JPS62142365A - Thin film solar battery - Google Patents
Thin film solar batteryInfo
- Publication number
- JPS62142365A JPS62142365A JP60283440A JP28344085A JPS62142365A JP S62142365 A JPS62142365 A JP S62142365A JP 60283440 A JP60283440 A JP 60283440A JP 28344085 A JP28344085 A JP 28344085A JP S62142365 A JPS62142365 A JP S62142365A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- transparent electrode
- deposited
- printing
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims description 5
- 238000007639 printing Methods 0.000 claims abstract description 14
- 238000007650 screen-printing Methods 0.000 claims abstract description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 8
- 238000000059 patterning Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 abstract description 11
- 239000002184 metal Substances 0.000 abstract description 11
- 239000011521 glass Substances 0.000 abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 abstract description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 7
- 239000000203 mixture Substances 0.000 abstract description 3
- 239000002904 solvent Substances 0.000 abstract description 3
- ARHIRDSNQLUBHR-UHFFFAOYSA-K 2-ethylhexanoate;indium(3+) Chemical compound [In+3].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O ARHIRDSNQLUBHR-UHFFFAOYSA-K 0.000 abstract description 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract description 2
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 abstract description 2
- 229930195733 hydrocarbon Natural products 0.000 abstract description 2
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 2
- 239000003495 polar organic solvent Substances 0.000 abstract description 2
- 239000008096 xylene Substances 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 235000015110 jellies Nutrition 0.000 abstract 1
- 239000008274 jelly Substances 0.000 abstract 1
- ZAGSCUBGRNEFFM-UHFFFAOYSA-J tris[(4-methylbenzoyl)oxy]stannyl 4-methylbenzoate Chemical compound CC1=CC=C(C(=O)[O-])C=C1.[Sn+4].CC1=CC=C(C(=O)[O-])C=C1.CC1=CC=C(C(=O)[O-])C=C1.CC1=CC=C(C(=O)[O-])C=C1 ZAGSCUBGRNEFFM-UHFFFAOYSA-J 0.000 abstract 1
- 238000000034 method Methods 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、透光性絶縁性基板上に形成された非晶質シリ
コン太陽電池に関するものであり、透明電極印刷インク
によって透光性電極の形成とパターニングを同時に行な
い非晶質シリコン太陽電池の低コスト化、大面積化をは
かるものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an amorphous silicon solar cell formed on a transparent insulating substrate, and the present invention relates to the formation of transparent electrodes using transparent electrode printing ink. By performing patterning at the same time, it is possible to reduce the cost and increase the area of amorphous silicon solar cells.
従来の技術
近年、この種の非晶質シリコン（ａ−８ｉ）太陽電池は
、民生用小型電子機器の電源として広く用いられている
。ガラスのような透光性絶縁基板上に形成されているａ
−８ｉ太陽電池の場合、ＩＴＯ（６％Ｓ ｎＯ２含有Ｉ
ｎ ２０３）やＳ ｎ Ｏ２からなる透光性第１電極
と、５ｔＨ４，Ｂ２Ｈ６，ＰＨ３，Ｈ２等の混合ガスの
グロー放電によって得られる非晶質シリコン層およびア
ルミニウム等の金属膜から構成される第２電極をそれぞ
れ適当な形状にパターニングすることによって、複数の
素子を同一基板上で直列接続することができる。しかし
、従来透光性第１電極をパターニングする場合、第２図
に示すように、真空蒸着法、スパッタ法、熱ＣＶＤ法に
よって３５０〜６５０℃にガラス板６を加熱し、酸素ガ
ス雰囲気中でガラス板全面にＩＴＯまたはＳｎＯ□７を
堆積させた後に、適当な形状にレジストインク８をスク
リーン印刷し、エツチングによって不用な部分のＩＴＯ
まだはＳｎ○２７を除去した後、溶剤に浸漬してレジス
トインク８を取り除き、ＩＴＯまたはＳ ｎ Ｏ２７の
パターニングが行なわれていた。このようにしてパター
ニングされた透光性共１電極９上にメタルマスクを用い
てａ−３ｉ１０をパターニング堆積し、さらにそのうえ
