JPS62143352A - 電子銃 - Google Patents
電子銃Info
- Publication number
- JPS62143352A JPS62143352A JP61283180A JP28318086A JPS62143352A JP S62143352 A JPS62143352 A JP S62143352A JP 61283180 A JP61283180 A JP 61283180A JP 28318086 A JP28318086 A JP 28318086A JP S62143352 A JPS62143352 A JP S62143352A
- Authority
- JP
- Japan
- Prior art keywords
- grid
- electron gun
- extraction grid
- extraction
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09707—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using an electron or ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8517724 | 1985-11-29 | ||
| FR8517724A FR2591035B1 (fr) | 1985-11-29 | 1985-11-29 | Canon a electrons operant par emission secondaire sous bombardement ionique |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62143352A true JPS62143352A (ja) | 1987-06-26 |
| JPH0456418B2 JPH0456418B2 (https=) | 1992-09-08 |
Family
ID=9325300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61283180A Granted JPS62143352A (ja) | 1985-11-29 | 1986-11-29 | 電子銃 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4777370A (https=) |
| EP (1) | EP0228318B1 (https=) |
| JP (1) | JPS62143352A (https=) |
| DE (1) | DE3664396D1 (https=) |
| FR (1) | FR2591035B1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63175324A (ja) * | 1984-04-02 | 1988-07-19 | 住友重機械工業株式会社 | プラズマ電子ガン |
| JPH04196039A (ja) * | 1990-11-28 | 1992-07-15 | Toshiba Corp | 電子銃 |
| JP2014533346A (ja) * | 2011-07-04 | 2014-12-11 | テトラ・ラヴァル・ホールディングス・アンド・ファイナンス・ソシエテ・アノニムTetra Laval Holdings & Finance S.A. | 冷却フランジを具備する電子ビーム放射器、及び当該電子ビーム放射器を冷却するための方法 |
| JP2016511516A (ja) * | 2013-03-15 | 2016-04-14 | ニコン・メトロロジー・エヌヴェ | X線源、高電圧発生器、電子ビーム銃、回転ターゲットアセンブリー、回転ターゲット、及び回転真空シール |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4749911A (en) * | 1987-03-30 | 1988-06-07 | Rpc Industries | Ion plasma electron gun with dose rate control via amplitude modulation of the plasma discharge |
| US4786844A (en) * | 1987-03-30 | 1988-11-22 | Rpc Industries | Wire ion plasma gun |
| US4977352A (en) * | 1988-06-24 | 1990-12-11 | Hughes Aircraft Company | Plasma generator having rf driven cathode |
| US5003226A (en) * | 1989-11-16 | 1991-03-26 | Avco Research Laboratories | Plasma cathode |
| EP2079092B1 (fr) | 2008-01-11 | 2010-08-11 | Excico Group | Dispositif et procédé d'alimentation électrique d'une source d'électrons et source d'électrons à émission secondaire sous bombardement ionique |
| CN101952931B (zh) * | 2008-01-11 | 2012-09-05 | 埃克西可集团公司 | 丝极放电离子源 |
| EP2079096B1 (fr) | 2008-01-11 | 2012-04-18 | Excico Group N.V. | Source d'ions à décharge électrique par filament |
| FR2926395B1 (fr) * | 2008-01-11 | 2010-05-14 | Excico Group | Source pulsee d'electrons, procede d'alimentation electrique pour source pulsee d'electrons et procede de commande d'une source pulsee d'electrons |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2204882B1 (https=) * | 1972-10-30 | 1976-10-29 | Onera (Off Nat Aerospatiale) | |
| US3970892A (en) * | 1975-05-19 | 1976-07-20 | Hughes Aircraft Company | Ion plasma electron gun |
| JPS58135752U (ja) * | 1982-03-05 | 1983-09-12 | ティーディーケイ株式会社 | 静電式複写機用帯電装置 |
| US4642522A (en) * | 1984-06-18 | 1987-02-10 | Hughes Aircraft Company | Wire-ion-plasma electron gun employing auxiliary grid |
-
1985
- 1985-11-29 FR FR8517724A patent/FR2591035B1/fr not_active Expired
-
1986
- 1986-11-13 DE DE8686402529T patent/DE3664396D1/de not_active Expired
- 1986-11-13 EP EP86402529A patent/EP0228318B1/fr not_active Expired
- 1986-11-18 US US06/932,141 patent/US4777370A/en not_active Expired - Lifetime
- 1986-11-29 JP JP61283180A patent/JPS62143352A/ja active Granted
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63175324A (ja) * | 1984-04-02 | 1988-07-19 | 住友重機械工業株式会社 | プラズマ電子ガン |
| JPH04196039A (ja) * | 1990-11-28 | 1992-07-15 | Toshiba Corp | 電子銃 |
| JP2014533346A (ja) * | 2011-07-04 | 2014-12-11 | テトラ・ラヴァル・ホールディングス・アンド・ファイナンス・ソシエテ・アノニムTetra Laval Holdings & Finance S.A. | 冷却フランジを具備する電子ビーム放射器、及び当該電子ビーム放射器を冷却するための方法 |
| JP2016511516A (ja) * | 2013-03-15 | 2016-04-14 | ニコン・メトロロジー・エヌヴェ | X線源、高電圧発生器、電子ビーム銃、回転ターゲットアセンブリー、回転ターゲット、及び回転真空シール |
| US9941090B2 (en) | 2013-03-15 | 2018-04-10 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, and rotary vacuum seal |
| US9947501B2 (en) | 2013-03-15 | 2018-04-17 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US9966217B2 (en) | 2013-03-15 | 2018-05-08 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10008357B2 (en) | 2013-03-15 | 2018-06-26 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10020157B2 (en) | 2013-03-15 | 2018-07-10 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10096446B2 (en) | 2013-03-15 | 2018-10-09 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10102997B2 (en) | 2013-03-15 | 2018-10-16 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2591035A1 (fr) | 1987-06-05 |
| JPH0456418B2 (https=) | 1992-09-08 |
| DE3664396D1 (en) | 1989-08-17 |
| FR2591035B1 (fr) | 1988-02-26 |
| EP0228318B1 (fr) | 1989-07-12 |
| EP0228318A1 (fr) | 1987-07-08 |
| US4777370A (en) | 1988-10-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |