JPS62172650A - 集束イオンビ−ム装置 - Google Patents
集束イオンビ−ム装置Info
- Publication number
- JPS62172650A JPS62172650A JP61012785A JP1278586A JPS62172650A JP S62172650 A JPS62172650 A JP S62172650A JP 61012785 A JP61012785 A JP 61012785A JP 1278586 A JP1278586 A JP 1278586A JP S62172650 A JPS62172650 A JP S62172650A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- mass
- voltage
- separator
- objective lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61012785A JPS62172650A (ja) | 1986-01-23 | 1986-01-23 | 集束イオンビ−ム装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61012785A JPS62172650A (ja) | 1986-01-23 | 1986-01-23 | 集束イオンビ−ム装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62172650A true JPS62172650A (ja) | 1987-07-29 |
| JPH0562419B2 JPH0562419B2 (forum.php) | 1993-09-08 |
Family
ID=11815048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61012785A Granted JPS62172650A (ja) | 1986-01-23 | 1986-01-23 | 集束イオンビ−ム装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62172650A (forum.php) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6330800A (ja) * | 1986-07-24 | 1988-02-09 | 日電アネルバ株式会社 | Exb速度選別器 |
| JPH0195458A (ja) * | 1987-10-06 | 1989-04-13 | Yokogawa Electric Corp | 四重極質量分析器を用いたイオン注入装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158852A (ja) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | 荷電粒子フイルタ |
| JPS6074249A (ja) * | 1983-09-29 | 1985-04-26 | Jeol Ltd | イオンビ−ム装置 |
-
1986
- 1986-01-23 JP JP61012785A patent/JPS62172650A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158852A (ja) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | 荷電粒子フイルタ |
| JPS6074249A (ja) * | 1983-09-29 | 1985-04-26 | Jeol Ltd | イオンビ−ム装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6330800A (ja) * | 1986-07-24 | 1988-02-09 | 日電アネルバ株式会社 | Exb速度選別器 |
| JPH0195458A (ja) * | 1987-10-06 | 1989-04-13 | Yokogawa Electric Corp | 四重極質量分析器を用いたイオン注入装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0562419B2 (forum.php) | 1993-09-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4649316A (en) | Ion beam species filter and blanker | |
| US4687940A (en) | Hybrid focused-flood ion beam system and method | |
| JPS5871545A (ja) | 可変成形ビ−ム電子光学系 | |
| US7135677B2 (en) | Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system | |
| US7084407B2 (en) | Ion beam extractor with counterbore | |
| US6495826B2 (en) | Monochrometer for electron beam | |
| EP0106154B1 (de) | Varioformstrahl-Ablenkobjektiv für Neutralteilchen und Verfahren zu seinem Betrieb | |
| US5369279A (en) | Chromatically compensated particle-beam column | |
| US4563587A (en) | Focused ion beam microfabrication column | |
| JP2004527885A (ja) | 粒子ビーム装置のための偏向システム | |
| JPS62172650A (ja) | 集束イオンビ−ム装置 | |
| EP0150089A1 (en) | Charged-particle optical systems | |
| EP0079931B1 (en) | Focused ion beam microfabrication column | |
| JP4343951B2 (ja) | 荷電粒子ビーム系用の単段式荷電粒子ビームエネルギー幅低減系 | |
| EP0150941A1 (en) | Charged-particle optical systems | |
| WO1998009313A1 (de) | Elektronenoptische linsenanordnung mit spaltförmigem öffnungsquerschnitt | |
| JP3577026B2 (ja) | 電子ビーム描画装置、電子ビーム描画装置の調整方法及び電子ビーム描画方法 | |
| RU2144237C1 (ru) | Оптическая колонка для излучения частиц | |
| JPS6266551A (ja) | 集束イオンビ−ム装置 | |
| JPS62177849A (ja) | 集束イオンビ−ム装置 | |
| JP3790646B2 (ja) | 低エネルギー反射電子顕微鏡 | |
| JPH06290725A (ja) | イオン源装置およびそのイオン源装置を備えたイオン打ち込み装置 | |
| JP2002216690A (ja) | 荷電ビーム制御方法および制御装置 | |
| JPS6313250A (ja) | イオンビ−ム装置 | |
| JPH063720B2 (ja) | 集束イオンビ−ム装置 |