JPS6216526A - 投影露光装置及びそれを用いたデバイス製造方法 - Google Patents

投影露光装置及びそれを用いたデバイス製造方法

Info

Publication number
JPS6216526A
JPS6216526A JP60155349A JP15534985A JPS6216526A JP S6216526 A JPS6216526 A JP S6216526A JP 60155349 A JP60155349 A JP 60155349A JP 15534985 A JP15534985 A JP 15534985A JP S6216526 A JPS6216526 A JP S6216526A
Authority
JP
Japan
Prior art keywords
optical system
wafer
mark
slit
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60155349A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0560254B2 (enrdf_load_stackoverflow
Inventor
Makoto Torigoe
真 鳥越
Hiroshi Sato
宏 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60155349A priority Critical patent/JPS6216526A/ja
Publication of JPS6216526A publication Critical patent/JPS6216526A/ja
Priority to US07/724,451 priority patent/US5114223A/en
Publication of JPH0560254B2 publication Critical patent/JPH0560254B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60155349A 1985-07-15 1985-07-15 投影露光装置及びそれを用いたデバイス製造方法 Granted JPS6216526A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60155349A JPS6216526A (ja) 1985-07-15 1985-07-15 投影露光装置及びそれを用いたデバイス製造方法
US07/724,451 US5114223A (en) 1985-07-15 1991-07-03 Exposure method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60155349A JPS6216526A (ja) 1985-07-15 1985-07-15 投影露光装置及びそれを用いたデバイス製造方法

Publications (2)

Publication Number Publication Date
JPS6216526A true JPS6216526A (ja) 1987-01-24
JPH0560254B2 JPH0560254B2 (enrdf_load_stackoverflow) 1993-09-01

Family

ID=15603946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60155349A Granted JPS6216526A (ja) 1985-07-15 1985-07-15 投影露光装置及びそれを用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JPS6216526A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5117254A (en) * 1988-05-13 1992-05-26 Canon Kabushiki Kaisha Projection exposure apparatus
JPH056906U (ja) * 1991-06-28 1993-01-29 太陽誘電株式会社 誘電体フイルタ
US5489966A (en) * 1988-05-13 1996-02-06 Canon Kabushiki Kaisha Projection exposure apparatus
CN103309169A (zh) * 2012-03-05 2013-09-18 佳能株式会社 检测装置、曝光装置和制造器件的方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5117254A (en) * 1988-05-13 1992-05-26 Canon Kabushiki Kaisha Projection exposure apparatus
US5489966A (en) * 1988-05-13 1996-02-06 Canon Kabushiki Kaisha Projection exposure apparatus
JPH056906U (ja) * 1991-06-28 1993-01-29 太陽誘電株式会社 誘電体フイルタ
CN103309169A (zh) * 2012-03-05 2013-09-18 佳能株式会社 检测装置、曝光装置和制造器件的方法
CN103309169B (zh) * 2012-03-05 2016-03-02 佳能株式会社 检测装置、曝光装置和制造器件的方法
US9523927B2 (en) 2012-03-05 2016-12-20 Canon Kabushiki Kaisha Exposure apparatus with detection apparatus for detection of upper and lower surface marks, and device manufacturing method

Also Published As

Publication number Publication date
JPH0560254B2 (enrdf_load_stackoverflow) 1993-09-01

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