JPS62112136U - - Google Patents
Info
- Publication number
- JPS62112136U JPS62112136U JP20414085U JP20414085U JPS62112136U JP S62112136 U JPS62112136 U JP S62112136U JP 20414085 U JP20414085 U JP 20414085U JP 20414085 U JP20414085 U JP 20414085U JP S62112136 U JPS62112136 U JP S62112136U
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- susceptor
- semiconductor substrate
- supply pipe
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 239000012495 reaction gas Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Description
第１図〜第５図は本考案の実施例を示し、第１
図は縦断正面図、第２図は第１図の―視断面
図、第３図はサセプターの斜視図、第４図はサセ
プター内への反応ガス供給用ノズルの拡大断面図
、第５図は第４図の―視断面図、第６図は従
来の膜形成装置の縦断正面図である。
１……リアクター、２……蓋カバー、３……サ
セプター、３ａ……側板、３ｂ……半導体基板装
着片、４……半導体基板、５……加熱用セヒータ
、６……反応ガス供給管。
1 to 5 show embodiments of the present invention.
The figure is a longitudinal sectional front view, Figure 2 is a cross-sectional view of Figure 1, Figure 3 is a perspective view of the susceptor, Figure 4 is an enlarged cross-sectional view of the nozzle for supplying reaction gas into the susceptor, and Figure 5 is a cross-sectional view of the susceptor. FIG. 4 is a sectional view, and FIG. 6 is a longitudinal sectional front view of a conventional film forming apparatus. DESCRIPTION OF SYMBOLS 1...Reactor, 2...Lid cover, 3...Susceptor, 3a...Side plate, 3b...Semiconductor substrate attachment piece, 4...Semiconductor substrate, 5...Heating heater, 6...Reaction gas supply pipe.
Claims (1)
のヒータを備えたリアクター内に、多角形筒状の
サセプターを挿入し、且つ、リアクター内への反
応ガスの供給管を備えて成る膜形成装置において
、前記多角形筒状のサセプターにおける内周面に
、半導体基板の装着部を設ける一方、前記反応ガ
スの供給管を、前記サセプター内にのぞませたこ
とを特徴とする半導体基板の膜形成装置。 A film forming device comprising a polygonal cylindrical susceptor inserted into a reactor sealed with an openable/closable lid cover and equipped with a heater for heating, and a reactor gas supply pipe into the reactor. A semiconductor substrate film formation method, characterized in that a mounting portion for a semiconductor substrate is provided on the inner circumferential surface of the polygonal cylindrical susceptor, and the reaction gas supply pipe is made to look into the susceptor. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20414085U JPS62112136U (en) | 1985-12-28 | 1985-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20414085U JPS62112136U (en) | 1985-12-28 | 1985-12-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62112136U true JPS62112136U (en) | 1987-07-17 |
Family
ID=31170117
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20414085U Pending JPS62112136U (en) | 1985-12-28 | 1985-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62112136U (en) |
-
1985
- 1985-12-28 JP JP20414085U patent/JPS62112136U/ja active Pending