JPS6217196A - Method for plating stainless steel - Google Patents
Method for plating stainless steelInfo
- Publication number
- JPS6217196A JPS6217196A JP15384085A JP15384085A JPS6217196A JP S6217196 A JPS6217196 A JP S6217196A JP 15384085 A JP15384085 A JP 15384085A JP 15384085 A JP15384085 A JP 15384085A JP S6217196 A JPS6217196 A JP S6217196A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- stainless steel
- cathode
- sulfuric acid
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明はステンレス鋼素材へのめっき方法に関し、特に
活性化処理方法の敗訴により密着性のよいめっきを→能
としたステンレス鋼へのめつき方法に関よる。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a method for plating stainless steel materials, and in particular to a method for plating stainless steel that has made plating with good adhesion possible due to the failure of the activation treatment method. Depends on the method.
〈従来の技術〉
一般にステンレス鋼素材に密着性の良いめっきを行なう
には、素材表面に強固に形成された不導態化皮膜を除く
ための活性化処理が必要である。<Prior Art> Generally, in order to plate a stainless steel material with good adhesion, an activation treatment is required to remove a passivation film that is firmly formed on the surface of the material.
このため従来は、酸性浴による化学研磨あるいは電解研
磨による表面エツチングおよびこれらと陰極電解活性化
を組合せて行なう方法、あるいは塩化ニッケル/塩酸浴
(ウッド浴)によるニッケルストラックめっき方法など
が行なわれている。For this reason, conventional methods include surface etching by chemical polishing or electrolytic polishing using an acid bath, and a combination of these with cathodic electrolytic activation, or nickel track plating using a nickel chloride/hydrochloric acid bath (Wood bath). There is.
しかし、これらの活性化処理法には以下のような欠点か
ある。まず前者のエツチング法では酸化膜を完全に除去
するには高濃度、高温の酸類を使用しなければならず、
また処理時間も長くする必要があるため、オーバーエツ
チングによる素地荒れを生じやすい。さらに、一旦酸化
膜を除かれたステンレス表面は再び不導態化しやすく高
度な密着性の要求されるめっきの場合には活性化効果が
不十分となることがある。However, these activation treatment methods have the following drawbacks. First, the former etching method requires the use of highly concentrated and high temperature acids to completely remove the oxide film.
Furthermore, since the processing time needs to be long, roughness of the substrate is likely to occur due to over-etching. Furthermore, once the oxide film has been removed, the stainless steel surface tends to become passivated again, and in the case of plating that requires a high degree of adhesion, the activation effect may be insufficient.
また後者のウッドニッケルストライク法は陰極電涜oh
率が低いことを利用して、陰極表面で発生する水素ガ
スにより酸化膜を還元活性化すると同時に、密着性の良
い薄いニッケル下地めっきを析出させ、活性化された素
材表面の再不導態化を防止するものであるが、腐食性の
高い塩酸を含むミストが飛散しやすく、作業環境の悪化
や周辺装置・機器類の著しい腐食を招きやすい。また浴
中の塩素イオンの陽極酸化による塩素ガスの発生を防止
するため、可溶性のニッケル陽極を用いる必要かあるが
、陽極電流効率に比べ陰極電流効率が著しく低いので、
浴中めニッケル濃度が上昇しやすく、浴濃度の補正ある
いは更新を頻繁に行なわねばならないという問題があっ
た。Also, the latter Wood nickel strike method involves cathode electrolysis.
Taking advantage of the low rate, the hydrogen gas generated on the cathode surface reduces and activates the oxide film, and at the same time deposits a thin nickel base plating with good adhesion, making the activated material surface re-passivated. However, the mist containing highly corrosive hydrochloric acid is likely to scatter, leading to deterioration of the working environment and severe corrosion of peripheral devices and equipment. In addition, in order to prevent the generation of chlorine gas due to anodic oxidation of chlorine ions in the bath, it is necessary to use a soluble nickel anode, but the cathode current efficiency is significantly lower than the anode current efficiency.
There is a problem in that the nickel concentration in the bath tends to increase and the bath concentration must be corrected or updated frequently.