にアルミニウム等の金属薄膜をメタルマスクを用いてパ
ターニング蒸着し、第２電極１１を形成して複数の素子
が直列接続されたａ−３ｉ太陽電池が得られる。BACKGROUND OF THE INVENTION In recent years, this type of amorphous silicon (A-8I) solar cell has been widely used as a power source for small consumer electronic devices. A formed on a transparent insulating substrate such as glass
-8i solar cell, ITO (6% SnO2 containing I
A transparent first electrode made of S n 203) or S n O2, and a second electrode made of an amorphous silicon layer obtained by glow discharge of a mixed gas such as 5tH4, B2H6, PH3, H2, etc. and a metal film such as aluminum. By patterning the two electrodes into appropriate shapes, a plurality of elements can be connected in series on the same substrate. However, when conventionally patterning the translucent first electrode, as shown in FIG. After ITO or SnO□7 is deposited on the entire surface of the glass plate, resist ink 8 is screen printed in an appropriate shape, and ITO is removed from unnecessary areas by etching.
Until now, after removing Sn○27, the resist ink 8 was removed by immersion in a solvent, and patterning of ITO or SnO27 was performed. A-3i10 is patterned and deposited on the thus patterned translucent electrode 9 using a metal mask, and then a metal thin film such as aluminum is patterned and deposited on the second electrode 11 using a metal mask. An a-3i solar cell in which a plurality of elements are connected in series can be obtained.
発明が解決しようとする問題点
このような従来の構成による透光性第１電極を形成する
には、ａ−５ｉ、第２電極のようにメタルマスクによる
パターニング法を用いることができない。というのは、
ＩＴＯまたはＳ ｎ Ｏ２の堆積時の温度が３５０〜５
６０℃と高温であるために、メタルマスクが熱変形し、
所定のパターン精度が得られないためである。従ってガ
ラス板全面に形成されたＩＴＯまたはＳｎ○２膜にレジ
ストを印刷塗布し、エツチングによってパターニングす
るという工程をとらなければならなかった。Problems to be Solved by the Invention In order to form the light-transmitting first electrode with such a conventional structure, it is not possible to use a patterning method using a metal mask as in the case of the a-5i and second electrodes. I mean,
The temperature during deposition of ITO or SnO2 is 350-5
Due to the high temperature of 60℃, the metal mask is thermally deformed.
This is because a predetermined pattern accuracy cannot be obtained. Therefore, it was necessary to take the steps of printing and coating a resist on the ITO or Sn◯2 film formed on the entire surface of the glass plate and patterning it by etching.
本発明では上記のようなＩＴＯまたはＳ ｎ Ｏ２のエ
ツチング工程なしで、透明電極印刷インクを用いてパタ
ーニングされた透光性第１電極を形成することを目的と
する。The present invention aims to form a transparent first electrode patterned using a transparent electrode printing ink without the above-described ITO or SnO2 etching process.
問題点を解決するだめの手段
本発明では上記の目的を達成するために、スクリーン印
刷可能な透明電極印刷インクを用いてガラス板上に適当
なパターンを印刷した後、焼成炉で加熱を行ない所定の
透光性第１電極を形成し、この上にａ−ＳＬ堆積層、ア
ルミニウム等の第２電極を形成し、同一基板上に複数個
の素子が直列接続されたａ−Ｓｉ太陽電池としたもので
ある。Means for Solving the Problems In the present invention, in order to achieve the above object, a suitable pattern is printed on a glass plate using a screen-printable transparent electrode printing ink, and then heated in a firing furnace to form a predetermined pattern. A translucent first electrode was formed, and an a-SL deposited layer and a second electrode made of aluminum, etc. were formed thereon to form an a-Si solar cell in which multiple elements were connected in series on the same substrate. It is something.
