JPS62157970U - - Google Patents
Info
- Publication number
- JPS62157970U JPS62157970U JP4669886U JP4669886U JPS62157970U JP S62157970 U JPS62157970 U JP S62157970U JP 4669886 U JP4669886 U JP 4669886U JP 4669886 U JP4669886 U JP 4669886U JP S62157970 U JPS62157970 U JP S62157970U
- Authority
- JP
- Japan
- Prior art keywords
- substrate holder
- frame
- hole
- cvd apparatus
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 3
- 239000011148 porous material Substances 0.000 claims 2
- 239000007769 metal material Substances 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986046698U JPH0527494Y2 (cg-RX-API-DMAC10.html) | 1986-03-28 | 1986-03-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986046698U JPH0527494Y2 (cg-RX-API-DMAC10.html) | 1986-03-28 | 1986-03-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62157970U true JPS62157970U (cg-RX-API-DMAC10.html) | 1987-10-07 |
| JPH0527494Y2 JPH0527494Y2 (cg-RX-API-DMAC10.html) | 1993-07-13 |
Family
ID=30866601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986046698U Expired - Lifetime JPH0527494Y2 (cg-RX-API-DMAC10.html) | 1986-03-28 | 1986-03-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0527494Y2 (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998005803A1 (en) * | 1996-08-05 | 1998-02-12 | Komatsu Ltd. | Surface treatment apparatus, surface treatment method using the apparatus, and surface treatment nozzle used for the apparatus and method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58163432A (ja) * | 1982-03-24 | 1983-09-28 | Fujitsu Ltd | プラズマ化学気相成長装置 |
| JPS5948138A (ja) * | 1982-07-29 | 1984-03-19 | エクセロ・コ−ポレ−シヨン | ポリウレタン反応射出成形系 |
| JPS6137969A (ja) * | 1984-07-31 | 1986-02-22 | Canon Inc | プラズマｃｖｄ薄膜製造装置 |
-
1986
- 1986-03-28 JP JP1986046698U patent/JPH0527494Y2/ja not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58163432A (ja) * | 1982-03-24 | 1983-09-28 | Fujitsu Ltd | プラズマ化学気相成長装置 |
| JPS5948138A (ja) * | 1982-07-29 | 1984-03-19 | エクセロ・コ−ポレ−シヨン | ポリウレタン反応射出成形系 |
| JPS6137969A (ja) * | 1984-07-31 | 1986-02-22 | Canon Inc | プラズマｃｖｄ薄膜製造装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998005803A1 (en) * | 1996-08-05 | 1998-02-12 | Komatsu Ltd. | Surface treatment apparatus, surface treatment method using the apparatus, and surface treatment nozzle used for the apparatus and method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0527494Y2 (cg-RX-API-DMAC10.html) | 1993-07-13 |