JPS62107953A - Polishing tape - Google Patents

Polishing tape

Info

Publication number
JPS62107953A
JPS62107953A JP24606585A JP24606585A JPS62107953A JP S62107953 A JPS62107953 A JP S62107953A JP 24606585 A JP24606585 A JP 24606585A JP 24606585 A JP24606585 A JP 24606585A JP S62107953 A JPS62107953 A JP S62107953A
Authority
JP
Japan
Prior art keywords
polishing
abrasive
tape
particle
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24606585A
Other languages
Japanese (ja)
Inventor
Nobutaka Yamaguchi
信隆 山口
Eiichi Tadokoro
田所 栄一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP24606585A priority Critical patent/JPS62107953A/en
Publication of JPS62107953A publication Critical patent/JPS62107953A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials

Abstract

PURPOSE:To prevent the slipping-off of polishing particles from a polishing coated film, maintaining the high grinding faculty, by covering the surface of the polishing particle projecting from the surface of the polishing coated film by binder and increasing the contact area between the polishing particle and the binder. CONSTITUTION:When the tape sliding surface of a magnetic head is polished, a polishing tape is traveled at a constant speed, and a coated layer 2 is slided onto the magnetic head. At this time, the tape sliding surface of the magnetic head is polished smoothly by the hard polishing agent 4 dispersed in the coated layer 2. In order to increase the grinding faculty, the polishing particle 4 having the particle size larger than the thickness of the coated layer 2 is used as polishing agent. Therefore, though the upper part of the polishing particle 4 projects from the surface of the coated layer 2, this part is covered with a thin film 5 made of binding agent, and the contact area between the polishing particle and the binding agent is increased. Therefore, the polishing particle is firmly bonded with the coated layer 2, and hardly slipped off from the coated layer 2 even in the polishing of the magnetic head.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気記録再生装置の磁気ヘッドの精密研磨に用
いる研磨テープに関するものであり、とくにビデオ用あ
るいは高級オーディオ用の磁気ヘッドの平滑仕上に用い
る研磨テープに関するものである。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an abrasive tape used for precision polishing of magnetic heads of magnetic recording and reproducing devices, and is particularly suitable for smoothing magnetic heads for video or high-end audio. This invention relates to the polishing tape used.

(従来技術) ビデオ用あるいは高級オーデ謙オ用磁気ヘッド等はテー
プ摺動面の平滑性がとくに要求されるため、磁気ヘッド
を製作する際研磨テープを用いてテープ摺動面を平滑に
仕上げる。このような研磨テープは可撓性を有する非磁
性支持体上に研磨剤および結合剤等を含んだ研磨塗膜を
塗着したものであるから、磁気ヘッドのテープ接触面の
曲面形状になじんでこの面を精密に研磨仕上することが
できる。
(Prior Art) Magnetic heads for video or high-end audio equipment require particularly smooth tape sliding surfaces, so when manufacturing magnetic heads, abrasive tape is used to make the tape sliding surfaces smooth. Such abrasive tape is made by coating an abrasive film containing an abrasive and a binder on a flexible non-magnetic support, so it adapts to the curved shape of the tape contact surface of the magnetic head. This surface can be precisely polished.

ところで、このような研磨テープはクリーニングテープ
等に比して高い研磨能力が必要とされるので、一般にM
磨削として研磨塗膜の厚さより粒子径の大きい研磨粒子
を使用している。
By the way, such abrasive tapes require higher abrasive ability than cleaning tapes, etc., so generally M
For polishing, abrasive particles with a particle size larger than the thickness of the abrasive coating are used.

ところがこの場合研磨粒子の上部が研磨塗膜表面からと
び出すように配され、研磨粒子の表面積に対して研磨粒
子が結合剤と接触している面積の比率が小ざくなるため
研磨粒子とfA@塗膜の結合力が弱くなり、磁気ヘッド
研磨の際、研磨粒子が研磨塗膜からはがれて脱離しやす
いという問題があった。
However, in this case, the upper part of the abrasive particle is arranged so as to protrude from the surface of the abrasive coating film, and the ratio of the area where the abrasive particle is in contact with the binder to the surface area of the abrasive particle is small, so that the abrasive particle and fA@ There was a problem in that the bonding force of the coating film became weak, and the abrasive particles easily peeled off from the abrasive coating film during magnetic head polishing.