作 用
このようなスクリーン印刷によって所定のパターンに塗
布した後、焼成炉で加熱を行なって形成した透光性第１
電極では従来のようにエツチング工程を用いないで透光
性の第１電極を形成することが可能となる。その透光性
第１電極上にａ−３ｉとアルミニウム等の第２電極をメ
タルマスクを用いて所定のパターンに形成することによ
って同一基板上に複数個の素子を直列接続することが可
能となる。Function: The transparent first layer is coated in a predetermined pattern by screen printing and then heated in a firing furnace.
For the electrode, it becomes possible to form a transparent first electrode without using an etching process as in the conventional method. By forming a-3i and a second electrode made of aluminum or the like on the transparent first electrode in a predetermined pattern using a metal mask, it becomes possible to connect multiple devices in series on the same substrate. .
実施例 次に本発明の実施例について第１図により説明する。Example Next, an embodiment of the present invention will be described with reference to FIG.
２−エチルへキサン酸インジウムと１）−トルイル酸す
ずの混合物Ｉｎ：５ｎ＝９５：５をキシレンなどの炭化
水素溶剤に溶かして濃度が２０ｗｔ％となるように調製
する。この溶液はゼリー状に固ったものとなるため、シ
クロヘキサノール等の極性有機溶剤を少量加えてスクリ
ーン印刷可能な粘度４００〜６００ポアズに調製し、透
明電極印刷インクとする。A mixture of indium 2-ethylhexanoate and tin 1)-toluate, In:5n=95:5, is dissolved in a hydrocarbon solvent such as xylene to a concentration of 20 wt%. Since this solution solidifies into a jelly-like state, a small amount of a polar organic solvent such as cyclohexanol is added to adjust the viscosity to 400 to 600 poise, which is suitable for screen printing, and is used as a transparent electrode printing ink.
上記透明電極印刷インクをスクリーン印刷によりガラス
板１上に所定のパターンで印刷することにより透明電極
印刷層２を形成し、次に焼成は５３０℃に昇温された電
気炉の中で１２０分行なう。The transparent electrode printing layer 2 is formed by printing the above transparent electrode printing ink in a predetermined pattern on the glass plate 1 by screen printing, and then baking is performed for 120 minutes in an electric furnace heated to 530°C. .
このような方法で形成された透光性第１電極３は厚さ１
６００人の時、シート抵抗が０．８〜０．８にΩ、光透
過率９３〜９６％の特性が得られる。The transparent first electrode 3 formed by such a method has a thickness of 1
When the number of people is 600, sheet resistance is 0.8 to 0.8 Ω and light transmittance is 93 to 96%.
これは電卓等の小型電子機器に用いられる小電力用のａ
−３ｉ太陽電池の電極として十分な特性である。This is a low power a used in small electronic devices such as calculators.
-3i It has sufficient characteristics as an electrode for a solar cell.
この透光性第１電極３のうえに、メタルマスクを用いて
適当な形状にパターニングされたａ−Ｓｉ４を堆積する
。ａ−３Ｌ４は通常のプラズマＣＶＤ法によって作製し
、ｐ型ａ−３ｉ、ｉ型ａ−３ｉ、ｎ型ａ−３Ｌと順次堆
積されている。On this transparent first electrode 3, a-Si4 patterned into an appropriate shape is deposited using a metal mask. A-3L4 is produced by a normal plasma CVD method, and p-type a-3i, i-type a-3i, and n-type a-3L are sequentially deposited.
さらにメタルマスクを用いて適当な形状にパターニング
された第２電極５を堆積する。第２電極６はアルミニウ
ム、クロム、チタン等の金属重体の薄膜、あるいは複数
の金属薄膜の多層膜より構成されている。Further, a second electrode 5 patterned into an appropriate shape is deposited using a metal mask. The second electrode 6 is composed of a thin film of heavy metal such as aluminum, chromium, titanium, etc., or a multilayer film of a plurality of thin metal films.
