JPS6181858U - - Google Patents
Info
- Publication number
- JPS6181858U JPS6181858U JP16692084U JP16692084U JPS6181858U JP S6181858 U JPS6181858 U JP S6181858U JP 16692084 U JP16692084 U JP 16692084U JP 16692084 U JP16692084 U JP 16692084U JP S6181858 U JPS6181858 U JP S6181858U
- Authority
- JP
- Japan
- Prior art keywords
- polishing device
- airtight chamber
- support
- pressing
- pressing surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 claims description 6
- 239000012530 fluid Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Description
第１図は本考案の概略を示す斜視図、第２図ａ
ないしｃは本考案の動作を示す説明図である。第
３図は研摩装置の一実施例を示す正面図、第４図
は第３図における−線に沿う断面図である。
第５図は従来例を示す概略図、第６図は従来例の
動作を示す説明図である。
１……ラツピングフイルム、４……研摩面、５
……被加工物、６……支持体、１９……気密室、
２２……加圧手段。
Figure 1 is a perspective view showing the outline of the present invention, Figure 2 a
1 to 3 are explanatory diagrams showing the operation of the present invention. FIG. 3 is a front view showing one embodiment of the polishing device, and FIG. 4 is a sectional view taken along the line - in FIG.
FIG. 5 is a schematic diagram showing a conventional example, and FIG. 6 is an explanatory diagram showing the operation of the conventional example. 1... Wrapping film, 4... Polished surface, 5
...Workpiece, 6...Support, 19...Airtight chamber,
22...pressurizing means.
Claims (1)
物５を摺接可能に配設するとともに、研摩面５の
裏側を支持体６の押圧面７により被加工物５に向
け押圧する研摩装置において、 上記支持体６に、少なくとも周面の一部に弾性
膜からなる押圧面７を備えた気密室１９を設ける
とともに、該気密室１９の内部に圧力流体を導入
可能とした研摩装置。 (2) 前記支持体６の気密室１９は加圧手段２２
と連通され、任意の内圧に設定される実用新案登
録請求の範囲第１項記載の研摩装置。 (3) 支持体６の押圧面７は円筒状であつて、ラ
ツピングフイルム１の送り速度と同一の周速で回
転される実用新案登録請求の範囲第１項または第
２項記載の研摩装置。[Claims for Utility Model Registration] (1) A workpiece 5 is disposed in a slidable manner on the polished surface 4 of the wrapping film 1, and the back side of the polished surface 5 is processed by the pressing surface 7 of the support 6. In the polishing device for pressing the object 5, the support 6 is provided with an airtight chamber 19 having a pressing surface 7 made of an elastic membrane on at least a part of the circumferential surface, and a pressurized fluid is supplied into the airtight chamber 19. Polishing equipment that can be introduced. (2) The airtight chamber 19 of the support body 6 is provided with a pressurizing means 22
The polishing device according to claim 1, which is communicated with the polishing device and is set to an arbitrary internal pressure. (3) The polishing device according to claim 1 or 2, wherein the pressing surface 7 of the support body 6 is cylindrical and rotated at the same circumferential speed as the feeding speed of the wrapping film 1. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16692084U JPS6181858U (en) | 1984-11-01 | 1984-11-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16692084U JPS6181858U (en) | 1984-11-01 | 1984-11-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6181858U true JPS6181858U (en) | 1986-05-30 |
Family
ID=30724727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16692084U Pending JPS6181858U (en) | 1984-11-01 | 1984-11-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6181858U (en) |
-
1984
- 1984-11-01 JP JP16692084U patent/JPS6181858U/ja active Pending