JPS6216956B2 - - Google Patents
Info
- Publication number
- JPS6216956B2 JPS6216956B2 JP19075682A JP19075682A JPS6216956B2 JP S6216956 B2 JPS6216956 B2 JP S6216956B2 JP 19075682 A JP19075682 A JP 19075682A JP 19075682 A JP19075682 A JP 19075682A JP S6216956 B2 JPS6216956 B2 JP S6216956B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- group
- chloride
- product
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 claims description 11
- -1 organosilane compound Chemical class 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 150000003512 tertiary amines Chemical class 0.000 claims description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 150000001282 organosilanes Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000004566 IR spectroscopy Methods 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- ONIKNECPXCLUHT-UHFFFAOYSA-N 2-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1Cl ONIKNECPXCLUHT-UHFFFAOYSA-N 0.000 description 1
- GPZXFICWCMCQPF-UHFFFAOYSA-N 2-methylbenzoyl chloride Chemical class CC1=CC=CC=C1C(Cl)=O GPZXFICWCMCQPF-UHFFFAOYSA-N 0.000 description 1
- YHOYYHYBFSYOSQ-UHFFFAOYSA-N 3-methylbenzoyl chloride Chemical compound CC1=CC=CC(C(Cl)=O)=C1 YHOYYHYBFSYOSQ-UHFFFAOYSA-N 0.000 description 1
- NQUVCRCCRXRJCK-UHFFFAOYSA-N 4-methylbenzoyl chloride Chemical compound CC1=CC=C(C(Cl)=O)C=C1 NQUVCRCCRXRJCK-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- GXGJIOMUZAGVEH-UHFFFAOYSA-N Chamazulene Chemical group CCC1=CC=C(C)C2=CC=C(C)C2=C1 GXGJIOMUZAGVEH-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical class [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 238000012844 infrared spectroscopy analysis Methods 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Description
本発明は新規なアミノシラン化合物の製造方法
に関する。
オルガノシラン化合物は有機物質と無機物質の
結合の中介をなす有用な物質であつて近年種々の
化合物とその用途が開発されている。本発明はこ
の分野において有益な貢献をなすものである。
一般に酸塩化物と第1級アミンとの反応は非常
に進行しやすく、アミド化合物が得られることが
知られているが、この反応をアミノアルキルトリ
アルコキシシランに応用した例は未だ知られてい
ない。
本発明によれば一般式
は3個までの低級アルキル基、ハロゲン原子、x
は0、1、2または3、Zは低級アルキル基)を
有する新規なオルガノシラン化合物が提供され、
該化合物は一般式
The present invention relates to a novel method for producing aminosilane compounds. Organosilane compounds are useful substances that mediate the bond between organic and inorganic substances, and various compounds and their uses have been developed in recent years. The present invention makes a valuable contribution to this field. It is generally known that the reaction between acid chlorides and primary amines proceeds very easily and yields amide compounds, but there are no known examples of this reaction being applied to aminoalkyltrialkoxysilanes. . According to the invention, the general formula is up to 3 lower alkyl groups, halogen atoms, x
is 0, 1, 2 or 3, Z is a lower alkyl group), a novel organosilane compound is provided,
The compound has the general formula
【式】((R)o
は前記の通り)を有する酸塩化物と一般式
NH2CH2(CH2)xSi(OZ)3(x、Zは前記の通
り)で表わされるアミノアルキルトリアルコキシ
シランを第3級アミンの存在下に反応させること
により製造される。
本発明にかかる化合物において、−CH2
(CH2)x−基はメチレン、エチレン(ジメチレ
ン)、トリメチレン、テトラメチレン、等の炭素
原子1〜4個を有する任意のアルキレン基に限定
される。炭素原子が5個以上になると、その製造
が工業的に容易でなく原料として入手しにくくな
る。
また−OZ基は通常の条件のもとで加水分解し