(発明の目的) 本発明は上記問題を解決するためになされたものであり
、被研磨体を研@する際、高い研削能力を維持しつつ研
磨塗膜からの研磨粒子の脱離を防止し得る研磨テープを
提供することを目的とするものである。
(Object of the Invention) The present invention has been made to solve the above problems, and is an object of the present invention to prevent detachment of abrasive particles from the abrasive coating film while maintaining high grinding ability when polishing an object to be polished. The object of the present invention is to provide an abrasive tape that can be obtained.

(発明の構成) 本発明の研磨テープは、研磨塗膜表面から突出した研磨
粒子の表面を結合剤の被膜で被い、研磨粒子と結合剤と
の接触面積を増加せしめたことを特徴とするものである
(Structure of the Invention) The abrasive tape of the present invention is characterized in that the surface of the abrasive particles protruding from the surface of the abrasive coating film is covered with a film of a binder to increase the contact area between the abrasive particles and the binder. It is something.

ここで、研磨塗膜は塗膜表面から研磨粒子が突出するよ
うな状態に配されているものをいう。
Here, the abrasive coating film is one in which abrasive particles are arranged so as to protrude from the surface of the coating film.

また、上記研磨テープとは、いわゆるテープ形状のもの
のほか、ディスク形状あるいはシート形状のものも広く
含むものとする。
Furthermore, the abrasive tape mentioned above broadly includes not only so-called tape-shaped polishing tapes but also disc-shaped or sheet-shaped polishing tapes.

(発明の効果) 本発明の研磨テープによれば、研磨粒子の全表面積に対
する研磨粒子と結合剤との接触面積の比率を高めて研磨
粒子を研磨塗膜に強く結合せしめるようにしているから
、この研磨テープによって磁気ヘッドを研磨する際、研
磨粒子が研磨塗膜からはがれて脱離するのを防止するこ
とができる。
(Effects of the Invention) According to the abrasive tape of the present invention, the ratio of the contact area between the abrasive particles and the binder to the total surface area of the abrasive particles is increased to strongly bond the abrasive particles to the abrasive coating film. When polishing a magnetic head with this polishing tape, it is possible to prevent the polishing particles from peeling off and detaching from the polishing coating.

これにより研磨テープの耐久性を著しく高めることがで
きる。
This significantly increases the durability of the abrasive tape.

(実施態様) 以下、本発明の実施態様について図面を用いて説明する
(Embodiments) Hereinafter, embodiments of the present invention will be described using the drawings.

本発明の実施態様による研磨テープは、第1図に示すよ
うに可撓性を有する非磁性支持体1と、この支持体1上
に形成された塗布層2から構成されている。塗布層2は
、研磨剤、結合剤(バインダー)と潤滑剤を混練して形
成したものである。
As shown in FIG. 1, the polishing tape according to the embodiment of the present invention is composed of a flexible non-magnetic support 1 and a coating layer 2 formed on the support 1. The coating layer 2 is formed by kneading an abrasive, a binder, and a lubricant.

ここで研磨剤は平均粒子径が3〜20μ而であって、モ
ース硬度の大きい粒状のCrzChあるいはA9、、z
 03等からなり、また結合剤は塩化ビニル−酢酸ビニ
ル系共重合体、塩化ビニル−塩化ビニリデン共重合体、
ニトロセルロース、ポリアミド。
Here, the abrasive is granular CrzCh or A9, with an average particle size of 3 to 20μ and a large Mohs hardness.
03, etc., and the binder is vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinylidene chloride copolymer,
Nitrocellulose, polyamide.

ポリアミン、エポキシ樹脂等からなる。また、上記i1
!ll滑剤は・、例えばシリコーンオイルが用いられる
Consists of polyamine, epoxy resin, etc. In addition, the above i1
! For example, silicone oil is used as the lubricant.

磁気ヘッド3のテープ摺動面を研磨する際は、磁気ヘッ
ド3を挾む2つの位置に配されたリール(図示されてい
ない)の一方から使方へこの研磨テープを定速で走行さ
せ、磁気ヘッド3に塗布層2を摺動させる。このとき塗
@層2中に分散された硬い研磨剤4により磁気ヘッドの
テープ圏動向が平滑に研磨される。
When polishing the tape sliding surface of the magnetic head 3, the polishing tape is run at a constant speed from one side of the reel (not shown) placed at two positions sandwiching the magnetic head 3. The coating layer 2 is made to slide on the magnetic head 3. At this time, the hard abrasive agent 4 dispersed in the coating layer 2 polishes the tape area of the magnetic head to make it smooth.

