JPS62101227U - - Google Patents

Info

Publication number

JPS62101227U

JPS62101227U JP19110685U JP19110685U JPS62101227U JP S62101227 U JPS62101227 U JP S62101227U JP 19110685 U JP19110685 U JP 19110685U JP 19110685 U JP19110685 U JP 19110685U JP S62101227 U JPS62101227 U JP S62101227U

Authority

JP

Japan

Prior art keywords

heat treatment

treatment furnace

semiconductor

treatment apparatus

processed

Prior art date

1985-12-13

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 238000010438 heat treatment Methods 0.000 claims description 10
• 239000004065 semiconductor Substances 0.000 claims 5
• 239000000758 substrate Substances 0.000 claims 3
• 239000000463 material Substances 0.000 claims 2
• 238000009423 ventilation Methods 0.000 claims 1
• 239000010453 quartz Substances 0.000 description 4
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
• 238000010586 diagram Methods 0.000 description 3
• 238000009792 diffusion process Methods 0.000 description 1