JPS62145247A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS62145247A JPS62145247A JP60286368A JP28636885A JPS62145247A JP S62145247 A JPS62145247 A JP S62145247A JP 60286368 A JP60286368 A JP 60286368A JP 28636885 A JP28636885 A JP 28636885A JP S62145247 A JPS62145247 A JP S62145247A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- photomask
- liquid crystal
- crystal display
- display element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体装置の製造に用いられる露光装置のフォ
トマスクに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a photomask for an exposure apparatus used in manufacturing semiconductor devices.
従来、この種のフォトマスクは第２図に示すように石英
板２上にクローム等を用いて所望の図形１が形成されて
おり、露光装置の紫外線等の光源を選択的に透過して半
導体基板上にフォトマスクの図形を投影露光させていた
。Conventionally, this type of photomask has a desired pattern 1 formed on a quartz plate 2 using chrome or the like, as shown in FIG. The pattern of the photomask was projected onto the substrate and exposed.
上述した従来のフォトマスクは図形が石英板の１− Ｆ
／Ｉロー人竺づ喜罰イ拍イ１△１高水 ロフル亦化さ
せる為には、石英板上のクローム等をレーザービーム等
を用いて選択的に消去するかあるいはクローム等の石英
板上への選択的蒸着を必要とし、その為に特殊な蒸着装
置等を用いなければならない。The conventional photomask described above has a quartz plate 1-F pattern.
/I Law people's joy and punishment I beat 1△1 Takasui In order to make Rohru increase, the chrome etc. on the quartz plate must be selectively erased using a laser beam, etc., or the chrome etc. on the quartz plate selective vapor deposition is required, and special vapor deposition equipment must be used for this purpose.
従って、フォトマスク上の図形の一部分である小規模な
範囲の図形を修正するにも多大な工数を必要とするほか
、小規模の図形が異なるだけの半導体装置を製造する際
にも露光装置上のフォトマスクを交換する工数が必要と
なる欠点があった。Therefore, it takes a large amount of man-hours to correct a small-scale figure that is a part of a figure on a photomask, and when manufacturing a semiconductor device with only a small-scale difference, the exposure equipment The drawback was that it required many man-hours to replace the photomask.
ことに近年の高集積化と微細加工化を実現する縮小露光
装置においては、フォトマスクを交換するにはフォトマ
スクを非常に高精度に縮小露光装置の半導体基板用ステ
ージに設定する必要があり、小量多品種のカスタムニー
ズに対応しようとすると、縮小露光装置のスループット
の低下が大きな問題点となっている。In particular, with the recent reduction exposure equipment that has achieved high integration and microfabrication, in order to replace the photomask, it is necessary to set the photomask on the semiconductor substrate stage of the reduction exposure equipment with extremely high precision. When trying to meet the custom needs of small-volume, high-mix products, a reduction in the throughput of reduction exposure equipment has become a major problem.
本発明はフォトマスク上の図形を容易に修正できるフォ
トマスクを提供するものである。The present invention provides a photomask that allows for easy modification of graphics on the photomask.
本発明は外部信号によシ透過率が変化する光学素子を組
合せて露出用図形の一部又は全部を描いたこと・を特徴
とするフォトマスクである。The present invention is a photomask characterized in that part or all of an exposure pattern is drawn by combining optical elements whose transmittance changes depending on an external signal.
次に、本発明、の一実施例について図面を参照して説明
する。Next, one embodiment of the present invention will be described with reference to the drawings.
第１図は本発明の一実施例を示す図である。第１図にお
いて、１はクローム等で石英板２上に描かれた図形であ
る。３，３・・・はクロームによる図形１上にはり合わ
され、透明配線部４及び接触部５を通して外部制御部に
よって表面の光の透過、不透過全制御されるマトリック
ス状の小四辺形液晶表示素子であり、各液晶表示素子３
の光の透過、不透過により、任意の図形を小四辺形の集
まりとして表示することを可能としている。FIG. 1 is a diagram showing an embodiment of the present invention. In FIG. 1, 1 is a figure drawn on a quartz plate 2 using chrome or the like. 3, 3... are matrix-shaped small quadrilateral liquid crystal display elements which are pasted onto the chrome figure 1 and whose surface light transmission or non-transmission is fully controlled by an external control unit through the transparent wiring part 4 and the contact part 5. and each liquid crystal display element 3
By transmitting or not transmitting light, it is possible to display any figure as a collection of small quadrilaterals.
