JPS62130283A - Method for coating cu on ceramic base plate - Google Patents
Method for coating cu on ceramic base plateInfo
- Publication number
- JPS62130283A JPS62130283A JP27125085A JP27125085A JPS62130283A JP S62130283 A JPS62130283 A JP S62130283A JP 27125085 A JP27125085 A JP 27125085A JP 27125085 A JP27125085 A JP 27125085A JP S62130283 A JPS62130283 A JP S62130283A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- base plate
- ceramic base
- electroless
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、プリント配線板を作る素材であるセラミック
基板へCuをコーティングする方法の改良に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an improvement in a method for coating a ceramic substrate, which is a material for making a printed wiring board, with Cu.
(従来の技術)
従来、セラミック基板へCuをコーティングするには、
セラミック基板を脱脂した後、無電解CUめっきを施し
ていた。(Prior art) Conventionally, in order to coat a ceramic substrate with Cu,
After degreasing the ceramic substrate, electroless CU plating was applied.
(発明が解決しようとする問題点)
ところで、上記従来のCuコーティング方法でCuをコ
ーティングしたセラミック基板は、フォトレジストによ
るパターン形成→パターンCuめっき→パターンNiめ
っき−パターンAuめっき→フォトレジスト除去−Cu
エツチングの各工程を経て所要の配線図形を形成してプ
リント配線板を作り、その後このプリント配線板の所要
位置に抵抗、コンデンサ、トランジスタ、IC,LSI
等の部品を搭載する為にこれらを半田付け (260℃
、20秒程度)すると、無電解Cuめっき層がセラミッ
ク基板より剥離することがあって、セラミック基板と無
電解Cuめっき層との接着部が耐熱性に劣るという問題
があった。(Problems to be Solved by the Invention) By the way, a ceramic substrate coated with Cu using the conventional Cu coating method described above has the following steps: pattern formation by photoresist → patterned Cu plating → patterned Ni plating - patterned Au plating → photoresist removal - Cu
A printed wiring board is created by forming the required wiring diagram through each etching process, and then resistors, capacitors, transistors, ICs, and LSIs are placed at the required positions on this printed wiring board.
In order to mount other parts, these are soldered (260℃
, about 20 seconds), the electroless Cu plating layer may peel off from the ceramic substrate, resulting in a problem that the bonding portion between the ceramic substrate and the electroless Cu plating layer has poor heat resistance.
これは上記の半田付けにより、無電解Cuめっき層が加
熱されるのであるが、セラミックとCuとの間には大き
な熱膨張差、熱伝導差がある為、無電解Cuめっきが上
記の半田付は後急速に冷却し収縮してセラミックとの界
面での付着力が低下し、従ってCuの接着強度が弱くな
るからである。This is because the electroless Cu plating layer is heated by the soldering described above, but since there is a large difference in thermal expansion and thermal conductivity between the ceramic and Cu, the electroless Cu plating is heated by the soldering described above. This is because the Cu material rapidly cools down and contracts, reducing the adhesion force at the interface with the ceramic, and thus weakening the adhesive strength of Cu.
そこで本発明は、高温でのセラミック基板に対するCu
の接着強度が高く、耐熱性に優れたCuコーティングの
セラミック基手反を得ようとするものである。Therefore, the present invention aims to provide Cu for ceramic substrates at high temperatures.
The objective is to obtain a Cu-coated ceramic base fabric with high adhesive strength and excellent heat resistance.
(問題点を解決するための手段)
上記問題点を解決するための本発明によるセラミック基
板へのコーティング方法は、セラミック基板を脱脂して
無電解Niめっきを施した後、無電解Cuめっきを施す
ことを特徴するものである。(Means for Solving the Problems) A method of coating a ceramic substrate according to the present invention to solve the above problems includes degreasing the ceramic substrate, applying electroless Ni plating, and then applying electroless Cu plating. It is characterized by this.
(作用)
上記のように本発明のセラミック基板へのCuコーティ
ング方法は、セラミック基板とCuとの間にNiめっき
を介在するので、セラミックと熱膨張差、熱伝導差の小
さいNiは高温でのセラミック基板との付着力が良好で
あり、またこのNiはCuとの熱膨張差、熱伝導差がセ
ラミックよりも這かに小さいので、Cuとの付着力が良
好である。従って、高温でのセラミック基板に対するC
Uの接着強度が高くなり、耐熱性に優れたCuコーティ
ングとなる。(Function) As described above, in the method of coating a ceramic substrate with Cu of the present invention, Ni plating is interposed between the ceramic substrate and Cu. It has good adhesion to the ceramic substrate, and since the difference in thermal expansion and thermal conductivity between Ni and Cu is much smaller than that of ceramic, the adhesion with Cu is good. Therefore, C for ceramic substrates at high temperatures
The adhesive strength of U increases, resulting in a Cu coating with excellent heat resistance.
(実施例)
本発明によるセラミック基板へのCuコーティング方法
の一実施例を説明すると、縦80+u、横801、厚さ
0 、8 amの96%アルミナ基板をアルカリ脱脂し
た後、両面に無電解Niめっき、本例ではN1−81%
を無電解めっきにて0.5μコーテイングし、然る後そ
の上に無電解めっきしてCuを2μコーテイングした。(Example) To explain one example of the method of Cu coating on a ceramic substrate according to the present invention, a 96% alumina substrate measuring 80+u in length, 801 in width and 0.8 am in thickness was degreased with alkali, and then coated with electroless Ni on both sides. Plating, in this example N1-81%
was coated with 0.5 μm of Cu by electroless plating, and then coated with 2 μm of Cu by electroless plating.
このCuコーティングのアルミナ基板に、フォトレジス
トによるパターン形成→パターンCuめっき→パターン
Niめっき→パターンAuめっき一フォトレジストの除
去−Cuと及びNiエツチングの各工程を経て所要の配
線図形を形成してプリント配′!JA仮を作り、その後
このプリント配線板の所要位置にICを搭載すべく配線
上にICを半田付けした処、このIC搭載部の配線の下
地であ゛る無電解Cuめっき層は加熱(260℃、20
秒程度)されても無電解Niめっき層の介在によりアル
ミナ基板より剥離することがなかった。また500℃、
30分の過酷な高温雰囲気に曝されてもブリスター等の
外観異常は全く認められなかった。On this Cu-coated alumina substrate, the required wiring figure is formed and printed through the following steps: pattern formation with photoresist → pattern Cu plating → pattern Ni plating → pattern Au plating, removal of photoresist, and Cu and Ni etching. Arrangement! After making the JA temporary, and then soldering the IC onto the wiring to mount the IC at the desired position on this printed wiring board, the electroless Cu plating layer that is the base of the wiring in the IC mounting area was heated (260℃). °C, 20
Even if the film was applied for several seconds), it did not peel off from the alumina substrate due to the presence of the electroless Ni plating layer. Also 500℃,
Even after being exposed to a harsh high temperature atmosphere for 30 minutes, no abnormalities in appearance such as blisters were observed.
尚、上記実施例ではセラミック基板がアルミナ基板であ
るが、これに限るものではない。また無電解Niめっき
は、N1−Bであるが、N1−Pでも良いものである。Although the ceramic substrate in the above embodiment is an alumina substrate, it is not limited to this. Further, the electroless Ni plating is N1-B, but N1-P may also be used.
さらに無電解めっきの厚さ0.1〜1μが好適である。Furthermore, the thickness of electroless plating is preferably 0.1 to 1 μm.
(発明の効果)
以上の説明で判るように本発明のセラミック基(反への
Cuコーティング方法は、セラミック基板へ無電解Cu
めっきを施す前に、無電解Niめっきを予備めっきする
ので、その後流した無電解CUめっきは無電解Niめっ
きがセラミック基板と無電解Cuめっきとの熱膨張差、
熱伝導差が小さい為、該無電解Niめっきを介してセラ
ミック基板と良好に付着される。従って、高温でのセラ
ミック基板に対するCuの接着強度が高くなって、プリ
ント配線板製作後の部品搭載の為の配線上への半田付は
等の高温雰囲気に於いて、無電解Cuめっきが決して剥
離することの無い信頼性の高い耐熱性に優れたプリント
配線板用のCuコーティングセラミック基板を得ること
ができる。(Effects of the Invention) As can be seen from the above explanation, the method of coating Cu on a ceramic substrate of the present invention is a method for coating a ceramic substrate with electroless Cu.
Before plating, electroless Ni plating is pre-plated, so the electroless CU plating that is applied afterwards is due to the difference in thermal expansion between the ceramic substrate and the electroless Cu plating.
Since the difference in thermal conductivity is small, it is well attached to the ceramic substrate through the electroless Ni plating. Therefore, the adhesive strength of Cu to ceramic substrates at high temperatures increases, and electroless Cu plating never peels off in high-temperature atmospheres, such as when soldering onto wiring for mounting components after manufacturing printed wiring boards. It is possible to obtain a Cu-coated ceramic substrate for printed wiring boards that is highly reliable and has excellent heat resistance without causing any damage.
Claims (1)
後、無電解Cuめっきを施すことを特徴とするセラミッ
ク基板へのCuコーティング方法。A method for coating a ceramic substrate with Cu, the method comprising degreasing the ceramic substrate, applying electroless Ni plating, and then applying electroless Cu plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27125085A JPS62130283A (en) | 1985-12-02 | 1985-12-02 | Method for coating cu on ceramic base plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27125085A JPS62130283A (en) | 1985-12-02 | 1985-12-02 | Method for coating cu on ceramic base plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62130283A true JPS62130283A (en) | 1987-06-12 |
Family
ID=17497452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27125085A Pending JPS62130283A (en) | 1985-12-02 | 1985-12-02 | Method for coating cu on ceramic base plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62130283A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002089749A (en) * | 2000-07-13 | 2002-03-27 | Toto Ltd | Water-supply pipe connection method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54118571A (en) * | 1978-03-06 | 1979-09-14 | Tokyo Shibaura Electric Co | Method of producing printed circuit board |
JPS5562156A (en) * | 1978-10-27 | 1980-05-10 | Schering Ag | Manufacture of metal pattern on electric insulating supporter by photochemical method |
-
1985
- 1985-12-02 JP JP27125085A patent/JPS62130283A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54118571A (en) * | 1978-03-06 | 1979-09-14 | Tokyo Shibaura Electric Co | Method of producing printed circuit board |
JPS5562156A (en) * | 1978-10-27 | 1980-05-10 | Schering Ag | Manufacture of metal pattern on electric insulating supporter by photochemical method |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002089749A (en) * | 2000-07-13 | 2002-03-27 | Toto Ltd | Water-supply pipe connection method |
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