〈発明が解決しようとする問題点〉
本発明の目的は、前記した従来技術の欠点を解消し、ス
テンレス鋼素材への新規な活性化処理方法を提供し、塩
酸ミストの飛散がなく、密着性の良いめっきを得ること
のできるステンレス鋼へのめっき方法を提供することに
ある。<Problems to be Solved by the Invention> The purpose of the present invention is to solve the above-mentioned drawbacks of the prior art and provide a new activation treatment method for stainless steel materials, which eliminates the scattering of hydrochloric acid mist and improves adhesion. The purpose of the present invention is to provide a method of plating stainless steel that can obtain good plating.
く問題点を解決するための手段〉
このような目的を達成するための本発明は、予め清浄化
したステンレス鋼素材を、硫酸ニッケルと硫酸を含む水
溶液中で陰極電解処理した後、所望のめっきを行なうこ
とを特徴とするステンレス鋼へのめっき方法である。Means for Solving the Problems> The present invention aims to achieve the above objects by subjecting pre-cleaned stainless steel material to cathodic electrolysis treatment in an aqueous solution containing nickel sulfate and sulfuric acid, and then subjecting it to desired plating. This is a method of plating stainless steel.
ここで、前記陰極電解処理において、用いる陽極を不溶
性陽極とすることが好ましい。Here, in the cathodic electrolytic treatment, it is preferable that the anode used be an insoluble anode.
また、前記硫酸ニッケルと硫酸を含む水溶液が、NiS
O4・6H2O、100〜300g/ l、)+2 S
04.98voJZ!にとして、20〜150 ml
/ IIを含む水溶液であることか良い。Further, the aqueous solution containing nickel sulfate and sulfuric acid may be NiS
O4・6H2O, 100-300g/l, )+2S
04.98voJZ! 20-150 ml
/ It is preferable that the solution is an aqueous solution containing II.
以下に本発明を更に詳細に説明する。The present invention will be explained in more detail below.
本発明方法に用いるステンレス鋼は、特に限定するもの
ではなく、5tJS304等いかなる種類のステンレス
鋼を用いてもよいし、ステンレス鋼の形状は、板材、棒
材、線材等いかなる形状のものでもよい。The stainless steel used in the method of the present invention is not particularly limited, and any type of stainless steel such as 5tJS304 may be used, and the stainless steel may be in any shape such as a plate, a bar, or a wire.
陰極電解処理を行なう以前のステンレス鋼素材への清浄
化処理は、陽極電解脱脂、酸洗い、水洗、揮発性有機溶
剤浸漬等の通常の清浄化処理を行なう。Prior to cathodic electrolytic treatment, the stainless steel material is cleaned by conventional cleaning treatments such as anodic electrolytic degreasing, pickling, water washing, and volatile organic solvent immersion.
本発明方法で用いる陰極電解処理液の組成は、硫酸ニッ
ケル(6水塩として)100〜300g/Il、硫酸(
98voj2 !k ) 20〜150 nll /
flのものが好ましく、硫酸ニッケル濃度が高過ぎるか
、硫酸濃度が低過ぎると、つきまわりが悪くなり、素材
の形状によっては局部的に密着性が低下する。また、こ
の逆の場合にはつきまわりは良好となるが、十分な密4
r性を得るための処理時間を長くしなければならず作業
性が低下する。The composition of the cathode electrolysis solution used in the method of the present invention is nickel sulfate (as hexahydrate) 100 to 300 g/Il, sulfuric acid (
98voj2! k) 20-150 nll/
fl is preferable; if the nickel sulfate concentration is too high or the sulfuric acid concentration is too low, the throwing power will be poor and the adhesion will locally decrease depending on the shape of the material. In addition, in the opposite case, the throwing power will be good, but if the
Processing time must be increased to obtain r properties, resulting in lower workability.
また、処理条件は素材の種類などによっても異なるが、
通常、浴温は室温〜40℃程度、陰極電流密度4〜20
A/dゴ、時間20秒〜3分の範囲が好ましい。これは
、通常のめっきを行なう前に比較的大きな電流密度で短
時間のめフきを行ない、あらかじめ密着性のよい均一な
ごく薄いニッケルめっき面をつくることにより、めっき
のつきまわりのおそい部分が液に侵されるのを防いだり
、また水素の発生によって表面の清浄作用を行なうため
である。In addition, processing conditions vary depending on the type of material, etc.
Usually, the bath temperature is room temperature to about 40℃, and the cathode current density is 4 to 20℃.
A/d time is preferably in the range of 20 seconds to 3 minutes. Before regular plating, plating is performed for a short period of time at a relatively high current density to create a uniform, very thin nickel-plated surface with good adhesion, which reduces the amount of plating that is slow to coat. This is to prevent the surface from being eroded by liquid and to clean the surface by generating hydrogen.
また、陰極電解処理に用いる陽極はニッケルを用いても
良いが、白金、白金めっきチタン、カーボン電極等の不
溶性陽極を用いると、処理液の濃度変化を著しく小さく
することができ、浴濃度の補正や、浴液の交換の必要が
ほとんどなく、繰返し長期間使用しても陰極電解処理液
の管理が安価で容易である。硫酸ニッケルと硫酸を含む
水溶液の上記陰極電解処理液を用いると、従来用いられ
てきたウッドニッケルストライク浴と異なり、実質的に
塩素イオンを含まないので、不溶性陽極を用いても有害
な塩素の発生がない。Although nickel may be used as the anode for cathodic electrolytic treatment, if an insoluble anode such as platinum, platinum-plated titanium, or carbon electrode is used, changes in the concentration of the treatment solution can be significantly reduced, and the bath concentration can be corrected. Moreover, there is almost no need to replace the bath solution, and the management of the cathode electrolysis treatment solution is inexpensive and easy even when used repeatedly over a long period of time. When using the cathode electrolysis treatment solution, which is an aqueous solution containing nickel sulfate and sulfuric acid, unlike the conventionally used Wood's nickel strike bath, it contains virtually no chlorine ions, so harmful chlorine is not generated even when an insoluble anode is used. There is no.
陰極電解処理後のめっきは、光沢ニッケルめっき、銀め
っき、金めつき、半田めっき、等種々の通常のめっきを
広範囲に良好に行なうことができる。After cathodic electrolytic treatment, a wide variety of conventional plating methods such as bright nickel plating, silver plating, gold plating, and solder plating can be successfully performed.
く実 施 例〉 以下、本発明について実施例により具体的に説明する。Example of implementation Hereinafter, the present invention will be specifically explained with reference to Examples.
実施例1
厚さ0.12mm、幅15mmのステンレス鋼(5O5
304)の板を用意し、下記の工程に従ってニッケルめ
っきを行なった。Example 1 Stainless steel (5O5) with a thickness of 0.12 mm and a width of 15 mm
A plate of No. 304) was prepared and nickel plated according to the following steps.
(1) 陽極電解脱脂:水酸化ナトリウム30g/2、
炭酸ナトリウム30g、l、界面活性剤0.5g/R,
の脱脂液中で、60℃、陽極電流密度5八/drn’、
処理時間30秒の条件で陽極電解脱脂を行なった。(1) Anodic electrolytic degreasing: sodium hydroxide 30g/2,
Sodium carbonate 30g, l, surfactant 0.5g/R,
in a degreasing solution at 60°C, anode current density 58/drn',
Anodic electrolytic degreasing was performed under conditions of a treatment time of 30 seconds.
(2) 酸洗:1Ovojll、塩酸中に、室温で30
秒間浸を貞した。(2) Pickling: 1Ovojll in hydrochloric acid for 30 minutes at room temperature.
I soaked it for a second.
(3) 陰極電解処理による活性化: NiSO4・6
H20240g/ It、 H2S04 (98vo
ffi* ) 50 mM/1の活性化処理液中で2
5℃、陰極電流密度10A/drn2.1分間陰極電解
処理を行なった。陽極にはカーボン電極をイ吏用した。(3) Activation by cathodic electrolytic treatment: NiSO4/6
H20240g/It, H2S04 (98vo
ffi*) 2 in 50 mM/1 activation treatment solution
Cathode electrolytic treatment was performed at 5° C. and cathode current density of 10 A/drn for 2.1 minutes. A carbon electrode was used as the anode.