なお、接触部５を廃止し、制御部をフォトマスクと一体
化できることは言うまでもない。It goes without saying that the contact section 5 can be eliminated and the control section can be integrated with the photomask.
本発明によれば、マトリックス状に配列した液晶表示素
子３の透過率を外部信号によって変化させ、クローム等
による図形１の一部又は全部に液晶表示素子３による図
形を付加することにより、図形１を修正するものである
。According to the present invention, the transmittance of the liquid crystal display elements 3 arranged in a matrix is changed by an external signal, and the figure by the liquid crystal display element 3 is added to part or all of the figure 1 made of chrome or the like. This is to correct.
以上説明したように本発明はフォトマスク上の一部もし
くは、全部の図形を液晶などの光の透過性を変化できる
物質で構成することにより、容易に露光装置上で図形を
変化させることができる効果がある。As explained above, the present invention makes it possible to easily change the pattern on the exposure device by configuring part or all of the pattern on the photomask using a substance that can change the transmittance of light, such as liquid crystal. effective.
特に、本発明によるフォトマスクを縮小投影露光装置に
用いると、マスタースライス法による小量多品種ＩＣに
おいてフォトマスクの交換を必要とせず、縮小投影露光
装置のスループットを著しく上げる効果がある。In particular, when the photomask according to the present invention is used in a reduction projection exposure apparatus, there is no need to replace the photomask in small-volume, high-mix ICs using the master slicing method, and the throughput of the reduction projection exposure apparatus can be significantly increased.
第１図は本発明の実施例を示す図、第２図は従来のフォ
トマスクの図である。
１・・・クローム等により描かれた図形、２・・・石英
板、３・・・液晶表示素子、４・・・透明配線部、５・
・・接続部第１図
ン
第２図FIG. 1 is a diagram showing an embodiment of the present invention, and FIG. 2 is a diagram of a conventional photomask. DESCRIPTION OF SYMBOLS 1... Figure drawn with chrome etc., 2... Quartz plate, 3... Liquid crystal display element, 4... Transparent wiring part, 5...
・Connection part Fig. 1 - Fig. 2
Claims (1)
組合せて露出用図形の一部又は全部を描いたことを特徴
とするフォトマスク。(1) A photomask characterized in that part or all of an exposure pattern is drawn by combining optical elements whose light transmittance changes depending on an external signal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60286368A JPS62145247A (en) | 1985-12-19 | 1985-12-19 | Photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60286368A JPS62145247A (en) | 1985-12-19 | 1985-12-19 | Photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62145247A true JPS62145247A (en) | 1987-06-29 |
Family
ID=17703479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60286368A Pending JPS62145247A (en) | 1985-12-19 | 1985-12-19 | Photomask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62145247A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1947695A3 (en) * | 2007-01-16 | 2010-05-19 | Hitachi Displays, Ltd. | Display device |
-
1985
- 1985-12-19 JP JP60286368A patent/JPS62145247A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1947695A3 (en) * | 2007-01-16 | 2010-05-19 | Hitachi Displays, Ltd. | Display device |
| US8242505B2 (en) | 2007-01-16 | 2012-08-14 | Hitachi I Displays, Ltd. | Display device |
| US8629451B2 (en) | 2007-01-16 | 2014-01-14 | Japan Display Inc. | Display device |
| US8802511B2 (en) | 2007-01-16 | 2014-08-12 | Japan Display Inc. | Display device |
| US10068932B2 (en) | 2007-01-16 | 2018-09-04 | Japan Display Inc. | Display device |
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