ところで研磨テープでは大きい研削能力を得るため研磨
剤として塗布層2の厚ざより大きな粒子径の研磨粒子4
を用いる。その結果第2図に示すように研磨粒子4の上
部が塗布層2の表面から突出するため、研磨粒子4の全
表面積に対する研磨粒子と結合剤の接触面積の比率が小
さくなり、磁気ヘッド研磨の際この研磨粒子が塗布a2
からはがれるという事態が生じていた。そこで本発明の
研磨テープでは研磨粒子の、塗布層2から突出した部分
に結合剤の薄い膜5を被覆せしめて研磨粒子と結合剤の
接触面積を多くするようにしている。
By the way, in order to obtain a large grinding ability with abrasive tape, abrasive particles 4 with a particle size larger than the thickness of the coating layer 2 are used as an abrasive.
Use. As a result, as shown in FIG. 2, the upper part of the abrasive particles 4 protrudes from the surface of the coating layer 2, so that the ratio of the contact area between the abrasive particles and the binder to the total surface area of the abrasive particles 4 becomes small, making it difficult to polish the magnetic head. When this abrasive particle is applied A2
There was a situation where it came off. Therefore, in the abrasive tape of the present invention, the parts of the abrasive particles protruding from the coating layer 2 are coated with a thin film 5 of a binder to increase the contact area between the abrasive particles and the binder.

第2図ではこの薄い膜5は3μm程度の厚さに形成され
ている。この薄い膜5は例えば以下のような方法(1)
、(2>により形成される。
In FIG. 2, this thin film 5 is formed to have a thickness of about 3 μm. This thin film 5 can be formed by, for example, the following method (1).
, (2>).

◎方法(1) 塗布層2の表面に有機溶剤(酢酸ブチル、メチルエチル
ケトン、トルエン等)を塗膜[シ、塗15層2の表面を
膨潤、溶解せしめ、この後遅乾せしめて上記薄い膜5を
形成する。
◎Method (1) Apply an organic solvent (butyl acetate, methyl ethyl ketone, toluene, etc.) to the surface of coating layer 2 to swell and dissolve the surface of layer 2, and then slowly dry to form the thin film 5. form.

◎方法(2) 塗布層2の表面に結合剤および溶液を再度塗布して上記
薄い膜5を形成する。
◎Method (2) The binder and solution are again applied to the surface of the coating layer 2 to form the thin film 5 described above.

この薄い膜5の存在により研磨粒子は塗布層2に強く結
合され、磁気ヘッドの研摩の際においても塗布層2から
容易に脱離することがない。
Due to the presence of this thin film 5, the abrasive particles are strongly bonded to the coating layer 2, and are not easily detached from the coating layer 2 even during polishing of the magnetic head.

なあ、前述した非磁性支持体としては例えば、ポリエチ
レンテレフタレート(PET)、ポリエチレンナフタレ
ートが用いられる。
For example, polyethylene terephthalate (PET) or polyethylene naphthalate is used as the non-magnetic support mentioned above.

次に実施例を挙げて説明する。Next, an example will be given and explained.

実施例1 厚さ38μmのポリエチレンテレフタレート(PET)
支持体上に下記の塗布組成の第1混合液を厚さ8μm程
度で塗布した後、この塗布層上に下記の塗布組成の第2
混合液を厚さ3μm(乾燥厚)程度で塗布して研磨テー
プ1を作った。なお、本実施例は特開昭53−1020
17号公報に開示されたサンブノいα41と同様のもの
である。また、以下の説明において部は全て重量部を示
す。
Example 1 Polyethylene terephthalate (PET) with a thickness of 38 μm
After coating a first liquid mixture having the following coating composition on the support to a thickness of about 8 μm, a second liquid mixture having the following coating composition is applied onto this coating layer.
Polishing tape 1 was prepared by applying the mixed solution to a thickness of approximately 3 μm (dry thickness). Note that this example is based on Japanese Patent Application Laid-open No. 53-1020.
This is similar to the Sambuno α41 disclosed in Publication No. 17. Moreover, in the following description, all parts indicate parts by weight.

