JPS62112140U - - Google Patents
Info
- Publication number
- JPS62112140U JPS62112140U JP1985203648U JP20364885U JPS62112140U JP S62112140 U JPS62112140 U JP S62112140U JP 1985203648 U JP1985203648 U JP 1985203648U JP 20364885 U JP20364885 U JP 20364885U JP S62112140 U JPS62112140 U JP S62112140U
- Authority
- JP
- Japan
- Prior art keywords
- magnification correction
- magnification
- alignment mark
- exposure apparatus
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 238000007689 inspection Methods 0.000 claims 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985203648U JPS62112140U ( ) | 1985-12-28 | 1985-12-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985203648U JPS62112140U ( ) | 1985-12-28 | 1985-12-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62112140U true JPS62112140U ( ) | 1987-07-17 |
Family
ID=31169173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985203648U Pending JPS62112140U ( ) | 1985-12-28 | 1985-12-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62112140U ( ) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07261371A (ja) * | 1994-03-16 | 1995-10-13 | Nec Corp | 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法 |
-
1985
- 1985-12-28 JP JP1985203648U patent/JPS62112140U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07261371A (ja) * | 1994-03-16 | 1995-10-13 | Nec Corp | 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法 |
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