得るアルコキシ基であり、Zは炭素数約3までの
アルキル基が望ましい。炭素数があまり大きくな
ると加水分解の速度が遅くなるからである。
同様に、酸塩化物の低級アルキル基は炭素原子
が3個までのものが好ましい。炭素原子数が4以
上になるとその製造が工業的に容易でなく原料と
して入手し難くなる。
要するに本発明の反応は本質的には、−COCl基
と−NH2基だけが関係している。従つてR、Z、
xについては特別に長大とならない限り大きさに
制限はないが工業的実際問題として上記のように
限定されよう。
本発明にかかるオルガノシランの合成に塩化水
素捕集剤として使用される第三級アミンの例はト
リエチルアミン、トリプロピルアミン、トリブチ
ルアミン、ピリジン、N・N−ジメチルアニリン
等である。
反応は通常エチルエーテル、ベンゼン、n−ヘ
キサン、トルエン、テトラヒドロフランのような
酸塩化物、アミノアルキルトリアルコキシシラン
および第三級アミンに対して不活性な溶媒中で、
これらの溶媒の沸点以下の温度で行われる。
反応は所望の生成物即ち
RCONHCH2(CH2)xSi(OZ)3の生成と副生成物
即ち第三級アミン塩酸塩の沈澱をともなつて進行
し、沈澱を別し、溶媒を留去して目的物を得
る。
アミノアルキルトリアルコキシシラン反応体は
トリ−n−ブチルアミンを触媒として使用し、ア
クリロニトリルをトリクロルシランと反応させ、
生成するクロルシラン付加物をアルコキシ化し、
ついでニトリル基に水素添加するとによつて合成
することができる。
本発明によつて得られるオルガノシランの有益
な特徴は、その分子の一端にアミド結合を有する
官能基を、他端に加水分解によつてシロキサン結
合を生成する官能基を有することであり、−CH2
(CH2)x−基はアミド結合を含む官能基をこのケ
イ素原子に結合する安定な橋を提供するものであ
る。
本発明によつて得られるオルガノシランは有機
樹脂材料と無機質の基体構成要素ないし骨材から
形成される成型物品にすぐれた強度と耐候性を与
えるのに有用であり、かくてすぐれた成型物品を
製造することができる。
以下に本発明の実施例を記載するが、これらの
実施例は単に本発明を例示するものであつて、こ
れを何等限定するものではない。
実施例 1
撹拌装置、コンデンサー、滴下漏斗を備えた
250mlの反応容器に44gのγ−アミノプロピルト
リエトキシシランと、20gのトリエチルアミンと
100mlのエチルエーテルを入れて、窒素雰囲気中
で撹拌しながら、28gの塩化ベンゾイルを滴下す
る。反応が激しく起こるので反応容器は氷水で冷
した。滴下終了後、20℃で1時間撹拌して反応を
進めた。次に沈澱物を別し、エチルエーテルで
洗浄後、液中のエチルエーテルを留去し、次に
減圧蒸留によつて反応生成物を採取した。
生成物は沸点は190〜195℃/4mmHgで、収量
は55g、収率83%であつた。生成物は赤外線吸収
スペクトル分析(IR)および核磁気共鳴スペク
トル分析(NMR)により、フエニル基、アミド
基、Si−O−C結合、−CH2−CH2−CH2−結合、
等の存在が確認され(第1図および第2図参照)
と同定された。
実施例 2
実施例1と同じ装置に、44gのγ−アミノプロ
ピルトリエトキシシランと、16gのピリジンと
100mlのベンゼンを入れて、窒素雰囲気中で撹拌
しながら、31gのm−メチル塩化ベンゾイルを滴
下する。滴下終了後、20℃で1時間撹拌して反応
を進めた。次に沈澱物を別し、エチルエーテル
で洗浄後、液中のエーテル、ベンゼンを留去し
たところ、68gの反応生成物が得られ、収率100
%であつた。生成物は実施例1と同様の方法で
と同定された。即ちフエニル基のm−CH3基は、
出発物質の酸塩化物との核磁気共鳴スペクトルの
比較によつて確認された。
同様にO−メチル塩化ベンゾイル及びp−メチ
ル塩化ベンゾイルについても、それらの誘導体が
それぞれ収量67g、68g、収率99%、100%で得
られ、同様に同定された。
実施例 3
実施例1と同じ装置に、44gのγ−アミノプロ
ピルトリエトキシシランと、20gのトリエチルア
ミンと、100mlのn−ヘキサンを入れて、窒素雰
囲気中で撹拌しながら、35gの塩化p−クロルベ
ンゾイルを滴下する。以下実施例2と同じ操作を
行なつた。そして70.5gの反応生成物が得られ、
収率98%であつた。生成物は実施例2と同様の方
法で
と同定された。
同様に塩化O−クロルベンゾイル及び塩化m−
クロルベンゾイルについても、それらの誘導体が
それぞれ収量70g、71g、収率97%、99%で得ら
れ、同様に同定された。An acid chloride having the formula ((R) o is as above) and an aminoalkyltritriamide represented by the general formula NH 2 CH 2 (CH 2 ) x Si(OZ) 3 (x and Z are as above). It is produced by reacting an alkoxysilane in the presence of a tertiary amine. In the compound according to the present invention, -CH 2
The ( CH2 ) x- group is limited to any alkylene group having 1 to 4 carbon atoms, such as methylene, ethylene (dimethylene), trimethylene, tetramethylene, and the like. When the number of carbon atoms is 5 or more, it is not industrially easy to manufacture and difficult to obtain as a raw material. Further, the -OZ group is an alkoxy group that can be hydrolyzed under normal conditions, and Z is preferably an alkyl group having up to about 3 carbon atoms. This is because when the number of carbon atoms becomes too large, the rate of hydrolysis becomes slow. Similarly, the lower alkyl group of the acid chloride preferably has up to 3 carbon atoms. When the number of carbon atoms is 4 or more, it is not industrially easy to manufacture and difficult to obtain as a raw material. In short, the reaction of the present invention essentially involves only -COCl and -NH2 groups. Therefore, R, Z,