以上のような方法によってガラス板上に複数の素子が直
列に接続されたａ−３ｉ太陽電池を作製することができ
る。By the method described above, an a-3i solar cell in which a plurality of elements are connected in series on a glass plate can be manufactured.
発明の効果
透光性第１電極を形成するのに、従来の真空蒸着法、ス
パッタ法を用いた場合、真空装置を用いなければならず
、スクリーン印刷によって透光性第１電極を形成する場
合に比較して、大面積処理が困難であった。本発明によ
るスクリーン印刷では、大面精処理が可能で高い生産性
が得られる。Effects of the invention When the conventional vacuum evaporation method or sputtering method is used to form the translucent first electrode, a vacuum apparatus must be used, whereas when the translucent first electrode is formed by screen printing. Compared to , it was difficult to process large areas. In the screen printing according to the present invention, large-area precision processing is possible and high productivity can be obtained.
またエツチング工程の必要もなく、工程の合理化による
低コストの薄膜太陽電池を提供するものである。Furthermore, there is no need for an etching process, and the process is streamlined to provide a low-cost thin film solar cell.
第１図は本発明によるａ−ＳＬ太陽電池の製造工程説明
図、第２図は従来の方法によるａ−３ｉ太陽電池の製造
工程説明図である。
１・・・・・・ガラス板、２・・・・・・透明電極印刷
インク、３・・・・・・透光性第１電極、４・・・・・
・ａ−３ｉ、６・・・・・・第２電極。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名第１
図
１力゛ラスオ反
↓FIG. 1 is an explanatory diagram of the manufacturing process of an a-SL solar cell according to the present invention, and FIG. 2 is an explanatory diagram of the manufacturing process of an a-3i solar cell according to a conventional method. 1...Glass plate, 2...Transparent electrode printing ink, 3...Translucent first electrode, 4...
-a-3i, 6... Second electrode. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 1 Force vs. Lasso ↓
Claims (1)
刷によりパターニング塗布し、焼成して形成した透光性
第１電極と、非晶質シリコンを主成分とする半導体層と
、この半導体層上に位置し、前記透光性第１電極に対向
する第２電極とよりなる薄膜太陽電池。A transparent first electrode formed by patterning transparent electrode printing ink on a transparent insulating substrate by screen printing and baking, a semiconductor layer mainly composed of amorphous silicon, and a semiconductor layer on this semiconductor layer. A thin film solar cell comprising: a second electrode located opposite the translucent first electrode;
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60283440A JPS62142365A (en) | 1985-12-17 | 1985-12-17 | Thin film solar battery |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60283440A JPS62142365A (en) | 1985-12-17 | 1985-12-17 | Thin film solar battery |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62142365A true JPS62142365A (en) | 1987-06-25 |
Family
ID=17665567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60283440A Pending JPS62142365A (en) | 1985-12-17 | 1985-12-17 | Thin film solar battery |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62142365A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5643369A (en) * | 1993-06-24 | 1997-07-01 | Fuji Xerox Co., Ltd. | Photoelectric conversion element having an infrared transmissive indium-tin oxide film |
| US6096569A (en) * | 1994-11-15 | 2000-08-01 | Mitsubishi Denki Kabushiki Kaisha | Method of and apparatus for manufacturing thin solar battery |
-
1985
- 1985-12-17 JP JP60283440A patent/JPS62142365A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5643369A (en) * | 1993-06-24 | 1997-07-01 | Fuji Xerox Co., Ltd. | Photoelectric conversion element having an infrared transmissive indium-tin oxide film |
| US5805333A (en) * | 1993-06-24 | 1998-09-08 | Fuji Xerox Co., Ltd. | Photoelectric conversion element having an infrared transmissive indium film |
| US6096569A (en) * | 1994-11-15 | 2000-08-01 | Mitsubishi Denki Kabushiki Kaisha | Method of and apparatus for manufacturing thin solar battery |
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