(4) 光沢ニッケルめっき:硫酸ニッケル240g/
L、塩化ニッケル45g/u、ホウ酸40g/fi、光
沢剤荏原ニージンライト製$610.4 r*l/ l
、#63、10社/2、pH3,6の光沢ニッケルめっ
き液で55℃、陰極電流密度5八/drn2.3分間の
条件でめっきを行ない、厚さ約3μの均一な外観の光沢
ニッケルめっき板を得た。(4) Bright nickel plating: Nickel sulfate 240g/
L, nickel chloride 45g/u, boric acid 40g/fi, brightener made by Ebara Nijin Light $610.4 r*l/l
, #63, 10 companies/2, plating with a bright nickel plating solution of pH 3.6 at 55°C and cathode current density of 58/drn for 2.3 minutes, resulting in bright nickel plating with a uniform appearance and a thickness of approximately 3μ. Got the board.
上記の光沢ニッケルめっきステンレス板を折り曲げ61
90度て3回曲げ戻した結果、めっきの剥離は認められ
ず密着性は良好であった。また、450℃に加熱したホ
ットプレート上で3分間加熱した後も、めっきのフクレ
、剥離などの異常は認められなかった。Bending the above bright nickel plated stainless steel plate 61
As a result of bending back three times at 90 degrees, no peeling of the plating was observed and the adhesion was good. Further, even after heating for 3 minutes on a hot plate heated to 450° C., no abnormalities such as blistering or peeling of the plating were observed.
実施例2
直径1.ononのステンレス鋼線を用意し、下記の工
程に従って銀めっきを行なった。Example 2 Diameter 1. Onon stainless steel wire was prepared and silver plated according to the following steps.
(1)〜(3) 実施例1の(1)〜(3)に同じ。(1) to (3) Same as (1) to (3) of Example 1.
(4) 銅ストライクめっきニジアン化銅50g/l’
、 シアン化カリウム83g/ffi、ロア セJL/
塩40g/lのアルカリ鋼めっき液で、50℃、陰極電
流密度2八/drn’、30秒間銅ストライクめっきを
行なった。(4) Copper strike plating copper dianide 50g/l'
, Potassium cyanide 83g/ffi, Roise JL/
Copper strike plating was performed using an alkaline steel plating solution containing 40 g/l of salt at 50° C. and a cathode current density of 28/drn' for 30 seconds.
(5) 銀めっきニジアン化銀2g/l、シアン化カリ
ウム70g/ILの銀ストライクめっき液で室温、陰極
電流密度4A/dm′、5秒間ストライクめっきを行な
った後、引続いてシアン化銀50g/fi、シアン化カ
リウム80g/I1.の銀めっき液で室温、陰極電流密
度2 A/drn2.4分間めっきを行ない、厚さ約5
μの銀めっき線を得た。(5) Silver plating After performing strike plating with a silver strike plating solution containing 2 g/l of silver dianide and 70 g/IL of potassium cyanide at room temperature and a cathode current density of 4 A/dm' for 5 seconds, successively plating with 50 g/fi of silver cyanide , potassium cyanide 80g/I1. Plating was carried out for 2.4 minutes at room temperature with a silver plating solution at a cathode current density of 2 A/drn, and the thickness was approximately 5.
A μ silver plated wire was obtained.
上記の銀めっきステンレス鋼線を実施例1と同様にして
、折曲げおよび加熱試験に供したが、めっきの剥離、フ
クレ等の異常は認められず、密着性は良好であった。The above silver-plated stainless steel wire was subjected to a bending and heating test in the same manner as in Example 1, but no abnormalities such as peeling of the plating or blistering were observed, and the adhesion was good.
なお、実施例1.2の活性化処理液は繰返し使用後も浴
組成の変動は掻くわずかであった。It should be noted that the activation treatment solution of Example 1.2 showed very little variation in bath composition even after repeated use.
