数のメモリ
セルを行列状に結線し、ワード線およびビット線を駆動
してメモリセルを選択する半導体記憶装置において、前
記ワード醐の複数を同時に駆動可能な躯動手&1−設け
たことを特徴とする。
This invention was made in view of the above problems, and involves connecting a plurality of memory cells to a plurality of word lines and a plurality of bit lines in a matrix, respectively, and driving the word lines and bit lines to drive the memory cells. The semiconductor memory device to be selected is characterized in that a sliding hand &1- is provided which can simultaneously drive a plurality of the word blocks.

〔作 用〕[For production]

この発明にかかる半導体記憶装置によれば、スクリーニ
ングのだめの試験を行う際に、複数のワード線を同時に
駆動して複数のメモリセルを選択することができる。し
たがって、試験に擬する時間を短縮することができ、ス
クリーニングを効率的に杓゛なえるようになる。
According to the semiconductor memory device according to the present invention, a plurality of word lines can be simultaneously driven to select a plurality of memory cells when performing a final screening test. Therefore, the time required to simulate the test can be shortened, and screening can be carried out efficiently.

〔実施例〕〔Example〕

以下、この発明の実施例を図面に基づいて説明するO 第1図は、この発明にかかる半導体記憶装置の一実施例
を示す回路図である。なお、以下、前述した第1図の従
来の半導体記憶装置と同一の部分には同一の符号を付し
て説明する。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a circuit diagram showing an embodiment of a semiconductor memory device according to the present invention. Hereinafter, the same parts as those of the conventional semiconductor memory device shown in FIG. 1 will be described with the same reference numerals.

同図に示すように、Xデコーダ3の各ゲート回jlGは
、各F ET Q t 、−−−−QN ト低tt位I
JLIA Vssとの間にそれぞれFETQa(図に示
すように添字を付して特定する)がそれぞれ介装されて
いる。
As shown in the figure, each gate circuit jlG of the X decoder 3 has a low tt position I
A FETQa (identified with a subscript as shown in the figure) is interposed between the FETQa and the JLIA Vss.

これらF E T Q Bは、ドレインが各FETQ、
息。
These FETQB have drains connected to each FETQ,
breath.

−−−QNのソースに、ソースが低電位を源V8Sに、
また、ケートがコンパレータ4に接続されている。
---The source of QN, the source is low potential to the source V8S,
Further, the gate is connected to the comparator 4.

コンパレータ4は、゛入力端子に外部アドレス信号人と
基準電圧信号■sが入力し、外部アドレス信号Aが基準
電圧信号v8より高電位の時に出力が低電位を維持する
。上述したFETQBおよびコンパレータ4かスクリー
ニング駆動手段5を構成する。なお、上記基準電圧信号
■S は、読み出し。
The comparator 4 receives an external address signal and a reference voltage signal s to its input terminal, and maintains its output at a low potential when the external address signal A is at a higher potential than the reference voltage signal v8. The above-mentioned FETQB and comparator 4 constitute the screening drive means 5. Note that the reference voltage signal ■S is read.

書き込みの動作時に許容される程度の電位を上限とする
The upper limit is set to a level of potential that is permissible during a write operation.

このような半導体記憶装置は、スクリーニングのだめの
バーンイン試験を行う場合、外部アドレス信号Aを基準
電圧信号Vs以上の電位としてコンパレータ4の出力を
各FETQ、の閾値電圧以下の低電位にする。このため
、各FETQBがオフ状態となり、プリチャージ信号φ
Pが高電位の時Xデコータ3の各ゲート回路Gの各節点
Nは高電位を維持する。、この結果、内部信号φAが高
電位になると、各FETQ1.Q重*−−−Qwにより
全てのワード線Wが同時に駆動され、この後にビット#
Bを駆動することにより複数のメモリセルが選択される
。したがって、バーンイン試験を短時間で行うことがで
き、スクリーニングを効率的に行うことが可能となる。
In such a semiconductor memory device, when performing a screening burn-in test, the external address signal A is set to a potential higher than the reference voltage signal Vs, and the output of the comparator 4 is set to a low potential lower than the threshold voltage of each FETQ. Therefore, each FETQB is turned off, and the precharge signal φ
When P is at a high potential, each node N of each gate circuit G of the X decoder 3 maintains a high potential. , As a result, when the internal signal φA becomes a high potential, each FET Q1 . Q weight *---All word lines W are driven simultaneously by Qw, and then bit #
By driving B, a plurality of memory cells are selected. Therefore, a burn-in test can be performed in a short time, and screening can be performed efficiently.

