JPS62107439U - - Google Patents
Info
- Publication number
- JPS62107439U JPS62107439U JP19839785U JP19839785U JPS62107439U JP S62107439 U JPS62107439 U JP S62107439U JP 19839785 U JP19839785 U JP 19839785U JP 19839785 U JP19839785 U JP 19839785U JP S62107439 U JPS62107439 U JP S62107439U
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- plasma
- gas
- dry etching
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985198397U JPH0528757Y2 (https=) | 1985-12-25 | 1985-12-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985198397U JPH0528757Y2 (https=) | 1985-12-25 | 1985-12-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62107439U true JPS62107439U (https=) | 1987-07-09 |
| JPH0528757Y2 JPH0528757Y2 (https=) | 1993-07-23 |
Family
ID=31159046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985198397U Expired - Lifetime JPH0528757Y2 (https=) | 1985-12-25 | 1985-12-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0528757Y2 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01287285A (ja) * | 1988-05-13 | 1989-11-17 | Matsushita Electric Ind Co Ltd | ドライエッチング装置 |
| JP2003520418A (ja) * | 1999-09-23 | 2003-07-02 | ラム リサーチ コーポレーション | 放射加熱されるセラミックライナを備えた半導体プロセス装置 |
| JP2022064042A (ja) * | 2020-10-13 | 2022-04-25 | 株式会社Kelk | 基板処理装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5753939A (en) * | 1980-09-17 | 1982-03-31 | Matsushita Electric Ind Co Ltd | Dry etching method for thin film |
| JPS57100732A (en) * | 1980-12-16 | 1982-06-23 | Nec Corp | Dry etching device |
-
1985
- 1985-12-25 JP JP1985198397U patent/JPH0528757Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5753939A (en) * | 1980-09-17 | 1982-03-31 | Matsushita Electric Ind Co Ltd | Dry etching method for thin film |
| JPS57100732A (en) * | 1980-12-16 | 1982-06-23 | Nec Corp | Dry etching device |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01287285A (ja) * | 1988-05-13 | 1989-11-17 | Matsushita Electric Ind Co Ltd | ドライエッチング装置 |
| JP2003520418A (ja) * | 1999-09-23 | 2003-07-02 | ラム リサーチ コーポレーション | 放射加熱されるセラミックライナを備えた半導体プロセス装置 |
| JP4837860B2 (ja) * | 1999-09-23 | 2011-12-14 | ラム リサーチ コーポレーション | プラズマ処理システム及び基板の処理方法 |
| JP2022064042A (ja) * | 2020-10-13 | 2022-04-25 | 株式会社Kelk | 基板処理装置 |
| US12183552B2 (en) | 2020-10-13 | 2024-12-31 | Kelk Ltd. | Substrate processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0528757Y2 (https=) | 1993-07-23 |