◎第1混合液組成 ・粒状CrzO3・・・・・・300部〈平均粒子径1
0u m 、モース硬度6)・塩化ビニル−塩化ビニリ
デン共重合体・・・46,4部(共重合比=7:3.重
合度= 400>・エポキシ樹脂          
・・・・・・28.3部(ビスフェノールAとエピクロ
ルヒドリンの反応生成物、分子量= 900、エポキシ
当量=460〜5201水酸基含有量= 0.29%、
Chell  Orl  Go、  エピD−ト100
1)・シリコーン油           ・・・・・
・1,0部(ジメチルポリシロキサン) ・イソシアネート化合物      ・・・・・・5.
6部(3モルの2,4−トリレンジイソシアネート化合
物と1モルのトリメチロールプロパンの反応生成物の7
5wt% 酢酸エチル溶液 BaVerA、 G、の[
)esmodur l −,75)・酢酸ブチル   
        ・・・・・・800部◎第2混合液組
成 ・塩化ビニル−塩化ビニリデン共重合体・・・46.4
部(共重合比−7:32重合度−400)・エポキシ樹
脂          ・・・・・・28.3部(ビス
フェノールAとエピクロルヒドリンの反応生成物、分子
量−900、エポキシ当量−460〜520、水!!!
基含有量= 0.29%、Chell  Oil  C
o、  エピコート1001)・イソシアネート化合物
      ・・・・・・5.6部(3モルの2.4−
トリレンジイソシアネート化合物と1モルのトリメチロ
ールプロパンの反応生成物の75wt% 酢酸エチル溶
液 BaVerA、 G、の[)esmodur L 
−75>・酢酸ブチル           ・・・・
・・800部実施例2 上記実施例1と同様の方法で支持体上に第1混合液を塗
布した後、この塗布層に酢酸ブチル処理を施し乾燥させ
て研磨テープ2を作った。
◎First mixed liquid composition/granular CrzO3...300 parts <average particle size 1
0um, Mohs hardness 6) Vinyl chloride-vinylidene chloride copolymer...46.4 parts (copolymerization ratio = 7:3. Degree of polymerization = 400>) Epoxy resin
...28.3 parts (reaction product of bisphenol A and epichlorohydrin, molecular weight = 900, epoxy equivalent = 460-5201, hydroxyl group content = 0.29%,
Chell Orl Go, Epi D-To 100
1)・Silicone oil・・・・・・
・1.0 parts (dimethylpolysiloxane) ・Isocyanate compound ・・・・・・5.
6 parts (7 parts of the reaction product of 3 moles of 2,4-tolylene diisocyanate compound and 1 mole of trimethylolpropane)
5wt% ethyl acetate solution BaVerA, G, [
) esmodur l -, 75) Butyl acetate
...800 parts ◎ Second mixed liquid composition Vinyl chloride-vinylidene chloride copolymer...46.4
parts (copolymerization ratio -7:32 degree of polymerization -400)・Epoxy resin...28.3 parts (reaction product of bisphenol A and epichlorohydrin, molecular weight -900, epoxy equivalent -460 to 520, water! !!
Group content = 0.29%, Shell Oil C
o, Epicote 1001)・Isocyanate compound...5.6 parts (3 moles of 2.4-
75 wt% ethyl acetate solution of reaction product of tolylene diisocyanate compound and 1 mol of trimethylolpropane BaVer A, G, [)esmodur L
-75>・Butyl acetate ・・・・
...800 parts Example 2 After applying the first liquid mixture onto a support in the same manner as in Example 1 above, this applied layer was treated with butyl acetate and dried to prepare polishing tape 2.

比較例 上記実施例1において、第1混合液を塗布した後の塗布
層上に第2混合液を塗布ぜず、その他は実施例1と同様
の方法で研磨テープ3を作った。
Comparative Example A polishing tape 3 was prepared in the same manner as in Example 1 except that the second mixed solution was not applied on the coating layer after the first mixed solution was applied.

以上の実施例1.2と比較例の各研磨テープについて磁
気ヘッド研削後における脱落研磨粒子数を調べた。その
結果を相対値にて下表に示す。
For each of the abrasive tapes of Example 1.2 and Comparative Example above, the number of abrasive particles that fell off after grinding the magnetic head was investigated. The results are shown in the table below as relative values.

上表において脱落研磨粒子数は、フェライトヘッド研削
後の研磨テープ表面を電子顕微鏡(5,000倍)で観
察し、脱落した研磨粒子の跡である凹みの数を計数した
ものである。
In the above table, the number of fallen abrasive particles is determined by observing the surface of the abrasive tape after grinding the ferrite head with an electron microscope (5,000 times magnification) and counting the number of dents that are traces of the abrasive particles that have fallen off.

上表から明らかなように、本実施例1.2によりテープ
表面からの研磨粒子の脱落を極めて少なくすることがで
きる。
As is clear from the above table, Example 1.2 can extremely reduce the amount of abrasive particles falling off the tape surface.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は磁気ヘッドの研磨時における、本発明の一実施
態様による研磨テープの断面図、第2図は第1図の研磨
テープを拡大して示す断面図である。 1・・・非磁性支持体(PET) 2・・・塗 布 層     3・・・磁気ヘッド4・
・・研磨剤(研磨粒子) 5・・・被 tl! (薄い
膜)第2図 (自発)手続補正口 特許庁長官 殿           昭和61年10
月3日特願昭60−246065号 2、発明の名称 研磨テープ 3、補正をする者 事件との関係     特許出願人 性 所   神奈川県南足柄市中沼210番地名 称 
   富士写真フィルム株式会社4、代理人 東京都港区六本木5丁目2番1号 はうらいやビル 7階 (7318)弁理士 柳 1)征 史 (ほか1名)5
、補正命令の日付   な  し 6、補正により増加する発明の数   な  し8、補
正の内容 1)特許請求の範囲を別紙の通り補正する。 2)明細書第5頁第3行 rcrz03Jの後にrsi CJを挿入する。 2)同頁第7行 「エポキシ樹脂」の後に「、イソシアネート化合物」を
挿入する。 3)同第6頁第18行 「薄い膜5を形成する。」の後に「ここで薄い膜5に用
いる結合剤は塗布層に用いる結合剤と異なってもよいの
は当然である。」と訂正する。 特許請求の範囲 (1) 可撓性を有する非磁性支持体上に、研磨粒子を
結合剤に分散せしめてなる研磨塗膜を塗着し、該研磨塗
膜の表面から突出した前記研磨粒子の表面に結合剤の被
膜を形成してなる研磨テープ。 (2)前記研磨!lの平均粒子径が3〜20μmであり
、前記被膜の厚さが0.5〜3μmであることを特徴と
する特許請求の!’囲第1項記載の研磨テープ。 手続補正置部式) %式% 2、発明の名称 研磨テープ 3、補正をする者 事件との関係     特許出願人 任 所   神奈川県南足柄市中沼210番地名 称 
   富士写真フィルム株式会社4、代理人 東京都港区六本木5丁目2番1す 昭和61年1月8日 (発送日 昭和61年1月28日
)  。 6、補正により増加する発明の数   な  し7、補
正の対象   図 面          ・S+ ;
、’ i’″(つ8、補正の内容 1)図面中、第1図を添付の通り補正する。 (内容に変更なし)
FIG. 1 is a sectional view of an abrasive tape according to an embodiment of the present invention during polishing of a magnetic head, and FIG. 2 is an enlarged sectional view of the abrasive tape of FIG. 1. 1... Nonmagnetic support (PET) 2... Coating layer 3... Magnetic head 4.
...Abrasive (abrasive particles) 5...Tl! (Thin film) Figure 2 (Voluntary) Procedure amendment mouth To the Commissioner of the Patent Office October 1986
Patent Application No. 60-246065 dated March 3rd, 2003, Title of the invention: Abrasive tape 3, Relationship with the case of the person making the amendment Person of the patent applicant Location: 210 Nakanuma, Minamiashigara City, Kanagawa Prefecture Name:
Fuji Photo Film Co., Ltd. 4, Agent: 7th floor, Uraya Building, 5-2-1 Roppongi, Minato-ku, Tokyo (7318) Patent attorney: Yanagi 1) Seishi (and 1 other person) 5
, Date of amendment order: None 6, Number of inventions increased by amendment: None 8, Contents of amendment 1) The scope of claims will be amended as shown in the attached sheet. 2) Insert rsi CJ after page 5, line 3, rcrz03J of the specification. 2) Insert "isocyanate compound" after "epoxy resin" in line 7 of the same page. 3) After "forming the thin film 5" on page 6, line 18, "the binder used for the thin film 5 may of course be different from the binder used for the coating layer." correct. Claims (1) An abrasive coating film made of abrasive particles dispersed in a binder is applied onto a flexible non-magnetic support, and the abrasive particles protruding from the surface of the abrasive coating film are coated on a flexible non-magnetic support. An abrasive tape with a bonding agent coating formed on its surface. (2) The polishing! The average particle diameter of l is 3 to 20 μm, and the thickness of the coating is 0.5 to 3 μm! 'The abrasive tape described in box 1. % formula % 2. Name of the invention Abrasive tape 3. Relationship with the person making the amendment Patent applicant Location 210 Nakanuma, Minamiashigara City, Kanagawa Prefecture Name
Fuji Photo Film Co., Ltd. 4, Agent: 5-2-1 Roppongi, Minato-ku, Tokyo, January 8, 1986 (Delivery date: January 28, 1986). 6. Number of inventions increased by amendment None 7. Subject of amendment Drawings ・S+;
, 'i''' (8. Contents of amendment 1) Figure 1 of the drawings is amended as attached. (No change in content)

