JPS62140725U - - Google Patents
Info
- Publication number
- JPS62140725U JPS62140725U JP2660186U JP2660186U JPS62140725U JP S62140725 U JPS62140725 U JP S62140725U JP 2660186 U JP2660186 U JP 2660186U JP 2660186 U JP2660186 U JP 2660186U JP S62140725 U JPS62140725 U JP S62140725U
- Authority
- JP
- Japan
- Prior art keywords
- resist
- resist material
- developer
- substrate
- coated surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2660186U JPS62140725U (enExample) | 1986-02-27 | 1986-02-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2660186U JPS62140725U (enExample) | 1986-02-27 | 1986-02-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62140725U true JPS62140725U (enExample) | 1987-09-05 |
Family
ID=30827835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2660186U Pending JPS62140725U (enExample) | 1986-02-27 | 1986-02-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62140725U (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5216172A (en) * | 1975-07-30 | 1977-02-07 | Hitachi Ltd | Rotatory treatment device |
| JPS56114322A (en) * | 1980-02-14 | 1981-09-08 | Fujitsu Ltd | Developing method for photoresist |
-
1986
- 1986-02-27 JP JP2660186U patent/JPS62140725U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5216172A (en) * | 1975-07-30 | 1977-02-07 | Hitachi Ltd | Rotatory treatment device |
| JPS56114322A (en) * | 1980-02-14 | 1981-09-08 | Fujitsu Ltd | Developing method for photoresist |