There is no limit to the size of x unless it is particularly large, but it will be limited as described above as an industrial practical problem. Examples of tertiary amines used as hydrogen chloride scavengers in the synthesis of organosilanes according to the invention are triethylamine, tripropylamine, tributylamine, pyridine, N.N-dimethylaniline, and the like. The reaction is usually carried out in a solvent inert towards acid chlorides, aminoalkyltrialkoxysilanes and tertiary amines, such as ethyl ether, benzene, n-hexane, toluene, tetrahydrofuran.
It is carried out at a temperature below the boiling point of these solvents. The reaction proceeds with the formation of the desired product, namely RCONHCH 2 (CH 2 ) x Si(OZ) 3 and the precipitation of a by-product, namely tertiary amine hydrochloride. and get the object. The aminoalkyltrialkoxysilane reactant reacts acrylonitrile with trichlorosilane using tri-n-butylamine as a catalyst;
The resulting chlorosilane adduct is alkoxylated,
It can then be synthesized by hydrogenating the nitrile group. An advantageous feature of the organosilane obtained according to the invention is that it has at one end of its molecule a functional group having an amide bond, and at the other end a functional group that generates a siloxane bond by hydrolysis, - CH 2
The (CH 2 ) x - group provides a stable bridge that connects a functional group containing an amide bond to this silicon atom. The organosilanes obtained in accordance with the present invention are useful in providing superior strength and weather resistance to molded articles formed from organic resin materials and inorganic base components or aggregates, thus providing superior molded articles. can be manufactured. Examples of the present invention will be described below, but these examples are merely illustrative of the present invention and are not intended to limit it in any way. Example 1 Equipped with stirrer, condenser, and dropping funnel
In a 250 ml reaction vessel, add 44 g of γ-aminopropyltriethoxysilane and 20 g of triethylamine.
Add 100 ml of ethyl ether and dropwise add 28 g of benzoyl chloride while stirring under nitrogen atmosphere. The reaction vessel was cooled with ice water since the reaction occurred violently. After the dropwise addition was completed, the reaction was stirred at 20° C. for 1 hour. Next, the precipitate was separated, washed with ethyl ether, the ethyl ether in the liquid was distilled off, and then the reaction product was collected by distillation under reduced pressure. The product had a boiling point of 190-195°C/4 mmHg and a yield of 55 g, 83%. The product was determined by infrared absorption spectroscopy (IR) and nuclear magnetic resonance spectroscopy (NMR) to identify phenyl groups, amide groups, Si-O-C bonds, -CH2 - CH2 - CH2 -bonds,
(See Figures 1 and 2) was identified. Example 2 In the same apparatus as in Example 1, 44 g of γ-aminopropyltriethoxysilane and 16 g of pyridine were added.