一方1通常の読み出し、書き込みの動作については、外
部アドレス信号A”i基準電圧イぎ号vs より低い電
位に維持すれば、前述した従来のものと同様に行うこと
ができる。
On the other hand, 1. Normal read and write operations can be performed in the same manner as in the prior art described above, provided that the external address signal A''i is maintained at a potential lower than the reference voltage signal vs.

なお、スクリーニング駆動手段としては、上述した構成
に限られるものでは無く、例えば、ゲートに制御のため
の信号が入力するFETをそれぞれ内部信号φAが入力
する端子とワード線Wとの間に各F M T Q t 
e −−−QNと並列的に設けることでも構成さ扛る。
Note that the screening driving means is not limited to the above-mentioned configuration; for example, each FET, whose gate receives a control signal, is connected between a terminal to which an internal signal φA is input and a word line W. M T Q t
e --- It can also be configured by providing it in parallel with QN.

また、上述した各FETQBのケートには、コンパレー
タ4によること無く、バーンイン試験時に低電位となる
伯gを直接に与えることも可能である。
Further, it is also possible to directly apply a voltage g that becomes a low potential during a burn-in test to the gate of each FET QB described above, without using the comparator 4.

〔効 果〕〔effect〕

以上説明してきたように、この発明にかかる半導体記憶
装置によれば、スクリーニングのための試験に要する時
間を短縮してスクリーニングを効率的に行うことができ
るようになる。
As described above, according to the semiconductor memory device according to the present invention, the time required for testing for screening can be shortened and screening can be performed efficiently.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例にかかる半導体記憶装置の
回路図、第2図は従来の半導体記憶装置の回路図である
。 1・・・・・・セルマトリクス、2・・・・・・Yデコ
ーダ、3・・・・・・Xfデコーダ4・・・・・・コン
パレータ、5・・・・・・スクリーニング駆動手段、W
・−・・・・ワード線、B・・・・・・ピッ ト線、Q
B  ・・・・・・PET。 代理人 弁理士  内 原   音 3    Qt 年 l  閃
FIG. 1 is a circuit diagram of a semiconductor memory device according to an embodiment of the present invention, and FIG. 2 is a circuit diagram of a conventional semiconductor memory device. 1...Cell matrix, 2...Y decoder, 3...Xf decoder 4...Comparator, 5...Screening drive means, W
・・・・・・Word line, B・・・・・・Pit line, Q
B...PET. Agent Patent Attorney Uchihara Oto 3 Qt Year 1 Sen

Claims (1)

【特許請求の範囲】[Claims] 複数のワード線とビット線にそれぞれ複数のメモリセル
を行列状に結線し、ワード線およびビット線を駆動して
メモリセルを選択する半導体記憶装置において、前記ワ
ード線の複数を同時に駆動可能な駆動手段を設けたこと
を特徴とする半導体記憶装置。
In a semiconductor memory device in which a plurality of memory cells are connected to a plurality of word lines and bit lines respectively in a matrix and a memory cell is selected by driving the word lines and bit lines, a drive capable of simultaneously driving a plurality of the word lines. A semiconductor memory device characterized by being provided with means.
JP61023112A 1986-02-04 1986-02-04 Semiconductor memory device Pending JPS62180593A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61023112A JPS62180593A (en) 1986-02-04 1986-02-04 Semiconductor memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61023112A JPS62180593A (en) 1986-02-04 1986-02-04 Semiconductor memory device

Publications (1)

Publication Number Publication Date
JPS62180593A true JPS62180593A (en) 1987-08-07

Family

ID=12101395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61023112A Pending JPS62180593A (en) 1986-02-04 1986-02-04 Semiconductor memory device

Country Status (1)

Country Link
JP (1) JPS62180593A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05250896A (en) * 1991-07-17 1993-09-28 Toshiba Corp Semiconductor memory and detecting circuit using the same
JP2002262562A (en) * 2001-02-23 2002-09-13 Semiconductor Components Industries Llc Power control device and structure thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622278A (en) * 1979-07-27 1981-03-02 Fujitsu Ltd Decoder selection system
JPS58175192A (en) * 1982-04-02 1983-10-14 Nec Corp Read/write memory circuit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622278A (en) * 1979-07-27 1981-03-02 Fujitsu Ltd Decoder selection system
JPS58175192A (en) * 1982-04-02 1983-10-14 Nec Corp Read/write memory circuit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05250896A (en) * 1991-07-17 1993-09-28 Toshiba Corp Semiconductor memory and detecting circuit using the same
JP2002262562A (en) * 2001-02-23 2002-09-13 Semiconductor Components Industries Llc Power control device and structure thereof

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