Claims (2)

【特許請求の範囲】[Claims] (1)可撓性を有する非磁性支持体上に、研磨粒子を結
合剤に分散せしめてなる研磨塗膜を塗着し、該研磨塗膜
の表面から突出した前記研磨粒子の表面に前記結合剤の
被膜を形成してなる研磨テープ。
(1) An abrasive coating film made of abrasive particles dispersed in a binder is applied onto a flexible non-magnetic support, and the above-mentioned bonding is applied to the surface of the abrasive particles protruding from the surface of the abrasive coating film. An abrasive tape formed with a coating of agent.
(2)前記研磨層の平均粒子径が3〜20μmであり、
前記被膜の厚さが0.5〜3μmであることを特徴とす
る特許請求の範囲第1項記載の研磨テープ。
(2) the average particle diameter of the polishing layer is 3 to 20 μm,
The polishing tape according to claim 1, wherein the thickness of the coating is 0.5 to 3 μm.
JP24606585A 1985-11-01 1985-11-01 Polishing tape Pending JPS62107953A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24606585A JPS62107953A (en) 1985-11-01 1985-11-01 Polishing tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24606585A JPS62107953A (en) 1985-11-01 1985-11-01 Polishing tape

Publications (1)

Publication Number Publication Date
JPS62107953A true JPS62107953A (en) 1987-05-19

Family

ID=17142943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24606585A Pending JPS62107953A (en) 1985-11-01 1985-11-01 Polishing tape

Country Status (1)

Country Link
JP (1) JPS62107953A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63201053U (en) * 1987-06-12 1988-12-26

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63201053U (en) * 1987-06-12 1988-12-26

Similar Documents

Publication Publication Date Title
JPS6294268A (en) Abrasive tape
JPH07102505B2 (en) Polishing tape
JPS642261Y2 (en)
JPH0542735B2 (en)
JPS63259830A (en) Production of magnetic recording medium
KR850000269B1 (en) Cleaning tape for magnetic recording apparatus
JPS62107953A (en) Polishing tape
JPS6384879A (en) Polishing tape
JPH0573550B2 (en)
JPS61204829A (en) Base film for magnetic recording medium and magnetic recording medium
JPS6294270A (en) Abrasive tape
JPS6294267A (en) Abrasive tape
JPH0445814Y2 (en)
JPS62176771A (en) Polishing tape
JP3254476B2 (en) Binder for magnetic recording medium and magnetic recording medium
JPS62114880A (en) Polishing tape
JPH03166061A (en) Polishing sheet
JPS61916A (en) Magnetic recording medium
JPS6294271A (en) Abrasive tape
JPS6177136A (en) Magnetic recording medium
JP3033983B2 (en) Manufacturing method of magnetic recording medium
JPS62203768A (en) Polishing tape
JPS5984343A (en) Magnetic recording medium
JPH0565927B2 (en)
JPS62224579A (en) Grinding tape