100 ml of benzene is charged and 31 g of m-methylbenzoyl chloride is added dropwise while stirring in a nitrogen atmosphere. After the addition was completed, the reaction was stirred at 20° C. for 1 hour. Next, the precipitate was separated, and after washing with ethyl ether, the ether and benzene in the liquid were distilled off, and 68 g of the reaction product was obtained, with a yield of 100.
It was %. The product was prepared in the same manner as in Example 1. was identified. That is, the m-CH 3 group of the phenyl group is
Confirmed by comparison of nuclear magnetic resonance spectra with the starting acid chloride. Similarly, derivatives of O-methylbenzoyl chloride and p-methylbenzoyl chloride were obtained in yields of 67 g and 68 g, 99% and 100%, respectively, and were similarly identified. Example 3 Into the same apparatus as in Example 1, 44 g of γ-aminopropyltriethoxysilane, 20 g of triethylamine, and 100 ml of n-hexane were placed, and while stirring in a nitrogen atmosphere, 35 g of p-chlorochloride was added. Add benzoyl dropwise. Hereinafter, the same operations as in Example 2 were performed. And 70.5g of reaction product was obtained,
The yield was 98%. The product was prepared in the same manner as in Example 2. was identified. Similarly, O-chlorobenzoyl chloride and m-chloride
Regarding chlorobenzoyl, derivatives thereof were obtained in yields of 70 g and 71 g, 97% and 99%, respectively, and were similarly identified.
第1図は本発明の製法によつて得た化合物の赤
外分光分析のチヤートである。第2図は同じ化合
物の核磁気共鳴分析のチヤートである。
FIG. 1 is a chart of infrared spectroscopic analysis of a compound obtained by the production method of the present invention. Figure 2 is a chart of nuclear magnetic resonance analysis of the same compound.
Claims (1)
ル基、ハロゲンである酸塩化物と一般式 NH2CH2(CH2)xSi(OZ)3で表わされ、式中Zは
低級アルキル基であり、xは0、1、2または3
であるアミノアルキルトリアルコキシシランを、
第三級アミンの存在下に反応させることからなる
一般式 で表わされ、式中Z、およびxは前記と同じであ
る新規なオルガノシラン化合物の製法。[Claims] 1. General formula represented by the formula NH 2 CH 2 (CH 2 ) Z is a lower alkyl group, x is 0, 1, 2 or 3
An aminoalkyltrialkoxysilane that is
General formula consisting of reaction in the presence of a tertiary amine A method for producing a novel organosilane compound represented by the formula, where Z and x are the same as described above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19075682A JPS5931781A (en) | 1982-11-01 | 1982-11-01 | Preparation of novel organosilane compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19075682A JPS5931781A (en) | 1982-11-01 | 1982-11-01 | Preparation of novel organosilane compound |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50031777A Division JPS51108022A (en) | 1975-03-18 | 1975-03-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5931781A JPS5931781A (en) | 1984-02-20 |
JPS6216956B2 true JPS6216956B2 (en) | 1987-04-15 |
Family
ID=16263206
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19075682A Granted JPS5931781A (en) | 1982-11-01 | 1982-11-01 | Preparation of novel organosilane compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5931781A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63109949U (en) * | 1987-01-07 | 1988-07-15 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6224444B2 (en) * | 2013-12-03 | 2017-11-01 | 株式会社Adeka | Resin composition, thermally conductive cured product, silicon compound, silane coupling agent composition and carrier |
-
1982
- 1982-11-01 JP JP19075682A patent/JPS5931781A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63109949U (en) * | 1987-01-07 | 1988-07-15 |
Also Published As
Publication number | Publication date |
---|---|
JPS5931781A (en) | 1984-02-20 |
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