JPS62157137U - - Google Patents
Info
- Publication number
- JPS62157137U JPS62157137U JP4405586U JP4405586U JPS62157137U JP S62157137 U JPS62157137 U JP S62157137U JP 4405586 U JP4405586 U JP 4405586U JP 4405586 U JP4405586 U JP 4405586U JP S62157137 U JPS62157137 U JP S62157137U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- reactive ion
- ion etching
- etching apparatus
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4405586U JPS62157137U (de) | 1986-03-26 | 1986-03-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4405586U JPS62157137U (de) | 1986-03-26 | 1986-03-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62157137U true JPS62157137U (de) | 1987-10-06 |
Family
ID=30861499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4405586U Pending JPS62157137U (de) | 1986-03-26 | 1986-03-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62157137U (de) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5739431B2 (de) * | 1976-12-30 | 1982-08-21 |
-
1986
- 1986-03-26 JP JP4405586U patent/JPS62157137U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5739431B2 (de) * | 1976-12-30 | 1982-08-21 |