〈発明の効果〉
本発明のステンレス鋼へのめっき方法によれば、硫酸ニ
ッケルと硫酸を含む水溶液中で陰極電解処理した後所望
のめっきを行なうことができるので、ステンレス鋼素材
表面に密着性および外観の良好な各種のめっきが可能で
あり、更に次のような効果が得られる。<Effects of the Invention> According to the method of plating stainless steel of the present invention, desired plating can be performed after cathodic electrolytic treatment in an aqueous solution containing nickel sulfate and sulfuric acid, so that the surface of the stainless steel material has good adhesion and Various types of plating with good appearance are possible, and the following effects can also be obtained.
(1) 従来の化学研磨あるいは電解研磨等を利用する
活性化処理方法を用いためつきでしばしば見られる素地
荒れによる外観不良かない。(1) There is no appearance defect due to roughness of the substrate, which is often seen when the activation treatment method using conventional chemical polishing or electrolytic polishing is used.
(2) ウッドニッケルストライク法のように腐食性の
強い塩酸を使用しないので作業環境への悪影響や、周辺
装置・機器等の損傷か少ない。(2) Unlike the Wood Nickel Strike method, highly corrosive hydrochloric acid is not used, so there is less negative impact on the working environment and less damage to peripheral devices and equipment.
(3) 陰極電解処理用の陽極として不溶性陽極が使用
できるので、活性化処理浴の組成変動を極〈小さく抑え
られ、陰極電解液等の浴管理が容易となる。(3) Since an insoluble anode can be used as the anode for catholytic electrolytic treatment, fluctuations in the composition of the activation treatment bath can be kept to a minimum, and bath management of the catholyte and the like becomes easy.
出 願 人 日立電線株式会社Applicant: Hitachi Cable, Ltd.
Claims (3)
ルと硫酸を含む水溶液中で陰極電解処理した後、所望の
めっきを行なうことを特徴とするステンレス鋼へのめっ
き方法。(1) A method for plating stainless steel, which comprises subjecting a pre-cleaned stainless steel material to cathodic electrolysis treatment in an aqueous solution containing nickel sulfate and sulfuric acid, and then subjecting it to desired plating.
陽極とすることを特徴とする特許請求の範囲第1項に記
載のステンレス鋼へのめっき方法。(2) The method for plating stainless steel according to claim 1, wherein the anode used in the cathodic electrolytic treatment is an insoluble anode.
O_4・6H_2O、100〜300g/l)H_2S
O_4、98vol%として、20〜150ml/lを
含む水溶液である特許請求の範囲第1項または第2項に
記載のステンレス鋼へのめっき方法。(3) The aqueous solution containing nickel sulfate and sulfuric acid is NiS
O_4・6H_2O, 100-300g/l)H_2S
The method for plating stainless steel according to claim 1 or 2, which is an aqueous solution containing 20 to 150 ml/l of O_4, 98 vol%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15384085A JPS6217196A (en) | 1985-07-12 | 1985-07-12 | Method for plating stainless steel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15384085A JPS6217196A (en) | 1985-07-12 | 1985-07-12 | Method for plating stainless steel |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6217196A true JPS6217196A (en) | 1987-01-26 |
Family
ID=15571247
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15384085A Pending JPS6217196A (en) | 1985-07-12 | 1985-07-12 | Method for plating stainless steel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6217196A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6439395A (en) * | 1987-08-06 | 1989-02-09 | Kawasaki Steel Co | Manufacture of stainless steel strip galvanized with zn or zn-ni alloy |
WO2003095713A1 (en) * | 2002-05-07 | 2003-11-20 | University Of Southern California | Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56152957A (en) * | 1980-04-28 | 1981-11-26 | Hitachi Cable Ltd | Pretreatment of metallic wire body for plating |
-
1985
- 1985-07-12 JP JP15384085A patent/JPS6217196A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56152957A (en) * | 1980-04-28 | 1981-11-26 | Hitachi Cable Ltd | Pretreatment of metallic wire body for plating |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6439395A (en) * | 1987-08-06 | 1989-02-09 | Kawasaki Steel Co | Manufacture of stainless steel strip galvanized with zn or zn-ni alloy |
WO2003095713A1 (en) * | 2002-05-07 | 2003-11-20 | University Of Southern California | Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate |
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